Patents by Inventor Michael Faeyrman

Michael Faeyrman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050208685
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying, or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Application
    Filed: May 9, 2005
    Publication date: September 22, 2005
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Publication number: 20050157297
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Application
    Filed: February 18, 2005
    Publication date: July 21, 2005
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Publication number: 20040229471
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Application
    Filed: October 30, 2003
    Publication date: November 18, 2004
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Publication number: 20040061857
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Application
    Filed: October 8, 2003
    Publication date: April 1, 2004
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Publication number: 20030002043
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Application
    Filed: April 10, 2001
    Publication date: January 2, 2003
    Applicant: KLA-Tencor Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Patent number: 6172349
    Abstract: A method and apparatus for automatically focusing a high resolution microscope, wherein during setup the operator designates areas within each field of view where a measurement will be taken, and for each area of interest translates the microscope along its optical axis (Z-axis) while measuring the image intensities at discrete subareas within the area of interest. These image intensities are then evaluated, and those having the greatest signal-to-noise ratio and occurring at a common point along the Z-axis will be selected, and the corresponding subareas identified. During subsequent inspections of the area of interest, only light reflected from the identified subareas will be used to focus the microscope. The invention has application in both conventional microscopy and interferometry.
    Type: Grant
    Filed: March 31, 1997
    Date of Patent: January 9, 2001
    Assignee: KLA-Tencor Corporation
    Inventors: Isaac Katz, Michael Faeyrman, Yehuda Elisha, Shimon Kostianovsky, Yoram Uziel, Joel L. Seligson, Yoram Hanfling