Abstract: Disclosed is a method for determining an overlay error between at least two layers in a multiple layer sample. An imaging optical system is used to measure multiple measured optical signals from multiple periodic targets on the sample, and the targets each have a first structure in a first layer and a second structure in a second layer. There are predefined offsets between the first and second structures A scatterometry overlay technique is used to analyze the measured optical signals of the periodic targets and the predefined offsets of the first and second structures of the periodic targets to thereby determine an overlay error between the first and second structures of the periodic targets. The scatterometry overlay technique is a phase based technique, and the imaging optical system is configured to have an illumination and/or collection numerical aperture (NA) and/or spectral band selected so that a specific diffraction order is collected and measured for the plurality of measured optical signals.

Abstract: A heat transfer system includes a vehicle electronic controller, a heat sink, a housing, a controller duct and a fan. The heat sink has fins and is fixed to the controller. The housing encloses the controller and the heat sink. The controller duct connects the housing with an exhaust opening in a passenger cabin in an installed condition. The fan is in fluid communication with one of the housing and the controller duct.

Abstract: An electrical power system for a vehicle includes an interface electrically connected to a node and a battery electrically connected to the interface. The interface includes circuit elements that permit current flow between the battery and the node when and only when the voltage of the node is below a threshold.

Abstract: A semiconductor fabrication system includes a target design device and a multi-stage fabrication tool configured to fabricate one or more layers of a sample using the fabrication process. The target design device receives metrology design rules associated with a metrology tool in which the metrology design rules include criteria for one or more physical attributes of metrology targets measurable with the metrology tool. The target design device may further receive process design rules associated with a fabrication process in which the process design rules include criteria for determining process stages of the fabrication process required to fabricate structures with selected physical attributes.

Abstract: A system includes a switch biased to a neutral position, a camera, and a computer communicatively coupled to the switch and the camera. The computer is programmed to activate a vehicle brake upon receiving data from the switch that the switch is in the neutral position and to activate the vehicle brake upon determining that an operator of the switch is in an inattentive state based on data received from the camera.

Abstract: A system for solar assisted water heating provides hot water to a user at a lower cost, higher energy efficiency, and with a quicker response time than conventional systems, reducing energy losses, and improving user comfort. The basic architecture includes four main components: a solar collector, a heat exchanger, an in-line heater, and a control system. A transient heat profile of a first temperature in a primary loop is measured while a first flow generator G1 is active for the primary loop. Solar assisted heating of water in a secondary loop is provided based on: a flow of water in the secondary loop; a current first temperature; and the transient heat profile of the first temperature by activating: the first flow generator in the primary loop and an in-line water heater in the secondary loop.

Abstract: A system includes a computer including a processor and a memory, the memory including instructions executable by the processor to detect a service controller connected to a vehicle, upon authenticating the service controller, receive an operation mode for a vehicle component from the service controller, and actuate the vehicle component within operating limits based on the operation mode.

Abstract: Metrology methods and modules are provided, which comprise carrying out recipe setup procedure(s) and/or metrology measurement(s) using zonal analysis with respect to respective setup parameter(s) and/or metrology metric(s). The zonal analysis comprises relating to spatially variable values of the setup parameter(s) and/or metrology metric(s) across one or more wafers in one or more lots. Wafer zones may be discrete or spatially continuous, and be used to weight one or more parameter(s) and/or metric(s) during any of the stages of the respective setup and measurement processes.

Abstract: It is provided a solar energy module for converting solar radiation to thermal energy. The module includes a thermally insulating element transmissive to solar radiation and having low transmissivity to thermal infra-red radiation, an absorbing element, a sealed enclosure, and a variable portion in the envelope of the sealed enclosure. This portion is adapted for varying the volume available to gas enclosed in the enclosure in accordance with changing temperature of the enclosed gas. Also, it is provided a solar energy module which includes a thermally insulating element, an absorbing surface and liquid pipes for absorbing the solar radiation, and an air duct thermally coupled thereof. The heated liquid and the heated air are usable for a variety of thermal applications. A heat storage may be thermally coupled to the absorbing surface and to the liquid pipes. The air duct has several air valves, and is associated with a controller for regulating air flow through the air duct.

Abstract: A metrology design and verification framework is provided, which includes methods and systems for metrology structure identification in an integrated circuit design data block, design rule checking, hierarchal design of metrology target structures to minimize random errors, and metrology design rule verification of metrology target design files. In-die metrology targets are identified using various filtering methods and/or designed as hierarchical structure within dies or outside the dies. Particularly, metrology target design files are generated, which are hierarchical in structure and compatible with design rule checks. Design rule check takes into account the hierarchical and often repetitive target designs in the verification process. Layouts may be verified using design rule checks at different levels of design rules, which may be combined to remove rule violations and errors prior to actual target production.

