Patents by Inventor Michael Layh
Michael Layh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20160077446Abstract: Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.Type: ApplicationFiled: November 19, 2015Publication date: March 17, 2016Inventors: Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul, Markus Deguenther, Michael Layh, Axel Scholz, Uwe Spengler, Reinhard Voelkel
-
Patent number: 9239229Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.Type: GrantFiled: April 24, 2015Date of Patent: January 19, 2016Assignee: Carl Zeiss SMT GmbHInventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
-
Patent number: 9217930Abstract: Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.Type: GrantFiled: February 6, 2013Date of Patent: December 22, 2015Assignee: Carl Zeiss SMT GmbHInventors: Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul, Markus Deguenther, Michael Layh, Axel Scholz, Uwe Spengler, Reinhard Voelkel
-
Patent number: 9176390Abstract: A method includes moving a correction device into a neutral position; subsequently ascertaining, for a given arrangement of imaging light channels in the illumination optical unit of the projection exposure apparatus, intensity distributions of at least some of the individual imaging light partial beams along a transverse coordinate transverse to a displacement direction of an object to be imaged; subsequently ascertaining, in dependence on the transverse coordinate, an actual variation of actual values of structure image sizes of object structures in an image field, onto which the object is imaged; and subsequently specifying a predetermined variation of the structure image sizes over the transverse coordinate and displacing correction elements of the correction device, starting from the neutral position, such that the actual variation matches the predetermined variation within a tolerance bandwidth. The method can provide improved imaging results as compared to known uniformity adjustment.Type: GrantFiled: March 15, 2012Date of Patent: November 3, 2015Assignee: Carl Zeiss SMT GmbHInventors: Michael Layh, Markus Deguenther
-
Publication number: 20150300807Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.Type: ApplicationFiled: April 24, 2015Publication date: October 22, 2015Inventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
-
Publication number: 20150185621Abstract: An illumination system for illuminating a mask in a scanning microlithographic projection exposure apparatus has an objective with an object plane, at least one pupil surface and an image plane in which a mask can be arranged. A beam deflection array of reflective or transparent beam deflection elements is provided, where each beam deflection element is adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements are arranged in or in close proximity to the object plane of the objective.Type: ApplicationFiled: March 13, 2015Publication date: July 2, 2015Inventors: Markus Deguenther, Michael Layh
-
Publication number: 20150177623Abstract: A microlithography projection exposure apparatus includes illumination optics configured to illuminate object field points of an object field in an object plane, and projection optics configured to image the object field onto an image field in an image plane. The illumination optics includes a multi-mirror array which includes a plurality of mirrors configured to adjust an intensity distribution in exit pupils associated with the object field points. The illumination optics also includes an optical system configured to produce, via an incoherent superposition of illumination rays, a temporal modification of a temporal stabilization of an illumination of the multi-mirror array. The optical system includes a mirror which includes a mirror surface. In addition, the optical system includes an actuator configured to produce a tilt of at least a portion of the mirror surface.Type: ApplicationFiled: February 27, 2015Publication date: June 25, 2015Inventors: Michael Layh, Markus Deguenther, Michael Patra, Johannes Wangler, Manfred Maul, Damian Fiolka, Gundula Weiss
-
Patent number: 9019475Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.Type: GrantFiled: April 17, 2014Date of Patent: April 28, 2015Assignee: Carl Zeiss SMT GmbHInventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
-
Patent number: 9013684Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.Type: GrantFiled: July 24, 2012Date of Patent: April 21, 2015Assignee: Carl Zeiss SMT GmbHInventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
-
Patent number: 9007563Abstract: An illumination system for illuminating a mask in a scanning microlithographic projection exposure apparatus has an objective with an object plane, at least one pupil surface and an image plane in which a mask can be arranged. A beam deflection array of reflective or transparent beam deflection elements is provided, where each beam deflection element is adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements are arranged in or in close proximity to the object plane of the objective.Type: GrantFiled: February 23, 2010Date of Patent: April 14, 2015Assignee: Carl Zeiss SMT GmbHInventors: Markus Deguenther, Michael Layh
-
Patent number: 9007559Abstract: An EUV collector for collecting and transmitting radiation from an EUV radiation source includes at least one collector mirror for reflecting an emission of the EUV radiation source, which is rotationally symmetric with respect to a central axis. The EUV collector also includes a cooling device for cooling the at least one collector mirror. The cooling device has at least one cooling element, which has a course with respect to the collector mirror, in each case, such that the projection of the course into a plane perpendicular to the central axis has a main direction, which encloses an angle of at most 20° with respect to a predetermined preferred direction. The collector transmits improved quality radiation to illuminate an object field.Type: GrantFiled: August 22, 2011Date of Patent: April 14, 2015Assignee: Carl Zeiss SMT GmbHInventors: Michael Layh, Udo Dinger
