Abstract: A non-contiguous group of cells in a battery of cells is selected for charging or discharging the battery.

Abstract: Determining linear modulator dynamics in an interferometric fiber-optic gyroscope may be accomplished by applying a stimulus at a point within the gyroscope, observing a response in an output of the gyroscope, and determining, from the observed response, the linear modulator dynamics.

Abstract: A system and method are provided for delivering power to a dynamic load. The system includes a power supply providing DC power having a substantially constant power open loop response, a power amplifier for converting the DC power to RF power, a sensor for measuring voltage, current and phase angle between voltage and current vectors associated with the RF power, an electrically controllable impedance matching system to modify the impedance of the power amplifier to at least a substantially matched impedance of a dynamic load, and a controller for controlling the electrically controllable impedance matching system. The system further includes a sensor calibration measuring module for determining power delivered by the power amplifier, an electronic matching system calibration module for determining power delivered to a dynamic load, and a power dissipation module for calculating power dissipated in the electrically controllable impedance matching system.

Abstract: A system and method are provided for delivering power to a dynamic load. The system includes a power supply providing DC power having a substantially constant power open loop response, a power amplifier for converting the DC power to RF power, a sensor for measuring voltage, current and phase angle between voltage and current vectors associated with the RF power, an electrically controllable impedance matching system to modify the impedance of the power amplifier to at least a substantially matched impedance of a dynamic load, and a controller for controlling the electrically controllable impedance matching system. The system further includes a sensor calibration measuring module for determining power delivered by the power amplifier, an electronic matching system calibration module for determining power delivered to a dynamic load, and a power dissipation module for calculating power dissipated in the electrically controllable impedance matching system.

Abstract: A method and apparatus for controlling a power supply to prevent instabilities due to dynamic loads in RF plasma processing systems, operating at frequencies of from 1 MHz and up 1 MHz and above. The apparatus includes a power source, a power converter receiving power from the source, the power converter providing a constant output power controlled by varying at least one of input voltage or switching frequency, and an RF generator receiving constant power from the power converter.

Abstract: Embodiments of early enabling synchronous elastic designs, devices and methods are presented herein.

Abstract: A radar transponder which does not have a receiver/transmit switch. A radio frequency coupler of the transponder switches the antenna between the transmitter and the receiver. The coupler connects the receiver, the transmitter and the antenna such that the receiver is connected to the most attenuated terminal of the coupler. The coupler may be a radio frequency coupler having an attenuation of between three and forty dB, or approximately ten dB. The antenna can be an integrated PCB surface-mounted multi-bay turnstile antenna.

Abstract: Determining linear modulator dynamics in an interferometric fiber-optic gyroscope may be accomplished by applying a stimulus at a point within the gyroscope, observing a response in an output of the gyroscope, and determining, from the observed response, the linear modulator dynamics.

Abstract: Embodiments of early enabling synchronous elastic designs, devices and methods are presented herein.

Abstract: A method and apparatus for controlling a power supply to prevent instabilities due to dynamic loads in RF plasma processing systems, operating at frequencies of from 1 MHz and up, uses a feedforward type of control loop to tightly regulate the power supplied to the dynamic electrical load, such as loads caused by variable and inconsistent plasma impedance. A feedback control loop can also be used in combination with the feedforward loop, but at a slower rate, to help regulate the amount of power provided to the load.

Abstract: A system and method are provided for delivering power to a dynamic load. The system includes a power supply providing DC power having a substantially constant power open loop response, a power amplifier for converting the DC power to RF power, a sensor for measuring voltage, current and phase angle between voltage and current vectors associated with the RF power, an electrically controllable impedance matching system to modify the impedance of the power amplifier to at least a substantially matched impedance of a dynamic load, and a controller for controlling the electrically controllable impedance matching system. The system further includes a sensor calibration measuring module for determining power delivered by the power amplifier, an electronic matching system calibration module for determining power delivered to a dynamic load, and a power dissipation module for calculating power dissipated in the electrically controllable impedance matching system.

