Patents by Inventor Michio Sato

Michio Sato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210010051
    Abstract: The present invention provides a method and probe for determining colibactin and a colibactin-producing bacterium. According to the present invention, there is provided a fluorescent probe for detecting myristoyl asparagine using, for example, a tissue sample and a fecal sample and detecting enzyme activity of ClbP.
    Type: Application
    Filed: August 27, 2018
    Publication date: January 14, 2021
    Applicant: SHIZUOKA PREFECTURE PUBLIC UNIVERSITY CORPORATION
    Inventors: Kenji WATANABE, Yuta TSUNEMATSU, Michio SATO
  • Patent number: 10100413
    Abstract: A base material is composed of a metal or ceramics, and an aluminum nitride coating is formed on an outermost surface thereof. The aluminum nitride coating is formed by impact sintering and contains fine particles having a particle diameter of 1 ?m or less. A thickness of the aluminum nitride coating is no less than 10 ?m. A film density of the aluminum nitride coating is no less than 90% An area ratio of aluminum nitride particles whose particle boundaries are recognizable existing in a 20 ?m×20 ?m unit area of the aluminum nitride coating is 0% to 90% while an area ratio of aluminum nitride particles whose particle boundaries are unrecognizable is 10% to 100%. Such a component for a plasma apparatus having the aluminum nitride coating can provide a strong resistance to plasma attack and radical attack.
    Type: Grant
    Filed: November 26, 2014
    Date of Patent: October 16, 2018
    Assignees: Kabushiki Kaisha Toshiba, Toshiba Materials Co., Ltd.
    Inventors: Michio Sato, Takashi Hino, Masashi Nakatani
  • Patent number: 9988702
    Abstract: The present invention provides a component for a plasma processing apparatus, the component comprising: a base material; an underlayer covering a surface of the base material; and an yttrium oxide film covering a surface of the underlayer, wherein the underlayer comprises a metal oxide film having a thermal conductivity of 35 W/m·K or less, the yttrium oxide film contains at least either particulate portions made of yttrium oxide or non-particulate portions made of yttrium oxide, the particulate portions being portions where a grain boundary demarcating an outer portion of the grain boundary is observed under a microscope, and the non-particulate portions being portions where the grain boundary is not observed under a microscope, the yttrium oxide film has a film thickness of 10 ?m or more and a film density of 96% or more, and when a surface of the yttrium oxide film is observed under a microscope, an area coverage ratio of the particulate portions is 0 to 20% in an observation range of 20 ?m×20 ?m and an ar
    Type: Grant
    Filed: May 22, 2013
    Date of Patent: June 5, 2018
    Assignees: Kabushiki Kaisha Toshiba, Toshiba Materials Co., Ltd.
    Inventors: Michio Sato, Takashi Hino, Masashi Nakatani
  • Publication number: 20170022595
    Abstract: The present invention provides a plasma-resistant component for use in a plasma apparatus, wherein an oxide film is formed on at least part of a surface of a substrate of the component, the oxide film is a deposited oxide film formed as an aggregate of polycrystalline particles, the polycrystalline particles being formed by sinter-bonding of microparticles having an average particle size of 0.05 to 3 ?m, and the deposited oxide film has a film thickness of 10 ?m or more and 200 ?m or less and a film density of 90% or more. Due to above structure, it becomes possible to obtain a plasma-resistant component and a method of manufacturing a plasma-resistant component in which the generation of particles removed from the component is stably and effectively suppressed, and damage such as corrosion and deformation rarely occur during the regeneration process.
    Type: Application
    Filed: March 20, 2015
    Publication date: January 26, 2017
    Applicants: KABUSHIKI KAISHA TOSHIBA, TOSHIBA MATERIALS CO., LTD.
    Inventors: Michio SATO, Takashi HINO, Masashi NAKATANI, Takashi NAKAMURA
  • Publication number: 20170002470
    Abstract: A base material is composed of a metal or ceramics, and an aluminum nitride coating is formed on an outermost surface thereof. The aluminum nitride coating is formed by impact sintering and contains fine particles having a particle diameter of 1 ?m or less. A thickness of the aluminum nitride coating is no less than 10 ?m. A film density of the aluminum nitride coating is no less than 90%. An area ratio of aluminum nitride particles whose particle boundaries are recognizable existing in a 20 ?m×20 ?m unit area of the aluminum nitride coating is 0% to 90% while an area ratio of aluminum nitride particles whose particle boundaries are unrecognizable is 10% to 100%. Such a component for a plasma apparatus having the aluminum nitride coating can provide a strong resistance to plasma attack and radical attack.
