Abstract: The processing of radiation patternable organometallic coatings is shown to be improved through the appropriate selection of post processing conditions between coating and development of the pattern. In particular, a coated wafer can be subjected to process delays to allow aging of the coating at various process points, in particular following irradiation. Process delays can be combined and interspersed with heating steps. The atmosphere above the coated wafer at various process steps can be adjusted to obtain desired improvements in the development of the pattern. Reactive gases can be beneficial with respect to improvement of coating properties.

Abstract: The processing of radiation patternable organometallic coatings is shown to be improved through the appropriate selection of post processing conditions between coating and development of the pattern. In particular, a coated wafer can be subjected to process delays to allow aging of the coating at various process points, in particular following irradiation. Process delays can be combined and interspersed with heating steps. The atmosphere above the coated wafer at various process steps can be adjusted to obtain desired improvements in the development of the pattern. Reactive gases can be beneficial with respect to improvement of coating properties.

Abstract: A rinse process is described for processing an initially patterned structure formed with an organometallic radiation sensitive material, in which the rinse process can remove portions of the composition remaining after pattern development to make the patterned structure more uniform such that a greater fraction of patterned structures can meet specifications. The radiation sensitive material can comprise alkyl tin oxide hydroxide compositions. The rinsing process can be effectively used to improve patterning of fine structures using extreme ultraviolet light.

Abstract: A bathing wall system including a wall panel supporting a cantilevered seat. A coupler secures the wall panel to a support wall and includes a hanger engaging a bracket.

Abstract: The processing of radiation patternable organometallic coatings is shown to be improved through the appropriate selection of post processing conditions between coating and development of the pattern. In particular, a coated wafer can be subjected to process delays to allow aging of the coating at various process points, in particular following irradiation. Process delays can be combined and interspersed with heating steps. The atmosphere above the coated wafer at various process steps can be adjusted to obtain desired improvements in the development of the pattern. Reactive gases can be beneficial with respect to improvement of coating properties.

Abstract: The processing of radiation patternable organometallic coatings is shown to be improved through the appropriate selection of post processing conditions between coating and development of the pattern. In particular, a coated wafer can be subjected to process delays to allow aging of the coating at various process points, in particular following irradiation. Process delays can be combined and interspersed with heating steps. The atmosphere above the coated wafer at various process steps can be adjusted to obtain desired improvements in the development of the pattern. Reactive gases can be beneficial with respect to improvement of coating properties.

Abstract: The processing of radiation patternable organometallic coatings is shown to be improved through the appropriate selection of post processing conditions between coating and development of the pattern. In particular, a coated wafer can be subjected to process delays to allow aging of the coating at various process points, in particular following irradiation. Process delays can be combined and interspersed with heating steps. The atmosphere above the coated wafer at various process steps can be adjusted to obtain desired improvements in the development of the pattern. Reactive gases can be beneficial with respect to improvement of coating properties.

Abstract: A rinse process is described for processing an initially patterned structure formed with an organometallic radiation sensitive material, in which the rinse process can remove portions of the composition remaining after pattern development to make the patterned structure more uniform such that a greater fraction of patterned structures can meet specifications. The radiation sensitive material can comprise alkyl tin oxide hydroxide compositions. The rinsing process can be effectively used to improve patterning of fine structures using extreme ultraviolet light.

Abstract: A rinse process is described for processing an initially patterned structure formed with an organometallic radiation sensitive material, in which the rinse process can remove portions of the composition remaining after pattern development to make the patterned structure more uniform such that a greater fraction of patterned structures can meet specifications. The radiation sensitive material can comprise alkyl tin oxide hydroxide compositions. The rinsing process can be effectively used to improve patterning of fine structures using extreme ultraviolet light.

Abstract: An electrical extending outlet having a rigid body slidably extendable such that, in use, extends the outlet of a wall above a restrictive surface. The rigid body has a male connector on its lower end that is rotatable to allow the rigid body to be positioned in a number of positions relative to the wall outlet. On the upper end of the rigid body is at least one female outlet which a user can insert a male plug of an electrical device. The rigid body has a fastener to attach the rigid body to the wall.

Abstract: The processing of radiation patternable organometallic coatings is shown to be improved through the appropriate selection of post processing conditions between coating and development of the pattern. In particular, a coated wafer can be subjected to process delays to allow aging of the coating at various process points, in particular following irradiation. Process delays can be combined and interspersed with heating steps. The atmosphere above the coated wafer at various process steps can be adjusted to obtain desired improvements in the development of the pattern. Reactive gases can be beneficial with respect to improvement of coating properties.

