Abstract: Rule reasoner includes: a Rete network builder for receiving ontology, including ontology instance represented by triple and ontology schema defining classes and properties of the triple, and reasoning rule, building Rete network corresponding to the ontology and the reasoning rule, selecting clue pattern corresponding to wild pattern rule with reference to the ontology schema when reasoning rule having wild pattern is received, rewriting the wild pattern rule with reference to the clue pattern, and adding test node, alpha memory node, and wild rule node so that the rewritten wild pattern rule is incorporated; a Rete network implementer for generating reasoned triple by implementing the Rete network built by the Rete network builder or generating reasoning rule where the wild pattern rule is dynamically materialized; and a Rete network expander expanding the Rete network by inputting the new reasoning rule, generated by the Rete network implementer, to the Rete network builder.

Abstract: A system and method for hybrid Rete reasoning based on memory and DBMS are provided. The system for hybrid Rete reasoning based on memory and DBMS includes a reasoning rule type classification means for classifying an input reasoning rule as one of one or more types. A network generation means generates a network depending on the classified reasoning rule type. A network execution means derives extended triples by applying a predetermined triple to the generated network.

Abstract: An apparatus and method for automatically collecting metallic impurities of a semiconductor wafer. In one aspect, an apparatus includes an air tight process chamber including a loading unit for loading the semiconductor wafer and unloading unit for unloading the semiconductor wafer; a vapor phase decomposition unit disposed in the process chamber for decomposing a silicon oxide layer on the semiconductor wafer; and a scanning unit disposed in the process chamber for scanning the semiconductor wafer to collect the metallic impurities. The scanning unit includes a scanning solution bottle for obtaining scanning solution that is used for absorbing metallic impurities on the semiconductor wafer; a scanning arm capable of downward, upward, and rotational movement; and a nozzle coupled to the scanning arm for drawing in scanning solution from the scanning solution bottle, and for forming a droplet of scanning solution that cohers to the nozzle when scanning a semiconductor wafer to collect metallic impurities.

Abstract: A plasma display panel and a method for fabricating the same are disclosed, in which the fabricating process time of the plasma display panel can be reduced, characteristic and performance of the panel can be prevented from being reduced, and the panel can be prevented from being damaged. Also, a panel structure is not changed by external pressure variation.

Abstract: The present invention describes a wastewater treatment method by a microorganism decomposing Tetramethyl Ammonium Hydroxide (TMAH) which, utilized in etching the surface of silicone chip in semiconductor manufacturing process, is toxic and hard to decompose. The present invention provides novel microorganisms capable of decomposing TMAH. Also, the present invention provides a treatment method for wastewater containing TMAH, using the microorganisms. The present invention is useful in industrial field as an environmental friendly wastewater treatment method by decomposing over 90% of TMAH, one of environmental contamination materials in the wastewater of semiconductor factory.

Abstract: The present invention describes a wastewater treatment method by a microorganism decomposing Tetramethyl Ammonium Hydroxide (TMAH) which, utilized in etching the surface of silicone chip in semiconductor manufacturing process, is toxic and hard to decompose. The present invention provides novel microorganisms capable of decomposing TMAH. Also, the present invention provides a treatment method for wastewater containing TMAH, using the microorganisms. The present invention is useful in industrial field as an environmental friendly wastewater treatment method by decomposing over 90% of TMAH, one of environmental contamination materials in the wastewater of semiconductor factory.

Abstract: Disclosed are a plasma display panel, apparatus for fabricating the same, and fabrication process thereof enabling to reduce the time for a product process and prevent panel characteristic reduction and panel damage by preventing the generation of impurity gas and achieving the plates-combination at a room temperature. The present invention includes a passivation layer formation means, a substrate transfer means, a cleaning means, a sealing material coating means, and a discharge gas injection/combination means. The present invention is constructed so as to be isolated from the atmosphere. The constructions of the fabrication process and PDP enables the normal temperature combination/attachment so as to increase product efficiency by reducing a process time and improve product quality by preventing the panel characteristic reduction.

Abstract: An apparatus and method for automaticaly collecting metallic impurities of a semiconductor wafer. In one aspect, an apparatus comprises: an air tight process chamber comprising a loading unit for loading the semiconductor wafer and unloading unit for unloading the semiconductor wafer; a vapor phase decomposition unit disposed in the process chamber for decomposing a silicon oxide layer on the semiconductor wafer; and a scanning unit disposed in the process chamber for scanning the semiconductor wafer to collect the metallic impurities. The scanning unit comprises a scanning solution bottle for obtaining scanning solution that is used for absorbing metallic impurities on the semiconductor wafer; a scanning arm capable of downward, upward, and rotational movement; and a nozzle coupled to the scanning arm for drawing in scanning solution from the scanning solution bottle, and for forming a droplet of scanning solution that cohers to the nozzle when scanning a semiconductor wafer to collect metallic impurities.

Abstract: A plasma display panel and a method for fabricating the same are disclosed, in which the fabricating process time of the plasma display panel can be reduced, characteristic and performance of the panel can be prevented from being reduced, and the panel can be prevented from being damaged. Also, a panel structure is not changed by external pressure variation.

Abstract: Disclosed are a plasma display panel, apparatus for fabricating the same, and fabrication process thereof enabling to reduce the time for a product process and prevent panel characteristic reduction and panel damage by preventing the generation of impurity gas and achieving the plates-combination at a room temperature. The present invention includes a passivation layer formation means, a substrate transfer means, a cleaning means, a sealing material coating means, and a discharge gas injection/combination means, The present invention is constructed so as to be isolated from the atmosphere. The constructions of the fabrication process and PDP enables the normal temperature combination/attachment so as to increase product efficiency by reducing a process time and improve product quality by preventing the panel characteristic reduction.