Patents by Inventor Matthew R. Graham
Matthew R. Graham has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11064987Abstract: Described are devices, methods, and systems useful in the treatment of fistulae, and in certain embodiments those having openings extending into the alimentary canal, such as anorectal fistulae. Illustratively, an anorectal fistula can be treated by placing a volumetric construct within the primary opening of the fistula. In certain embodiments, the volumetric construct can include a rolled remodelable material processed to form a substantially unitary body. Advantageous such remodelable materials can include collagenous extracellular matrix materials, such as small intestine submucosa.Type: GrantFiled: May 16, 2017Date of Patent: July 20, 2021Assignee: Cook Biotech IncorporatedInventors: F. Joseph Obermiller, Michael C. Hiles, Matthew R. Graham, Clay D. Fette
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Patent number: 9956315Abstract: Described are medical products, systems, and methods for treating fistulae having a primary opening, such as in the alimentary canal. Certain methods of the invention include providing an implantable material including a compliant sheet form biocompatible material, and forcing this sheet form biocompatible material into the primary opening so as to deform the sheet form biocompatible material to conform to and block the primary opening. The biocompatible material preferably comprises a remodelable material, for example, a remodelable extracellular matrix material such as submucosa.Type: GrantFiled: April 28, 2006Date of Patent: May 1, 2018Assignee: Cook Biotech IncorporatedInventors: Umesh H. Patel, F. Joseph Obermiller, Matthew R. Graham
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Patent number: 9832853Abstract: An extreme ultraviolet light system includes a steering system that steers and focuses an amplified light beam traveling along a propagation direction to a focal plane near a target location within an extreme ultraviolet light chamber, a detection system including at least one detector positioned to detect an image of a laser beam reflected from at least a portion of a target material within the chamber, a wavefront modification system in the path of the reflected laser beam and between the target location and the detection system, and a controller. The wavefront modification system is configured to modify the wavefront of the reflected laser beam as a function of a target focal plane position along the propagation direction. The controller includes logic for adjusting a location of the focal plane of the amplified light beam relative to the target material based on the detected image of the reflected laser beam.Type: GrantFiled: February 7, 2014Date of Patent: November 28, 2017Assignee: ASML Netherlands B.V.Inventors: Matthew R. Graham, William N. Partlo, Steven Chang, Robert A. Bergstedt
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Patent number: 9755396Abstract: A method and apparatus for control of a dose of extreme ultraviolet (EUV) radiation generated by a laser produced plasma (LPP) EUV light source that combines pulse control mode and pulse modulation. The EUV energy created by each pulse is measured and total EUV energy created by the fired pulses determined, a desired energy for the next pulse is determined based upon whether the total EUV energy is greater or less than a desired average EUV energy times the number of pulses. If the desired pulse energy for the next droplet is within the range of one or more pulse modulation actuators, the pulse is modulated; otherwise, the pulse is fired to miss the droplet. This provides greater control of the accumulated dose as well as uniformity of the EUV energy over time, greater ability to compensate for pulses that generate EUV energy that is higher or lower than nominal expected values, and ability to provide an average EUV energy per pulse that is less than the nominal minimum EUV energy per pulse of the system.Type: GrantFiled: November 29, 2016Date of Patent: September 5, 2017Assignee: ASML Netherlands B.V.Inventors: Paul Frihauf, Andrew Liu, Spencer Rich, Matthew R. Graham, Steven Chang, Wayne J. Dunstan, Daniel Jason Riggs
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Publication number: 20170245847Abstract: Described are devices, methods, and systems useful in the treatment of fistulae, and in certain embodiments those having openings extending into the alimentary canal, such as anorectal fistulae. Illustratively, an anorectal fistula can be treated by placing a volumetric construct within the primary opening of the fistula. In certain embodiments, the volumetric construct can include a rolled remodelable material processed to form a substantially unitary body. Advantageous such remodelable materials can include collagenous extracellular matrix materials, such as small intestine submucosa.Type: ApplicationFiled: May 16, 2017Publication date: August 31, 2017Inventors: F. Joseph Obermiller, Michael C. Hiles, Matthew R. Graham, Clay D. Fette
