Abstract: Disclosed is a scatterometry mark for determining an overlay error, critical dimension, or profile of the mark. The mark includes a first plurality of periodic structures on a first layer, a second plurality of periodic structures on a second layer, and a third plurality of periodic structures on a third layer that is underneath the first and second layer. The third periodic structures are perpendicular to the first and second structures, and the third periodic structures have one or more characteristics so as to result in a plurality of lower structures beneath the third periodic structures being screened from significantly affecting at least part of a spectrum of a plurality of scattered signals detected from the first and second periodic structures for determining an overlay error, critical dimension, or profile of the first and second periodic structures or at least one of such detected scattered signals.

Abstract: Insulated solar panels that provide a solar thermal collector with means for limiting stagnation temperatures and preventing damage include: temperature limiting is provided by the insulated solar panel, isolating internal components from the environment, using passive closed systems within the sealed solar thermal collector, while also allowing alternative implementations as active systems and/or portions of the temperature limiting system outside the sealed solar thermal collector. A heat pipe can be used as a passive thermal switch, where the temperature induced action at a predetermined temperature causes an abrupt transition from a state of thermal isolation to a state of strong thermal coupling. Additionally, a set of siphon circulation pipes provides a passive closed system for temperature limiting.

Abstract: A system for solar assisted water heating provides hot water to a user at a lower cost, higher energy efficiency, and with a quicker response time than conventional systems, reducing energy losses, and improving user comfort. The basic architecture includes four main components: a solar collector, a heat exchanger, an in-line heater, and a control system. A transient heat profile of a first temperature in a primary loop is measured while a first flow generator G1 is active for the primary loop. Solar assisted heating of water in a secondary loop is provided based on: a flow of water in the secondary loop; a current first temperature; and the transient heat profile of the first temperature by activating: the first flow generator in the primary loop and an in-line water heater in the secondary loop.

Abstract: Disclosed is a scatterometry mark for determining an overlay error, critical dimension, or profile of the mark. The mark includes a first plurality of periodic structures on a first layer, a second plurality of periodic structures on a second layer, and a third plurality of periodic structures on a third layer that is underneath the first and second layer. The third periodic structures are perpendicular to the first and second structures, and the third periodic structures have one or more characteristics so as to result in a plurality of lower structures beneath the third periodic structures being screened from significantly affecting at least part of a spectrum of a plurality of scattered signals detected from the first and second periodic structures for determining an overlay error, critical dimension, or profile of the first and second periodic structures or at least one of such detected scattered signals.

Abstract: A design feature in a design file including a pattern to be formed on a substrate may be selected as a metrology target, alignment target or inspection proxy. Metrology or inspection may be performed on the substrate using a printed feature on the substrate that corresponds to the design feature as a metrology target or inspection proxy.

Abstract: A method and apparatus for process control in a lithographic process are described. Metrology may be performed on a substrate either before or after performing a patterning process on the substrate. One or more correctables to the lithographic patterning process may be generated based on the metrology. The patterning process performed on the substrate (or a subsequent substrate) may be adjusted with the correctables.

Abstract: Metrology may be implemented during semiconductor device fabrication by a) modeling a first measurement on a first test cell formed in a layer of a partially fabricated device; b) performing a second measurement on a second test cell in the layer; c) feeding information from the second measurement into the modeling of the first measurement; and after a lithography pattern has been formed on the layer including the first and second test cells, d) modeling a third and a fourth measurement on the first and second test cells respectively using information from a) and b) respectively.

Abstract: Insulated solar panels that provide a solar thermal collector with means for limiting stagnation temperatures and preventing damage include: temperature limiting is provided by the insulated solar panel, isolating internal components from the environment, using passive closed systems within the sealed solar thermal collector, while also allowing alternative implementations as active systems and/or portions of the temperature limiting system outside the sealed solar thermal collector. A heat pipe can be used as a passive thermal switch, where the temperature induced action at a predetermined temperature causes an abrupt transition from a state of thermal isolation to a state of strong thermal coupling. Additionally, a set of siphon circulation pipes provides a passive closed system for temperature limiting.

Abstract: Metrology may be implemented during semiconductor device fabrication by a) modeling a first measurement on a first test cell formed in a layer of a partially fabricated device; b) performing a second measurement on a second test cell in the layer; c) feeding information from the second measurement into the modeling of the first measurement; and after a lithography pattern has been formed on the layer including the first and second test cells, d) modeling a third and a fourth measurement on the first and second test cells respectively using information from a) and b) respectively.

Abstract: A scatterometry tool including an illumination source for directing a light beam into a first optical beam shaping and positioning element at an illumination pupil plane of the tool where the light beam is modulated and directed to an objective lens system having a high numerical aperture. The objective receiving the modulated light beam and directing it onto a target to generate a scattering signal. The objective lens collects the scattering signal and directs it to a second optical beam shaping and positioning element at a collection pupil plane where the signal is modulated and then directed to detectors for receiving and processing the signal to determine surface characteristics of the target.

