Abstract: A dual channel gas distributor can simultaneously distribute plasma species of an first process gas and a non-plasma second process gas into a process zone of a substrate processing chamber. The gas distributor has a localized plasma box with a first inlet to receive a first process gas, and opposing top and bottom plates that are capable of being electrically biased relative to one another to define a localized plasma zone in which a plasma of the first process gas can be formed. The top plate has a plurality of spaced apart gas spreading holes to spread the first process gas across the localized plasma zone, and the bottom plate has a plurality of first outlets to distribute plasma species of the plasma of the first process gas into the process zone. A plasma isolated gas feed has a second inlet to receive the second process gas and a plurality of second outlets to pass the second process gas into the process zone.

Abstract: Methods are provided for depositing amorphous carbon materials. In one aspect, the invention provides a method for processing a substrate including forming a dielectric material layer on a surface of the substrate, depositing an amorphous carbon layer on the dielectric material layer by introducing a processing gas comprises one or more hydrocarbon compounds and an argon carrier gas, and generating a plasma of the processing gas by applying power from a dual-frequency RF source, etching the amorphous carbon layer to form a patterned amorphous carbon layer, and etching feature definitions in the dielectric material layer corresponding to the patterned amorphous carbon layer. The amorphous carbon layer may act as an etch stop, an anti-reflective coating, or both.

Abstract: An apparatus and method are provided for the automatic operation of a manipulator to move a test head or peripheral into position for proper alignment and docking of the test head with the peripheral. Examples of peripherals include a handler and a prober. Sensors are provided to obtain relative positional information of the test head in the relation to the peripheral, allowing a controller to issue instructions to the manipulator to correct differences in each of the six degrees of freedom between the mating surfaces of the test head and the manipulator.

Abstract: Methods are provided for depositing amorphous carbon materials. In one aspect, the invention provides a method for processing a substrate including positioning the substrate in a processing chamber, introducing a processing gas into the processing chamber, wherein the processing gas comprises a carrier gas, hydrogen, and one or more precursor compounds, generating a plasma of the processing gas by applying power from a dual-frequency RF source, and depositing an amorphous carbon layer on the substrate.

Abstract: A method for forming sidewall spacers on a gate stack by depositing one or more layers of silicon containing materials using PECVD process(es) on a gate structure to produce a spacer having an overall k value of about 3.0 to about 5.0. The silicon containing materials may be silicon carbide, oxygen doped silicon carbide, nitrogen doped silicon carbide, carbon doped silicon nitride, nitrogen doped silicon oxycarbide, or combinations thereof. The deposition is performed in a plasma enhanced chemical vapor deposition chamber and the deposition temperature is less than 450° C. The sidewall spacers so produced provide good capacity resistance, as well as excellent structural stability and hermeticity.

Abstract: An apparatus and method are provided for the automatic operation of a manipulator to move a test head or peripheral into position for proper alignment and docking of the test head with the peripheral. Examples of peripherals include a handler and a prober. Sensors are provided to obtain relative positional information of the test head in the relation to the peripheral, allowing a controller to issue instructions to the manipulator to correct differences in each of the six degrees of freedom between the mating surfaces of the test head and the manipulator.

Abstract: A method of depositing a high density plasma silicon oxide layer having improved gapfill capabilities. In one embodiment the method includes flowing a process gas consisting of a silicon-containing source, an oxygen-containing source and helium into a substrate processing chamber and forming a plasma from the process gas. The ratio of the flow rate of the helium with respect to the combined flow rate of the silicon source and oxygen source is between 0.5:1 and 3.0:1 inclusive. In one particular embodiment, the process gas consists of monosilane (SiH4), molecular oxygen (O2) and helium.

Abstract: A method of depositing a high density plasma silicon oxide layer having improved gapfill capabilities. In one embodiment the method includes flowing a process gas consisting of a silicon-containing source, an oxygen-containing source and helium into a substrate processing chamber and forming a plasma from the process gas. The ratio of the flow rate of the helium with respect to the combined flow rate of the silicon source and oxygen source is between 0.5:1 and 3.0:1 inclusive. In one particular embodiment, the process gas consists of monosilane (SiH4), molecular oxygen (O2) and helium.

Abstract: A subassembly to aid in changing the interface unit for an automatic test system. The disclosed embodiment shows an automatic test system with a handler and a tester. The interface unit is a device interface board (DIB). The subassembly allows the DIB to be easily accessed, yet can be properly aligned to the test system. No special tools are required to change the DIB.

