Abstract: A stage assembly for positioning a device along a first axis, the stage assembly comprising: a base; a stage that retains the device and moves above the base; a mover assembly that moves the stage along the first axis relative to the base; a first sensor system that monitors the movement of the stage along the first axis, the first sensor system generating a first signal, the first sensor system having a first sensor accuracy; a second sensor system that monitors the movement of the stage along the first axis, the second sensor system having a second sensor accuracy that is different from the first sensor accuracy of the first sensor system, the second sensor generating a second signal; and a control system that controls the mover assembly using at least one of the first sensor and the second signal.

Abstract: An optical element assembly includes a base, and an element unit. The element unit includes (i) an optical element having an element central axis and an element perimeter; and (ii) an element connector assembly that couples the optical element to the base, the element connector assembly including a flexure assembly having an element flexure and a base flexure. A distal end of the element flexure is coupled to the optical element near the element perimeter, a distal end of the base flexure is coupled to the base, and a proximal end of the element flexure is coupled to a proximal end of the base flexure near the element central axis.

Abstract: A method for moving a stage includes coupling a stage mover to the stage, and directing current to the stage mover with a control system. The stage mover includes a magnet array and a conductor array positioned adjacent to the magnet array. The conductor array includes a first layer of coils and a second layer of coils, with the first layer of coils being closer to the magnet array than the second layer of coils. The control system directs current to the first layer of coils and the second layer of coils independently. Further, the control system directs more current to the first layer of coils than the second layer of coils during a movement step to reduce the power consumption.

Abstract: A liquid immersion lithography apparatus and method expose a substrate with an optical beam via an optical assembly and liquid by (i) arranging a stage opposite to the optical assembly such that the liquid is maintained in a local space under the optical assembly, the stage having an upper surface and a surface of a pad member and being configured to support the substrate within the upper surface; and (ii) moving the upper surface and the surface of the pad member in a movement relative to the optical assembly in a state in which the upper surface and the surface of the pad member are adjacent to and substantially coplanar with each other so that the surface of the pad member is arranged opposite to the optical assembly in place of the upper surface while the liquid is maintained in the local space under the optical assembly.

Abstract: An optical element assembly includes a base, and an element unit. The element unit includes (i) an optical element having an element central axis and an element perimeter; and (ii) an element connector assembly that couples the optical element to the base, the element connector assembly including a flexure assembly having an element flexure and a base flexure. A distal end of the element flexure is coupled to the optical element near the element perimeter, a distal end of the base flexure is coupled to the base, and a proximal end of the element flexure is coupled to a proximal end of the base flexure near the element central axis.

Abstract: An immersion exposure apparatus and method involves (i) supporting a substrate with a stage, (ii) arranging the stage under an optical assembly to maintain immersion liquid in a gap between the optical assembly and the stage, (iii) projecting an image onto the substrate via the optical assembly and the immersion liquid, (iv) arranging a movable pad, which is movable separately from the stage, adjacent to the stage, and (v) moving the stage and the pad adjacent to each other relative to the optical assembly to arrange the pad under the optical assembly in place of the stage such that the immersion liquid is maintained below the optical assembly during the movement, thereby to arrange the movable pad under the optical assembly to maintain the immersion liquid in a gap between the optical assembly and the pad.

Abstract: A stage assembly for positioning a device includes: (i) a stage that retains the device; (ii) a base; (iii) a mover assembly that moves the stage along a first axis, along a second axis, and along a third axis relative to the base; (iv) a magnetic sensor system that monitors the movement of the stage along the first, second and third axes, the magnetic sensor system generating a magnetic sensor signal; (v) a second sensor system that monitors the movement of the stage along the first, second and third axes, the second sensor system generating a second sensor signal; and (vi) a control system that controls the mover assembly using at least one of the magnetic sensor signal and the second sensor signal.

Abstract: An optical element assembly includes a base, and an element unit. The element unit includes (i) an optical element having an element central axis and an element perimeter; and (ii) an element connector assembly that couples the optical element to the base, the element connector assembly including a flexure assembly having an element flexure and a base flexure. A distal end of the element flexure is coupled to the optical element near the element perimeter, a distal end of the base flexure is coupled to the base, and a proximal end of the element flexure is coupled to a proximal end of the base flexure near the element central axis.

Abstract: A stage assembly for positioning a device along a first axis, the stage assembly comprising: a base; a stage that retains the device and moves above the base; a mover assembly that moves the stage along the first axis relative to the base; a first sensor system that monitors the movement of the stage along the first axis, the first sensor system generating a first signal, the first sensor system having a first sensor accuracy; a second sensor system that monitors the movement of the stage along the first axis, the second sensor system having a second sensor accuracy that is different from the first sensor accuracy of the first sensor system, the second sensor generating a second signal; and a control system that controls the mover assembly using at least one of the first sensor and the second signal.

Abstract: A stage assembly for positioning a device along a first axis, the stage assembly comprising: a base; a stage that retains the device and moves above the base; a mover assembly that moves the stage along the first axis relative to the base; a first sensor system that monitors the movement of the stage along the first axis, the first sensor system generating a first signal, the first sensor system having a first sensor accuracy; a second sensor system that monitors the movement of the stage along the first axis, the second sensor system having a second sensor accuracy that is different from the first sensor accuracy of the first sensor system, the second sensor generating a second signal; and a control system that controls the mover assembly using at least one of the first sensor and the second signal.

