Abstract: An extreme ultraviolet lithography system (10) that creates a pattern (230) having a plurality of densely packed parallel lines (232) on a workpiece (22) includes a patterning element (16); an EUV illumination system (12) that directs an extreme ultraviolet beam (13A) at the patterning element (16); a projection optical assembly (18) that directs the extreme ultraviolet beam diffracted off of the patterning element (16) at the workpiece (22); and a pattern blind assembly (26) positioned in a beam path (55) of the extreme ultraviolet beam (13A). The pattern blind assembly (26) shapes the extreme ultraviolet beam (13A) so that an exposure field (28) on the workpiece (22) has a polygonal shape.

Abstract: A stage assembly (10) that includes (i) a stage (14) that retains a device (26); (ii) a reaction assembly (18) that is spaced apart from the stage (14); (iii) a stage mover (16) that moves the stage (14), the stage mover (16) including a magnet array (38) that is coupled to the stage (14) and a conductor array (36) that is coupled to the reaction assembly (18); (iv) a temperature adjuster (20); and (v) a control system (22) that selectively controls the temperature adjuster (20). The conductor array (36) includes a set of first zone conductor units (250), and a set of second zone conductor units (252). The temperature adjuster (20) independently adjusts the temperature of the set of first zone conductor units (250), and the set of second zone conductor units (252).

Abstract: System and method for accurately measuring alignment of every exposure field on a pre-patterned wafer without reducing wafer-exposure throughput. Diffraction grating disposed in scribe-lines of such wafer, used as alignment marks, and array of encoder-heads (each of which is configured to define positional phase(s) of at least one such alignment mark) are used. Determination of trajectory of a wafer-stage scanning during the wafer-exposure in the exposure tool employs determining in-plane coordinates of such spatially-periodic alignment marks by simultaneously measuring position-dependent phases of signals produced by these marks as a result of recombination of light corresponding to different diffraction orders produced by these marks.

Abstract: An exemplary stage assembly has movable stage mass and counter-mass. A stage motor is coupled to the stage mass and counter-mass such that stage-mass motion imparted by the stage motor causes a reactive motion of the counter-mass counter to the motion of the stage mass. At least one trim-motor is coupled to the counter-mass. A control system commands the trim-motor to regulate movement of the counter-mass in reaction to stage-mass motion. A PI feedback controller receives the following-error of the counter-mass and generates corresponding center-of-gravity (CG) force commands and trim-motor force commands to the trim-motor(s) to produce corrective counter-mass motion. A trim-motor force limiter receives trim-motor force commands and produces corresponding limited trim-motor force commands that are fed back as actual CG force commands to the feedback controller to modify integral terms of the feedback controller according to the limited trim-motor force commands.

Abstract: A method for determining a commutation offset for a mover (250A) of a mover assembly (220C) that moves and positions a stage (220A) relative to a stage base (220B) includes controlling the mover assembly (220C) in a closed loop fashion to maintain the position of the stage (220A) along a first axis and along a second axis with the stage (220A) levitated above the stage base (220B). The method also includes the steps of (i) directing current to a coil array (240) of the mover assembly (220C) so that the mover assembly (220C) imparts a disturbance on the stage (220A); and (ii) evaluating one or more forces generated by the mover assembly (220C) as a result of the disturbance on the stage (220A) created by the mover (250A). Further, a method for generating a compensation map (1402) includes sequentially directing a plurality of excitation signals to the control of the mover assembly (220C) and determining the control commands that result from the plurality of excitation signals.

Abstract: According to one aspect, an apparatus includes a stage, a motor to move the stage, an amplifier, and a controller. The motor has at least a first coil and a second coil, and the amplifier is configured to selectively provide current to either the first coil or the second coil. The controller is configured to control force generated by the motor. When moving the stage, the controller controls the motor force by using the amplifier to provide current to the first coil, smoothly reducing a force generated by the first coil before the stage moves to a predetermined switching location so that the coil is generating substantially no force at the switching location, switching the amplifier so that the amplifier provides current to the second coil, and smoothly increasing a force generated by the second coil after the stage moves past the predetermined switching location.

