Abstract: A stacked semiconductor device includes a first, a second, a third, and a fourth semiconductor device. A first major surface of each of the first and second semiconductor devices which includes the active circuitry directly face each other, and a first major surface of each of the third and fourth semiconductor devices which includes the active circuitry directly face each other. A second major surface of the second semiconductor device directly faces a second major surface of the third semiconductor device. The stacked semiconductor device includes a plurality of continuous conductive vias, wherein each continuous conductive via extends from the second major surface of the first device, through the first device, second device, third device, and fourth device to the second major surface of the fourth device. Each of the semiconductor devices may include a beveled edge at the first major surface on at least one edge of the device.

Abstract: A microelectronic assembly (100) and a microelectronic device (4100) include a stacked structure (101). The stacked structure includes a heat spreader (104), at least one die (106) thermally coupled to at least a portion of one side of the heat spreader, at least one other die (108) thermal coupled to at least a portion of an opposite side of the heat spreader, at least one opening (401) in the heat spreader located in a region of between the two die, an insulator (603) disposed in the at least one opening, and electrically conductive material (1308, 1406) in an insulated hole (705) in the insulator. The heat spreader allows electrical communication between the two die through the opening while the insulator isolates the electrically conductive material and the heat spreader from each other.

Abstract: A stacked semiconductor device includes a first and second semiconductor device having a first major surface and a second major surface opposite the first major surface, the first major surface of the first and second semiconductor devices include active circuitry. The first and second semiconductor devices are stacked so that the first major surface of the first semiconductor device faces the first major surface of the second semiconductor device. At least one continuous conductive via extends from the second major surface of the first semiconductor device to the first major surface of the second semiconductor device. Conductive material fills a cavity adjacent to the contact pad and is in contact with one side of the contact pad. Another side of the contact pad of the first semiconductor device faces and is in contact with another side of the contact pad of the second semiconductor device.

Abstract: A first semiconductor device die is provided having a bottom edge incorporating a notch structure that allows sufficient height and width clearance for a wire bond connected to a bond pad on an active surface of a second semiconductor device die upon which the first semiconductor device die is stacked. Use of such notch structures reduces a height of a stack incorporating the first and second semiconductor device die, thereby also reducing a thickness of a semiconductor device package incorporating the stack.

Abstract: An anti-counterfeiting security circuit is incorporated into an authentic integrated circuit device to induce failure in a counterfeited integrated circuit device by forming the security circuit (e.g., 21, 31, 41, 51) with one or more operatively inert high-k metal gate transistors (e.g., HKMG PMOS 112) having switched or altered work function metal layers (82) where the security circuit defines a first electrical function with the one or more operatively inert high-k metal gate transistors and defines a second different electrical function if the one or more operatively inert high-k metal gate transistors were instead fabricated as operatively functional high-k metal gate transistors of the first polarity type with a work function metal layer of the first polarity type, the security circuit would define a second different electrical function.

Abstract: Edge coupling of semiconductor dies. In some embodiments, a semiconductor device may include a first semiconductor die, a second semiconductor die disposed in a face-to-face configuration with respect to the first semiconductor die, and an interposer arranged between the first semiconductor and second semiconductor dies, the interposer having an edge detent configured to allow an electrical coupling between the first and second semiconductor dies. In other embodiments, a method may include coupling a first semiconductor die to a surface of an interposer where an edge of the interposer includes detents and the first semiconductor die includes a first pad aligned with a first detent, coupling a second semiconductor die to an opposite surface of the interposer where the first and second semiconductor dies are in a face-to-face configuration and the second semiconductor die includes a second pad aligned with a second detent, and coupling the first and second pads together.

Abstract: A semiconductor device includes a semiconductor die having a first major surface and a second major surface opposite the first major surface, a first minor surface and a second minor surface opposite the first minor surface, a plurality of contact pads on the first major surface, and a notch which extends from the first minor surface and the second major surface into the semiconductor die. The notch has a notch depth measured from the second major surface into the semiconductor die, wherein the notch depth is less than a thickness of the semiconductor die, and a notch length measured from the first minor surface into the semiconductor die, wherein the notch length is less than a length of the semiconductor die measured between the first and second minor surfaces. The device includes a lead having a first end in the notch, and an encapsulant over the first major surface.

Abstract: A semiconductor device includes a semiconductor die having a first major surface and a second major surface opposite the first major surface, a first minor surface and a second minor surface opposite the first minor surface, a plurality of contact pads on the first major surface, and a notch which extends from the first minor surface and the second major surface into the semiconductor die. The notch has a notch depth measured from the second major surface into the semiconductor die, wherein the notch depth is less than a thickness of the semiconductor die, and a notch length measured from the first minor surface into the semiconductor die, wherein the notch length is less than a length of the semiconductor die measured between the first and second minor surfaces. The device includes a lead having a first end in the notch, and an encapsulant over the first major surface.

Abstract: A high density, low power, high performance information system, method and apparatus are described in which perpendicularly oriented processor and memory die stacks (130, 140, 150, 160, 170) include integrated deflectable MEMS optical beam waveguides (e.g., 190) at each die edge to provide optical communications (182-185) in and between die stacks by supplying deflection voltages to a plurality of deflection electrodes (195-197) positioned on and around each MEMS optical beam waveguide (193-194) to provide two-dimensional alignment and controlled feedback to adjust beam alignment and establish optical communication links between die stacks.