Abstract: An electrical extending outlet having a rigid body slidably extendable such that, in use, extends the outlet of a wall above a restrictive surface. The rigid body has a male connector on its lower end that is rotatable to allow the rigid body to be positioned in a number of positions relative to the wall outlet. On the upper end of the rigid body is at least one female outlet which a user can insert a male plug of an electrical device. The rigid body has a fastener to attach the rigid body to the wall.

Abstract: A rinse process is described for processing an initially patterned structure formed with an organometallic radiation sensitive material, in which the rinse process can remove portions of the composition remaining after pattern development to make the patterned structure more uniform such that a greater fraction of patterned structures can meet specifications. The radiation sensitive material can comprise alkyl tin oxide hydroxide compositions. The rinsing process can be effectively used to improve patterning of fine structures using extreme ultraviolet light.

Abstract: A display system includes a light source, a spatial light homogenizer, and imaging optics. The spatial light modulator has a plurality of modulator pixels. The display system also includes a pixelated plate illuminated by the light source. The pixelated plate has a plurality of individually defined pixels formed thereon. The spatial light modulator is in optical communication with the pixelated color management device by the imaging optics and each of the modulator pixels is associated with at least one of the individually defined pixels of the pixelated plate.

Abstract: A display system includes a light source, a spatial light homogenizer, and imaging optics. The spatial light modulator has a plurality of modulator pixels. The display system also includes a pixelated plate illuminated by the light source. The pixelated plate has a plurality of individually defined pixels formed thereon. The spatial light modulator is in optical communication with the pixelated color management device by the imaging optics and each of the modulator pixels is associated with at least one of the individually defined pixels of the pixelated plate.

Abstract: A method and apparatus includes receiving light at an intensity modulator. Subsequently, the light is received at an intensity-color modulator that includes at least one Fabry-Perot filter having a tunable optical property.

Abstract: An interface is provided for managing a plurality of tracked objects, each tracked object associated with a corresponding telemetry device. A request is received from a web browser for at least one action to be performed by the telemetry device. A message including information indicating the at least one action is transmitted, to the corresponding telemetry device. The web browser is configured to display at least one geographical map indication of at least one location of each tracked object.

Abstract: The invention disclosed in this application uses a method of modulation named Integer Cycle Frequency Hopping (ICFH) wherein a carrier signal, comprised of a continuum of sine waves is generated on a single frequency. A data bit representing either a “1” or a “0”, depending upon the logic polarity chosen by the builder is imposed upon the carrier signal by modifying the carrier signal at precisely the zero crossing point or the zero degree angle. The method of imposing the data is to cause either a lengthening or shortening of the proceeding 360 degrees of phase angle, thus effectively either raising or lowering the frequency of the carrier signal for just the one, or a succession of cycles at hand. Upon completion of the 360-degree cycle(s), the carrier will return to the original frequency. The main carrier frequency is only modulated beginning at the zero degree phase angle and ending at the 360-degree phase angle.

Abstract: The present invention is addressed to a method of modulation wherein digital data streams are radio transmitted at a high level of efficiency and speed, and without a large continuous concomitant formation of side frequency phenomena. Thus, bandwidths assigned for this transmissional task are quite narrow, with data transmission speeds at the singular frequency of the RF carrier itself. This invention can send high-speed data in RF channels that are very narrow and that would ordinarily be considered useful only for very low speed data or analog voice. The purpose of this invention is to provide a means by which a radio frequency carrier, expressed, as a square wave can be amplitude modulated with maximum efficiency and speed with minimum phase delay and distortion. RF filtering is used to reduce the modulated square wave to its base band sine wave component after modulation. This circuit may be used to modulate the carrier (clock) at any frequency up to and beyond the carrier frequency itself.

Abstract: The present invention is addressed to a method of modulation wherein digital data streams are radio transmitted at a high level of efficiency and speed, and without a large continuous concomitant formation of side frequency phenomena. Thus, bandwidths assigned for this transmissional task are quite narrow, with data transmission speeds at the singular frequency of the RF carrier itself. This invention can send high-speed data in RF channels that are very narrow and that would ordinarily be considered useful only for very low speed data or analog voice. The purpose of this invention is to provide a means by which a radio frequency carrier, expressed, as a square wave can be amplitude modulated with maximum efficiency and speed with minimum phase delay and distortion. RF filtering is used to reduce the modulated square wave to its base band sine wave component after modulation. This circuit may be used to modulate the carrier (clock) at any frequency up to and beyond the carrier frequency itself.