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Patent number: 9687215Abstract: Described are devices, methods, and systems useful in the treatment of fistulae, and in certain embodiments those having openings extending into the alimentary canal, such as anorectal fistulae. Illustratively, an anorectal fistula can be treated by placing a volumetric construct within the primary opening of the fistula. In certain embodiments, the volumetric construct can include a rolled remodelable material processed to form a substantially unitary body. Advantageous such remodelable materials can include collagenous extracellular matrix materials, such as small intestine submucosa.Type: GrantFiled: November 4, 2009Date of Patent: June 27, 2017Assignee: Cook Biotech IncorporatedInventors: F. Joseph Obermiller, Michael C. Hiles, Matthew R. Graham
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Patent number: 9588430Abstract: Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam is focused on droplets of target material to generate plasma at a primary focal spot. Maintaining droplets at the primary focal spot during burst firing is difficult because generated plasma from preceding droplets push succeeding droplets out of the primary focal spot. Current droplet-to-droplet feedback control to re-align droplets to the primary focal spot is relatively slow. The system and method described herein adaptively pre-compensate for droplet push-out by directing droplets to a target position that is offset from the primary focal spot such that when a droplet is lased, the droplet is pushed by the laser beam into the primary focal spot to generate plasma. Over time, the EUV system learns to maintain real-time alignment of droplet position so plasma is generated consistently within the primary focal spot.Type: GrantFiled: January 13, 2016Date of Patent: March 7, 2017Assignee: ASML Netherlands B.V.Inventors: Jeroen van der Burgt, Matthew R. Graham, Charles Kinney, Wayne J. Dunstan
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Patent number: 9572556Abstract: Described are devices, methods, and systems useful in the treatment of fistulae, and in certain embodiments those having openings extending into the alimentary canal, such as anorectal fistulae. Illustratively, an anorectal fistula can be treated by placing a volumetric construct within the primary opening of the fistula. In certain embodiments, the volumetric construct can include a rolled remodelable material processed to form a substantially unitary body. Advantageous such remodelable materials can include collagenous extracellular matrix materials, such as small intestine submucosa.Type: GrantFiled: May 1, 2006Date of Patent: February 21, 2017Assignee: Cook Biotech IncorporatedInventors: F. Joseph Obermiller, Michael C. Hiles, Matthew R. Graham
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Patent number: 9456813Abstract: Described are devices, methods, and systems useful in the treatment of fistulae, and in certain embodiments those having openings extending into the alimentary canal, such as anorectal fistulae. Illustratively, an anorectal fistula can be treated by placing a volumetric construct within the primary opening of the fistula. In certain embodiments, the volumetric construct can include a rolled remodelable material processed to form a substantially unitary body. Advantageous such remodelable materials can include collagenous extracellular matrix materials, such as small intestine submucosa.Type: GrantFiled: April 2, 2012Date of Patent: October 4, 2016Assignee: Cook Biotech IncorporatedInventors: F. Joseph Obermiller, Michael C. Hiles, Matthew R. Graham
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Publication number: 20160202614Abstract: Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam is focused on droplets of target material to generate plasma at a primary focal spot. Maintaining droplets at the primary focal spot during burst firing is difficult because generated plasma from preceding droplets push succeeding droplets out of the primary focal spot. Current droplet-to-droplet feedback control to re-align droplets to the primary focal spot is relatively slow. The system and method described herein adaptively pre-compensate for droplet push-out by directing droplets to a target position that is offset from the primary focal spot such that when a droplet is lased, the droplet is pushed by the laser beam into the primary focal spot to generate plasma. Over time, the EUV system learns to maintain real-time alignment of droplet position so plasma is generated consistently within the primary focal spot.Type: ApplicationFiled: January 13, 2016Publication date: July 14, 2016Inventors: Jeroen van der Burgt, Matthew R. Graham, Charles Kinney, Wayne J. Dunstan