Abstract: A semiconductor fabrication system includes a target design device and a multi-stage fabrication tool configured to fabricate one or more layers of a sample using the fabrication process. The target design device receives metrology design rules associated with a metrology tool in which the metrology design rules include criteria for one or more physical attributes of metrology targets measurable with the metrology tool. The target design device may further receive process design rules associated with a fabrication process in which the process design rules include criteria for determining process stages of the fabrication process required to fabricate structures with selected physical attributes.

Abstract: Disclosed is a method for determining an overlay error between at least two layers in a multiple layer sample. An imaging optical system is used to measure multiple measured optical signals from multiple periodic targets on the sample, and the targets each have a first structure in a first layer and a second structure in a second layer. There are predefined offsets between the first and second structures A scatterometry overlay technique is used to analyze the measured optical signals of the periodic targets and the predefined offsets of the first and second structures of the periodic targets to thereby determine an overlay error between the first and second structures of the periodic targets. The scatterometry overlay technique is a phase based technique, and the imaging optical system is configured to have an illumination and/or collection numerical aperture (NA) and/or spectral band selected so that a specific diffraction order is collected and measured for the plurality of measured optical signals.

Abstract: A metrology system for determining overlay is disclosed. The system includes an optical assembly for capturing images of an overlay mark and a computer for analyzing the captured images to determine whether there is an overlay error. The mark comprises first and second regions that each include at least two separately generated working zones, juxtaposed relative to one another, configured to provide overlay information in a first direction, and include a periodic structure having coarsely segmented elements. The mark comprises third and fourth regions that each include at least two separately generated working zones, juxtaposed relative to one another, configured to provide overlay information in a second direction, and include a periodic structure having coarsely segmented elements.

Abstract: Universal target based inspection drive metrology includes designing a plurality of universal metrology targets measurable with an inspection tool and measurable with a metrology tool, identifying a plurality of inspectable features within at least one die of a wafer using design data, disposing the plurality of universal targets within the at least one die of the wafer, each universal target being disposed at least proximate to one of the identified inspectable features, inspecting a region containing one or more of the universal targets with an inspection tool, identifying one or more anomalistic universal targets in the inspected region with an inspection tool and, responsive to the identification of one or more anomalistic universal targets in the inspected region, performing one or more metrology processes on the one or more anomalistic universal metrology targets with the metrology tool.

Abstract: An apparatus includes a dedicated material handling module having a dedicated automated material handling system (AMHS) defines a transport route between a first tool and a second tool selected from a plurality of tools in a fabrication facility. The dedicated AMHS is configured to transport wafer carriers between the first tool and the second tool or vice versa independent of a fabrication facility AMHS that is configured to transport wafer carriers among the plurality of tools.

Abstract: Metrology may be implemented during semiconductor device fabrication by a) modeling a first measurement on a first test cell formed in a layer of a partially fabricated device; b) performing a second measurement on a second test cell in the layer; c) feeding information from the second measurement into the modeling of the first measurement; and after a lithography pattern has been formed on the layer including the first and second test cells, d) modeling a third and a fourth measurement on the first and second test cells respectively using information from a) and b) respectively.

Abstract: A metrology system for determining overlay is disclosed. The system includes an optical assembly for capturing images of an overlay mark and a computer for analyzing the captured images to determine whether there is an overlay error. The mark comprises first and second regions that each include at least two separately generated working zones, juxtaposed relative to one another, configured to provide overlay information in a first direction, and include a periodic structure having coarsely segmented elements. The mark comprises third and fourth regions that each include at least two separately generated working zones, juxtaposed relative to one another, configured to provide overlay information in a second direction, and include a periodic structure having coarsely segmented elements.

Abstract: A device may detect location information. The location information may indicate a location of the device. The device may receive product search information that identifies one or more criteria for searching inventory information. The inventory information may be associated with the location, and may include information regarding products. The device may cause a search of the inventory information to be performed, based on the product search information, to determine compatible products. The device may determine one or more selected products of the compatible products. The one or more selected products may be selected for purchasing. The device may locate tag devices associated with the one or more selected products to guide a user to a physical location of the tag devices. The device may provide purchase information associated with the one or more selected products.

Abstract: A metrology design and verification framework is provided, which includes methods and systems for metrology structure identification in an integrated circuit design data block, design rule checking, hierarchal design of metrology target structures to minimize random errors, and metrology design rule verification of metrology target design files. In-die metrology targets are identified using various filtering methods and/or designed as hierarchical structure within dies or outside the dies. Particularly, metrology target design files are generated, which are hierarchical in structure and compatible with design rule checks. Design rule check takes into account the hierarchical and often repetitive target designs in the verification process. Layouts may be verified using design rule checks at different levels of design rules, which may be combined to remove rule violations and errors prior to actual target production.

Abstract: An exercise reporting and maintenance system contains a device including a memory with a management application installed thereon. The application is configured to process a sensor signal including a total weight and movement speed, analyze the sensor signal by inputting the total weight and the movement speed into a monitoring heuristic to generate an output, and automatically transmit the output in real-time to be presented by a display system.