Patents by Inventor Michio Ishikawa

Michio Ishikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050268852
    Abstract: A vacuum film-forming apparatus comprising substrate stages; vacuum chamber-forming containers opposed to the stages; a means for moving the substrate between the stages; and gas-introduction means connected to every containers, wherein one of the stage and the container is ascended or descended towards the other to bring the upper face of the stage and the opening of the container into contact with one another so that vacuum chambers can be formed and that a raw gas and/or a reactant gas can be introduced into each space of the chamber through each gas-introduction means to carry out either the adsorption or reaction step for allowing the raw gas to react with the reactant gas. The apparatus permits the independent establishment of process conditions for the adsorption and reaction processes and the better acceleration of the reaction between raw and reactant gases to give a film having excellent quality and the apparatus can be manufactured at a low cost.
    Type: Application
    Filed: May 20, 2005
    Publication date: December 8, 2005
    Inventors: Masanobu Hatanaka, Michio Ishikawa, Se-Ju Lim, Fumio Nakamura
  • Patent number: 6897754
    Abstract: Disclosed is a low-priced and small-sized magnetic core for an inductor suitable for a high frequency signal and a large-current signal. The magnetic core is modified from a conventional EP type magnetic core. A recess is integrally formed with a peripheral portion of the magnetic core when it is shaped. A bottom portion and the peripheral portion are extended toward an opening portion to an extent of about 70 percentages of a length measured from a center of the center portion to an internal surface of the peripheral portion. The peripheral portion opposite to the opening portion has a uniform thickness. The magnetic core is designed to facilitate its surface mounting onto a PCB.
    Type: Grant
    Filed: June 5, 2002
    Date of Patent: May 24, 2005
    Assignees: Pulsus Technologies Inc., Korea Coil Engineering Co. Ltd.
    Inventors: Bong Soo Jeong, Michio Ishikawa, Jin Wook Koo
  • Publication number: 20040007247
    Abstract: In a plasma film-forming apparatus which includes a film-forming chamber in which a substrate is arranged, a film-forming gas introducing pipe connected to a supply source of a film-forming gas at its first end, a shower plate through numerous holes of which a second end of said film-forming gas introducing pipe communicate with said film-forming chamber, film-gas exciting means for exciting film-forming gas introduced through said shower plate into said film-forming chamber, to form a film on the surface of said substrate with the chemical reaction, radicals-producing means which excites said cleaning gas and produces radicals, and cleaning-gas introducing means which introduces said cleaning gas containing said radicals into said film-forming chamber, the improvement in which said cleaning-gas introducing means communicate directly with said film-forming chamber.
    Type: Application
    Filed: May 28, 2003
    Publication date: January 15, 2004
    Applicant: ULVAC, Inc.
    Inventors: Shin Asari, Naoto Tsuji, Takaomi Kurata, Kazuaki Yamauchi, Masanori Hashimoto, Michio Ishikawa, Masayasu Hirata, Katsuhiko Mori
  • Publication number: 20030020580
    Abstract: Disclosed is a low-priced and small-sized magnetic core for an inductor suitable for a high frequency signal and a large-current signal. The magnetic core is modified from a conventional EP type magnetic core. A recess is integrally formed with a peripheral portion of the magnetic core when it is shaped. A bottom portion and the peripheral portion are extended toward an opening portion to an extent of about 70 percentages of a length measured from a center of the center portion to an internal surface of the peripheral portion. The peripheral portion opposite to the opening portion has a uniform thickness. The magnetic core is designed to facilitate its surface mounting onto a PCB.
    Type: Application
    Filed: June 5, 2002
    Publication date: January 30, 2003
    Applicant: Pulsus Technologies Inc.
    Inventors: Bong Soo Jeong, Michio Ishikawa, Jin Wook Koo
  • Publication number: 20020124866
    Abstract: In a plasma film-forming apparatus which includes a film-forming chamber in which a substrate is arranged, a film-forming gas introducing pipe connected to a supply source of a film-forming gas at its first end, a shower plate through numerous holes of which a second end of said film-forming gas introducing pipe communicate with said film-forming chamber, film-gas exciting means for exciting film-forming gas introduced through said shower plate into said film-forming chamber, to form a film on the surface of said substrate with the chemical reaction, radicals-producing means which excites said cleaning gas and produces radicals, and cleaning-gas introducing means which introduces said cleaning gas containing said radicals into said film-forming chamber, the improvement in which said cleaning-gas introducing means communicate directly with said film-forming chamber.
