Patents by Inventor Matthew R. Graham

Matthew R. Graham has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11064987
    Abstract: Described are devices, methods, and systems useful in the treatment of fistulae, and in certain embodiments those having openings extending into the alimentary canal, such as anorectal fistulae. Illustratively, an anorectal fistula can be treated by placing a volumetric construct within the primary opening of the fistula. In certain embodiments, the volumetric construct can include a rolled remodelable material processed to form a substantially unitary body. Advantageous such remodelable materials can include collagenous extracellular matrix materials, such as small intestine submucosa.
    Type: Grant
    Filed: May 16, 2017
    Date of Patent: July 20, 2021
    Assignee: Cook Biotech Incorporated
    Inventors: F. Joseph Obermiller, Michael C. Hiles, Matthew R. Graham, Clay D. Fette
  • Patent number: 9956315
    Abstract: Described are medical products, systems, and methods for treating fistulae having a primary opening, such as in the alimentary canal. Certain methods of the invention include providing an implantable material including a compliant sheet form biocompatible material, and forcing this sheet form biocompatible material into the primary opening so as to deform the sheet form biocompatible material to conform to and block the primary opening. The biocompatible material preferably comprises a remodelable material, for example, a remodelable extracellular matrix material such as submucosa.
    Type: Grant
    Filed: April 28, 2006
    Date of Patent: May 1, 2018
    Assignee: Cook Biotech Incorporated
    Inventors: Umesh H. Patel, F. Joseph Obermiller, Matthew R. Graham
  • Patent number: 9832853
    Abstract: An extreme ultraviolet light system includes a steering system that steers and focuses an amplified light beam traveling along a propagation direction to a focal plane near a target location within an extreme ultraviolet light chamber, a detection system including at least one detector positioned to detect an image of a laser beam reflected from at least a portion of a target material within the chamber, a wavefront modification system in the path of the reflected laser beam and between the target location and the detection system, and a controller. The wavefront modification system is configured to modify the wavefront of the reflected laser beam as a function of a target focal plane position along the propagation direction. The controller includes logic for adjusting a location of the focal plane of the amplified light beam relative to the target material based on the detected image of the reflected laser beam.
    Type: Grant
    Filed: February 7, 2014
    Date of Patent: November 28, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Matthew R. Graham, William N. Partlo, Steven Chang, Robert A. Bergstedt
  • Patent number: 9755396
    Abstract: A method and apparatus for control of a dose of extreme ultraviolet (EUV) radiation generated by a laser produced plasma (LPP) EUV light source that combines pulse control mode and pulse modulation. The EUV energy created by each pulse is measured and total EUV energy created by the fired pulses determined, a desired energy for the next pulse is determined based upon whether the total EUV energy is greater or less than a desired average EUV energy times the number of pulses. If the desired pulse energy for the next droplet is within the range of one or more pulse modulation actuators, the pulse is modulated; otherwise, the pulse is fired to miss the droplet. This provides greater control of the accumulated dose as well as uniformity of the EUV energy over time, greater ability to compensate for pulses that generate EUV energy that is higher or lower than nominal expected values, and ability to provide an average EUV energy per pulse that is less than the nominal minimum EUV energy per pulse of the system.
    Type: Grant
    Filed: November 29, 2016
    Date of Patent: September 5, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Paul Frihauf, Andrew Liu, Spencer Rich, Matthew R. Graham, Steven Chang, Wayne J. Dunstan, Daniel Jason Riggs
  • Publication number: 20170245847
    Abstract: Described are devices, methods, and systems useful in the treatment of fistulae, and in certain embodiments those having openings extending into the alimentary canal, such as anorectal fistulae. Illustratively, an anorectal fistula can be treated by placing a volumetric construct within the primary opening of the fistula. In certain embodiments, the volumetric construct can include a rolled remodelable material processed to form a substantially unitary body. Advantageous such remodelable materials can include collagenous extracellular matrix materials, such as small intestine submucosa.
