Abstract: There is provided by this invention an apparatus and method for generating voltage pulses to first and second magnetron devices in a plasma chamber. An isolation transformer is connected to a pulsed DC power supply having a flux sensor, such as a Hall effect sensor, in close proximity to its air gap to monitor the transformer flux. A control circuit is connected to the flux sensor to control the duty cycle of the transformer by controlling the flux of the transformer such that the maximum and minimum peak transformer fluxes are equal in magnitude and opposite in sign to prevent saturation.

Abstract: Systems to achieve both more uniform and particle free DLC deposition is disclosed which automatically cycles between modes to effect automatic removal of carbon-based buildups or which provides barriers to achieve proper gas flow involves differing circuitry and design parameter options. One ion source may be used in two different modes whether for DLC deposition or not through automatic control of gas flow types and rates and through the control of the power applied to achieve maximum throughput or other desired processing goals. Arcing can be controlled and even permitted to optimize the overall results achieved.

Abstract: A power supply for driving two magnetron sputtering devices in a bipolar mode includes current pulse circuits one for driving each of the two magnetrons. Each of the current pulse circuits converts positive and negative voltage outputs of a DC electrical power source to a train of regulated current pulses of independently adjustable duration. Each of the current pulse circuits includes a circuit block for converting the DC output voltage to a source of regulated current and delivering that regulated current to an input end of an inductor. Each of the current pulse circuits also includes an output switching circuit block which periodically and alternatively switches an output terminal between an output end of the inductor and the positive voltage output of the DC power source. The power supply may be configured to drive one magnetron in a unipolar mode alone or as an alternative to driving two magnetrons in a bipolar mode.