    Type: Application
    Filed: August 17, 2001
    Publication date: September 12, 2002
    Applicant: ULVAC, Inc.
    Inventors: Shin Asari, Naoto Tsuji, Takaomi Kurata, Kazuaki Yamauchi, Masanori Hashimoto, Michio Ishikawa, Masayasu Hirata, Katsuhiko Mori
  • Patent number: 6061020
    Abstract: At a transmitting end, first and second dipole antennas are crossed each other by right angles and are arranged in a plane perpendicular to a propagating direction of radio wave. In first and second balanced modulators, a carrier signal is modulated with respective modulation signals having a phase difference of 90.degree. to produce balanced-modulated signals, which are then supplied to the first and second dipole antennas, respectively. Then a plane of polarization of a composite vector of radio waves transmitted by the dipole antennas is rotated at a frequency of the modulation signals, said frequency being higher than a fading frequency. The modulation signals are controlled by a state of a digital signal to be transmitted. At a receiving end, the digital signal is reproduced by receiving the transmitted radio wave by a conventional single side band receiver.
    Type: Grant
    Filed: October 31, 1997
    Date of Patent: May 9, 2000
    Assignee: The University of Electro-Communications
    Inventors: Iwao Ishijima, Yasubumi Kanai, Michio Ishikawa, Akira Tsutsumi, Shigeki Sugiyama, Toshio Miyoshi
  • Patent number: 5840374
    Abstract: An SiO.sub.2 passivation film is formed on a surface of a substrate made of a plastic material by plasma chemical vapor deposition (CVD) process in which organic oxysilane is used as a raw gas. Instead of a reactive gas having an ashing effect, Ar, He or NH.sub.3 is used as a reactive gas which serves as an auxiliary for decomposing the raw gas at a temperature not greater than a temperature at which the substrate is thermally deformed (i.e., about 250.degree. C.). The ashing of the substrate by oxygen or hydrogen radicals is thus prevented.
    Type: Grant
    Filed: June 11, 1996
    Date of Patent: November 24, 1998
    Assignees: Nihon Shinku Gijutsu Kabushiki Kaisha, Brother Kogyo Kabushiki Kaisha
    Inventors: Kazuyuki Ito, Kyuzo Nakamura, Michio Ishikawa, Jun Togawa, Noriaki Tani, Masanori Hashimoto, Yumiko Ohashi
  • Patent number: 5606255
    Abstract: A Hall effect sensing apparatus for a moving object includes a moving magnetic member having concave and convex segments alternately at is periphery, a detector including a pair of Hall effect elements for converting a magnetic signal to an electric signal, a processing circuit for processing signals from the detector, a magnet for providing magnetic field to the Hall effect elements, and a yoke provided in close proximity to the magnet. The yoke has a smaller surface area than that of the magnet and is movably arranged so as to adjust detecting sensitivity of the sensing apparatus. Therefore, even though there are some variances of magnetic characteristics in the detector, the detecting sensitivity of the sensing apparatus can be adjusted to an optimum level by observing a signal outputted from the processing circuit.
    Type: Grant
    Filed: March 10, 1993
    Date of Patent: February 25, 1997
    Assignee: TDK Corporation
    Inventors: Nobuyuki Shimbo, Junichi Ishiwata, Takatoshi Oyama, Fumio Ono, Michio Ishikawa
  • Patent number: 5554418
    Abstract: A passivation film is formed by plasma CVD process in which organic oxysilane is used as a raw gas. When an SiO.sub.2 film as the passivation film is formed on a surface of a substrate, Ar, He or NH.sub.3 gas is used as a reactive gas which serves as an auxiliary for decomposing the raw gas. Ashing of the substrate by oxygen or hydrogen radicals is thus prevented. Fluorine group gas of CF.sub.4 or NF.sub.3 may be added to the reactive gas. The SiO.sub.2 film as a passivation film as described above may be formed first as an initial passivation film and then another passivation film may be formed on top of the initial passivation film by using a reactive gas having an ashing effect such as O.sub.2, N.sub.2 O, O.sub.3 and H.sub.2.
