Abstract: A separator carries lithium particles on its surface. Using the separator, a non-aqueous electrolyte secondary battery having a high initial efficiency and improved cycle retentivity is available.

Abstract: A SiCO—Li composite is prepared by causing a reactive silane and/or siloxane having crosslinkable groups to crosslink, sintering the crosslinked product into an inorganic Si—C—O composite, and doping the Si—C—O composite with lithium. When the SiCO—Li composite is used as a negative electrode, a lithium ion secondary cell exhibits good cycle performance, unique discharge characteristics and improved initial efficiency.

Abstract: A silicon-silicon oxide-lithium composite comprises a silicon-silicon oxide composite having such a structure that silicon grains having a size of 0.5-50 nm are dispersed in silicon oxide, the silicon-silicon oxide composite being doped with lithium. Using the silicon-silicon oxide-lithium composite as a negative electrode material, a lithium ion secondary cell having a high initial efficiency and improved cycle performance can be constructed.

Abstract: A non-aqueous electrolytic solution is provided comprising a non-aqueous solvent, an electrolyte salt, and a siloxane-modified polyoxyalkylene compound having (poly)organosiloxane structures at both ends of polyoxyalkylene. A secondary battery using the same has improved temperature characteristics and high-output characteristics.

Abstract: A siloxane modified with a cyclic carbonate of the formula: is combined with a non-aqueous solvent and an electrolyte salt to form a non-aqueous electrolytic solution, which is used to construct a secondary battery having improved temperature and cycle characteristics.

Abstract: A cyclic carbonate-modified silane or siloxane is combined with a non-aqueous solvent and an electrolyte salt to form a non-aqueous electrolytic solution, which is used to construct a secondary battery having improved temperature and cycle characteristics.

Abstract: A carbonate-modified silane or siloxane is combined with a non-aqueous solvent and an electrolyte salt to form a non-aqueous electrolytic solution, which is used to construct a secondary battery having improved charge/discharge characteristics.

Abstract: A polyoxyalkylene-modified silane is combined with a non-aqueous solvent and an electrolyte salt to form a non-aqueous electrolytic solution, which is used to construct a secondary battery having improved temperature and high-output characteristics.

Abstract: A non-aqueous electrolytic solution is provided comprising a non-aqueous solvent, an electrolyte salt, and a siloxane-modified polyoxyalkylene compound having (poly)organosiloxane structures at both ends of polyoxyalkylene. A secondary battery using the same has improved temperature characteristics and high-output characteristics.

Abstract: A cyclic carbonate-modified silane or siloxane is combined with a non-aqueous solvent and an electrolyte salt to form a non-aqueous electrolytic solution, which is used to construct a secondary battery having improved temperature and high-output characteristics.

Abstract: A non-aqueous electrolytic solution is provided comprising a non-aqueous solvent, an electrolyte salt, and a siloxane modified with ether bond-bearing organic group. A non-aqueous electrolyte secondary battery using the same has improved characteristics both at low temperatures and at high outputs.

Abstract: There is disclosed a pellicle having a pellicle frame with at least one vent for controlling atmospheric pressure and a filter attached so as to cover the vent, wherein it takes 5 minutes to 180 minutes, to restore a pellicle film swelled during a step of attaching the pellicle to the exposure original plate under atmospheric pressure of 760 mmHg followed by reducing atmospheric pressure to 500 mmHg and keeping the pressure, to the original state and a method for producing it, and a pellicle with a filter having a pellicle frame with at least one vent for controlling atmospheric pressure wherein all over the inner surface of the filter attached so as to cover said vent is impregnated with a resin, and 50% by volume or more of the filter is impregnated therewith.

Abstract: There is disclosed a jig for producing a pellicle comprising a support frame having an opening, and an adhesive layer provided at periphery of the opening, wherein the adhesive layer is composed of a polymer material having a glass transition temperature within a range of 0° C. to 300° C. The jig of the present invention can be repeatedly used without reforming the adhesive layer after use.

