Patents by Inventor Michio Nakamura

Michio Nakamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4438556
    Abstract: A process of forming a polycrystalline silicon pattern which is used for a semiconductor device, wherein the degree of side etching is low and the obtained pattern is of high precision. Firstly, a polycrystalline silicon layer is deposited on a semiconductor substrate or on an insulating film which is formed on a semiconductor substrate. An impurity is selectively ion-implanted with high concentration into the region in the layer which is to remain as a polycrystalline silicon pattern. Finally, whole of the polycrystalline silicon layer into which the impurity is thus selectively ion-implanted is plasma-etched to etch off the areas into which the impurity is not ion-implanted.
    Type: Grant
    Filed: December 21, 1981
    Date of Patent: March 27, 1984
    Assignee: Tokyo Shibaura Denki Kabushiki Kaisha
    Inventors: Shigeru Komatsu, Michio Nakamura
  • Patent number: 4257024
    Abstract: A color picture tube apparatus comprising a color picture tube and beam deflecting means surrounding the color picture tube. The color picture tube includes an in-line type electron gun and a phosphor screen with phosphor layers. Each phosphor layer emits red, green and blue light when the electron beams from the electron gun impinge upon it. The beam deflecting means includes a horizontal deflection coil for generating a horizontal deflection magnetic field, a vertical deflecting coil and correction coils. The vertical deflecting coil and the correction coils cooperate to generate a vertical deflection magnetic field. The distribution of the horizontal deflection magnetic field is barrel-shaped on the electron gun side and pincushion-shaped on the phosphor screen side and is, as a whole, pincushion-shaped. The distribution of the vertical deflection magnetic field is barrel-shaped on the electron gun side and pincushion-shaped on the phosphor screen side and is, as a whole, barrel-shaped.
    Type: Grant
    Filed: September 14, 1979
    Date of Patent: March 17, 1981
    Assignee: Tokyo Shibaura Denki Kabushiki Kaisha
    Inventors: Taketoshi Shimoma, Kumio Fukuda, Michio Nakamura
  • Patent number: 4041533
    Abstract: A delay circuitry for producing a delayed signal the gain of which is stable irrespective of drift and fluctuation of the delay time of a delay line employed therein, which drift and fluctuation are caused by the changes in the conditions around the delay line.In this circuitry, a carrier signal is modulated with an input signal and the modulated carrier signal is then delayed in the delay line, the delay time of which is unstable due to the conditions around the delay line. The modulated and delayed carrier signal is detected by a synchronous detector with a reference signal, the phase of which is adjusted so that it is always in phase with the modulated and delayed carrier signal to produce the delayed signal which is stable irrespective of the drift and the fluctuation of the delay time.
    Type: Grant
    Filed: September 19, 1975
    Date of Patent: August 9, 1977
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Katsuhiko Yamamoto, Kunihiko Hontani, Hiromu Kitaura, Michio Nakamura
  • Patent number: 3967043
    Abstract: A method of preparing asbestos articles to exhibit dustproof effects in secondary processing without degradation of the inherent properties of the asbestos articles comprises the step of immersing the asbestos article in a treating agent comprising formaldehyde, a water-soluble organic compound capable of reacting with formaldehyde to form a water-insoluble compound under weakly alkaline conditions in an atmosphere maintained at a high temperature and a high humidity, a plasticizer, and a water-soluble macromolecular substance having film forming properties, and the steps of infusing the asbestos article with a weakly alkaline solution and first reacting the asbestos article in an atmosphere maintained at a high temperature and high humidity, and subsequently heat treating the resulting product to obtain the final product. The final product is impregnated in the interior substrate thereof by 0.5 to 10 wt.% of the water-insoluble compound, has a surface layer of 0.04 to 0.09 wt.
    Type: Grant
    Filed: January 3, 1974
    Date of Patent: June 29, 1976
    Assignee: Nippon Asbestos Company, Ltd.
    Inventors: Takashi Otouma, Michio Nakamura