    Type: Grant
    Filed: September 27, 1994
    Date of Patent: September 10, 1996
    Assignees: Nihon Shinku Gijutsu Kabushiki Kaisha, Brother Kogyo Kabushiki Kaisha
    Inventors: Kazuyuki Ito, Kyuzo Nakamura, Michio Ishikawa, Jun Togawa, Noriaki Tani, Masanori Hashimoto, Yumiko Ohashi
  • Patent number: 5288329
    Abstract: An in-line type chemical vapor deposition apparatus having an etching device for cleaning at least substrate holders, which is provided downstream of the substrate unloading station in which the processed substrates are removed from the substrate holders at atmosphere pressure. The etching device comprises a plasma etching means in which the substrate holders are positioned on an anode side or a dry-etching means in which the substrate holders are positioned on a cathode side, thereby reducing the down time of the apparatus without any influence of an exfoliation of an adhered film from the substrate holders or other portions.
    Type: Grant
    Filed: November 20, 1990
    Date of Patent: February 22, 1994
    Assignee: Nihon Shinku Gijutsu Kabushiki Kaisha
    Inventors: Kyuzo Nakamura, Michio Ishikawa, Kazuyuki Ito, Noriaki Tani, Masanori Hashimoto, Yoshifumi Ota
  • Patent number: 5250339
    Abstract: A magnetic recording medium suitable for high-density recording which comprises a non-magnetic substrate disk, at least one magnetic layer and at least one protective layer, the magnetic layer and the protective layer being formed in succession on the non-magnetic substrate disk, wherein the non-magnetic substrate disk comprises a glass substrate and at least one non-magnetic metallic film provided on the glass substrate, and the non-magnetic metallic film is provided on a surface thereof with a multitude of fine concentric grooves.
    Type: Grant
    Filed: September 8, 1992
    Date of Patent: October 5, 1993
    Assignee: Nihon Shinku Gijutsu Kabushiki Kaisha
    Inventors: Noriaki Tani, Kyuzo Nakamura, Michio Ishikawa, Masanori Hashimoto, Yoshifumi Ota
  • Patent number: 5198309
    Abstract: An improved magnetic recording member comprising a magnetic metallic film having the composition Co.sub.x Cr.sub.y Ni.sub.z wherein x, y, and z are atomic ratios and 0.45.ltoreq.x<1.0; 0<y.ltoreq.0.25; and x+y+z=1. The magnetic metallic film is formed over a Cr film provided on a surface of a non-magnetic substrate.
    Type: Grant
    Filed: August 24, 1987
    Date of Patent: March 30, 1993
    Assignee: Nihon Shinku Gijutsu Kabushiki Kaisha
    Inventors: Kyuzo Nakamura, Yoshifumi Ota, Taiki Yamada, Michio Ishikawa, Noriaki Tani
  • Patent number: 5147734
    Abstract: A magnetic recording member with improved coercive force is obtained by:(a) forming by sputtering or Cr film on a non-magnetic substrate;(b) forming by sputtering an epitaxially grown film of a Co alloy containing at least Cr as an additional metal on the Cr film formed in the step (a);and applying a negative bias voltage to the substrate during at least one of steps (a) and (b).The coercive force of the magnetic recording member is further increased when high-frequency sputtering is used instead of direct current sputtering.
    Type: Grant
    Filed: March 14, 1989
    Date of Patent: September 15, 1992
    Assignee: Nihon Shinku Gijutsu Kabushiki Kaisha
    Inventors: Kyuzo Nakamura, Yoshifumi Ota, Michio Ishikawa, Noriaki Tani, Masanori Hashimoto
  • Patent number: 5123163
    Abstract: A film carrier is used for fabricating a semiconductor device, and comprises an insulating film and a plurality of conductive leads each extending on the insulating film and having a front side surface and a reverse side surface, and a bump is formed in each of the conductive leads and has a projecting surface projecting from the reverse side surface and a depressed surface defining a recess open to the front side surface, so that the bump has a dome-shaped configuration and is much liable to deform in a thermocompression bonding stage.
    Type: Grant
    Filed: April 17, 1990
    Date of Patent: June 23, 1992
    Assignee: NEC Corporation
    Inventors: Michio Ishikawa, Toshio Ohkubo, Yasuhiro Otsuka
  • Patent number: 5069983
    Abstract: A magnetic recording member having high coercive force, comprising:(a) a non-magnetic substrate;(b) a Cr base film formed on said substrate by a film forming process; and(c) a Co alloy film formed on said Cr base film by the same film forming process as in (b),wherein said Cr base film contains in addition to Cr at least one additional element selected from the group consisting of rare earth elements, Si, Cu, P and Ge, and wherein said Co alloy film is formed by continuous operation of said film forming process without interruption after completion of the formation of said Cr base film.
