Abstract: A load port including a frame defining a load port opening, a substrate carrier interface connected to the frame and configured to removably couple with a substrate carrier shell, a load port door configured to interface with a substrate carrier door, the load port door being movably coupled to frame and having a first position substantially blocking the load port opening, and a second position where the load port opening is substantially unblocked by the load port door, and a door coupling member without moving parts, located on the load port door configured to releasably couple with a corresponding member without moving parts on the substrate carrier door, wherein activation of the door coupling member effects coupling between the load port door and substrate carrier door and a passive release of the substrate carrier door from the substrate carrier shell.

Abstract: A substrate processing apparatus is provided. The apparatus has a casing, a low port interface and a carrier holding station. The casing has processing devices within for processing substrates. The load port interface is connected to the casing for loading substrates into the processing device. The carrier holding station is connected to the casing. The carrier holding station is adapted for holding at least one substrate transport carrier at the load port interface. The carrier holding station is arranged to provide a fast swap section for replacement of the substrate transport carrier from the carrier holding station.

Abstract: A semiconductor workpiece processing system having at least one processing apparatus for processing workpieces, a primary transport system, a secondary transport system and one or more interfaces between first transport system and second transport system. The primary and secondary transport systems each have one or more sections of substantially constant velocity and in queue sections communicating with the constant velocity sections.

Abstract: A substrate processing apparatus is provided. The apparatus has a casing, a low port interface and a carrier holding station. The casing has processing devices within for processing substrates. The load port interface is connected to the casing for loading substrates into the processing device. The carrier holding station is connected to the casing. The carrier holding station is adapted for holding at least one substrate transport carrier at the load port interface. The carrier holding station is arranged to provide a fast swap section for replacement of the substrate transport carrier from the carrier holding station.

Abstract: An exemplary embodiment a substrate transport system is provided. The system has a guideway and at least one transport vehicle. The transport vehicle is adapted for holding at least one substrate and capable of being supported from and moving along the guideway. The guideway comprises at least one travel lane for the vehicle and at least one access lane offset from the travel lane allowing the vehicle selectable access on and off the travel lane.

Abstract: A semiconductor workpiece processing system having at least one processing apparatus for processing workpieces, a primary transport system, a secondary transport system and one or more interfaces between first transport system and second transport system. The primary and secondary transport systems each have one or more sections of substantially constant velocity and in queue sections communicating with the constant velocity sections.

Abstract: An electron beam emitter includes an electron generator for generating electrons. The electron generator can have a housing containing at least one electron source for generating the electrons. The at least one electron source has a width. The electron generator housing can have an electron permeable region spaced from the at least one electron source for allowing extraction of the electrons from the electron generator housing. The electron permeable region can include a series of narrow elongate slots and ribs formed in the electron generator housing and extending laterally beyond the width of the at least one electron source. The electron permeable region can be configured and positioned relative to the at least one electron source for laterally spreading the electrons that are generated by the at least one electron source.

Abstract: A semiconductor workpiece processing system having at least one processing apparatus for processing workpieces, a primary transport system, a secondary transport system and one or more interfaces between first transport system and second transport system. The primary and secondary transport systems each have one or more sections of substantially constant velocity and in queue sections communicating with the constant velocity sections.