Abstract: A semiconductor test system that includes a tester, a material handling unit and a manipulator that positions the tester relative to the material handling unit. The manipulator is in the form of a cart that can be wheeled to the material handling unit. The cart is attached to the mateiral handling unit to provide course positioning of the tester relative to the handling unit. Major motion of the test head is constrained to an axis perpendicular to the mating interface of the material handling unit. However, compliant motion, with up to six degrees of freedom, is possible in a complaint zone near the handler. In this way, alignment units on the tester and material handling unit can accurately control the final positioning of the tester relative to the material handling unit.

Abstract: A method and apparatus for cleaning a semiconductor wafer processing system comprising a turbomolecular pump. In one embodiment, the invention may be reduced to practice by first supplying a cleaning agent to a chamber; pumping the cleaning agent from the chamber through an the exhaust port; at least partially opening a gate valve; and drawing at least a portion of the cleaning agent through the gate valve and into the turbomolecular pump.

Abstract: A method of depositing a high density plasma silicon oxide layer having improved gapfill capabilities. In one embodiment the method includes flowing a process gas consisting of a silicon-containing source, an oxygen-containing source and helium into a substrate processing chamber and forming a plasma from the process gas. The ratio of the flow rate of the helium with respect to the combined flow rate of the silicon source and oxygen source is between 0.5:1 and 3.0:1 inclusive. In one particular embodiment, the process gas consists of monosilane (SiH4), molecular oxygen (O2) and helium.

Abstract: A semiconductor test system that includes a tester, a material handling unit and a manipulator that positions the tester relative to the material handling unit. The manipulator is in the form of a cart that can be wheeled to the material handling unit. The cart is attached to the mateiral handling unit to provide course positioning of the tester relative to the handling unit. Major motion of the test head is constrained to an axis perpendicular to the mating interface of the material handling unit. However, compliant motion, with up to six degrees of freedom, is possible in a complaint zone near the handler. In this way, alignment units on the tester and material handling unit can accurately control the final positioning of the tester relative to the material handling unit.

Abstract: A subassembly to aid in changing the interface unit for an automatic test system. The disclosed embodiment shows an automatic test system with a handler and a tester. The interface unit is a device interface board (DIB). The subassembly allows the DIB to be easily accessed, yet can be properly aligned to the test system. No special tools are required to change the DIB.

Abstract: A method and apparatus for cleaning a semiconductor wafer processing system comprising a turbomolecular pump. In one embodiment, the invention may be reduced to practice by first supplying a cleaning agent to a chamber; pumping the cleaning agent from the chamber through an the exhaust port; at least partially opening a gate valve; and drawing at least a portion of the cleaning agent through the gate valve and into the turbomolecular pump.

Abstract: A method and apparatus for cleaning a semiconductor wafer processing system comprising a turbomolecular pump. In one embodiment, the invention may be reduced to practice by first supplying a cleaning agent to a chamber; pumping the cleaning agent from the chamber through an the exhaust port; at least partially opening a gate valve; and drawing at least a portion of the cleaning agent through the gate valve and into the turbomolecular pump.

Abstract: A hidden device in a multifunctional sports shoe comprises a roller mechanism and an actuating mechanism. The roller mechanism is disposed under a bottom sole of the shoe and the actuating mechanism, being attached to the roller mechanism. The roller mechanism further comprises an upper base frame, a lower base frame, and four pairs of cross arms, a roller frame with lined up rollers. The upper and the lower base frames at two longitudinal lateral sides have elongated sliding grooves respectively for these pairs of cross arms slidably moving along. The upper base frame and the wheel seat frame are fastened to the bottom sole on the sports shoe. The actuation mechanism further comprises a shaft disposed next to an end of the upper base frame transversely. A ratchet wheel, two rolling wheels, and a rotary disk with a turning stem are provided on the shaft. A ratchet stop with a press knob engages with the ratchet wheel. The elastic cords join these pairs of cross arms and wound on the rolling wheels.

Abstract: A hidden device in a multifunctional sports shoe comprises a roller mechanism and an actuating mechanism.

Abstract: An interface between a test head portion of automatic test equipment and handling device such as a prober. The interface employs preloaded kinematic couplings between the test head and handling device and between the probe card and the test head. These couplings allow the probe card to be repeatedly positioned relative to the component in the handling device. They also reduce forces on the probe card to prevent distortion of the probe card. The interface provide seperate mechanical and electrical loops such that mechanical position is not dependant on the electrical structure.

Abstract: A bicycle carrying frame includes a first part having a first bar and a neck link extending transversely and inclinedly from the mediated portion of the bar which is connected to the trunk lid by strips. A second part has a second bar and a connecting link intersectionally connected to the second bar. The first end of the connecting link is connected to the neck link and the second bar contacts against the rear bumper of the vehicle. A third part is connected to the second end of the connecting link and has two rings connected to two ends thereof so that the bicycle wheels are respectively supported by the two rings.