    Type: Grant
    Filed: September 29, 1989
    Date of Patent: December 3, 1991
    Assignee: Nihon Shinku Gijutsu Kabushiki Kaisha
    Inventors: Kyuzo Nakamura, Yoshifumi Ota, Michio Ishikawa, Noriaki Tani, Masanori Hashimoto, Yuzo Murata
  • Patent number: 5057535
    Abstract: A new class of aminoketone derivatives according to the formula: ##STR1## and certain propiophenone derivatives in particular, corresponding to the formula: ##STR2## having central muscle relaxant activity.
    Type: Grant
    Filed: September 25, 1987
    Date of Patent: October 15, 1991
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Akira Shiozawa, Michio Ishikawa, Giichi Izumi, Katsuhiko Sakitama, Kazuhisa Narita, Shuji Kurashige, Takeji Sakasai, Kazuo Ohtsuki, Hideo Sugimura, Hirotaka Yamamoto
  • Patent number: 5043598
    Abstract: A high voltage generating circuit which includes a switching circuit for switching a DC input, a fly-back transformer whose input coil is driven by pulses delivered from the switching actuation of the switching actuation of the circuit, a rectifier circuit for rectifying the fly-back voltage generated in the output coil of the fly-back transformer, a capacitor for smoothing the rectified output, and a voltage stabilizing circuit. A diode is electrically connected to one terminal of the output coil of the fly-back transformer on the low-voltage side thereof as compared with the ground, the diode being so determined as to position in the forward direction to the direction of rectification. The voltage stabilizing circuit is formed by a voltage sensing circuit for sensing a DC high voltage output, comparing it with a reference voltage applied from a reference voltage source and generating an output of a result of comparison and a control circuit connected between the anode of the diode and the ground terminal.
    Type: Grant
    Filed: September 15, 1989
    Date of Patent: August 27, 1991
    Assignee: TDK Corporation
    Inventors: Tsutomu Maeda, Kiyoshi Matsui, Michio Ishikawa, Takayuki Kanno, Yasushi Iwata
  • Patent number: 4832810
    Abstract: A Co-based alloy sputter target comprising a f.c.c. phase and a h.c.p. phase, wherein the value of th ratio of X-ray diffraction peak intensity, I.sub.fcc(200) /I.sub.hcp(101), is smaller than the value of the same ratio in a Co-based alloy obtained by cooling a Co-based alloy having a f.c.c. single phase to room temperature from the high temperature at which it is in a melted state.The target is manufactured by subjecting to cold-working treatment a Co-based alloy obtained by cooling a Co-based alloy material having a f.c.c. single phase from its melting temperature.
    Type: Grant
    Filed: July 7, 1987
    Date of Patent: May 23, 1989
    Assignee: Nihon Shinku Gijutsu Kabushiki Kaisha
    Inventors: Kyuzo Nakamura, Yoshifumi Ota, Taiki Yamada, Michio Ishikawa, Noriaki Tani, Yasushi Higuchi
  • Patent number: 4804590
    Abstract: An abrasion resistant magnetic recording member having a carbonaceous surfacial protective film for protecting a surface of a magnetic film formed on a substrate, and the carbonaceous surfacial protective film is formed of a lower layer comprising a comparatively hard carbonaceous film and an upper layer comprising a comparatively soft carbonaceous film.
    Type: Grant
    Filed: November 25, 1986
    Date of Patent: February 14, 1989
    Assignee: Nihon Shinku Gijutsu Kabushiki Kaisha
    Inventors: Kyuzo Nakamura, Yoshifumi Ota, Taiki Yamada, Michio Ishikawa, Noriaki Tani
  • Patent number: 4635272
    Abstract: A laser discharge tube comprises a discharge envelope and an anode and cathode both disposed within the envelope. The envelope includes a capillary tube having a hole. In this hole the tip portion of the anode is inserted. Outside the envelope there is provided a magnet generating a magnetic field which lies in the vicinity of the anode.
    Type: Grant
    Filed: February 28, 1986
    Date of Patent: January 6, 1987
    Assignee: Kimmon Electric Co., Ltd.
    Inventors: Noboru Kamide, Hiroshi Hijikata, Katsumi Tokudome, Michio Ishikawa, Yuji Hayashi