Patents by Inventor Michael Faeyrman

Michael Faeyrman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Periodic patterns and technique to control misalignment between two layers
    Patent number: 10151584
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Grant
    Filed: October 30, 2017
    Date of Patent: December 11, 2018
    Assignee: KLA-Tencor Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • PERIODIC PATTERNS AND TECHNIQUE TO CONTROL MISALIGNMENT BETWEEN TWO LAYERS
    Publication number: 20180100735
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Application
    Filed: October 30, 2017
    Publication date: April 12, 2018
    Applicant: KLA-Tencor Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Periodic patterns and technique to control misalignment between two layers
    Patent number: 9835447
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Grant
    Filed: October 24, 2016
    Date of Patent: December 5, 2017
    Assignee: KLA-Tencor Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • PERIODIC PATTERNS AND TECHNIQUE TO CONTROL MISALIGNMENT BETWEEN TWO LAYERS
    Publication number: 20170038198
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Application
    Filed: October 24, 2016
    Publication date: February 9, 2017
    Applicant: KLA-Tencor Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Periodic patterns and technique to control misalignment between two layers
    Patent number: 9476698
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Grant
    Filed: December 7, 2015
    Date of Patent: October 25, 2016
    Assignee: KLA-Tencor Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Periodic Patterns and Technique to Control Misalignment Between Two Layers
    Publication number: 20160084639
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Application
    Filed: December 7, 2015
    Publication date: March 24, 2016
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Periodic patterns and techniques to control misalignment between two layers
    Patent number: 9234745
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Grant
    Filed: July 1, 2015
    Date of Patent: January 12, 2016
    Assignee: KLA-Tencor Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Periodic Patterns and Techniques to Control Misalignment Between Two Layers
    Publication number: 20150300815
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Application
    Filed: July 1, 2015
    Publication date: October 22, 2015
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Periodic patterns and technique to control misalignment between two layers
    Patent number: 9103662
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Grant
    Filed: September 24, 2013
    Date of Patent: August 11, 2015
    Assignee: KLA-Tencor Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Periodic Patterns and Technique to Control Misalignment Between Two Layers
    Publication number: 20140022563
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Application
    Filed: September 24, 2013
    Publication date: January 23, 2014
    Applicant: KLA-Tencor Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Periodic patterns and technique to control misalignment between two layers
    Patent number: 8570515
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Grant
    Filed: November 30, 2009
    Date of Patent: October 29, 2013
    Assignee: KLA-Tencor Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Periodic patterns and technique to control misaligment between two layers
    Patent number: 8525994
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Grant
    Filed: April 22, 2009
    Date of Patent: September 3, 2013
    Assignee: KLA-Tencor Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • PERIODIC PATTERNS AND TECHNIQUE TO CONTROL MISALIGNMENT BETWEEN TWO LAYERS
    Publication number: 20100073688
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Application
    Filed: November 30, 2009
    Publication date: March 25, 2010
    Applicant: KLA-Tencor Technologies Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Periodic patterns and technique to control misalignment between two layers
    Patent number: 7656528
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Grant
    Filed: February 9, 2007
    Date of Patent: February 2, 2010
    Assignee: KLA-Tencor Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • PERIODIC PATTERNS AND TECHNIQUE TO CONTROL MISALIGMENT BETWEEN TWO LAYERS
    Publication number: 20090231584
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Application
    Filed: April 22, 2009
    Publication date: September 17, 2009
    Applicant: KLA-Tencor Technology Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Methods and systems for analyzing a specimen using atomic force microscopy profiling in combination with an optical technique
    Patent number: 7430898
    Abstract: A system that includes an optical subsystem and an atomic force microscope probe is provided. The optical subsystem is configured to generate positional information about a location on a surface of the specimen. The system is configured to position the probe proximate the location based on the positional information. One method includes generating positional information about a location on a surface of a specimen with an optical subsystem. The method also includes positioning an atomic force microscopy probe proximate the location based on the positional information. Another system includes an optical subsystem configured to measure overlay of a wafer using scatterometry. The system also includes an atomic force microscope configured to measure a characteristic of a feature on the wafer. An additional method includes measuring overlay of a wafer using scatterometry. The method also includes measuring a characteristic of a feature on the wafer using atomic force microscopy.
    Type: Grant
    Filed: September 3, 2004
    Date of Patent: October 7, 2008
    Assignee: KLA-Tencor Technologies Corp.
    Inventors: Michael Weber-Grabau, Christopher F. Bevis, Michael Faeyrman, Ofir Zamir
  • Periodic Patterns and Technique to Control Misalignment Between Two Layers
    Publication number: 20070127025
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Application
    Filed: February 9, 2007
    Publication date: June 7, 2007
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Periodic patterns and technique to control misalignment between two layers
    Publication number: 20060262326
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Application
    Filed: July 27, 2006
    Publication date: November 23, 2006
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Periodic patterns and technique to control misalignment between two layers
    Publication number: 20060132807
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Application
    Filed: February 15, 2006
    Publication date: June 22, 2006
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Periodic patterns and technique to control misalignment between two layers
    Publication number: 20060065625
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Application
    Filed: November 16, 2005
    Publication date: March 30, 2006
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman