Abstract: Provided is a method of manufacturing a patterned substrate. The method may be applied to a process of manufacturing a device such as an electronic device or integrated circuit, or another use, for example, to manufacture an integrated optical system, a guidance and detection pattern of a magnetic domain memory, a flat panel display, a LCD, a thin film magnetic head or an organic light emitting diode, and used to construct a pattern on a surface to be used to manufacture a discrete tract medium such as an integrated circuit, a bit-patterned medium and/or a magnetic storage device such as a hard drive.

Abstract: To summarize an input image, an image summarization system extracts a background frame and object information of each of objects from an image stream, and receives a region of interest set in a predetermined region of the background frame. The image summarization system selects the extracted objects as queue objects, and generates a summarized video based on the queue object, the background frame, and the region of interest.

Abstract: The present application relates to a block copolymer and uses thereof. The present application can provide a block copolymer—which exhibits an excellent self-assembling property and thus can be used effectively in a variety of applications—and uses thereof.

Abstract: The present application relates to a monomer, a method for preparing a block copolymer, a block copolymer, and uses thereof. Each monomer of the present application exhibits an excellent self-assembling property and is capable of forming a block copolymer to which a variety of required functions are granted as necessary without constraint.

Abstract: The present disclosure relates to a medium composition for culturing stem cells, and more specifically, to a medium composition for culturing mesenchymal stem cells, in which the medium composition includes a basic medium in which various quasi-completed mediums (DMEM, ?-MEM, IMDM, F12, and DMEM/F12) are mixed, L-ascorbic acid 2-phosphate, fetal bovine serum, basic fibroblast growth factors (b-FGF), insulin, N-acetyl-L-cysteine, calcium chloride, and hydrocortisone. According to the present disclosure, it is capable of improving proliferation ability and differentiation ability of the mesenchymal stem cells, and is capable of producing cell therapy products more economically using the mesenchymal stem cells by enabling the mesenchymal stem cells to be cultured at a low price compared to the existing culturing methods.

Abstract: The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, and can be provided with a variety of required functions without constraint.

Abstract: Provided is a method of manufacturing a patterned substrate. The method may be applied to a process of manufacturing a device such as an electronic device or integrated circuit, or another use, for example, to manufacture an integrated optical system, a guidance and detection pattern of a magnetic domain memory, a flat panel display, a LCD, a thin film magnetic head or an organic light emitting diode, and used to construct a pattern on a surface to be used to manufacture a discrete tract medium such as an integrated circuit, a bit-patterned medium and/or a magnetic storage device such as a hard drive.

Abstract: The present application relates to a block copolymer and uses thereof. The present application can provide a block copolymer—which exhibits an excellent self-assembling property and thus can be used effectively in a variety of applications—and uses thereof.

Abstract: The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, can be provided with a variety of required functions without constraint and, especially, etching selectivity can be secured, making the block copolymer effectively applicable to such uses as pattern formation.

Abstract: The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.

Abstract: The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.

Abstract: The present application provides the block copolymers and their application. The present application may provide the block copolymers that have excellent self assembling and phase separation properties and therefore that can be effectively used in various applications. The present application may also provide applications of the block copolymers.

Abstract: The present application provides the block copolymers and their application. The present application may provide the block copolymers that have excellent self assembling and phase separation properties and therefore that can be effectively used in various applications. The present application may also provide applications of the block copolymers.

Abstract: The present application provides the block copolymers and their application. The present application may provide the block copolymers that have excellent self assembling and phase separation properties and therefore that can be effectively used in various applications. The present application may also provide applications of the block copolymers.

Abstract: The present application provides the block copolymers and their application. The present application may provide the block copolymers that have excellent self assembling and phase separation properties and therefore that can be effectively used in various applications. The present application may also provide applications of the block copolymers.

Abstract: The present invention relates to a process for selectively removing a block on one side using a wet etching process in connection with self-assembly block copolymer thin films that have etching-resisting properties different from each other. The present invention can form a vertical nanopore structure having a high aspect ratio, even in the case of a thick film which has a vertically oriented cylinder self-assembly structure and which has one or more periods, by overcoming the limit of the prior art, which cannot implement a vertical pore structure through wet etching.

Abstract: The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.

Abstract: The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.

Abstract: In one example embodiment, a server may divide documents into a plurality of morphological segments, parse, from the plurality of morphological segments, a plurality of named biological entities, tag the plurality of named biological entities and the plurality of morphological segments, generate a database that includes the tagged named biological entities and the tagged morphological segments, receive a first search term including one or more of the tagged named biological entities or one or more of the tagged morphological segments, search the database for at least one result phrase that includes at least one occurrence of the first search term, receive an input to retrieve a second search term including at least one morphological segment from one of the result phrases, store the second search term as a mining search term, and mine for the one or more documents based on the mining search term.

Abstract: The present application relates to a neutral layer composition. The present application can provide a neutral layer composition capable of forming a neutral layer, which can be effectively applied in the formation of a polymeric film comprising a vertically aligned self-assembled block copolymer.