Abstract: A high density, low power, high performance information system, method and apparatus are described in which an integrated circuit apparatus includes a plurality of deflectable MEMS optical beam waveguides (e.g., 190) at each die edge which are each formed with an optical beam structure (193) which is encapsulated by a waveguide beam structure (194) to extend into a deflection cavity (198) and which is surrounded by a plurality of deflection electrodes (195-197) that are positioned on walls of the deflection cavity (198) to provide two-dimensional deflection control of each deflectable MEMS optical beam waveguide in response to application of one or more deflection voltages to provide optical communications (e.g., 184) between different die.

Abstract: A high density, low power, high performance information system, method and apparatus are described in which a laser source (213) on a first die (210) generates a source light beam of unmodulated monochromatic coherent light (281) for distribution via optical beam routing structures (e.g., 214/214a, 224/224a, 234/234a) to a plurality of receiving die (220, 230), each of which includes its own modulator (e.g., 223, 233) for optically receiving at least a portion of the source light beam (281a, 281b) from the first die and generating therefrom an output source light beam of modulated monochromatic coherent light (291, 292) which is encoded at said modulator in response to electrical signal information.

Abstract: An integrated circuit optical die test interface and associated testing method are described for using scribe area optical mirror structures (106) to perform wafer die tests on MEMS optical beam waveguide (112) and optical circuit elements (113) by perpendicularly deflecting optical test signals (122) from the scribe area optical mirror structures (106) into and out of the plane of the integrated circuit die under test (104) and/or production test die (157).

Abstract: An optical die probe wafer testing circuit arrangement and associated testing methodology are described for mounting a production test die (157) and surrounding scribe grid (156) to a test head (155) which is positioned over a wafer (160) in alignment with a die under test (163) and surrounding scribe grid (161, 165), such that one or more optical deflection mirrors (152, 154) in the test head scribe grid (156) are aligned with one or more optical deflection mirrors (162, 164) in the scribe grid (161, 165) for the die under test (163) to enable optical die probe testing on the die under test (163) by directing a first optical test signal (158) from the production test die (157), through the first and second optical deflection mirrors (e.g., 152, 162) and to the first die.

Abstract: A high density, low power, high performance information system, method and apparatus are described in which an integrated circuit apparatus includes a first integrated circuit link element (657) and a redundant integrated circuit link element (660) connected in parallel between first and second deflectable MEMS switches (652-655, 662-665) which are connected in a signal path and controlled to deselect the first integrated circuit link element (657) and connect the redundant integrated circuit link element (660) in the signal path in response to a two-state control signal provided to the first and second deflectable MEMs switches which identifies the first integrated circuit link element as being defective.

Abstract: An integrated circuit optical backplane die and associated semiconductor fabrication process are described for forming optical backplane mirror structures for perpendicularly deflecting optical signals out of the plane of the optical backplane die by selectively etching an optical waveguide semiconductor layer (103) on an optical backplane die wafer using an orientation-dependent anisotropic wet etch process to form a first recess opening (107) with angled semiconductor sidewall surfaces (106) on the optical waveguide semiconductor layer, where the angled semiconductor sidewall surfaces (106) are processed to form an optical backplane mirror (116) for perpendicularly deflecting optical signals to and from a lateral plane of the optical waveguide semiconductor layer.

Abstract: An anti-counterfeiting security circuit is incorporated into an authentic integrated circuit device to induce failure in a counterfeited integrated circuit device by forming the security circuit (e.g., 21, 31, 41, 51) with one or more operatively inert high-k metal gate transistors (e.g., HKMG PMOS 112) having switched or altered work function metal layers (82) where the security circuit defines a first electrical function with the one or more operatively inert high-k metal gate transistors and defines a second different electrical function if the one or more operatively inert high-k metal gate transistors were instead fabricated as operatively functional high-k metal gate transistors of the first polarity type with a work function metal layer of the first polarity type, the security circuit would define a second different electrical function.

Abstract: A stacked semiconductor device includes a first and a second semiconductor device. A first major surface of each of the first and second devices which includes the active circuitry directly face each other. The first major surface of each of the devices includes a beveled edge on at least one edge, and a probe pad which extends onto the beveled edge. A first opening is located between the beveled edges of the first and second devices on a vertical side of the stacked semiconductor device.

Abstract: An electric device with vias that include dielectric structures to prevent conductive material in the vias from electrically connecting conductive structures on a top of the vias with conductive structures on the bottom of the vias. The dielectric structures are formed in selected vias where other vias do not include the dielectric structures.

Abstract: A microelectronic assembly (100) and a microelectronic device (4100) include a stacked structure (101). The stacked structure includes a heat spreader (104), at least one die (106) thermally coupled to at least a portion of one side of the heat spreader, at least one other die (108) thermal coupled to at least a portion of an opposite side of the heat spreader, at least one opening (401) in the heat spreader located in a region of between the two die, an insulator (603) disposed in the at least one opening, and electrically conductive material (1308, 1406) in an insulated hole (705) in the insulator. The heat spreader allows electrical communication between the two die through the opening while the insulator isolates the electrically conductive material and the heat spreader from each other.

Abstract: A semiconductor device comprises an integrated circuit (IC) die having a top side and a back side. The circuit substrate includes a heat source circuit, a heat sensitive circuit, a package substrate coupled to the top side of the circuit substrate, and a plurality of thermally conductive through-silicon vias (TSVs) formed from the back side of the circuit substrate to near but not through the top side of the circuit substrate.