    Type: Application
    Filed: May 16, 2017
    Publication date: August 31, 2017
    Inventors: F. Joseph Obermiller, Michael C. Hiles, Matthew R. Graham, Clay D. Fette
  • Patent number: 9687215
    Abstract: Described are devices, methods, and systems useful in the treatment of fistulae, and in certain embodiments those having openings extending into the alimentary canal, such as anorectal fistulae. Illustratively, an anorectal fistula can be treated by placing a volumetric construct within the primary opening of the fistula. In certain embodiments, the volumetric construct can include a rolled remodelable material processed to form a substantially unitary body. Advantageous such remodelable materials can include collagenous extracellular matrix materials, such as small intestine submucosa.
    Type: Grant
    Filed: November 4, 2009
    Date of Patent: June 27, 2017
    Assignee: Cook Biotech Incorporated
    Inventors: F. Joseph Obermiller, Michael C. Hiles, Matthew R. Graham
  • Patent number: 9588430
    Abstract: Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam is focused on droplets of target material to generate plasma at a primary focal spot. Maintaining droplets at the primary focal spot during burst firing is difficult because generated plasma from preceding droplets push succeeding droplets out of the primary focal spot. Current droplet-to-droplet feedback control to re-align droplets to the primary focal spot is relatively slow. The system and method described herein adaptively pre-compensate for droplet push-out by directing droplets to a target position that is offset from the primary focal spot such that when a droplet is lased, the droplet is pushed by the laser beam into the primary focal spot to generate plasma. Over time, the EUV system learns to maintain real-time alignment of droplet position so plasma is generated consistently within the primary focal spot.
    Type: Grant
    Filed: January 13, 2016
    Date of Patent: March 7, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Jeroen van der Burgt, Matthew R. Graham, Charles Kinney, Wayne J. Dunstan
  • Patent number: 9572556
    Abstract: Described are devices, methods, and systems useful in the treatment of fistulae, and in certain embodiments those having openings extending into the alimentary canal, such as anorectal fistulae. Illustratively, an anorectal fistula can be treated by placing a volumetric construct within the primary opening of the fistula. In certain embodiments, the volumetric construct can include a rolled remodelable material processed to form a substantially unitary body. Advantageous such remodelable materials can include collagenous extracellular matrix materials, such as small intestine submucosa.
    Type: Grant
    Filed: May 1, 2006
    Date of Patent: February 21, 2017
    Assignee: Cook Biotech Incorporated
    Inventors: F. Joseph Obermiller, Michael C. Hiles, Matthew R. Graham
  • Patent number: 9456813
    Abstract: Described are devices, methods, and systems useful in the treatment of fistulae, and in certain embodiments those having openings extending into the alimentary canal, such as anorectal fistulae. Illustratively, an anorectal fistula can be treated by placing a volumetric construct within the primary opening of the fistula. In certain embodiments, the volumetric construct can include a rolled remodelable material processed to form a substantially unitary body. Advantageous such remodelable materials can include collagenous extracellular matrix materials, such as small intestine submucosa.
    Type: Grant
    Filed: April 2, 2012
    Date of Patent: October 4, 2016
    Assignee: Cook Biotech Incorporated
    Inventors: F. Joseph Obermiller, Michael C. Hiles, Matthew R. Graham
  • Publication number: 20160202614
    Abstract: Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam is focused on droplets of target material to generate plasma at a primary focal spot. Maintaining droplets at the primary focal spot during burst firing is difficult because generated plasma from preceding droplets push succeeding droplets out of the primary focal spot. Current droplet-to-droplet feedback control to re-align droplets to the primary focal spot is relatively slow. The system and method described herein adaptively pre-compensate for droplet push-out by directing droplets to a target position that is offset from the primary focal spot such that when a droplet is lased, the droplet is pushed by the laser beam into the primary focal spot to generate plasma. Over time, the EUV system learns to maintain real-time alignment of droplet position so plasma is generated consistently within the primary focal spot.