Abstract: Insulated solar panels provide that provide a solar thermal collector with means for limiting stagnation temperatures and preventing damage include: temperature limiting is provided by the insulated solar panel, isolating internal components from the environment, using passive closed systems within the sealed solar thermal collector, while also allowing alternative implementations as active systems and/or portions of the temperature limiting system outside the sealed solar thermal collector. A heat pipe can be used as a passive thermal switch, where the temperature induced action at a predetermined temperature causes an abrupt transition from a state of thermal isolation to a state of strong thermal coupling. Additionally, a set of siphon circulation pipes provides a passive closed system for temperature limiting.

Abstract: An exercise reporting and maintenance system contains a device including a memory with a management application installed thereon. The application is configured to process a sensor signal including a total weight and movement speed, analyze the sensor signal by inputting the total weight and the movement speed into a monitoring heuristic to generate an output, and automatically transmit the output in real-time to be presented by a display system.

Abstract: Universal target based inspection drive metrology includes designing a plurality of universal metrology targets measurable with an inspection tool and measurable with a metrology tool, identifying a plurality of inspectable features within at least one die of a wafer using design data, disposing the plurality of universal targets within the at least one die of the wafer, each universal target being disposed at least proximate to one of the identified inspectable features, inspecting a region containing one or more of the universal targets with an inspection tool, identifying one or more anomalistic universal targets in the inspected region with an inspection tool and, responsive to the identification of one or more anomalistic universal targets in the inspected region, performing one or more metrology processes on the one or more anomalistic universal metrology targets with the metrology tool.

Abstract: A system and method for prevention and removal of snowpack from solar panels increases the collection efficiency of solar panels by using one or more techniques, alone or in combination including: vibrating a vibrationally isolated surface of the solar panel; flexing a flexible sheet attached to the solar panel; inducing vibrations via extenial circulation piping for detaching the snowpack from at least one solar thermal collector of a solar array; activating a heat-pipe to transfer heat from an absorber plate to the surface of the collection panel; and using a PZT to generate vibrations for detaching the snowpack from the solar panel.

Abstract: An apparatus includes a dedicated material handling module having a dedicated automated material handling system (AMHS) defines a transport route between a first tool and a second tool selected from a plurality of tools in a fabrication facility. The dedicated ANHS is configured to transport wafer carriers between the first tool and the second tool or vice versa independent of a fabrication facility AMHS that is configured to transport wafer carriers among the plurality of tools. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Abstract: The disclosure is directed to designing and using an overlay target with orthogonal underlayer dummyfill. According to various embodiments, an overlay target may include one or more segmented overlay pattern elements forming at least one overlay target structure. The overlay target may further include one or more inactive pattern elements forming at least one dummyfill target structure. Each of the one or more inactive pattern elements may include dummyfill segmented along an axis orthogonal to a segmentation axis of at least one proximately disposed overlay pattern element. In some embodiments, each of the target structures or layers may be formed from a separate process layer successively disposed upon a substrate, such as a silicon wafer. In some embodiments, the overlay and dummyfill target structures may be twofold or fourfold rotationally symmetric to allow for certain manufacturing or metrology advantages.

Abstract: An overlay mark for determining the relative shift between two or more successive layers of a substrate is disclosed. The overlay mark includes at least one test pattern for determining the relative shift between a first and a second layer of the substrate in a first direction. The test pattern includes a first set of working zones and a second set of working zones. The first set of working zones are disposed on a first layer of the substrate and have at least two working zones diagonally opposed and spatially offset relative to one another. The second set of working zones are disposed on a second layer of the substrate and have at least two working zones diagonally opposed and spatially offset relative to one another. The first set of working zones are generally angled relative to the second set of working zones thus forming an “X” shaped test pattern.

Abstract: Insulated solar panels provide that provide a solar thermal collector with means for limiting stagnation temperatures and preventing damage include: temperature limiting is provided by the insulated solar panel, isolating internal components from the environment, using passive closed systems within the sealed solar thermal collector, while also allowing alternative implementations as active systems and/or portions of the temperature limiting system outside the sealed solar thermal collector. A heat pipe can be used as a passive thermal switch, where the temperature induced action at a predetermined temperature causes an abrupt transition from a state of thermal isolation to a state of strong thermal coupling. Additionally, a set of siphon circulation pipes provides a passive closed system for temperature limiting.

Abstract: A semiconductor wafer may include a dummy field configured to enable overlay measurements. The enhanced dummy field may include a plurality of encoding blocs that enable OVL measurements to be made throughout the enhanced dummy field.

Abstract: A metrology target design may be optimized using inputs including metrology target design information, substrate information, process information, and metrology system information. Acquisition of a metrology signal with a metrology system may be modeled using the inputs to generate one or more optical characteristics of the metrology target. A metrology algorithm may be applied to the characteristics to determine a predicted accuracy and precision of measurements of the metrology target made by the metrology system. Part of the information relating to the metrology target design may be modified and the signal modeling and metrology algorithm may be repeated to optimize the accuracy and precision of the one or more measurements. The metrology target design may be displayed or stored after the accuracy and precision are optimized.