Abstract: An apparatus for combining plasma processing and thermal processing of a workpiece is presented. The apparatus includes a processing chamber, a plasma chamber separated from the processing chamber disposed on a first side of the processing chamber, and a plasma source configured to generate a plasma in the plasma chamber. A quartz workpiece support is disposed within the processing chamber, the workpiece support configured to support a workpiece. One or more radiative heat sources configured to heat the workpiece are disposed on a second and opposite side of the first side of the processing chamber. A dielectric window is disposed between the workpiece support and the one or more heat sources. In addition, the apparatus includes a temperature measurement system configured to obtain a temperature measurement indicative of a temperature of the workpiece.

Abstract: An apparatus for combining plasma processing and thermal processing of a workpiece is presented. The apparatus includes a processing chamber, a plasma chamber separated from the processing chamber disposed on a first side of the processing chamber, and a plasma source configured to generate a plasma in the plasma chamber. A quartz workpiece support is disposed within the processing chamber, the workpiece support configured to support a workpiece. One or more radiative heat sources configured to heat the workpiece are disposed on a second and opposite side of the first side of the processing chamber. A dielectric window is disposed between the workpiece support and the one or more heat sources. In addition, the apparatus includes a temperature measurement system configured to obtain a temperature measurement indicative of a temperature of the workpiece.

Abstract: A thermal processing system for performing thermal processing can include a workpiece support plate configured to support a workpiece and heat source(s) configured to heat the workpiece. The thermal processing system can include window(s) having transparent region(s) that are transparent to electromagnetic radiation within a measurement wavelength range and opaque region(s) that are opaque to electromagnetic radiation within a portion of the measurement wavelength range. A temperature measurement system can include a plurality of infrared emitters configured to emit infrared radiation and a plurality of infrared sensors configured to measure infrared radiation within the measurement wavelength range where the transparent region(s) are at least partially within a field of view the infrared sensors.

Abstract: A display assistant device comprises a display, a camera, a speaker, microphones, a processor and memory. The memory stores programs comprising instructions that, when executed by the processor, enable a plurality of modes of the display assistant device. The modes include a monitoring mode and an assistant mode. In the monitoring mode, the device is configured to perform a remote monitoring function in which first video captured by the camera is streamed to a remote server system for monitoring uses. The monitoring uses include transmission of the first video to remote client devices authorized to access the first video. In the assistant mode, the device is configured to perform a second plurality of functions that excludes the monitoring function and includes a video communication function in which second video captured by the camera is transmitted to second devices participating in a video communication with a first user of the device.

Abstract: There is provided computer implemented method for detecting and reducing or removing bias for generating a machine learning model, comprising: prior to generating the machine learning model: receiving a training dataset, comprising target inputs, each comprising parameters and labelled with a corresponding target output, wherein at least one of the parameters of at least of the target inputs comprises a sensitive parameter indicative of the corresponding target input assigned to a sensitive group that is potentially biased against other target inputs that are excluded from the sensitive group, analyzing the training dataset to identify target inputs affected by label bias when a statistically significant difference is detected between target inputs assigned to the sensitive group and target inputs excluded from the sensitive group, correcting labels of the target inputs affected by label bias, and generating the machine learning model using the corrected labels.

Abstract: A thermal processing system for performing thermal processing can include a workpiece support plate configured to support a workpiece and heat source(s) configured to heat the workpiece. The thermal processing system can include window(s) having transparent region(s) that are transparent to electromagnetic radiation within a measurement wavelength range and opaque region(s) that are opaque to electromagnetic radiation within a portion of the measurement wavelength range. A temperature measurement system can include a plurality of infrared emitters configured to emit infrared radiation and a plurality of infrared sensors configured to measure infrared radiation within the measurement wavelength range where the transparent region(s) are at least partially within a field of view the infrared sensors.

