Patents by Inventor Michihiro Sugo

Michihiro Sugo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090062480
    Abstract: A heat-curable polyimide silicone resin composition comprising 100 parts by weight of a polyimide silicone resin having a radically polymerizable group bonded to a silicon atom, 0.1 to 20 parts by weight of a peroxycarbonate curing agent, and a solvent. The composition can be cured at a low temperature in a short time.
    Type: Application
    Filed: September 4, 2008
    Publication date: March 5, 2009
    Inventors: Yoshinori Yoneda, Michihiro Sugo
  • Publication number: 20090062479
    Abstract: A heat-curable resin composition, comprising (A) a polyimide silicone resin having a phenolic hydroxyl group and a radically polymerizable group bonded to a silicon atom, (B) an epoxy resin in such an amount that a molar ratio of the epoxy groups of the epoxy resin to the phenolic hydroxyl groups of the polyimide silicone resin (A) ranges from 0.2 to 10, and a catalytic amount of (C) an organic peroxide.
    Type: Application
    Filed: September 4, 2008
    Publication date: March 5, 2009
    Inventors: Yoshinori Yoneda, Michihiro Sugo
  • Patent number: 7485405
    Abstract: The present invention relates to a photocurable resin composition, wherein the composition comprises:(A) a polyimide resin having one or more primary alcoholic groups with an alcoholic equivalent equal to or less than 3500, said polyimide being soluble in an organic solvent and having a weight average molecular weight of from 5,000 to 500,000; (B) at least one selected from the group consisting of a condensate of an amino compound modified with formalin, optionally further with alcohol, preferably a melamine resin modified with formalin, optionally further with alcohol, and a urea resin with formalin, optionally further with alcohol, and a phenolic compound having, on average, at least two selected from the group consisting of a methylol group and an alkoxy methylol group, and (C) a photoacid generator capable of generating an acid upon irradiation with light of a wavelength of from 240 nm to 500 nm.
    Type: Grant
    Filed: October 7, 2005
    Date of Patent: February 3, 2009
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hideto Kato, Michihiro Sugo, Tomoyuki Goto
  • Patent number: 7432313
    Abstract: A solvent-free polyimide silicone resin composition comprising (a) a polyimide silicone resin having repeating units represented by the following formula (1-1) and repeating units represented by the following formula (1-2), a film of said resin with a thickness of 100 ?m prepared on a quartz glass substrate having a light transmittance of 80% or higher at wavelengths of from 350 nm to 450 nm, (b) a reactive diluent, and (c) a photopolymerization initiator wherein X is a tetravalent organic group, Y is a divalent organic group, and Z is a divalent organic group represented by the following formula (2), wherein R1 may be different from each other and is a monovalent hydrocarbon group having 1 to 8 carbon atoms, which group may be substituted, R2 is a monovalent hydrocarbon group having a photopolymerizable group, a and b are each an integer of from 1 to 100 with a+b?100.
    Type: Grant
    Filed: September 9, 2005
    Date of Patent: October 7, 2008
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoshinori Yoneda, Michihiro Sugo
  • Patent number: 7405244
    Abstract: A solvent-free resin composition comprising (a) a polyimide silicone resin having repeating units represented by the following general formulas (1-1) and (1-2), wherein X is a tetravalent organic group, Y is a divalent organic group, and Z is a divalent organic group having an organosiloxane moiety, (b) a reactive diluent, and (c) a photo-polymerization initiator, characterized in that a film of said resin composition with a film thickness of 100 ?m prepared on a quartz glass substrate shows a light transmittance of 80% or higher at wavelengths of from 350 nm to 450 nm.
    Type: Grant
    Filed: April 22, 2005
    Date of Patent: July 29, 2008
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoshinori Yoneda, Michihiro Sugo
  • Publication number: 20080057446
    Abstract: A polyimide resin, characterized in that the polyimide resin comprises three kinds of repeating units represented by the formula (1), and has a weight average molecular weight, reduced to polystyrene, of from 5,000 to 500,000, an acryl equivalent of from 400 to 3,000 g/eq, and a carboxylic acid equivalent of from 300 to 2500 g/eq wherein X is a tetravalent organic group, Y is a divalent organic group, Z is a divalent organic group, W is a divalent organic group having a polyorganosiloxane structure. The polyimide resin is suitable for preparing a patterned or non-patterned protective coating.