    Type: Application
    Filed: January 13, 2016
    Publication date: July 14, 2016
    Inventors: Jeroen van der Burgt, Matthew R. Graham, Charles Kinney, Wayne J. Dunstan
  • Patent number: 9238243
    Abstract: Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam is focused on droplets of target material to generate plasma at a primary focal spot. Maintaining droplets at the primary focal spot during burst firing is difficult because generated plasma from preceding droplets push succeeding droplets out of the primary focal spot. Current droplet-to-droplet feedback control to re-align droplets to the primary focal spot is relatively slow. The system and method described herein adaptively pre-compensate for droplet push-out by directing droplets to a target position that is offset from the primary focal spot such that when a droplet is lased, the droplet is pushed by the laser beam into the primary focal spot to generate plasma. Over time, the EUV system learns to maintain real-time alignment of droplet position so plasma is generated consistently within the primary focal spot.
    Type: Grant
    Filed: September 28, 2012
    Date of Patent: January 19, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Jeroen van der Burgt, Matthew R. Graham, Charles Kinney, Wayne J. Dunstan
  • Patent number: 9226736
    Abstract: Described are devices, methods, and systems useful in the treatment of fistulae, and in certain embodiments those having openings extending into the alimentary canal, such as anorectal fistulae. Illustratively, an anorectal fistula can be treated by placing a volumetric construct within the primary opening of the fistula. In certain embodiments, the volumetric construct can include a rolled remodelable material processed to form a substantially unitary body. Advantageous such remodelable materials can include collagenous extracellular matrix materials, such as small intestine submucosa.
    Type: Grant
    Filed: June 3, 2010
    Date of Patent: January 5, 2016
    Assignee: Cook Biotech Incorporated
    Inventors: F. Joseph Obermiller, Michael C. Hiles, Matthew R. Graham
  • Patent number: 8872122
    Abstract: Described herein are embodiments of a method to control energy dose output from a laser-produced plasma extreme ultraviolet light system by adjusting timing of fired laser beam pulses. During stroboscopic firing, pulses are timed to lase droplets until a dose target of EUV has been achieved. Once accumulated EUV reaches the dose target, pulses are timed so as to not lase droplets during the remainder of the packet, and thereby prevent additional EUV light generation during those portions of the packet. In a continuous burst mode, pulses are timed to irradiate droplets until accumulated burst error meets or exceeds a threshold burst error. If accumulated burst error meets or exceeds the threshold burst error, a next pulse is timed to not irradiate a next droplet. Thus, the embodiments described herein manipulate pulse timing to obtain a constant desired dose target that can more precisely match downstream dosing requirements.
    Type: Grant
    Filed: January 10, 2013
    Date of Patent: October 28, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Alexander Schafgans, James Crouch, Matthew R. Graham, Steven Chang, Paul Frihauf, Andrew Liu, Wayne Dunstan
  • Patent number: 8872123
    Abstract: Described herein are embodiments of a method to control energy dose output from a laser-produced plasma extreme ultraviolet light system by adjusting timing of fired laser beam pulses. During stroboscopic firing, pulses are timed to lase droplets until a dose target of EUV has been achieved. Once accumulated EUV reaches the dose target, pulses are timed so as to not lase droplets during the remainder of the packet, and thereby prevent additional EUV light generation during those portions of the packet. In a continuous burst mode, pulses are timed to irradiate droplets until accumulated burst error meets or exceeds a threshold burst error. If accumulated burst error meets or exceeds the threshold burst error, a next pulse is timed to not irradiate a next droplet. Thus, the embodiments described herein manipulate pulse timing to obtain a constant desired dose target that can more precisely match downstream dosing requirements.
