Patents by Inventor Meng-Song Yin

Meng-Song Yin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PPE derivatives and resin composition having the same
    Publication number: 20020072585
    Abstract: This invention relates to a partially or exhaustively derivatized PPE. The partially derivatized PPE comprises vinylated phenylene ether repeating unit, and at least one another repeating unit, which is selected from a phenylene ether repeating unit and a hydroxylated phenylene ether repeating unit. A resin composition having a low curing temperature is also disclosed, which comprises: (a) a partially or exhaustively derivatized PPE; and (b) a free radical initiator.
    Type: Application
    Filed: December 28, 2000
    Publication date: June 13, 2002
    Applicant: Industrial Technology Research Institute
    Inventors: Chingchen S. Chiu, Chien-Ting Lin, Gue-Wuu Hwang, Li-Chung Liang, Meng-Song Yin
  • Triazine hardener and epoxy composition containing the same
    Patent number: 6225378
    Abstract: A triazine compound having formula I or formula II: Wherein n is integer from 1 to 5; R1 is hydrogen, halogen, C1-C4 alkyl, or C1-C4 alkoxyl; and R2 is aliphatic amine, aliphatic alcohol, alicyclic amine or alicyclic alcohol, and an epoxy resin composition containing the triazine compound. The epoxy resin composition is suitable for the preparation of the structural substrate of printed circuit boards having low dielectric constant.
    Type: Grant
    Filed: July 1, 1999
    Date of Patent: May 1, 2001
    Assignee: Industrial Technology Research Institute
    Inventors: Shin-Shin Wang, Hung-Chou Kang, Jie-Hwa Ma, Meng-Song Yin, Se-Tsun Hong, Kuo-Yuan Hsu, Kung-Lung Cheng
  • Epoxy resin composition
    Patent number: 6090870
    Abstract: The present invention provides an epoxy resin composition, comprising:(A) a phenol epoxy resin represented by the following formula (I) ##STR1## wherein each R.sup.1 is the same or different and is independently selected from the group consisting of hydrogen, C.sub.1 to C.sub.6 hydrocarbyl groups, C.sub.6 to C.sub.10 aromatic groups, and C.sub.1 to C.sub.6 hydrocarbyl-substituted C.sub.6 to C.sub.10 aromatic groups,each R.sup.2 is the same or different and is independently selected from the group consisting of hydrogen, C.sub.1 to C.sub.6 hydrocarbyl groups, C.sub.6 to C.sub.10 aromatic groups, and C.sub.1 to C.sub.6 hydrocarbyl-substituted C.sub.6 to C.sub.10 aromatic groups, ##STR2## wherein R.sup.3 is selected from the group consisting of hydrogen, C.sub.1 to C.sub.6 hydrocarbyl groups, C.sub.6 to C.sub.10 aromatic groups, and C.sub.1 to C.sub.6 hydrocarbyl-substituted C.sub.6 to C.sub.10 aromatic groups, each R.sup.
    Type: Grant
    Filed: October 30, 1998
    Date of Patent: July 18, 2000
    Assignee: Industrial Technology Research Institute
    Inventors: Hsiu-Rong Chang, Yeong-Tsyr Hwang, Meng-Song Yin, Kung-Lung Cheng