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Patent number: 9238243Abstract: Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam is focused on droplets of target material to generate plasma at a primary focal spot. Maintaining droplets at the primary focal spot during burst firing is difficult because generated plasma from preceding droplets push succeeding droplets out of the primary focal spot. Current droplet-to-droplet feedback control to re-align droplets to the primary focal spot is relatively slow. The system and method described herein adaptively pre-compensate for droplet push-out by directing droplets to a target position that is offset from the primary focal spot such that when a droplet is lased, the droplet is pushed by the laser beam into the primary focal spot to generate plasma. Over time, the EUV system learns to maintain real-time alignment of droplet position so plasma is generated consistently within the primary focal spot.Type: GrantFiled: September 28, 2012Date of Patent: January 19, 2016Assignee: ASML Netherlands B.V.Inventors: Jeroen van der Burgt, Matthew R. Graham, Charles Kinney, Wayne J. Dunstan
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Patent number: 9226736Abstract: Described are devices, methods, and systems useful in the treatment of fistulae, and in certain embodiments those having openings extending into the alimentary canal, such as anorectal fistulae. Illustratively, an anorectal fistula can be treated by placing a volumetric construct within the primary opening of the fistula. In certain embodiments, the volumetric construct can include a rolled remodelable material processed to form a substantially unitary body. Advantageous such remodelable materials can include collagenous extracellular matrix materials, such as small intestine submucosa.Type: GrantFiled: June 3, 2010Date of Patent: January 5, 2016Assignee: Cook Biotech IncorporatedInventors: F. Joseph Obermiller, Michael C. Hiles, Matthew R. Graham
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Patent number: 8872122Abstract: Described herein are embodiments of a method to control energy dose output from a laser-produced plasma extreme ultraviolet light system by adjusting timing of fired laser beam pulses. During stroboscopic firing, pulses are timed to lase droplets until a dose target of EUV has been achieved. Once accumulated EUV reaches the dose target, pulses are timed so as to not lase droplets during the remainder of the packet, and thereby prevent additional EUV light generation during those portions of the packet. In a continuous burst mode, pulses are timed to irradiate droplets until accumulated burst error meets or exceeds a threshold burst error. If accumulated burst error meets or exceeds the threshold burst error, a next pulse is timed to not irradiate a next droplet. Thus, the embodiments described herein manipulate pulse timing to obtain a constant desired dose target that can more precisely match downstream dosing requirements.Type: GrantFiled: January 10, 2013Date of Patent: October 28, 2014Assignee: ASML Netherlands B.V.Inventors: Alexander Schafgans, James Crouch, Matthew R. Graham, Steven Chang, Paul Frihauf, Andrew Liu, Wayne Dunstan
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Patent number: 8872123Abstract: Described herein are embodiments of a method to control energy dose output from a laser-produced plasma extreme ultraviolet light system by adjusting timing of fired laser beam pulses. During stroboscopic firing, pulses are timed to lase droplets until a dose target of EUV has been achieved. Once accumulated EUV reaches the dose target, pulses are timed so as to not lase droplets during the remainder of the packet, and thereby prevent additional EUV light generation during those portions of the packet. In a continuous burst mode, pulses are timed to irradiate droplets until accumulated burst error meets or exceeds a threshold burst error. If accumulated burst error meets or exceeds the threshold burst error, a next pulse is timed to not irradiate a next droplet. Thus, the embodiments described herein manipulate pulse timing to obtain a constant desired dose target that can more precisely match downstream dosing requirements.Type: GrantFiled: January 10, 2013Date of Patent: October 28, 2014Assignee: ASML Netherlands B.V.Inventors: James Crouch, Robert Jacques, Matthew R. Graham, Andrew Liu