    Type: Grant
    Filed: January 10, 2013
    Date of Patent: October 28, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: James Crouch, Robert Jacques, Matthew R. Graham, Andrew Liu
  • Publication number: 20140191132
    Abstract: Described herein are embodiments of a method to control energy dose output from a laser-produced plasma extreme ultraviolet light system by adjusting timing of fired laser beam pulses. During stroboscopic firing, pulses are timed to lase droplets until a dose target of EUV has been achieved. Once accumulated EUV reaches the dose target, pulses are timed so as to not lase droplets during the remainder of the packet, and thereby prevent additional EUV light generation during those portions of the packet. In a continuous burst mode, pulses are timed to irradiate droplets until accumulated burst error meets or exceeds a threshold burst error. If accumulated burst error meets or exceeds the threshold burst error, a next pulse is timed to not irradiate a next droplet. Thus, the embodiments described herein manipulate pulse timing to obtain a constant desired dose target that can more precisely match downstream dosing requirements.
    Type: Application
    Filed: January 10, 2013
    Publication date: July 10, 2014
    Applicant: Cymer, Inc.
    Inventors: Alexander Schafgans, James Crouch, Matthew R. Graham, Steven Chang, Paul Frihauf, Andrew Liu, Wayne Dunstan
  • Publication number: 20140191133
    Abstract: Described herein are embodiments of a method to control energy dose output from a laser-produced plasma extreme ultraviolet light system by adjusting timing of fired laser beam pulses. During stroboscopic firing, pulses are timed to lase droplets until a dose target of EUV has been achieved. Once accumulated EUV reaches the dose target, pulses are timed so as to not lase droplets during the remainder of the packet, and thereby prevent additional EUV light generation during those portions of the packet. In a continuous burst mode, pulses are timed to irradiate droplets until accumulated burst error meets or exceeds a threshold burst error. If accumulated burst error meets or exceeds the threshold burst error, a next pulse is timed to not irradiate a next droplet. Thus, the embodiments described herein manipulate pulse timing to obtain a constant desired dose target that can more precisely match downstream dosing requirements.
    Type: Application
    Filed: January 10, 2013
    Publication date: July 10, 2014
    Applicant: Cymer, Inc.
    Inventors: James Crouch, Robert Jacques, Matthew R. Graham, Andrew Liu
  • Publication number: 20140151583
    Abstract: An extreme ultraviolet light system includes a steering system that steers and focuses an amplified light beam traveling along a propagation direction to a focal plane near a target location within an extreme ultraviolet light chamber, a detection system including at least one detector positioned to detect an image of a laser beam reflected from at least a portion of a target material within the chamber, a wavefront modification system in the path of the reflected laser beam and between the target location and the detection system, and a controller. The wavefront modification system is configured to modify the wavefront of the reflected laser beam as a function of a target focal plane position along the propagation direction. The controller includes logic for adjusting a location of the focal plane of the amplified light beam relative to the target material based on the detected image of the reflected laser beam.
    Type: Application
    Filed: February 7, 2014
    Publication date: June 5, 2014
    Inventors: Matthew R. Graham, William N. Partlo, Steven Chang, Robert A. Bergstedt
  • Publication number: 20140091239
    Abstract: Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam is focused on droplets of target material to generate plasma at a primary focal spot. Maintaining droplets at the primary focal spot during burst firing is difficult because generated plasma from preceding droplets push succeeding droplets out of the primary focal spot Current droplet-to-droplet feedback control to re-align droplets to the primary focal spot is relatively slow. The system and method described herein adaptively pre-compensate for droplet push-out by directing droplets to a target position that is offset from the primary focal spot such that when a droplet is lased, the droplet is pushed by the laser beam into the primary focal spot to generate plasma. Over time, the EUV system learns to maintain real-time alignment of droplet position so plasma is generated consistently within the primary focal spot.
    Type: Application
    Filed: September 28, 2012
    Publication date: April 3, 2014
    Inventors: Jeroen van der Burgt, Matthew R. Graham, Charles Kinney, Wayne J. Dunstan
  • Patent number: D800221
    Type: Grant
    Filed: April 29, 2015
    Date of Patent: October 17, 2017
    Inventor: Matthew R. Graham
  • Patent number: D800222
    Type: Grant
    Filed: April 29, 2015
    Date of Patent: October 17, 2017
    Inventor: Matthew R. Graham