Abstract: A method and apparatus for controlling a power supply to prevent instabilities due to dynamic loads in RF plasma processing systems, operating at frequencies of from 1 MHz and up 1 MHz and above. The apparatus includes a power source, a power converter receiving power from the source, the power converter providing a constant output power controlled by varying at least one of input voltage or switching frequency, and an RF generator receiving constant power from the power converter.

Abstract: Apparatus to achieve both more uniform and particle free DLC deposition is disclosed which automatically cycles between modes to effect automatic removal of carbon-based buildups or which provides barriers to achieve proper gas flow involves differing circuitry and design parameter options. One ion source may be used in two different modes whether for DLC deposition or not through automatic control of gas flow types and rates and through the control of the power applied to achieve maximum throughput or other desired processing goals. Arcing can be controlled and even permitted to optimize the overall results achieved.

Abstract: A method and apparatus for controlling a power supply to prevent instabilities due to dynamic loads in RF plasma processing systems, operating at frequencies of from 1 MHz and up, uses a feedforward type of control loop to tightly regulate the power supplied to the dynamic electrical load, such as loads caused by variable and inconsistent plasma impedance. A feedback control loop can also be used in combination with the feedforward loop, but at a slower rate, to help regulate the amount of power provided to the load.

Abstract: Systems to achieve both more uniform and particle free DLC deposition is disclosed which automatically cycles between modes to effect automatic removal of carbon-based buildups or which provides barriers to achieve proper gas flow involves differing circuitry and design parameter options. One ion source may be used in two different modes whether for DLC deposition or not through automatic control of gas flow types and rates and through the control of the power applied to achieve maximum throughput or other desired processing goals. Arcing can be controlled and even permitted to optimize the overall results achieved.

Abstract: The invention pertains to the use of enhanced electron emitting surfaces to increase the supply of electrons in a thin film deposition system including the ion source in order to enhance the deposition rates of thin film materials. The use of enhanced electron emitting surfaces reduces the erosion of component parts in the ion source while increasing the rate and quality of the film deposited on the substrate. Allowing for ion source operation at lower gas pressure also increases the range of cold-cathode applications and improving operation at all pressures. The cathode section of the ion source is comprised of a reactive material that upon reaction with a reactive gas forms an insulating thin film on the cathode surface that provides an addition source of electrons for the ion beam source. Also, electron emitters located outside of the ion beam source have cathode sections that comprise enhanced electron emitting surfaces to provide electron flow to the ion beam.

Abstract: Embodiments of the present invention generate equations that model a synchronous circuit that contains sequential elements, which may include transparent elements, and a plurality of multiple-phase clocks. Phase-related information is assigned to nodes of the circuit. The phase-related information describes input and output characteristics at nodes of the circuit as the characteristics relate to clock phases. Equations are formed that model signals at the circuit nodes based on the phase-related information.

Abstract: Embodiments of the present invention generate equations that model a synchronous circuit that contains sequential elements, which may include transparent elements, and a plurality of multiple-phase clocks. Phase-related information is assigned to nodes of the circuit. The phase-related information describes input and output characteristics at nodes of the circuit as the characteristics relate to clock phases. Equations are formed that model signals at the circuit nodes based on the phase-related information.

Abstract: Systems to achieve both more uniform and particle free DLC deposition is disclosed which automatically cycles between modes to effect automatic removal of carbon-based buildups or which provides barriers to achieve proper gas flow involves differing circuitry and design parameter options. One ion source may be used in two different modes whether for DLC deposition or not through automatic control of gas flow types and rates and through the control of the power applied to achieve maximum throughput or other desired processing goals. Arcing can be controlled and even permitted to optimize the overall results achieved.

Abstract: There is provided by this invention an apparatus and method for generating voltage pulses to first and second magnetron devices in a plasma chamber. An isolation transformer is connected to a pulsed DC power supply having a flux sensor, such as a Hall effect sensor, in close proximity to its air gap to monitor the transformer flux. A control circuit is connected to the flux sensor to control the duty cycle of the transformer by controlling the flux of the transformer such that the maximum and minimum peak transformer fluxes are equal in magnitude and opposite in sign to prevent saturation.