Abstract: The present invention provides a method and probe for determining colibactin and a colibactin-producing bacterium. According to the present invention, there is provided a fluorescent probe for detecting myristoyl asparagine using, for example, a tissue sample and a fecal sample and detecting enzyme activity of ClbP.

Abstract: A rotary motor includes a stator having a coil, and a rotor placed apart from the stator and rotating around a rotation shaft, wherein the rotor has a rotor frame coupled to the rotation shaft, and a magnet placed on the rotor frame, when a direction from the magnet to the coil is a first direction, the magnet has a plurality of first magnets having anisotropy and magnetized at least in the first direction, and a second magnet having isotropy and placed on end surfaces of the first magnets at a positive side in the first direction.

Abstract: A rotary motor includes a stator and a rotor configured to rotate around a rotation axis. The rotor includes a frame including a first surface facing the stator and a plurality of first recesses arrayed along a circumferential direction around the rotation axis and opened on the first surface, the frame being formed in an annular shape, main magnets disposed in the first recesses or among the first recesses, and sub-magnets disposed in the first recesses when the main magnets are disposed among the first recesses and disposed among the first recesses when the main magnets are disposed in the first recesses.

Abstract: The present invention provides a method and probe for determining colibactin and a colibactin-producing bacterium. According to the present invention, there is provided a fluorescent probe for detecting myristoyl asparagine using, for example, a tissue sample and a fecal sample and detecting enzyme activity of ClbP.

Abstract: A base material is composed of a metal or ceramics, and an aluminum nitride coating is formed on an outermost surface thereof. The aluminum nitride coating is formed by impact sintering and contains fine particles having a particle diameter of 1 ?m or less. A thickness of the aluminum nitride coating is no less than 10 ?m. A film density of the aluminum nitride coating is no less than 90% An area ratio of aluminum nitride particles whose particle boundaries are recognizable existing in a 20 ?m×20 ?m unit area of the aluminum nitride coating is 0% to 90% while an area ratio of aluminum nitride particles whose particle boundaries are unrecognizable is 10% to 100%. Such a component for a plasma apparatus having the aluminum nitride coating can provide a strong resistance to plasma attack and radical attack.

Abstract: The present invention provides a component for a plasma processing apparatus, the component comprising: a base material; an underlayer covering a surface of the base material; and an yttrium oxide film covering a surface of the underlayer, wherein the underlayer comprises a metal oxide film having a thermal conductivity of 35 W/m·K or less, the yttrium oxide film contains at least either particulate portions made of yttrium oxide or non-particulate portions made of yttrium oxide, the particulate portions being portions where a grain boundary demarcating an outer portion of the grain boundary is observed under a microscope, and the non-particulate portions being portions where the grain boundary is not observed under a microscope, the yttrium oxide film has a film thickness of 10 ?m or more and a film density of 96% or more, and when a surface of the yttrium oxide film is observed under a microscope, an area coverage ratio of the particulate portions is 0 to 20% in an observation range of 20 ?m×20 ?m and an ar

Abstract: The present invention provides a plasma-resistant component for use in a plasma apparatus, wherein an oxide film is formed on at least part of a surface of a substrate of the component, the oxide film is a deposited oxide film formed as an aggregate of polycrystalline particles, the polycrystalline particles being formed by sinter-bonding of microparticles having an average particle size of 0.05 to 3 ?m, and the deposited oxide film has a film thickness of 10 ?m or more and 200 ?m or less and a film density of 90% or more. Due to above structure, it becomes possible to obtain a plasma-resistant component and a method of manufacturing a plasma-resistant component in which the generation of particles removed from the component is stably and effectively suppressed, and damage such as corrosion and deformation rarely occur during the regeneration process.

Abstract: A base material is composed of a metal or ceramics, and an aluminum nitride coating is formed on an outermost surface thereof. The aluminum nitride coating is formed by impact sintering and contains fine particles having a particle diameter of 1 ?m or less. A thickness of the aluminum nitride coating is no less than 10 ?m. A film density of the aluminum nitride coating is no less than 90%. An area ratio of aluminum nitride particles whose particle boundaries are recognizable existing in a 20 ?m×20 ?m unit area of the aluminum nitride coating is 0% to 90% while an area ratio of aluminum nitride particles whose particle boundaries are unrecognizable is 10% to 100%. Such a component for a plasma apparatus having the aluminum nitride coating can provide a strong resistance to plasma attack and radical attack.

Abstract: The present invention provides a plasma etching apparatus component 1 includes a base material 10 and an yttrium oxide coating 20 formed by an impact sintering process and configured to cover a surface of the base material. The yttrium oxide coating 20 contains at least one of particulate portions and non-particulate portions. The yttrium oxide coating 20 has a film thickness of 10 ?m or above and a film density of 90% or above. The particulate portions have an area coverage ratio of 0 to 80% and the non-particulate portions have an area coverage ratio of 20 to 100%.

Abstract: The present invention provides a component for a plasma processing apparatus, the component comprising: a base material; an underlayer covering a surface of the base material; and an yttrium oxide film covering a surface of the underlayer, wherein the underlayer comprises a metal oxide film having a thermal conductivity of 35 W/m·K or less, the yttrium oxide film contains at least either particulate portions made of yttrium oxide or non-particulate portions made of yttrium oxide, the particulate portions being portions where a grain boundary demarcating an outer portion of the grain boundary is observed under a microscope, and the non-particulate portions being portions where the grain boundary is not observed under a microscope, the yttrium oxide film has a film thickness of 10 ?m or more and a film density of 96% or more, and when a surface of the yttrium oxide film is observed under a microscope, an area coverage ratio of the particulate portions is 0 to 20% in an observation range of 20 ?m×20 ?m and an ar

Abstract: A storage unit stores first filter information specifying the formats of messages and second filter information specifying weights for words or phrases. A first search unit selects messages matching the formats specified by the first filter information from a plurality of messages as messages to be extracted. A second search unit calculates the importance level of each message unselected by the first search unit, based on the words or phrases included in the message and the second filter information, and selects messages to be extracted, according to the calculated importance levels from the messages unselected by the first search unit.