    Type: Application
    Filed: August 21, 2007
    Publication date: March 6, 2008
    Inventors: Tomoyuki Goto, Michihiro Sugo, Shohei Tagami, Hideto Kato
  • Publication number: 20070197680
    Abstract: A polyimide silicone resin, characterized in that the polyimide silicone resin comprises repeating units represented by the following formula (1) and has a number average molecular weight of from 5,000 to 200,000 wherein X is a tetravalent organic group, at least one of the tetravalent organic groups being represented by the following formula (2) wherein R1 may be the same with or different from each other and is a monovalent hydrocarbon group having 1 to 8 carbon atoms, R2may be the same with or different from each other and is a trivalent organic group, and n ranges from 1 to 120 on average, and Y is a divalent organic group, at least one of the divalent organic groups comprising a phenolic hydroxyl group or a carboxyl group bonded to an aromatic ring.
    Type: Application
    Filed: February 14, 2007
    Publication date: August 23, 2007
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Michihiro Sugo, Hideto Kato, Tomoyuki Goto, Shohei Tagami
  • Patent number: 7256248
    Abstract: A novel imide silicone resin is provided that on heat treatment is capable of easily forming a cured resin coating with excellent solvent resistance, humidity resistance and durability, as well as a production process therefor.
    Type: Grant
    Filed: September 3, 2003
    Date of Patent: August 14, 2007
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Michihiro Sugo
  • Patent number: 7163986
    Abstract: Novel siloxane copolymers have a structure as shown below. They can be applied and heat treated at relatively low temperatures into cured resin coatings which have satisfactory solvent resistance, durability, and good adhesion and bond to metal substrates such as copper even under humid conditions.
    Type: Grant
    Filed: June 1, 2004
    Date of Patent: January 16, 2007
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Michihiro Sugo
  • Publication number: 20060183880
    Abstract: A polyimide resin having a number average molecular weight of from 2,000 to 800,000 and a repeating unit represented by the following formula (1): wherein X is a tetravalent organic group, Y is a divalent organic group, 75 to 98 mole % of R1 is hydrogen atom, and 2 to 25 mole % of R1 is 1,2-naphthoquinonediazide sulfonyl group.
    Type: Application
    Filed: February 13, 2006
    Publication date: August 17, 2006
    Inventors: Yoshitaka Aoki, Michihiro Sugo, Hideto Kato
  • Patent number: 7041766
    Abstract: A colorless and transparent thermosetting polyimidesilicone resin comprising structural units of the following general formula (1) and structural units of the general formula (4), said resin being soluble in an organic solvent wherein X is a tetravalent organic group having 4 or more carbon atoms, none of the carbon atoms of X being bound to a plurality of carbonyl groups, Y is a diamine residue and Z is a diaminosiloxane residue.
    Type: Grant
    Filed: October 9, 2003
    Date of Patent: May 9, 2006
    Assignee: Shin-Etsu Chemical Co., LTD
    Inventors: Yoshinori Yoneda, Michihiro Sugo, Hideto Kato
  • Publication number: 20060084714
    Abstract: A solvent-free resin composition comprising (a) a polyimide silicone resin having repeating units represented by the following general formulas (1-1) and (1-2), wherein X is a tetravalent organic group, Y is a divalent organic group, and Z is a divalent organic group having an organosiloxane moiety, (b) a reactive diluent, and (c) a photo-polymerization initiator, characterized in that a film of said resin composition with a film thickness of 100 ?m prepared on a quartz glass substrate shows a light transmittance of 80% or higher at wavelengths of from 350 nm to 450 nm.
    Type: Application
    Filed: May 23, 2005
    Publication date: April 20, 2006
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoshinori Yoneda, Michihiro Sugo
  • Publication number: 20060079658
    Abstract: The present invention relates to a photocurable resin composition, wherein the composition comprises:(A) a polyimide resin having one or more primary alcoholic groups with an alcoholic equivalent equal to or less than 3500, said polyimide being soluble in an organic solvent and having a weight average molecular weight of from 5,000 to 500,000; (B) at least one selected from the group consisting of a condensate of an amino compound modified with formalin, optionally further with alcohol, preferably a melamine resin modified with formalin, optionally further with alcohol, and a urea resin with formalin, optionally further with alcohol, and a phenolic compound having, on average, at least two selected from the group consisting of a methylol group and an alkoxy methylol group, and (C) a photoacid generator capable of generating an acid upon irradiation with light of a wavelength of from 240 nm to 500 nm.
