Patents by Inventor Michael N. Miller

Michael N. Miller has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11237479
    Abstract: An imprint lithography method of configuring an optical layer includes depositing a set of droplets atop a side of a substrate in a manner such that the set of droplets do not contact a functional pattern formed on the substrate. The imprint lithography method further includes curing the set of droplets to form a spacer layer associated with the side of the substrate and of a height selected such that the spacer layer can support a surface adjacent the substrate and spanning the set of droplets at a position spaced apart from the functional pattern.
    Type: Grant
    Filed: July 2, 2020
    Date of Patent: February 1, 2022
    Assignee: Molecular Imprints, Inc.
    Inventors: Vikramjit Singh, Michael N. Miller, Frank Y. Xu, Christopher Fleckenstein
  • Patent number: 11161280
    Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
    Type: Grant
    Filed: January 31, 2019
    Date of Patent: November 2, 2021
    Assignee: Molecular Imprints, Inc.
    Inventors: Niyaz Khusnatdinov, Frank Y. Xu, Mario Johannes Meissl, Michael N. Miller, Ecron D. Thompson, Gerard M. Schmid, Pawan Kumar Nimmakayala, Xiaoming Lu, Byung-Jin Choi
  • Publication number: 20200333705
    Abstract: An imprint lithography method of configuring an optical layer includes depositing a set of droplets atop a side of a substrate in a manner such that the set of droplets do not contact a functional pattern formed on the substrate. The imprint lithography method further includes curing the set of droplets to form a spacer layer associated with the side of the substrate and of a height selected such that the spacer layer can support a surface adjacent the substrate and spanning the set of droplets at a position spaced apart from the functional pattern.
    Type: Application
    Filed: July 2, 2020
    Publication date: October 22, 2020
    Inventors: Vikramjit Singh, Michael N. Miller, Frank Y. Xu, Christopher Fleckenstein
  • Patent number: 10747108
    Abstract: An imprint lithography method of configuring an optical layer includes depositing a set of droplets atop a side of a substrate in a manner such that the set of droplets do not contact a functional pattern formed on the substrate. The imprint lithography method further includes curing the set of droplets to form a spacer layer associated with the side of the substrate and of a height selected such that the spacer layer can support a surface adjacent the substrate and spanning the set of droplets at a position spaced apart from the functional pattern.
    Type: Grant
    Filed: June 27, 2019
    Date of Patent: August 18, 2020
    Assignee: Molecular Imprints, Inc.
    Inventors: Vikramjit Singh, Michael N. Miller, Frank Y. Xu, Christopher Fleckenstein
  • Publication number: 20190317399
    Abstract: An imprint lithography method of configuring an optical layer includes depositing a set of droplets atop a side of a substrate in a manner such that the set of droplets do not contact a functional pattern formed on the substrate. The imprint lithography method further includes curing the set of droplets to form a spacer layer associated with the side of the substrate and of a height selected such that the spacer layer can support a surface adjacent the substrate and spanning the set of droplets at a position spaced apart from the functional pattern.
    Type: Application
    Filed: June 27, 2019
    Publication date: October 17, 2019
    Inventors: Vikramjit Singh, Michael N. Miller, Frank Y. Xu, Christopher Fleckenstein
  • Patent number: 10379438
    Abstract: An imprint lithography method of configuring an optical layer includes depositing a set of droplets atop a side of a substrate in a manner such that the set of droplets do not contact a functional pattern formed on the substrate. The imprint lithography method further includes curing the set of droplets to form a spacer layer associated with the side of the substrate and of a height selected such that the spacer layer can support a surface adjacent the substrate and spanning the set of droplets at a position spaced apart from the functional pattern.
    Type: Grant
    Filed: January 31, 2018
    Date of Patent: August 13, 2019
    Assignee: Molecular Imprints, Inc.
    Inventors: Vikramjit Singh, Michael N. Miller, Frank Y. Xu, Christopher Fleckenstein
  • Publication number: 20190232533
    Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
    Type: Application
    Filed: January 31, 2019
    Publication date: August 1, 2019
    Inventors: Niyaz Khusnatdinov, Frank Y. Xu, Mario Johannes Meissl, Michael N. Miller, Ecron D. Thompson, Gerard M. Schmid, Pawan Kumar Nimmakayala, Xiaoming Lu, Byung-Jin Choi
  • Publication number: 20180217495
    Abstract: An imprint lithography method of configuring an optical layer includes depositing a set of droplets atop a side of a substrate in a manner such that the set of droplets do not contact a functional pattern formed on the substrate. The imprint lithography method further includes curing the set of droplets to form a spacer layer associated with the side of the substrate and of a height selected such that the spacer layer can support a surface adjacent the substrate and spanning the set of droplets at a position spaced apart from the functional pattern.
    Type: Application
    Filed: January 31, 2018
    Publication date: August 2, 2018
    Inventors: Vikramjit Singh, Michael N. Miller, Frank Y. Xu, Christopher Fleckenstein
  • Patent number: 9616614
    Abstract: Methods and systems are provided for patterning polymerizable material dispensed on flexible substrates or flat substrates using imprint lithography techniques. Template replication methods and systems are also presented where patterns from a master are transferred to flexible substrates to form flexible film templates. Such flexible film templates are then used to pattern large area flat substrates. Contact between the imprint template and substrate can be initiated and propagated by relative translation between the template and the substrate.
    Type: Grant
    Filed: February 21, 2013
    Date of Patent: April 11, 2017
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Byung-Jin Choi, Se Hyun Ahn, Mahadevan GanapathiSubramanian, Michael N. Miller, Sidlgata V. Sreenivasan
  • Patent number: 9452574
    Abstract: Described are methods of forming large area templates useful for patterning large area optical devices including e.g. wire grid polarizers (WGPs). Such methods provide for seamless patterning of such large area devices.
