Patents by Inventor Michael Sievers

Michael Sievers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7135112
    Abstract: A flocculation apparatus and method for treating colloidal suspensions. The apparatus includes a suspension inlet, a suspension outlet and an inner cone mounted centrally in a conical outer housing. The inner cone and/or the outer housing is rotatable relative to one another and a gap for through-flow of suspensions is present between the inner cone and the outer housing. In the method, continuously measuring a flock size distribution of a suspension stream passed into the flocculation apparatus is provided. Additionally provided is axially displacing the inner cone and/or outer housing as a function of the flock size distribution and the suspension volume flow rate.
    Type: Grant
    Filed: September 26, 2002
    Date of Patent: November 14, 2006
    Assignee: Clausthaler Umwelttechnikinstitut GmbH (CUTEC-Institute)
    Inventors: Christian Schroeder, Michael Sievers
  • Publication number: 20060227321
    Abstract: A non-destructive in-situ elemental profiling of a layer in a set of layers method and system are disclosed. In one embodiment, a first emission of a plurality of photoelectrons is caused from the layer to be elementally profiled. An elemental profile of the layer is determined based on the emission. In another embodiment, a second emission of a plurality of photoelectrons is also received from the layer, and an elemental profile is determined by comparison of the resulting signals. A process that is altering the layer can then be controlled “on-the-fly” to obtain a desired material composition. Since the method can be employed in-situ and is non-destructive, it reduces turn around time and lowers wafer consumption. The invention also records the composition of all processed wafers, hence, removing the conventional statistical sampling problem.
    Type: Application
    Filed: April 7, 2005
    Publication date: October 12, 2006
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Siddhartha Panda, Michael Sievers, Richard Wise
  • Publication number: 20060118718
    Abstract: Photoelectron emissions are used to detect an endpoint of a thickness alteration of a topmost layer in a set of layers undergoing patterning. The set of layers are irradiated, which causes an emission of photoelectrons. Upon receipt of or absence of a photoelectron emission, patterning endpoint is detected.
    Type: Application
    Filed: December 2, 2004
    Publication date: June 8, 2006
    Inventors: Michael Sievers, Siddhartha Panda, Richard Wise
  • Publication number: 20060097159
    Abstract: Detection of weak ion currents scattered from a sample by an ion beam is improved by the use of a multiplier system in which a conversion electrode converts incident ions to a number of secondary electrons multiplied by a multiplication factor, the secondary electrons being attracted to an electron detector by an appropriate bias. In one version, the detector is a two stage system, in which the secondary electrons strike a scintillator that emits photons that are detected in a photon detector such as a photomultiplier or a CCD.
    Type: Application
    Filed: November 10, 2004
    Publication date: May 11, 2006
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Steven Herschbein, Narender Rana, Chad Rue, Michael Sievers
  • Publication number: 20050016954
    Abstract: Very small scale altering of features of an existing pattern, such as of an IC or photomask can be edited wherein a chemical reactant and/or activating energy is localized to the site of the target feature. In this manner, the alteration can be contained in a highly localized area such that other portions of the pattern remain substantially unaffected. The activating energy may be delivered by far-field and/or near field techniques. In one embodiment, the energy is converted into thermal energy at the site by interaction with the apex of a probe where the apex is proximate to the site. In another embodiment, the energy is converted to a plasma by spaced electrodes at the apex of the probe in combination with activating energy of at least two specifically selected wavelengths. The method can be applied to the repair and/or metrology of very small features of densely patterned substrates, e.g., an integrated circuit, package, photomask, etc.
    Type: Application
    Filed: July 25, 2003
    Publication date: January 27, 2005
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Hendrik Hamann, Steven Herschbein, Herschel Marchman, Chad Rue, Michael Sievers
  • Publication number: 20050016952
    Abstract: A system and method are provided for altering a very small surface area of a feature of a substrate. The disclosed system includes a localized chemical delivery probe (LCDP) having a plurality of channels, in which each channel is adapted to carry a material through the probe to exit at an apex of the probe. The system further includes a way to maneuver the apex of the probe to a site proximate to the target feature on the surface. A first channel of the probe is preferably coupled to a source of chemical to assist in a reaction, and a second channel of the probe is preferably coupled to a second chemical, a diluting fluid, an expulsion gas, and/or suction to provide the same through the probe apex. In a preferred embodiment, a first chemical is delivered by a first channel of the probe to assist in an exothermic reaction to etch a low-K organic dielectric, and a diluting fluid or suction is provided by a second channel to confine the effect of the reaction.
    Type: Application
    Filed: July 25, 2003
    Publication date: January 27, 2005
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Hendrik Hamann, Steven Herschbein, Herschel Marchman, Chad Rue, Michael Sievers
  • Publication number: 20040262230
    Abstract: A flocculation apparatus and method for treating colloidal suspensions. The apparatus includes a suspension inlet, a suspension outlet and an inner cone mounted centrally in a conical outer housing. The inner cone and/or the outer housing is rotatable relative to one another and a gap for through-flow of suspensions is present between the inner cone and the outer housing. In the method, continuously measuring a flock size distribution of a suspension stream passed into the flocculation apparatus is provided. Additionally provided is axially displacing the inner cone and/or outer housing as a function of the flock size distribution and the suspension volume flow rate.
    Type: Application
    Filed: March 31, 2004
    Publication date: December 30, 2004
    Inventors: Christian Schroder, Michael Sievers
  • Patent number: 6444124
    Abstract: A method and system for treating sludge in a wastewater facility involving a novel concentration step optimises the energy balance and sludge solids mass reduction incurred from concentration and low pressure homogenization of the sludge.
    Type: Grant
    Filed: August 25, 2000
    Date of Patent: September 3, 2002
    Inventors: Theodore Onyeche, Michael Sievers