Abstract: A processor assembly including: an exposure station operable to expose a sample on a slide; a print station operable to apply a reagent to the exposed sample through a thermal inkjet process; and a robotic transfer mechanism to transfer the slide from the exposure station to the print station. Also, a reagent cartridge including: a body defining a container having a volume therein; a nonmetallic bag in the container operable to contain a reagent; and a printhead at a base of the body, the printhead coupled to an outlet of the bag. Further, a method including exposing a sample on a slide in a processor assembly; robotically transferring the slide to a printing station of the processor assembly; and applying a reagent to the exposed sample at the printing station by a thermal inkjet printing process.

Abstract: A processing system for processing a plurality of workpieces includes a transfer chamber in process flow communication with a first processing chamber and a second processing chamber, the transfer chamber having a first straight side, wherein the first process chamber includes at least one first processing station, and wherein the first processing chamber is disposed along the first straight side, wherein the second process chamber includes at least two second processing stations, wherein the second processing chamber is disposed along the first straight side, and wherein the second process chamber disposed in linear arrangement with the first process chamber along the first straight side, and wherein the transfer chamber includes at least one workpiece handling robot configured to transfer at least one workpiece to the at least one first processing station and the at least two second processing stations.

Abstract: A processor assembly including a core module operable to expose a sample on a slide; a staining module operable to apply a stain to the exposed sample; and a robotic transfer mechanism to transfer the slide from the core module to the staining module. Also, an apparatus including a rectangular body having an open rear end and an opposite front end; a flange having a first side and a second side, wherein the first side of the flange is coupled to the front end of the body; and a pair of legs extending from second side of the flange, wherein the pair of legs are operable to engage opposite side edges of a slide.

Abstract: A display assistant device comprises a display, a camera, a speaker, microphones, a processor and memory. The memory stores programs comprising instructions that, when executed by the processor, enable a plurality of modes of the display assistant device. The modes include a monitoring mode and an assistant mode. In the monitoring mode, the device is configured to perform a remote monitoring function in which first video captured by the camera is streamed to a remote server system for monitoring uses. The monitoring uses include transmission of the first video to remote client devices authorized to access the first video. In the assistant mode, the device is configured to perform a second plurality of functions that excludes the monitoring function and includes a video communication function in which second video captured by the camera is transmitted to second devices participating in a video communication with a first user of the device.

Abstract: The subject matter of the instant invention relates to a dental implant surgical apparatus and system comprising a customized dental ridge augmentation matrix and one or, optionally, a plurality of dental implant surgical drill guides, and methods of use thereof.

Abstract: Computer-implemented systems and methods are disclosed to interface with one or more storage devices storing a plurality of documents, wherein each of the plurality of documents is associated with one or more tags of one or more predefined hierarchies of tags, wherein the one or more hierarchies of tags include multiple dimensions. In accordance with some embodiments, a method is provided to identify one or more documents from the data storage devices. The method comprises acquiring, via an interface, a selection of one or more tags of the one or more predefined hierarchies of tags. The method further comprises identifying one or more documents from the data storage devices in response to the selection, the identified one or more documents having tags that have a relationship with the selected tags, and providing data corresponding to the identified documents for displaying in the interface.

Abstract: A one-piece flap valve (150) comprising first and second portions hingedly connected to one another by a flexible strip, the first portion having a hingeable internal valve flap (152) and the second portion comprising an at least partially annular valve seat (154). The first and second portions being socket-fitted together by relative movement, such that the valve seat (54, 154) is spanned by the flap (152), the second portion comprising first and second legs (121a, 121b) having first and second locking lugs (127a, 127b) extending radially outwardly therefrom, the locking lugs for location within locking apertures (125a, 125b) of a tube body (10) of a dispenser. The flap valve (150) comprising a retaining mechanism configured and arranged such that once the flap valve is installed in a tube body of a dispenser, the retaining mechanism resists against radially inward displacement of the first and second legs.