    Type: Application
    Filed: November 26, 2014
    Publication date: January 5, 2017
    Applicants: KABUSHIKI KAISHA TOSHIBA, TOSHIBA MATERIALS CO., LTD.
    Inventors: Michio SATO, Takashi HINO, Masashi NAKATANI
  • Patent number: 9355855
    Abstract: The present invention provides a plasma etching apparatus component 1 includes a base material 10 and an yttrium oxide coating 20 formed by an impact sintering process and configured to cover a surface of the base material. The yttrium oxide coating 20 contains at least one of particulate portions and non-particulate portions. The yttrium oxide coating 20 has a film thickness of 10 ?m or above and a film density of 90% or above. The particulate portions have an area coverage ratio of 0 to 80% and the non-particulate portions have an area coverage ratio of 20 to 100%.
    Type: Grant
    Filed: November 29, 2011
    Date of Patent: May 31, 2016
    Assignees: KABUSHIKI KAISHA TOSHIBA, TOSHIBA MATERIALS CO., LTD.
    Inventors: Michio Sato, Takashi Hino, Takashi Rokutanda, Masashi Nakatani
  • Publication number: 20150152540
    Abstract: The present invention provides a component for a plasma processing apparatus, the component comprising: a base material; an underlayer covering a surface of the base material; and an yttrium oxide film covering a surface of the underlayer, wherein the underlayer comprises a metal oxide film having a thermal conductivity of 35 W/m·K or less, the yttrium oxide film contains at least either particulate portions made of yttrium oxide or non-particulate portions made of yttrium oxide, the particulate portions being portions where a grain boundary demarcating an outer portion of the grain boundary is observed under a microscope, and the non-particulate portions being portions where the grain boundary is not observed under a microscope, the yttrium oxide film has a film thickness of 10 ?m or more and a film density of 96% or more, and when a surface of the yttrium oxide film is observed under a microscope, an area coverage ratio of the particulate portions is 0 to 20% in an observation range of 20 ?m×20 ?m and an ar
    Type: Application
    Filed: May 22, 2013
    Publication date: June 4, 2015
    Inventors: Michio Sato, Takashi Hino, Masashi Nakatani
  • Patent number: 8676568
    Abstract: A storage unit stores first filter information specifying the formats of messages and second filter information specifying weights for words or phrases. A first search unit selects messages matching the formats specified by the first filter information from a plurality of messages as messages to be extracted. A second search unit calculates the importance level of each message unselected by the first search unit, based on the words or phrases included in the message and the second filter information, and selects messages to be extracted, according to the calculated importance levels from the messages unselected by the first search unit.
    Type: Grant
    Filed: April 23, 2013
    Date of Patent: March 18, 2014
    Assignee: Fujitsu Limited
    Inventors: Akira Minegishi, Michio Sato, Takao Shibazaki, Naomi Ozawa
  • Publication number: 20130251949
    Abstract: The present invention provides a plasma etching apparatus component 1 includes a base material 10 and an yttrium oxide coating 20 formed by an impact sintering process and configured to cover a surface of the base material. The yttrium oxide coating 20 contains at least one of particulate portions and non-particulate portions. The yttrium oxide coating 20 has a film thickness of 10 ?m or above and a film density of 90% or above. The particulate portions have an area coverage ratio of 0 to 80% and the non-particulate portions have an area coverage ratio of 20 to 100%.
    Type: Application
    Filed: November 29, 2011
    Publication date: September 26, 2013
    Applicants: TOSHIBA MATERIALS CO., LTD., KABUSHIKI KAISHA TOSHIBA
    Inventors: Michio Sato, Takashi Hino, Takashi Rokutanda, Masashi Nakatani
  • Publication number: 20130238319
    Abstract: A storage unit stores first filter information specifying the formats of messages and second filter information specifying weights for words or phrases. A first search unit selects messages matching the formats specified by the first filter information from a plurality of messages as messages to be extracted. A second search unit calculates the importance level of each message unselected by the first search unit, based on the words or phrases included in the message and the second filter information, and selects messages to be extracted, according to the calculated importance levels from the messages unselected by the first search unit.
