Patents by Inventor Michael Konrad Grobis

Michael Konrad Grobis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8048546
    Abstract: A continuous-media perpendicular magnetic recording disk with an oxide-containing granular Co alloy recording layer (RL) having minimal grain size dispersion has an ordered nucleation layer (ONL) formed below RL. The ONL has ordered nucleation sites arranged in a generally repetitive pattern. The nucleation sites are generally surrounded by non-nucleation regions of a different material than the nucleation sites. The Co-alloy grains of the subsequently deposited RL grow on the nucleation sites and the oxide of the RL become generally segregated on the non-nucleation regions. The ordered nucleation sites may be formed of a Ru-containing material and the non-nucleation regions may be formed of an oxide. The ONL is formed by nanoimprint lithography, preferably by a master mold fabricated with a method using self-assembling block copolymers for creating periodic nanometer scale features.
    Type: Grant
    Filed: December 16, 2009
    Date of Patent: November 1, 2011
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Thomas R Albrecht, Michael Konrad Grobis, Ernesto E. Marinero, Hal J. Rosen, Ricardo Ruiz
  • Publication number: 20110143169
    Abstract: A continuous-media perpendicular magnetic recording disk with an oxide-containing granular Co alloy recording layer (RL) having minimal grain size dispersion has an ordered nucleation layer (ONL) formed below RL. The ONL has ordered nucleation sites arranged in a generally repetitive pattern. The nucleation sites are generally surrounded by non-nucleation regions of a different material than the nucleation sites. The Co-alloy grains of the subsequently deposited RL grow on the nucleation sites and the oxide of the RL become generally segregated on the non-nucleation regions. The ordered nucleation sites may be formed of a Ru-containing material and the non-nucleation regions may be formed of an oxide. The ONL is formed by nanoimprint lithography, preferably by a master mold fabricated with a method using self-assembling block copolymers for creating periodic nanometer scale features.
    Type: Application
    Filed: December 16, 2009
    Publication date: June 16, 2011
    Applicant: HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V.
    Inventors: Thomas R. Albrecht, Michael Konrad Grobis, Ernesto E. Marinero, Hal J. Rosen, Ricardo Ruiz