Abstract: The present invention provides a plasma etching apparatus component 1 includes a base material 10 and an yttrium oxide coating 20 formed by an impact sintering process and configured to cover a surface of the base material. The yttrium oxide coating 20 contains at least one of particulate portions and non-particulate portions. The yttrium oxide coating 20 has a film thickness of 10 ?m or above and a film density of 90% or above. The particulate portions have an area coverage ratio of 0 to 80% and the non-particulate portions have an area coverage ratio of 20 to 100%.

Abstract: A storage unit stores first filter information specifying the formats of messages and second filter information specifying weights for words or phrases. A first search unit selects messages matching the formats specified by the first filter information from a plurality of messages as messages to be extracted. A second search unit calculates the importance level of each message unselected by the first search unit, based on the words or phrases included in the message and the second filter information, and selects messages to be extracted, according to the calculated importance levels from the messages unselected by the first search unit.

Abstract: An antibody provided by the present invention has a low reactivity with amyloid precursor proteins, and has a higher reactivity with amylospheroids than with amyloid ? fibrils or monomeric amyloid ?-proteins. According to the present invention, an antibody is provided that has a higher reactivity with amylospheroids than with amyloid precursor proteins, and has any one or more of the following properties: (i) a higher activity with amylospheroids than with amyloid ? fibrils; (ii) a higher reactivity with amylospheroids than with monomeric amyloid ?-proteins; and (iii) an activity of inhibiting neuronal cell death induced by amylospheroids.

Abstract: According to one embodiment, a plasma processing apparatus that includes a process target holding portion and a plasma generating unit in a chamber, and processes a process target by using generated plasma is provided. An yttrium oxide film is formed on an inner wall of the chamber and a surface of a structural member in the chamber on a generation region side of the plasma. The yttrium oxide film includes yttrium oxide particles, has a film thickness of 10 ?m or more and 200 ?m or less, has a film density of 90% or more, and is such that yttrium oxide particles, which are present in a unit area 20 ?m×20 ?m and whose grain boundary is confirmable, are 0 to 80% in area ratio.

Abstract: Provided is an image forming apparatus including: a latent image carrying drum on which a latent image is formed; a charging section that includes a corona charger charging the latent image carrying drum and an air flow duct formed in the corona charger so as to be long in the rotation axis direction of the latent image carrying drum so that air flows in the corona charger; a developing section that is disposed above the air flow duct in the vertical direction, is formed so as to be shorter than the air flow duct in the rotation axis direction of the latent image carrying drum, and develops the latent image formed on the latent image carrying drum by a liquid developing agent including toner and a carrier liquid.

Abstract: A method of manufacturing a laminate includes: a step of deriving, by the processor, an in-plane positional relationship between the retardation film and the object from an image of each of the retardation film and the object captured by the camera while the retardation film and the object are disposed in this order from a side of the camera within the imaging area of the camera at positions on a side opposite to the camera with respect to the (2n+1)?/4 retardation film; and a step of performing alignment of the retardation film to the object based on the positional relationship derived by the processor, and then attaching the retardation film to the object.

Abstract: The present invention provides a carbon film coated member comprising: a base material; and a coated film formed on at least part of a surface of the base material, the coated film comprising: a matrix composed of amorphous carbon; and at least one of metal and metal carbide contained in the matrix, wherein an atomic ratio (M/C) of the metal (M) to carbon (C) constituting the coated film is 0.01 to 0.7. According to the above structure, there can be provided a carbon film coated member excellent in low-friction property, wear resistance and durability, and capable of suppressing a dust generation, peeling-off and deterioration of the coated film even if the carbon film coated member is used as semiconductor equipment members such as wafer cassette, dummy wafer, probe pin or the like under severe operating conditions, so that the carbon film coated member would not exert a bad influence onto the resultant semiconductor products.

Abstract: The present invention provides a vibration monitoring apparatus that monitors vibration of a jet pump disposed in a reactor pressure vessel using ultrasonic wave, including: an ultrasonic sensor that is attached to an outside the reactor pressure vessel, and transmits and receives ultrasonic wave; a reflector that is mounted on a surface of a riser pipe of the jet pump, and includes a planar reflecting surface that can reflect ultrasonic wave; and a signal processing unit that performs signal processing of the ultrasonic wave transmitted by the ultrasonic sensor, reflected by the reflecting surface of the reflector, and received by the ultrasonic sensor, and measures a vibration amplitude of the riser pipe and calculates a vibration waveform.

Abstract: An antibody provided by the present invention has a low reactivity with amyloid precursor proteins, and has a higher reactivity with amylospheroids than with amyloid ? fibrils or monomeric amyloid ?-proteins. According to the present invention, an antibody is provided that has a higher reactivity with amylospheroids than with amyloid precursor proteins, and has any one or more of the following properties: (i) a higher activity with amylospheroids than with amyloid ? fibrils; (ii) a higher reactivity with amylospheroids than with monomeric amyloid ?-proteins; and (iii) an activity of inhibiting neuronal cell death induced by amylospheroids.