Abstract: A stage assembly (10) that includes (i) a stage (14) that retains a device (26); (ii) a reaction assembly (18) that is spaced apart from the stage (14); (iii) a stage mover (16) that moves the stage (14), the stage mover (16) including a magnet array (38) that is coupled to the stage (14) and a conductor array (36) that is coupled to the reaction assembly (18); (iv) a temperature adjuster (20); and (v) a control system (22) that selectively controls the temperature adjuster (20). The conductor array (36) includes a set of first zone conductor units (250), and a set of second zone conductor units (252). The temperature adjuster (20) independently adjusts the temperature of the set of first zone conductor units (250), and the set of second zone conductor units (252).

Abstract: A method for determining a commutation offset for a mover (250A) of a mover assembly (220C) that moves and positions a stage (220A) relative to a stage base (220B) includes controlling the mover assembly (220C) in a closed loop fashion to maintain the position of the stage (220A) along a first axis and along a second axis with the stage (220A) levitated above the stage base (220B). The method also includes the steps of (i) directing current to a coil array (240) of the mover assembly (220C) so that the mover assembly (220C) imparts a disturbance on the stage (220A); and (ii) evaluating one or more forces generated by the mover assembly (220C) as a result of the disturbance on the stage (220A) created by the mover (250A). Further, a method for generating a compensation map (1402) includes sequentially directing a plurality of excitation signals to the control of the mover assembly (220C) and determining the control commands that result from the plurality of excitation signals.

Abstract: Embodiments of the invention compensate for one or more effects of a stage motor in a precision stage device. A feedforward module receives an input signal corresponding to the effect of the motor and generates a feedforward control signal that can be used to modify a motor control signal to compensate for the effect of the motor. In some embodiments, a control system is provided to compensate for a back-electromotive force generated by a motor, while in other embodiments, a control system may compensate for an inductive effect of a motor. Embodiments of the invention may be useful in precision stage devices, for example, lithography devices such as steppers and scanners.

Abstract: New and useful concepts for an imaging optical system configured to simultaneously image a reticle to a pair of imaging locations are provided, where the imaging optics comprise a pair of arms, each of which includes catadioptric imaging optics. In addition, the imaging optics are preferably designed to image a reticle simultaneously to the pair of imaging locations, at a numerical aperture of at least 1.3, and without obscuration of light by the imaging optics.

Abstract: Methods and apparatus for adjusting the amount of current provided to a magnetic actuator to compensate for a temperature change associated with the magnetic actuator are disclosed. According to one aspect of the present invention, an apparatus includes an actuator, which has at least one magnet and an associated force constant. The apparatus also includes a temperature sensing arrangement and a control arrangement, the temperature sensing arrangement being arranged to determine or measure a temperature of the magnet. The control arrangement adjusts the current provided to the actuator based on the temperature of the magnet. The current is adjusted to maintain a correct or desired force in light of temperature-induced variations to a force constant.

Abstract: A stage apparatus includes at least one tube having a first section and a second section, the first section being coupled to a point of reference. The apparatus also includes at least one magnet, a precision stage, and a tube carrier. The precision stage is positioned at least partially over the at least one magnet, and has a first set of coils. The first set of coils cooperates with the at least one magnet to drive the precision stage. The tube carrier is at least partially positioned over the at least one magnet, and includes an end effector portion arranged to carry the second section, wherein the tube carrier further includes a second set of coils, the second set of coils being supported by the end effector portion and arranged to cooperate with the at least one magnet to control motion of the end effector portion.

Abstract: According to one aspect, a stage apparatus includes a first surface, a second surface, an overall magnet array, and a plurality of coils. The overall magnet array is mounted on the first surface, and includes an X magnet array and a Y magnet array. The coils are mounted on the second surface, and include a first coil that cooperates with the X magnet array to control force on the first surface along an x-axis. The coils also include a second coil that cooperates with the Y magnet array to control force on the first surface along a y-axis. The second coil cooperates with the overall magnet array to control force applied to the first surface in a direction normal to the first surface. The first coil does not cooperate with the overall magnet array to control the force applied in the direction normal to the first surface.