    Type: Application
    Filed: April 23, 2013
    Publication date: September 12, 2013
    Applicant: FUJITSU LIMITED
    Inventors: Akira Minegishi, Michio Sato, Takao Shibazaki, Naomi Ozawa
  • Patent number: 8445649
    Abstract: An antibody provided by the present invention has a low reactivity with amyloid precursor proteins, and has a higher reactivity with amylospheroids than with amyloid ? fibrils or monomeric amyloid ?-proteins. According to the present invention, an antibody is provided that has a higher reactivity with amylospheroids than with amyloid precursor proteins, and has any one or more of the following properties: (i) a higher activity with amylospheroids than with amyloid ? fibrils; (ii) a higher reactivity with amylospheroids than with monomeric amyloid ?-proteins; and (iii) an activity of inhibiting neuronal cell death induced by amylospheroids.
    Type: Grant
    Filed: October 29, 2008
    Date of Patent: May 21, 2013
    Assignee: Tao Health Life Pharma Co., Ltd.
    Inventors: Minako Hoshi, Michio Sato, Shoji Ideno, Koji Naito, Satoshi Horie, Munehiro Noda, Hajime Horii
  • Publication number: 20120216955
    Abstract: According to one embodiment, a plasma processing apparatus that includes a process target holding portion and a plasma generating unit in a chamber, and processes a process target by using generated plasma is provided. An yttrium oxide film is formed on an inner wall of the chamber and a surface of a structural member in the chamber on a generation region side of the plasma. The yttrium oxide film includes yttrium oxide particles, has a film thickness of 10 ?m or more and 200 ?m or less, has a film density of 90% or more, and is such that yttrium oxide particles, which are present in a unit area 20 ?m×20 ?m and whose grain boundary is confirmable, are 0 to 80% in area ratio.
    Type: Application
    Filed: February 21, 2012
    Publication date: August 30, 2012
    Applicants: TOSHIBA MATERIALS CO., LTD., KABUSHIKI KAISHA TOSHIBA
    Inventors: Hideo ETO, Makoto Saito, Hisashi Hashiguchi, Atsushi Ito, Michio Sato
  • Publication number: 20120201563
    Abstract: Provided is an image forming apparatus including: a latent image carrying drum on which a latent image is formed; a charging section that includes a corona charger charging the latent image carrying drum and an air flow duct formed in the corona charger so as to be long in the rotation axis direction of the latent image carrying drum so that air flows in the corona charger; a developing section that is disposed above the air flow duct in the vertical direction, is formed so as to be shorter than the air flow duct in the rotation axis direction of the latent image carrying drum, and develops the latent image formed on the latent image carrying drum by a liquid developing agent including toner and a carrier liquid.
    Type: Application
    Filed: January 30, 2012
    Publication date: August 9, 2012
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Kazuma MIYAZAWA, Tsutomu SASAKI, Hidehiro TAKANO, Michio SATO, Naoyuki OKUMURA, Satoru MIYAMOTO, Ken IKUMA
  • Publication number: 20120045625
    Abstract: A method of manufacturing a laminate includes: a step of deriving, by the processor, an in-plane positional relationship between the retardation film and the object from an image of each of the retardation film and the object captured by the camera while the retardation film and the object are disposed in this order from a side of the camera within the imaging area of the camera at positions on a side opposite to the camera with respect to the (2n+1)?/4 retardation film; and a step of performing alignment of the retardation film to the object based on the positional relationship derived by the processor, and then attaching the retardation film to the object.
    Type: Application
    Filed: July 21, 2011
    Publication date: February 23, 2012
    Applicant: SONY CORPORATION
    Inventors: Taro Omura, Mitsunari Hoshi, Michio Sato
  • Patent number: 7988786
    Abstract: The present invention provides a carbon film coated member comprising: a base material; and a coated film formed on at least part of a surface of the base material, the coated film comprising: a matrix composed of amorphous carbon; and at least one of metal and metal carbide contained in the matrix, wherein an atomic ratio (M/C) of the metal (M) to carbon (C) constituting the coated film is 0.01 to 0.7. According to the above structure, there can be provided a carbon film coated member excellent in low-friction property, wear resistance and durability, and capable of suppressing a dust generation, peeling-off and deterioration of the coated film even if the carbon film coated member is used as semiconductor equipment members such as wafer cassette, dummy wafer, probe pin or the like under severe operating conditions, so that the carbon film coated member would not exert a bad influence onto the resultant semiconductor products.
    Type: Grant
    Filed: November 22, 2004
    Date of Patent: August 2, 2011
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Michio Sato, Takashi Yamanobe
  • Publication number: 20110154900
    Abstract: The present invention provides a vibration monitoring apparatus that monitors vibration of a jet pump disposed in a reactor pressure vessel using ultrasonic wave, including: an ultrasonic sensor that is attached to an outside the reactor pressure vessel, and transmits and receives ultrasonic wave; a reflector that is mounted on a surface of a riser pipe of the jet pump, and includes a planar reflecting surface that can reflect ultrasonic wave; and a signal processing unit that performs signal processing of the ultrasonic wave transmitted by the ultrasonic sensor, reflected by the reflecting surface of the reflector, and received by the ultrasonic sensor, and measures a vibration amplitude of the riser pipe and calculates a vibration waveform.
