Patents by Inventor Michael Bartholomeusz

Michael Bartholomeusz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6398880
    Abstract: Cobalt-based Ta-containing magnetic target alloy materials are produced in which homogeneity of the magnetic material is improved by eliminating Ta-rich second phases in the microstructure by a process comprising soaking ingots of said alloy from which targets are to be produced at temperatures ranging from 1600° to 2600° F. for periods of 10 minutes to 24 hours prior to hot-rolling, preferably using multiple steps, then hot-rolling at similar temperatures utilizing at least a 3% reduction for pass, and optionally soaking the rolled plates from said rolling step at temperatures ranging from 2000° to 2600° F. for periods of 10 minutes to 24 hours.
    Type: Grant
    Filed: August 8, 1997
    Date of Patent: June 4, 2002
    Assignee: Heraeus, Inc.
    Inventors: Michael Bartholomeusz, Carlos Chappa
  • Publication number: 20020023698
    Abstract: Cobalt-based Ta-containing magnetic target alloy materials are produced in which homogeneity of the magnetic material is improved by eliminating Ta-rich second phases in the microstructure by a process comprising soaking ingots of said alloy from which targets are to be produced at temperatures ranging from 1600° to 2600° F for periods of 10 minutes to 24 hours prior to hot-rolling, preferably using multiple steps, then hot-rolling at similar temperatures utilizing at least a 3% reduction for pass, and optionally soaking the rolled plates from said rolling step at temperatures ranging from 2000° to 2600°F. for periods of 10 minutes to 24 hours.
    Type: Application
    Filed: August 8, 1997
    Publication date: February 28, 2002
    Inventors: MICHAEL BARTHOLOMEUSZ, CARLOS CHAPPA
  • Publication number: 20020003009
    Abstract: An ingot of material which is normally too brittle to allow successful rolling and wrought processing is formed so as to have a thickness-to-width ratio of less than about 0.5 and is annealed in a temperature range of 1000° F. to 2500° F. for a preselected time. The ingot is then rolled in a temperature range of 1500° F. to 2500° F. Additional/optional annealing of the resulting rolled plate in a temperature range of 500° F. to 2000° F., or between room temperature and 1500° F., and/or a final annealing between 500° F. and 1500° F., is possible. Sputtering targets are cut out of the rolled plate and used for the manufacture of storage disks.
    Type: Application
    Filed: October 1, 1999
    Publication date: January 10, 2002
    Inventors: MICHAEL BARTHOLOMEUSZ, MICHAEL TSAI, ANAND DEODUTT
  • Patent number: 6123783
    Abstract: A method for making a magnetic data storage target includes warm-rolling a magnetic alloy sheet at a temperature of less than about 1200.degree. F., optimally followed by annealing. The method results in increased pass-through-flux (PTF) and improved performance in magnetron sputtering applications.
    Type: Grant
    Filed: October 7, 1997
    Date of Patent: September 26, 2000
    Assignee: Heraeus, Inc.
    Inventors: Michael Bartholomeusz, Michael Tsai