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Publication number: 20140191132Abstract: Described herein are embodiments of a method to control energy dose output from a laser-produced plasma extreme ultraviolet light system by adjusting timing of fired laser beam pulses. During stroboscopic firing, pulses are timed to lase droplets until a dose target of EUV has been achieved. Once accumulated EUV reaches the dose target, pulses are timed so as to not lase droplets during the remainder of the packet, and thereby prevent additional EUV light generation during those portions of the packet. In a continuous burst mode, pulses are timed to irradiate droplets until accumulated burst error meets or exceeds a threshold burst error. If accumulated burst error meets or exceeds the threshold burst error, a next pulse is timed to not irradiate a next droplet. Thus, the embodiments described herein manipulate pulse timing to obtain a constant desired dose target that can more precisely match downstream dosing requirements.Type: ApplicationFiled: January 10, 2013Publication date: July 10, 2014Applicant: Cymer, Inc.Inventors: Alexander Schafgans, James Crouch, Matthew R. Graham, Steven Chang, Paul Frihauf, Andrew Liu, Wayne Dunstan
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Publication number: 20140191133Abstract: Described herein are embodiments of a method to control energy dose output from a laser-produced plasma extreme ultraviolet light system by adjusting timing of fired laser beam pulses. During stroboscopic firing, pulses are timed to lase droplets until a dose target of EUV has been achieved. Once accumulated EUV reaches the dose target, pulses are timed so as to not lase droplets during the remainder of the packet, and thereby prevent additional EUV light generation during those portions of the packet. In a continuous burst mode, pulses are timed to irradiate droplets until accumulated burst error meets or exceeds a threshold burst error. If accumulated burst error meets or exceeds the threshold burst error, a next pulse is timed to not irradiate a next droplet. Thus, the embodiments described herein manipulate pulse timing to obtain a constant desired dose target that can more precisely match downstream dosing requirements.Type: ApplicationFiled: January 10, 2013Publication date: July 10, 2014Applicant: Cymer, Inc.Inventors: James Crouch, Robert Jacques, Matthew R. Graham, Andrew Liu
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Publication number: 20140151583Abstract: An extreme ultraviolet light system includes a steering system that steers and focuses an amplified light beam traveling along a propagation direction to a focal plane near a target location within an extreme ultraviolet light chamber, a detection system including at least one detector positioned to detect an image of a laser beam reflected from at least a portion of a target material within the chamber, a wavefront modification system in the path of the reflected laser beam and between the target location and the detection system, and a controller. The wavefront modification system is configured to modify the wavefront of the reflected laser beam as a function of a target focal plane position along the propagation direction. The controller includes logic for adjusting a location of the focal plane of the amplified light beam relative to the target material based on the detected image of the reflected laser beam.Type: ApplicationFiled: February 7, 2014Publication date: June 5, 2014Inventors: Matthew R. Graham, William N. Partlo, Steven Chang, Robert A. Bergstedt
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Publication number: 20140091239Abstract: Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam is focused on droplets of target material to generate plasma at a primary focal spot. Maintaining droplets at the primary focal spot during burst firing is difficult because generated plasma from preceding droplets push succeeding droplets out of the primary focal spot Current droplet-to-droplet feedback control to re-align droplets to the primary focal spot is relatively slow. The system and method described herein adaptively pre-compensate for droplet push-out by directing droplets to a target position that is offset from the primary focal spot such that when a droplet is lased, the droplet is pushed by the laser beam into the primary focal spot to generate plasma. Over time, the EUV system learns to maintain real-time alignment of droplet position so plasma is generated consistently within the primary focal spot.Type: ApplicationFiled: September 28, 2012Publication date: April 3, 2014Inventors: Jeroen van der Burgt, Matthew R. Graham, Charles Kinney, Wayne J. Dunstan
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Patent number: D800221Type: GrantFiled: April 29, 2015Date of Patent: October 17, 2017Inventor: Matthew R. Graham
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Patent number: D800222Type: GrantFiled: April 29, 2015Date of Patent: October 17, 2017Inventor: Matthew R. Graham