    Type: Grant
    Filed: December 19, 2012
    Date of Patent: September 27, 2016
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Douglas J. Resnick, Michael N. Miller, Frank Y. Xu
  • Patent number: 9196765
    Abstract: Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE.
    Type: Grant
    Filed: May 19, 2015
    Date of Patent: November 24, 2015
    Assignee: MOLECULAR IMPRINTS, INC.; BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM
    Inventors: Shuqiang Yang, Michael N. Miller, Mohamed M. Hilali, Fen Wan, Gerard M. Schmid, Liang Wang, Sidlgata V. Sreenivasan, Frank Y. Xu
  • Publication number: 20150255640
    Abstract: Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE.
    Type: Application
    Filed: May 19, 2015
    Publication date: September 10, 2015
    Inventors: Shuqiang Yang, Michael N. Miller, Mohamed M. Hilali, Fen Wan, Gerard M. Schmid, Liang Wang, Sidlgata V. Sreenivasan, Frank Y. Xu
  • Patent number: 9122148
    Abstract: Systems and methods for providing multiple replicas from a master template are described. Replicas may be formed having a mesa. In one embodiment, a dummy fill region may be included on master template and/or replicas.
    Type: Grant
    Filed: October 28, 2009
    Date of Patent: September 1, 2015
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Michael N. Miller, Cynthia B. Brooks, Laura Anne Brown, Gerard M. Schmid
  • Patent number: 9070803
    Abstract: Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE.
    Type: Grant
    Filed: May 11, 2011
    Date of Patent: June 30, 2015
    Assignee: Molecular Imprints, Inc.
    Inventors: Shuqiang Yang, Michael N. Miller, Mohamed M. Hilali, Fen Wan, Gerard M. Schmid, Liang Wang, Sidlgata V. Sreenivasan, Frank Y. Xu
  • Patent number: 8980751
    Abstract: Polymerized material on a substrate may be removed by exposure to vacuum ultraviolet (VUV) radiation from an energy source within a gaseous atmosphere of a controlled composition. Following such removal, additional etching techniques are also described for nano-imprinting.
    Type: Grant
    Filed: January 26, 2011
    Date of Patent: March 17, 2015
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Gerard M. Schmid, Michael N. Miller, Byung-Jin Choi, Douglas J. Resnick, Sidlgata V. Sreenivasan, Frank Y. Xu, Darren D. Donaldson
  • Publication number: 20140117574
    Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
    Type: Application
    Filed: January 8, 2014
    Publication date: May 1, 2014
    Applicant: Molecular Imprints, Inc.
    Inventors: Niyaz Khusnatdinov, Frank Y. Xu, Mario Johannes Meissl, Michael N. Miller, Ecron D. Thompson, Gerard M. Schmid, Pawan Kumar Nimmakayala, Xiaoming Lu, Byung- Jin Choi
  • Patent number: 8652393
    Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
    Type: Grant
    Filed: October 23, 2009
    Date of Patent: February 18, 2014
    Assignee: Molecular Imprints, Inc.
    Inventors: Niyaz Khusnatdinov, Frank Y. Xu, Mario Johannes Meissl, Michael N. Miller, Ecron D. Thompson, Gerard M. Schmid, Pawan Kumar Nimmakayala, Xiaoming Lu, Byung-Jin Choi
  • Patent number: 8616873
    Abstract: A micro-conformal nanoimprint lithography template includes a backing layer and a nanopatterned layer adhered to the backing layer. The elastic modulus of the backing layer exceeds the elastic modulus of the nanopatterned layer. The micro-conformal nanoimprint lithography template can be used to form a patterned layer from an imprint resist on a substrate, the substrate having a micron-scale defect, such that an excluded distance from an exterior surface of the micron-scale defect to the patterned layer formed by the nanoimprint lithography template is less than a height of the defect. The nanoimprint lithography template can be used to form multiple imprints with no reduction in feature fidelity.
    Type: Grant
    Filed: January 26, 2011
    Date of Patent: December 31, 2013
    Assignee: Molecular Imprints, Inc.
    Inventors: Michael N. Miller, Frank Y. Xu, Nicholas A. Stacey
  • Patent number: 8545709
    Abstract: Thickness of a residual layer may be altered to control critical dimension of features in a patterned layer provided by an imprint lithography process. The thickness of the residual layer may be directly proportional or inversely proportional to the critical dimension of features. Dispensing techniques and material selection may also provide control of the critical dimension of features in the patterned layer.
    Type: Grant
    Filed: April 6, 2012
    Date of Patent: October 1, 2013
    Assignee: Molecular Imprints, Inc.
    Inventors: Cynthia B. Brooks, Dwayne L. LaBrake, Niyaz Khusnatdinov, Michael N. Miller, Sidlgata V. Sreenivasan, David James Lentz, Frank Y. Xu
  • Publication number: 20130214452
    Abstract: Methods and systems are provided for patterning polymerizable material dispensed on flexible substrates or flat substrates using imprint lithography techniques. Template replication methods and systems are also presented where patterns from a master are transferred to flexible substrates to form flexible film templates. Such flexible film templates are then used to pattern large area flat substrates. Contact between the imprint template and substrate can be initiated and propagated by relative translation between the template and the substrate.
    Type: Application
    Filed: February 21, 2013
    Publication date: August 22, 2013
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Byung-Jin Choi, Se Hyun Ahn, Mahadevan GanapathiSubramanian, Michael N. Miller, Sidlgata V. Sreenivasan