Abstract: Methods and apparatus for providing an efficient oval coil planar motor are disclosed. According to one aspect of the present invention, an electromagnetic actuator includes at least a first coil group, at least a second coil group, and a magnet array. The first coil group includes at least a first coil that is of an elongated toroidal shape. The first coil has a first coil length and a first coil width that is approximately equal to a multiple of three times the first coil width. The second coil group includes at least a second coil that is of an elongated toroidal shape. The second coil has a second coil width and a second coil length that is approximately equal to a multiple of three times the second coil width. The second coil group is approximately adjacent to the first coil group. The magnet array is configured to cooperate with the first and second coil groups, and includes a plurality of magnets.

Abstract: A stage assembly includes a stage, a base assembly, a stage mover, and a temperature adjuster. The temperature adjuster includes a first plate, a first thermal insulator, a circulation housing, a first fluid system, and a second fluid system. The first plate is positioned adjacent to a conductor array of the stage mover. The first thermal insulator is positioned adjacent to the first plate. The circulation housing defines at least a portion of a housing passageway that is positioned adjacent to the first thermal insulator. The first fluid system directs a first circulation fluid through the housing passageway, and the second fluid system directs a second circulation fluid through the first plate channel. With this design, the second circulation fluid removes the majority of the heat from the conductor array, and the first circulation fluid shields an outer surface of the circulation housing from thermal disturbance.

Abstract: A mover (344) moving a stage (238) along a first axis, along a second axis and along a third axis includes a magnetic component (354), a conductor component (356), and a control system (324). The magnetic component (354) includes a plurality of magnets (354D) that are surrounded by a magnetic field. The conductor component (356) is positioned near the magnetic component (354) in the magnetic field. Further, the conductor component (356) interacts with the magnetic component (354) when current is directed to the conductor component (356) to generate a controllable force along the first axis, a controllable force along the second axis, and a controllable force along the third axis. The conductor component (356) can include a split coil design, having a first conductor array (356A) and a second conductor array (356B) that is positioned substantially adjacent to the first conductor array (356A).

Abstract: According to one aspect, an apparatus includes a stage and a first actuator. The stage has a stage center of gravity, and a first axis passes, e.g., horizontally, though the stage center of gravity. The first actuator is offset from the stage center of gravity relative to a second axis and arranged to generate a first force. The second axis is perpendicular to the first axis, and the first actuator is oriented to allow the first force to act through the stage center of gravity to drive the stage.

Abstract: In one embodiment, a stage apparatus includes a wafer stage, at least one conduit, and a measurement stage. The at least one conduit is coupled between the wafer stage and a ground. The measurement stage is configured to approximately follow the wafer stage during at least a portion of a motion of the wafer stage, and is configured to carry the at least one conduit to reduce disturbances on the wafer stage caused by the at least one conduit.

Abstract: Methods and apparatus for increasing the efficiency of a voice coil motor (VCM) are disclosed. According to one aspect of the present invention, a cylindrical and radially symmetric VCM includes a plurality of sets of magnets, and a single coil. The plurality of sets of the magnets are each arranged in an array configuration, and cooperate to form a magnetic field. The coil receives current and has a plurality of windings. A first space is defined within the coil, and the plurality of sets of the magnets are arranged such that a first set of the magnets is positioned within the first space and a second set of the magnets is positioned external to the coil.

Abstract: A method for determining a commutation offset for a mover (250A) of a mover assembly (220C) that moves and positions a stage (220A) relative to a stage base (220B) includes controlling the mover assembly (220C) in a closed loop fashion to maintain the position of the stage (220A) along a first axis and along a second axis with the stage (220A) levitated above the stage base (220B). The method also includes the steps of (i) directing current to a coil array (240) of the mover assembly (220C) so that the mover assembly (220C) imparts a disturbance on the stage (220A); and (ii) evaluating one or more forces generated by the mover assembly (220C) as a result of the disturbance on the stage (220A) created by the mover (250A). Further, a method for generating a compensation map (1402) includes sequentially directing a plurality of excitation signals to the control of the mover assembly (220C) and determining the control commands that result from the plurality of excitation signals.