    Type: Application
    Filed: October 7, 2005
    Publication date: April 13, 2006
    Inventors: Hideto Kato, Michihiro Sugo, Tomoyuki Goto
  • Publication number: 20060069227
    Abstract: This invention relates to a novel polyimide silicone having an alcoholic hydroxyl group and a process for the preparation thereof. The polyimide of the invention having a primary alcoholic hydroxyl group is represented by the following general formula (1), wherein X represents a tetravalent organic group, Y represents a divalent group having at least one monovalent group selected from the group consisting of a phenolic hydroxyl group and a carboxyl group, with at least one being a divalent organic group having an alcoholic hydroxyl group, Z represents a divalent organic group, W represents a divalent organic group having an organosiloxane structure, k is a positive number, and each of m and n is equal to 0 (zero) or a positive number, with 0.1?k/(k+m+n)?1, 0?m/(k+m+n)?0.8, 0?n/(k+m+n)?0.8.
    Type: Application
    Filed: September 30, 2005
    Publication date: March 30, 2006
    Inventors: Michihiro Sugo, Hideto Kato, Tomoyuki Goto
  • Publication number: 20060052476
    Abstract: A solvent-free polyimide silicone resin composition comprising (a) a polyimide silicone resin having repeating units represented by the following formula (1-1) and repeating units represented by the following formula (1-2), a film of said resin with a thickness of 100 ?m prepared on a quartz glass substrate having a light transmittance of 80% or higher at wavelengths of from 350 nm to 450 nm, (b) a reactive diluent, and (c) a photopolymerization initiator wherein X is a tetravalent organic group, Y is a divalent organic group, and Z is a divalent organic group represented by the following formula (2), wherein R1 may be different from each other and is a monovalent hydrocarbon group having 1 to 8 carbon atoms, which group may be substituted, R2 is a monovalent hydrocarbon group having a photopolymerizable group, a and b are each an integer of from 1 to 100 with a+b?100.
    Type: Application
    Filed: September 9, 2005
    Publication date: March 9, 2006
    Inventors: Yoshinori Yoneda, Michihiro Sugo
  • Publication number: 20040242829
    Abstract: Novel siloxane copolymers have a structure as shown below. They can be applied and heat treated at relatively low temperatures into cured resin coatings which have satisfactory solvent resistance, durability, and good adhesion and bond to metal substrates such as copper even under humid conditions.
    Type: Application
    Filed: June 1, 2004
    Publication date: December 2, 2004
    Inventor: Michihiro Sugo
  • Patent number: 6749643
    Abstract: The invention discloses a novel method for dry cleaning of a fabric material characterized by the use of a unique dry cleaning solvent which is a tris(trimethylsiloxy) silane compound represented by the general formula of RSi(—O—SiMe3)3, in which Me is a methyl group and R is a monovalent hydrocarbon group of 1 to 6 carbon atoms or, preferably, a methyl group, or a mixture thereof with a petroleum-based hydrocarbon solvent in a limited proportion. In addition to the excellent effect of dry cleaning equivalent to that of conventional dry cleaning solvents and little unpleasant smell remaining on the fabric material, the solvent used in the inventive method is little liable for the problems of environmental pollution against public and workers' health and the problem of ozone layer destruction in the aerosphere due to emission of vapors of halogenated hydrocarbon solvents can be solved by the inventive method.
    Type: Grant
    Filed: December 26, 2001
    Date of Patent: June 15, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Michihiro Sugo, Satoshi Asai
  • Patent number: 6723432
    Abstract: An electrode-forming composition comprising a binder component containing a solvent-soluble polyimide silicone and an epoxy compound, and an electrically conductive material can be cured and bonded to a current collector at a relatively low temperature and has excellent adhesion and chemical resistance, facilitating the manufacture of lithium ion batteries and electrical double-layer capacitors of various shapes.
    Type: Grant
    Filed: March 26, 2002
    Date of Patent: April 20, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Michihiro Sugo, Hideto Kato
  • Publication number: 20040072982
    Abstract: A colorless and transparent thermosetting polyimidesilicone resin comprising structural units of the following general formula (1) and structural units of the general formula (4), said resin being soluble in an organic solvent 1
    Type: Application
    Filed: October 9, 2003
    Publication date: April 15, 2004
    Inventors: Yoshinori Yoneda, Michihiro Sugo, Hideto Kato
  • Patent number: 6706841
    Abstract: A polyimide silicone resin composition comprising a polyimide silicone resin having recurring units of formula (1), a (meth)acrylic compound, and a polymerization initiator has fluidity at 25° C. despite the substantially absence of a solvent. In formula (1), X is a tetravalent organic group, Y is a divalent organic group, Z is a divalent organic group having an organosiloxane structure, p and q are positive numbers.
    Type: Grant
    Filed: May 8, 2002
    Date of Patent: March 16, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Michihiro Sugo, Akira Yamamoto, Hideto Kato