-
Patent number: 9001309Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.Type: GrantFiled: April 17, 2014Date of Patent: April 7, 2015Assignee: Carl Zeiss SMT GmbHInventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
-
Patent number: 8891057Abstract: A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(?) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points.Type: GrantFiled: June 18, 2010Date of Patent: November 18, 2014Assignee: Carl Zeiss SMT GmbHInventors: Michael Layh, Markus Deguenther, Michael Patra, Johannes Wangler, Manfred Maul, Damian Fiolka, Gundula Weiss
-
Publication number: 20140240686Abstract: A mirror for EUV radiation comprises a total reflection surface, which has a first EUV-radiation-reflecting region and at least one second EUV-radiation-reflecting region, wherein the EUV-radiation-reflecting regions are structurally delimited from one another, wherein the first region comprises at least one first partial reflection surface which is surrounded along a circumference in each case by the at least one second region, and wherein the at least one second EUV-radiation-reflecting region comprises at least one second partial reflection surface which is embodied in a path-connected fashion and which is embodied in a continuous fashion.Type: ApplicationFiled: May 5, 2014Publication date: August 28, 2014Inventors: Johannes Ruoff, Heiko Feldmann, Michael Layh
-
Publication number: 20140233006Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.Type: ApplicationFiled: April 17, 2014Publication date: August 21, 2014Inventors: Stefan Xalter, Yim-Bun Patrick Kwan, Manfred Maul, Johannes Eisenmenger, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Damian Fiolka, Andras G. Major, Johannes Wangler, Michael Layh
-
Publication number: 20140226141Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.Type: ApplicationFiled: April 17, 2014Publication date: August 14, 2014Applicant: Carl Zeiss SMT GmbHInventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
-
Publication number: 20140211188Abstract: A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(?) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a second adjusted intensity distribution in the associated exit pupil by less than 0.1 in at least one of an inner ? or an outer ?.Type: ApplicationFiled: April 3, 2014Publication date: July 31, 2014Applicant: Carl Zeiss SMT GmbHInventors: Michael Layh, Markus Deguenther, Michael Patra, Johannes Wangler, Manfred Maul, Damian Fiolka, Gundula Weiss
-
Patent number: 8786849Abstract: First test beams (464a-d), after passing through an optical system on optical paths that differ in pairs, impinge on a first measurement region (461) at angles that differ in pairs with respect to the measurement plane. Second test beams (465a-d), after passing through the optical system on optical paths that differ in pairs, impinge on a second measurement region (462) at angles that differ in pairs, wherein the second region differs from the first. A value of a first measurement variable of the test beam at the first region is detected for each of the first test beams, and comparably for a second measurement variable at the second region for the second test beams. Impingement regions (467a-d) on reference surface(s) (466, 471) of the optical system are determined and a spatial diagnosis distribution of a property of the reference surface(s) for each test beam is calculated.Type: GrantFiled: June 7, 2013Date of Patent: July 22, 2014Assignee: Carl Zeiss SMT GmbHInventors: Thomas Korb, Christian Hettich, Michael Layh, Ulrich Wegmann, Karl-Heinz Schuster, Matthias Manger
-
Publication number: 20140176930Abstract: A microlithographic illumination system can include a light distribution device that can generate a two-dimensional intensity distribution in a first illumination plane. A first raster array of optical raster elements can generates a raster array of secondary light sources. A device with an additional optical effect can be disposed spatially adjacent to the two raster arrays. The device can be configured as an illumination angle variation device. The device can influence the intensity and/or the phase and/or the beam direction of the illumination light. The influence can be such that an intensity contribution of raster elements to the total illumination intensity can vary across the illumination field. This can enable the illumination intensity to be influenced across the illumination field in a defined manner with respect to the total illumination intensity and/or with respect to the intensity contributions from different directions of illumination.Type: ApplicationFiled: February 27, 2014Publication date: June 26, 2014Applicant: Carl Zeiss SMT GmbHInventors: Markus Deguenther, Michael Layh, Michael Gerhard, Bruno Thome, Wolfgang Singer
-
Patent number: 8724086Abstract: A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(?) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a second adjusted intensity distribution in the associated exit pupil by less than 0.1 in at least one of an inner ? or an outer ?.Type: GrantFiled: June 18, 2010Date of Patent: May 13, 2014Assignee: Carl Zeiss SMT GmbHInventors: Michael Layh, Markus Deguenther, Michael Patra, Johannes Wangler, Manfred Maul, Damian Fiolka, Gundula Weiss