Abstract: A processing system for processing a plurality of workpieces includes a transfer chamber in process flow communication with a first processing chamber and a second processing chamber, the transfer chamber having a first straight side, wherein the first process chamber includes at least one first processing station, and wherein the first processing chamber is disposed along the first straight side, wherein the second process chamber includes at least two second processing stations, wherein the second processing chamber is disposed along the first straight side, and wherein the second process chamber disposed in linear arrangement with the first process chamber along the first straight side, and wherein the transfer chamber includes at least one workpiece handling robot configured to transfer at least one workpiece to the at least one first processing station and the at least two second processing stations.

Abstract: A processing apparatus for a thermal treatment of a workpiece is presented. The processing apparatus includes a processing chamber, a workpiece support disposed within the processing chamber, a gas delivery system, and radiative heat sources for heating the workpiece. The gas delivery system includes a gas showerhead assembly that is transparent to electromagnetic radiation emitted from the one or more radiative heat sources. The gas showerhead assembly includes one or more gas diffusion mechanisms to distribute gas within the enclosure.

Abstract: A workpiece processing apparatus is provided. The workpiece processing apparatus can include a processing chamber and a workpiece disposed on a workpiece support within the processing chamber. The workpiece processing apparatus can include a gas delivery system and one or more exhaust ports for removing gas from the processing chamber such that a vacuum pressure can be maintained. The workpiece processing apparatus can include radiative heating sources configured to heat the workpiece. The workpiece processing apparatus can further include a plurality of reflectors. The workpiece processing apparatus can include a control system configured to control one or more positions of the reflectors.

Abstract: An apparatus for combining plasma processing and thermal processing of a workpiece is presented. The apparatus includes a processing chamber, a plasma chamber separated from the processing chamber disposed on a first side of the processing chamber, and a plasma source configured to generate a plasma in the plasma chamber. A quartz workpiece support is disposed within the processing chamber, the workpiece support configured to support a workpiece. One or more radiative heat sources configured to heat the workpiece are disposed on a second and opposite side of the first side of the processing chamber. A dielectric window is disposed between the workpiece support and the one or more heat sources. In addition, the apparatus includes a temperature measurement system configured to obtain a temperature measurement indicative of a temperature of the workpiece.

Abstract: A processing apparatus for a thermal treatment of a workpiece is presented. The processing apparatus includes a processing chamber, a workpiece support disposed within the processing chamber, a rotation system configured to rotate the workpiece support, a gas delivery system configured to flow one or more process gases into the processing chamber from the a first side of the processing chamber, one or more gas exhaust ports for removing gas from the processing chamber such that a vacuum pressure can be maintained, one or more radiative heating sources disposed on the second side of the processing chamber, one or more dielectric windows disposed between the workpiece support and the one or more radiative heating sources, and a workpiece temperature measurement system configured at a temperature measurement wavelength range to obtain a measurement indicative of a temperature of a back side of the workpiece.

Abstract: Various systems and methods for aggregating data from disparate sources to determine an optimal package of data items are disclosed. For example, the system described herein can obtain data items from various sources, aggregate and/or organize the data items into an optimal package based on various criteria, and present, via an interactive user interface, the optimal package. Furthermore, the interactive user interface may enable a user to adjust the criteria used to aggregate and/or organize the data items. The system may interactively re-aggregate and re-organize the data items using the adjusted criteria as the user interacts with the package via the user interface. The system and user interface may thus enable the user to optimize the packages of data items based on multiple factors quickly and efficiently.

Abstract: Methods and apparatuses are provided for generating a quadrature modulated signal for transmission in an electronic device. Samples are obtained from a quadrature amplitude modulation (QAM) signal at a predefined sampling rate to generate a signal spectrum. The samples are interpolated to move the signal spectrum on a frequency axis. Modulation is performed on the interpolated samples based on a digital carrier frequency to move the signal spectrum on the frequency axis. Digital to analog conversion and analog filtering are performed on the modulated samples in a real part of the signal spectrum to generate a quadrature modulated signal for transmission.