Abstract: Methods and apparatus for enabling a coil to be used to provide a net force along more than one axis are disclosed. According to one aspect of the present invention, an actuator includes a magnet assembly and a coil assembly. The coil assembly moves at least partially within the magnet arrangement, and includes a top coil half and a bottom coil half. The top coil half and the bottom coil half are independently controllable such that a first current applied to the top coil half may be independently applied from a second current applied to the bottom coil half.

Abstract: A system for cooling motors of a lithographic tool. The system includes a core plate having a plurality of outward extending cores. A cover is joined to the core plate or the plurality of outward extending cores, which forms at least one flow path for coolant to remove heat from coils of the motor.

Abstract: A stage assembly (220) that moves a work piece (200) a movement step (257) includes a first stage (238), a first mover assembly (242), a second stage (240), and a second mover assembly (244). The first mover assembly (242) moves the first stage (238) with a first acceleration profile (366) during the movement step (257) and the second mover assembly (244) moves the second stage (240) with a second acceleration profile (368) during the movement step (257) that is different than the first acceleration profile. For example, the second mover assembly (244) moves the second stage (240) during the movement step (257) with a higher maximum acceleration than the first mover assembly (242) moves the first stage (238) during the movement step (257). Further, the second mover assembly (244) moves the second stage (240) during the movement step (257) with a higher average acceleration than the first mover assembly (242) moves the first stage (238) during the movement step (257).

Abstract: A stage assembly (220) that moves a work piece (200) along a first axis, along a second axis and along a third axis includes a first stage (238), a first mover assembly (242) that moves the first stage (238) along the first axis, a second stage (240) that retains the work piece (200), a second mover assembly (244), and a non-contact bearing (257). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) along the first axis, along the second axis, and along the third axis. The non-contact bearing (257) supports the mass of the second stage (240). Further, the non-contact bearing (257) allows the second stage (240) to move relative to the first stage (238) along the first axis and along the second axis. The second mover assembly (244) can move the second stage (240) with at least four degrees of movement.

Abstract: A stage assembly (220) that moves a work piece (200) about a first axis and along a first axis includes a first stage (238), a second stage (240) that retains the work piece (200), a second mover assembly (244), a measurement system, and an initialization system (1081A). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) about the first axis. The measurement system (22) monitors the position of the second stage (240) about the first axis when the second stage (240) is positioned within a working range about the first axis. The initialization system (1081A) facilitates movement of the second stage (240) about the first axis when the second stage (240) is rotated about the first axis outside the working range. The second mover assembly (244) can include a mover (255) and a dampener (410) that reduces the transmission of vibration from the first stage (238) to the second stage (240).

Abstract: Methods and apparatus for increasing the efficiency of a voice coil motor (VCM) are disclosed. According to one aspect of the present invention, a cylindrical and radially symmetric VCM includes a plurality of sets of magnets, and a single coil. The plurality of sets of the magnets are each arranged in an array configuration, and cooperate to form a magnetic field. The coil receives current and has a plurality of windings. A first space is defined within the coil, and the plurality of sets of the magnets are arranged such that a first set of the magnets is positioned within the first space and a second set of the magnets is positioned external to the coil.

Abstract: Methods and apparatus for enabling a coil to be used to provide a net force along more than one axis are disclosed. According to one aspect of the present invention, an actuator includes a magnet assembly and a coil assembly. The coil assembly moves at least partially within the magnet arrangement, and includes a top coil half and a bottom coil half. The top coil half and the bottom coil half are independently controllable such that a first current applied to the top coil half may be independently applied from a second current applied to the bottom coil half.

Abstract: An apparatus and method maintain immersion fluid in the gap adjacent to the projection lens during the exchange of a work piece in a lithography machine. The apparatus and method include an optical assembly that projects an image onto a work piece and a stage assembly including a work piece table that supports the work piece adjacent to the optical assembly. An environmental system is provided to supply and remove an immersion fluid from the gap between the optical assembly and the work piece on the stage assembly. After exposure of the work piece is complete, an exchange system removes the work piece and replaces it with a second work piece. An immersion fluid containment system maintains the immersion liquid in the gap during removal of the first work piece and replacement with the second work piece.

Abstract: An apparatus and method maintain immersion fluid in the gap adjacent to the projection lens during the exchange of a work piece in a lithography machine. The apparatus and method include an optical assembly that projects an image onto a work piece and a stage assembly including a work piece table that supports the work piece adjacent to the optical assembly. An environmental system is provided to supply and remove an immersion fluid from the gap between the optical assembly and the work piece on the stage assembly. After exposure of the work piece is complete, an exchange system removes the work piece and replaces it with a second work piece. An immersion fluid containment system maintains the immersion liquid in the gap during removal of the first work piece and replacement with the second work piece.

Abstract: A stage assembly and support system are provided to stabilize a stage base, such as a wafer stage base or a reticle stage base, minimizing forces transmitted from the stage assembly to a stationary surface, such as the ground, and thereby preventing vibration of other parts or systems in a wafer manufacturing process. Depending of the applicable photolithography system, a reticle stage and/or a wafer stage are accelerated in response to a wafer manufacturing control system to position the semiconductor substrates. The jerking motions of the reticle stage and/or wafer stage cause reaction forces acting on the reticle stage base and/or wafer stage base. The reaction forces induce vibration to the stationary surface and surrounding parts of the photolithography system. The wafer stage assembly and support system according to this invention allow the reticle stage base and/or wafer stage base to move relative the stationary surface.