Abstract: Proposed is a frame-supported pellicle used for dustproof protection of a photomask in the photolithographic patterning work for the manufacture of electronic fine devices such as LSIs, VLSIs and the like by mounting thereon. The inventive frame-supported pellicle is characterized in that the pellicle frame, to which a pellicle membrane is adhesively bonded on one of the end surfaces, is partly subjected to smoothing treatment. The inventive frame-supported pellicle can solve the heretofore unavoidable problems of dust particle deposition on the photomask even under dustproof protection with a pellicle as well as the high cost of the preparation of the pellicle and the difficulty of finding of any dust particles deposited on the surface of the frame.

Abstract: A pellicle for a mask or substrate including a frame having one end surface and another end surface and a membrane extended over the frame on the one end surface side. A channel is formed in the other end surface of the frame. The channel is filled with a layer of a tackifier capable of expanding upon heating and/or light irradiation such that the tackifier layer does not protrude outward beyond the other end surface of the frame in an unexpanded state, but protrudes outward beyond the other end surface of the frame when expanded. No liner is attached to the tackifier layer.

Abstract: Proposed is an improvement in a frame-supported pellicle, which is a device for dust-proof protection of a photomask used in the photolithographic patterning works in the manufacture of fine electronic devices, consisting of a rigid pellicle frame, a highly transparent membrane of a plastic resin spread over and adhesively bonded to one end surface of the pellicle frame in a slack-free fashion and a layer of a pressure-sensitive adhesive formed on the other end surface of the pellicle frame to facilitate mounting of the frame-supported pellicle on the surface of a photomask and to secure the same at the correct position.

Abstract: Disclosed is a frame-supported pellicle, which is an integral body consisting of a rigid frame and a transparent plastic film adhesively bonded to one end surface of the frame in a slack-free fashion, for dustproof protection of a photomask used in a photolithographic patterning work in the manufacture of fine electronic devices such as LSIs and liquid crystal display panels. The frame-supported pellicle is prepared by bonding the frame and plastic film with an adhesive having a glass transition temperature substantially lower than that of the polymeric resin forming the film and the adhesive bonding work is performed at a temperature higher than the glass transition temperature of the adhesive but lower than that of the polymeric resin of the film so that excellent adhesive bonding strength can be obtained between the frame and the resin film still without causing any adverse influences on the resin film such as distortion and crease formation.

Abstract: Disclosed is a frame-supported pellicle for dust-proofing of a photolithographic photomask used for patteriwse light exposure in the manufacturing process of, for example, semiconductor devices, which comprises (a) a frame member, (b) a transparent polymeric film supported by the frame member and (c) a coating layer of a sticky adhesive on one surface of the polymeric film to capture any dust particles in the space between the photomask and the pellicle. The inventive pellicle is imparted with a greatly improved serviceable life with stability against ultraviolet irradiation relative to the adhesive coating layer which is formed from a specific organo-polysiloxane-based adhesive composition.

Abstract: An improvement is proposed for a frame-supported pellicle used for dust-proof protection of a photomask in the photolithographic patterning work in the manufacture of semiconductor devices. In view of the problem that, when a frame-supported pellicle having the other end surface of the frame coated with a pressure-sensitive adhesive and temporarily protected by attaching a releasable protective sheet of a plastic resin prepared by die punching is handled or transported as packaged, subsequent occurrence of dust particles is more or less unavoidable from the rugged die-punched sections, the die-punched peripheries of the protective sheet is subjected to a smoothening treatment by locally dissolving with an organic solvent, by locally melting at a temperature higher than the melting point of the plastic resin or by coating with a coating composition so that the protective sheet is absolutely not responsible for the subsequent formation of dust particles.

Abstract: Proposed is an improved frame-supported pellicle, which is an integral body consisting of a rigid frame, a transparent plastic resin film adhesively bonded to one end surface of the frame in a slack-free fashion and a layer of a pressure-sensitive adhesive on the other end surface of the frame. The improvement consists in the use of a specific pressure-sensitive adhesive capable of being imparted with a greatly decreased bonding strength when it is heated at a temperature higher than a critical temperature or irradiated with UV light in a dose exceeding a critical dose so as to facilitate demounting of the frame-supported pellicle from a photomask on which the pellicle is mounted when it is to be replaced with a new pellicle without leaving any fragments of the adhesive adherent to the photomask surface.