Patents by Inventor Max Zhang

Max Zhang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12127334
    Abstract: An example system for maintaining the shape of a circuit board includes metal balls that are configured not to collapse in whole or part in response to a force below a predefined force and a temperature below a predefined temperature. The metal balls are configured to support a substrate and are part of electrical connections between the substrate and a circuit board. The system includes a fixture configured to apply force to the substrate while the substrate is subjected to the temperature. The fixture is configured to distribute the force across a surface of the substrate that is not in contact with the metal balls such that the force applied by the fixture and the support of the substrate by the metal balls maintains a shape of the substrate at the temperature.
    Type: Grant
    Filed: February 26, 2019
    Date of Patent: October 22, 2024
    Assignee: Dis Tech America, LLC
    Inventors: Heng-Kit Too, Xue-Bin Tan, Max Zhang, Rocky Tao, Brian Brecht, Iris Weng, Hale Deng
  • Publication number: 20200253041
    Abstract: An example system for maintaining the shape of a circuit board includes metal balls that are configured not to collapse in whole or part in response to a force below a predefined force and a temperature below a predefined temperature. The metal balls are configured to support a substrate and are part of electrical connections between the substrate and a circuit board. The system includes a fixture configured to apply force to the substrate while the substrate is subjected to the temperature. The fixture is configured to distribute the force across a surface of the substrate that is not in contact with the metal balls such that the force applied by the fixture and the support of the substrate by the metal balls maintains a shape of the substrate at the temperature.
    Type: Application
    Filed: February 26, 2019
    Publication date: August 6, 2020
    Inventors: Heng-Kit Too, Xue-Bin Tan, Max Zhang, Rocky Tao, Brian Brecht, Iris Weng, Hale Deng
  • Patent number: 10074695
    Abstract: A negative differential resistance (NDR) device for non-volatile memory cells in crossbar arrays is provided. Each non-volatile memory cell is situated at a crosspoint of the array. Each non-volatile memory cell comprises a switching layer in series with an NDR material containing fast diffusive atoms that are electrochemically inactive. The switching layer is positioned between two elec-trodes.
    Type: Grant
    Filed: December 19, 2014
    Date of Patent: September 11, 2018
    Assignee: Hewlett Packard Enterprise Development LP
    Inventors: Jianhua Yang, Stanley Williams, Max Zhang, Zhiyong Li
  • Publication number: 20170243924
    Abstract: A negative differential resistance (NDR) device for non-volatile memory cells in crossbar arrays is provided. Each non-volatile memory cell is situated at a crosspoint of the array. Each non-volatile memory cell comprises a switching layer in series with an NDR material containing fast diffusive atoms that are electrochemically inactive. The switching layer is positioned between two elec-trodes.
    Type: Application
    Filed: December 19, 2014
    Publication date: August 24, 2017
    Applicant: HEWLETT PACKARD ENTERPRISE DEVELOPMENT LP
    Inventors: Jianhua YANG, Stanley WILLIAMS, Max ZHANG, Zhiyong LI
  • Publication number: 20150053909
    Abstract: A nonlinear memristor includes a bottom electrode, a top electrode, and an insulator layer between the bottom electrode and the top electrode. The insulator layer comprises a metal oxide. The nonlinear memristor further includes a switching channel within the insulator layer, extending from the bottom electrode toward the top electrode, and a nano-cap layer of a metal-insulator-transition material between the switching channel and the top electrode. The top electrode comprises the same metal as the metal in the metal-insulator-transition material.
    Type: Application
    Filed: April 25, 2012
    Publication date: February 26, 2015
    Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, LP.
    Inventors: Jianhua Yang, Max Zhang, Matthew D. Pickett, R. Stanley Williams