Abstract: A circulation system (330) for a mover (328) includes a fluid source (360) that directs a first fluid (356) into a first inlet (364A) of the mover (328) and a second fluid (358) into a second inlet (366A) of the mover (328). In one embodiment, a temperature of the second fluid (358) at the second inlet (366A) is different than a temperature of the first fluid (356) at the first inlet (364A). For example, in one embodiment, the temperature of the first fluid (356) at the first inlet (364A) is at least approximately 10 degrees greater than the temperature of the second fluid (358) at the second inlet (366A). In alternative embodiments, the temperature of the first fluid (356) is at least approximately 2, 5, or 15 degrees greater than the temperature of the second fluid (358).

Abstract: A mover (36) for an exposure apparatus (10) includes a conductor array (358) and a circulation housing (362) that defines at least a portion of a fluid passageway (364) near the conductor array (358). The circulation housing (362) includes a wall (366A) having a wall thickness. In one embodiment, the wall thickness at a first position on the wall (366A) is different than the wall thickness at a second position on the wall (366A). The wall (366A) can be curved and the shape of the curve is different at the first position than at the second position. Further, a cross-sectional shape of the wall (366A) at the first position is different from a cross-sectional shape of the wall (366A) at the second position.

Abstract: A wafer stage countermass assembly generally includes a base supporting one or more stages and first and second countermasses. The first and second stages move in one or more degrees of freedom. The countermasses move in at least one degree of freedom and, under ideal conditions, move to counter the movement of the stages in operation and thus preserve the systems center of gravity to avoid unwanted body motion. However, under actual conditions the countermasses may under travel or over travel their ideal trajectory. To more closely track the ideal trajectory, a controller actuates trim motors to apply small forces to the countermasses to push them towards a reference position in the Y direction. A second embodiment also takes into account the X position the stage(s) to cancel torque.

Abstract: A circulation system (330) for a mover (328) includes a fluid source (360) that directs a first fluid (356) into a first inlet (364A) of the mover (328) and a second fluid (358) into a second inlet (366A) of the mover (328). In one embodiment, a temperature of the second fluid (358) at the second inlet (366A) is different than a temperature of the first fluid (356) at the first inlet (364A). For example, in one embodiment, the temperature of the first fluid (356) at the first inlet (364A) is at least approximately 10 degrees greater than the temperature of the second fluid (358) at the second inlet (366A). In alternative embodiments, the temperature of the first fluid (356) is at least approximately 2, 5, or 15 degrees greater than the temperature of the second fluid (358).

Abstract: In electric motor assemblies, separating the x and y coils may achieve significant advantages. An advantageous design includes pairs of interacting magnet array/coil arrays. Separated coil arrays are provided, with a coil array on an arm connected to a following stage, and another coil array on a stage base (the stage being one to which is attached magnet arrays). Positioning devices, moving magnet motor assemblies, moving coil motor assemblies, and methods of driving a stage are provided. By differential driving and creation of torques about the x and y axes, a stage may be driven in six independent degrees of freedom.

Abstract: A mover (36) for an exposure apparatus (10) includes a conductor array (358) and a circulation housing (362) that defines at least a portion of a fluid passageway (364) near the conductor array (358). The circulation housing (362) includes a wall (366A) having a wall thickness. In one embodiment, the wall thickness at a first position on the wall (366A) is different than the wall thickness at a second position on the wall (366A). The wall (366A) can be curved and the shape of the curve is different at the first position than at the second position. Further, a cross-sectional shape of the wall (366A) at the first position is different from a cross-sectional shape of the wall (366A) at the second position.

Abstract: A coolant cools an object (such as, for example, a coil of a linear motor that drives a stage of an exposure apparatus) while suppressing the generation of a temperature distribution in various parts of the object being cooled by using a coolant that includes a first component and a second component dispersed in the first component, the second component increases in temperature by a lesser amount than the first component when a predetermined amount of heat is absorbed by the first and second components, respectively. The second component may be a substance that changes phase (for example, from a solid to a liquid or from a liquid to a gas) in order to absorb the predetermined amount of heat. The second component may have a higher heat capacity than the first component, and may not change phase when it absorbs heat to cool the object.

Abstract: A circulation system (330) for a mover (328) includes a fluid source (360) that directs a first fluid (356) into a first inlet (364A) of the mover (328) and a second fluid (358) into a second inlet (366A) of the mover (328). In one embodiment, a temperature of the second fluid (358) at the second inlet (366A) is different than a temperature of the first fluid (356) at the first inlet (364A). For example, in one embodiment, the temperature of the first fluid (356) at the first inlet (364A) is at least approximately 10 degrees greater than the temperature of the second fluid (358) at the second inlet (366A). In alternative embodiments, the temperature of the first fluid (356) is at least approximately 2, 5, or 15 degrees greater than the temperature of the second fluid (358).

Abstract: A stage assembly for an exposure apparatus is disclosed. The stage assembly comprises a guide assembly. The guide assembly includes a guide bar, a stage, a first actuator component, and a second actuator component. The guide bar is movable in a first direction and has a center of gravity and a guiding portion. The stage is movable along the guiding portion of the guide bar in a second direction substantially perpendicular to the first direction and exerts a reaction force on the guide bar. The stage has a center of gravity spaced apart from the center of gravity of the guide bar in the first direction. The first actuator component is positioned on the guide bar. The first actuator component is aligned with the center of gravity of the stage in the second direction to apply a compensating force on the guide bar to cancel the reaction force exerted by the stage. The second actuator component is positioned on the guide bar.

Abstract: An apparatus and method for supporting and precisely positioning a table or stage with respect to a frame. The table is supported by at least one flexible member which is flexible in a plurality of degrees of freedom. The flexible member is mounted on a base which is movable in an additional degree of freedom. In the context of lithographic semiconductor processing, a wafer stage can thereby be precisely positioned with respect to a frame or reticle in six degrees of freedom.