Abstract: An immersion exposure apparatus and method exposes a substrate with a light beam via an optical element and immersion liquid. A table holds the substrate and is movable relative to the optical element. A pad member is movable relative to the table and is movable away from being opposite the optical element. While the table is arranged opposite the optical element, the pad member is movable relative to the table so that the pad member can be arranged adjacent to the table, and when the pad member is arranged adjacent to the table, the adjacent table and pad member are movable to locate the pad member opposite the optical element in place of the table such that the immersion liquid is maintained below the optical element during the movement.

Abstract: An immersion exposure apparatus and method exposes a substrate with a light beam via an optical element and immersion liquid. A table holds the substrate and is movable relative to the optical element. A pad member is movable relative to the table and is movable away from being opposite the optical element. While the table is arranged opposite the optical element, the pad member is movable relative to the table so that the pad member can be arranged adjacent to the table, and when the pad member is arranged adjacent to the table, the adjacent table and pad member are movable to locate the pad member opposite the optical element in place of the table such that the immersion liquid is maintained below the optical element during the movement.

Abstract: An immersion exposure apparatus and method exposes a substrate with a light beam via an optical element and immersion liquid. A first stage mounts the substrate and is movable relative to the optical element. A second stage is independently movable relative to the first stage and is positionable away from below the optical element. While the first stage is positioned below the optical element, the second stage is movable relative to the first stage so that the second stage is positioned adjacent to the first stage, and when the second stage is positioned adjacent to the first stage, the adjacent first and second stages are movable to locate the second stage opposed to the optical element in place of the first stage such that the immersion liquid is maintained below the optical element during the movement.

Abstract: A stage assembly for positioning a device along a first axis, the stage assembly comprising: a base; a stage that retains the device and moves above the base; a mover assembly that moves the stage along the first axis relative to the base; a first sensor system that monitors the movement of the stage along the first axis, the first sensor system generating a first signal, the first sensor system having a first sensor accuracy; a second sensor system that monitors the movement of the stage along the first axis, the second sensor system having a second sensor accuracy that is different from the first sensor accuracy of the first sensor system, the second sensor generating a second signal; and a control system that controls the mover assembly using at least one of the first sensor and the second signal.

Abstract: An immersion exposure apparatus and method involves (i) supporting a substrate with a stage, (ii) arranging the stage under an optical assembly to maintain immersion liquid in a gap between the optical assembly and the stage, (iii) projecting an image onto the substrate via the optical assembly and the immersion liquid, (iv) arranging a movable pad, which is movable separately from the stage, adjacent to the stage, and (v) moving the stage and the pad adjacent to each other relative to the optical assembly to arrange the pad under the optical assembly in place of the stage such that the immersion liquid is maintained below the optical assembly during the movement, thereby to arrange the movable pad under the optical assembly to maintain the immersion liquid in a gap between the optical assembly and the pad.

Abstract: An apparatus and method maintain immersion fluid in the gap adjacent to the projection lens during the exchange of a work piece in a lithography machine. The apparatus and method include an optical assembly that projects an image onto a work piece and a stage assembly including a work piece table that supports the work piece adjacent to the optical assembly. An environmental system is provided to supply and remove an immersion fluid from the gap between the optical assembly and the work piece on the stage assembly. After exposure of the work piece is complete, an exchange system removes the work piece and replaces it with a second work piece. An immersion fluid containment system maintains the immersion liquid in the gap during removal of the first work piece and replacement with the second work piece.

Abstract: A stage assembly that moves a device includes a stage that retains the device, a stage mover that moves the stage, a measurement system that provides a measurement signal that relates to the position or movement of the stage, and a control system that control the stage mover. The control system can use an estimator to estimate the position of the stage in the event the measurement signal is lost. Alternatively, the control system can be used to urge the stage against a base assembly when the measurement signal is lost to inhibit the movement of the stage.

Abstract: A method for moving a stage includes coupling a stage mover to the stage, and directing current to the stage mover with a control system. The stage mover includes a magnet array and a conductor array positioned adjacent to the magnet array. The conductor array includes a first layer of coils and a second layer of coils, with the first layer of coils being closer to the magnet array than the second layer of coils. The control system directs current to the first layer of coils and the second layer of coils independently. Further, the control system directs more current to the first layer of coils than the second layer of coils during a movement step to reduce the power consumption.

Abstract: An optical element assembly includes a base, and an element unit. The element unit includes (i) an optical element having an element central axis and an element perimeter; and (ii) an element connector assembly that couples the optical element to the base, the element connector assembly including a flexure assembly having an element flexure and a base flexure. A distal end of the element flexure is coupled to the optical element near the element perimeter, a distal end of the base flexure is coupled to the base, and a proximal end of the element flexure is coupled to a proximal end of the base flexure near the element central axis.

Abstract: An immersion exposure apparatus exposes a substrate with a light beam. The apparatus includes an optical member through which the light beam is irradiated onto the substrate, a substrate table which holds the substrate and is movable relative to the optical member, and a pad member which is movable relative to the substrate table. The substrate table and the pad member are moved together during a transition from a first state to a second state, the first state being a state in which an immersion liquid is maintained in a space between the optical member and the substrate table, the second state being a state in which the immersion liquid is maintained in a space between the optical member and the pad member. The optical member is kept in contact with the immersion liquid during the transition.