    Type: Application
    Filed: September 12, 2008
    Publication date: June 30, 2011
    Inventors: Masanobu Watanabe, Yasumi Kitajima, Michio Sato, Mieko Sato, Tsuyoshi Hagiwara, Masahiko Warashina
  • Publication number: 20100297662
    Abstract: An antibody provided by the present invention has a low reactivity with amyloid precursor proteins, and has a higher reactivity with amylospheroids than with amyloid ? fibrils or monomeric amyloid ?-proteins. According to the present invention, an antibody is provided that has a higher reactivity with amylospheroids than with amyloid precursor proteins, and has any one or more of the following properties: (i) a higher activity with amylospheroids than with amyloid ? fibrils; (ii) a higher reactivity with amylospheroids than with monomeric amyloid ?-proteins; and (iii) an activity of inhibiting neuronal cell death induced by amylospheroids.
    Type: Application
    Filed: October 29, 2008
    Publication date: November 25, 2010
    Inventors: Minako Hoshi, Michio Sato, Shoji Ideno, Koji Naito, Satoshi Horie, Munehiro Noda, Hajime Horii
  • Publication number: 20100107982
    Abstract: A vacuum depositing apparatus part constituting a vacuum depositing apparatus for depositing a thin film forming material vaporized in a vacuum chamber on a substrate, the vacuum depositing apparatus part includes: a part body; and a sprayed film integrally formed to a surface of the part body, the sprayed film preferably has a plurality of dimples formed to a surface thereof, and the dimples preferably have an average depth of 10 ?m or less. The vacuum depositing apparatus part is capable of stably and effectively preventing a peel-off and dropping-off of a film forming material adhered to the apparatus parts during the film forming operation, capable of suppressing a lowering of productivity of the film product or suppressing an increase of a film forming cost accompanied by a frequent cleaning of the depositing apparatus or a frequent exchange of the apparatus part, and capable of preventing a generation of fine particles.
    Type: Application
    Filed: July 11, 2007
    Publication date: May 6, 2010
    Applicants: Kabushiki Kaisha Toshiba, Toshiba Materials Co., Ltd.
    Inventors: Michio Sato, Takashi Nakamura
  • Publication number: 20090282920
    Abstract: A nuclear reactor vibration surveillance system has a first ultrasonic transducer for transmission, an ultrasonic transmitter, a second ultrasonic transducer for reception, an ultrasonic receiver, a signal processor, and a display unit. The first ultrasonic transducer for transmission is arranged on the outer surface of a reactor pressure vessel and is configured to convert a transmission signal into an ultrasonic pulse signal and allow the ultrasonic pulse to be transmitted to a reactor internal component. The second ultrasonic transducer for reception is arranged on the outer surface of the reactor pressure vessel and is configured to receive a reflected ultrasonic pulse reflected by the reactor internal component and convert the received reflected ultrasonic pulse into a reception signal.
    Type: Application
    Filed: March 23, 2009
    Publication date: November 19, 2009
    Inventors: Michio SATO, Mieko Sato, Hidehiko Kuroda, Mikio Izumi, Mitsuhiro Enomoto, Masaki Yoda
  • Publication number: 20090134020
    Abstract: There are provided a sputtering target and a process for producing a sputtering target. The sputtering target includes a first layer located on its side to be sputter treated and a second layer located on its side not to be sputter treated. The first and second layers are bonded to each other through a bonding interface between the first layer and the second layer. The sputtering target satisfying the following requirements X and Y: requirement X: A/B?1.5 and requirement Y: A/C?1.5, wherein A represents an oxygen peak value for the bonding interface; B represents an oxygen peak value for the first layer; and C represents an oxygen peak value for the second layer. The sputtering target is advantageous in that a spent sputtering target can be recycled to utilize resources and can form a thin film while effectively preventing the occurrence of abnormal discharge and splash.
    Type: Application
    Filed: November 2, 2006
    Publication date: May 28, 2009
    Applicants: Kabushiki Kaisha Toshiba, Toshiba Materials Co., Ltd.
    Inventors: Yukinobu Suzuki, Koichi Watanabe, Toshiya Sakamoto, Michio Sato, Yasuo Kohsaka