Patents by Inventor Mi-kyung Kim

Mi-kyung Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240126163
    Abstract: Disclosed is a blankmask for EUV lithography, including a reflective film, a capping film, an etch stop film, a phase shift film, and a hard mask film which are sequentially formed on a substrate. The phase shift film contains ruthenium (Ru), and the etch stop film contains chrome (Cr) and niobium (Nb). In the etch stop film, the content of niobium (Nb) ranges from 20 to 50 at %, and the content of chrome (Cr) ranges from 10 to 40 at %. The hard mask film contains tantalum (Ta) and oxygen (O). The content of tantalum (Ta) in the hard mask film is higher than or equal to 50 at %. With the blankmask, it is possible to implement a high resolution and NILS during wafer printing, and implement DtC.
    Type: Application
    Filed: January 24, 2023
    Publication date: April 18, 2024
    Applicant: S&S TECH Co., Ltd.
    Inventors: Yong-Dae KIM, Chul-Kyu YANG, Mi-Kyung WOO
  • Patent number: 11957669
    Abstract: One aspect of the present disclosure is a pharmaceutical composition which includes (R)—N-[1-(3,5-difluoro-4-methansulfonylamino-phenyl)-ethyl]-3-(2-propyl-6-trifluoromethyl-pyridin-3-yl)-acrylamide as a first component and a cellulosic polymer as a second component, wherein the composition of one aspect of the present disclosure has a formulation characteristic in which crystal formation is delayed for a long time.
    Type: Grant
    Filed: August 10, 2018
    Date of Patent: April 16, 2024
    Assignee: AMOREPACIFIC CORPORATION
    Inventors: Joon Ho Choi, Won Kyung Cho, Kwang-Hyun Shin, Byoung Young Woo, Ki-Wha Lee, Min-Soo Kim, Jong Hwa Roh, Mi Young Park, Young-Ho Park, Eun Sil Park, Jae Hong Park
  • Patent number: 11953502
    Abstract: The present invention relates to an epitope of a thioredoxin-1 (Trx1) antigen and a use thereof, and more particularly, to the epitope, and an antibody or an antigen-binding fragment binding thereto. The epitope region of the human Trx1 antigen confirmed in the present invention may be effectively used in the development of an improved antibody to enhance the binding affinity of an anti-Trx1 antibody. In addition, the improved antibody of the present invention is effective in improvement of performance of a breast cancer diagnosis kit due to excellent binding affinity for Trx1 and very high sensitivity and specificity, compared to a conventional anti-Trx1 antibody. Further, the accuracy and reliability of breast cancer diagnosis may significantly increase because exceptionally high sensitivity and specificity are exhibited by detecting the monoclonal antibody of the present invention, which specifically binds to Trx1, rather than detecting CA15-3, another conventional breast cancer diagnostic biomarker.
    Type: Grant
    Filed: October 12, 2018
    Date of Patent: April 9, 2024
    Assignee: E&S HEALTHCARE CO., LTD.
    Inventors: Kyong Hoon Suh, Dae Joong Kim, Young Kim, Mi Kyung Kim, Jong Hwan Jung, Ki Se Lee
  • Patent number: 11940725
    Abstract: A blankmask for EUV lithography includes a substrate, a reflective layer, a capping layer, and a phase shift layer. The phase shift layer is made of a material containing ruthenium (Ru) and chromium (Cr), and a total content of ruthenium (Ru) and chromium (Cr) is 50 to 100 at %. The phase shift layer may further contain boron (B) or nitrogen (N). The phase shift layer of the present invention has a high relative reflectance (relative reflectance with respect to a reflectance of the reflective layer under the phase shift layer) with respect to a tantalum (Ta)-based phase shift layer and has a phase shift amount of 170 to 230°. It is possible to obtain excellent resolution when finally manufacturing a pattern of 7 nm or less by using a photomask manufactured using such a blankmask.
    Type: Grant
    Filed: December 6, 2021
    Date of Patent: March 26, 2024
    Assignee: S&S Tech Co., Ltd.
    Inventors: Cheol Shin, Yong-Dae Kim, Jong-Hwa Lee, Chul-Kyu Yang, Min-Kwang Park, Mi-Kyung Woo
  • Patent number: 11927880
    Abstract: A blankmask for extreme ultraviolet lithography includes a substrate, a reflective layer formed on the substrate, and a phase shift layer formed on the reflective layer. The phase shift layer contains niobium (Nb), and is made of a material containing one of tantalum (Ta), chromium (Cr), and ruthenium (Ru). A phase shift layer containing Nb and Ta has a relative reflectance of 5 to 20%, a phase shift layer containing Nb and Cr has a relative reflectance of 9 to 15%, and a phase shift layer containing Nb and Ru has a relative reflectance of 20% or more. The phase shift layer has a phase shift amount of 170 to 230°, and has a surface roughness of 0.5 nmRMS or less. It is possible to obtain excellent resolution when finally manufacturing a pattern of 7 nm or less by using a photomask manufactured using such a blankmask.
    Type: Grant
    Filed: January 10, 2022
    Date of Patent: March 12, 2024
    Assignee: S&S TECH Co., Ltd.
    Inventors: Yong-Dae Kim, Chul-Kyu Yang, Min-Kwang Park, Mi-Kyung Woo
  • Publication number: 20240066059
    Abstract: A method for producing CAR-M1 macrophages expressing a chimeric antigen receptor in vitro and in vivo includes using a conjugate of a non-viral gene delivery system and a chimeric antigen receptor gene. The CAR-M1 macrophages are produced in vivo by delivering genes encoding a chimeric antigen receptor and IFN-?, specifically to macrophages in the body, and thus does not require culturing and preparing an in-vitro cellular therapeutic agent, thus reducing the manufacturing costs of therapeutic agents. The CAR-M1 macrophages are a safer therapy since a non-viral vector is used, as compared to the production of CAR-M1 macrophages by gene delivery using a viral vector, and are a novel therapeutic candidate having the advantage of high anticancer efficiency for solid cancers, due to CAR-M1 macrophages in which intrinsic properties of macrophages infiltrating solid cancers and cancer cell phagocytosis are improved.
    Type: Application
    Filed: March 3, 2022
    Publication date: February 29, 2024
    Inventors: Byung Soo KIM, Mi Kyung KANG, Hee Ho PARK
  • Publication number: 20240043368
    Abstract: Provided is a method for preparing an acrylic acid including: dehydrating a lactic acid aqueous solution in a reaction unit to prepare a reaction product stream; passing the reaction product stream through a cooling unit and a refining unit sequentially and supplying a discharge stream from the refining unit to an acrylic acid separation column; and separating an unreacted lactic acid as a side discharge stream and separating the acrylic acid as an upper discharge stream in the acrylic acid separation column.
    Type: Application
    Filed: June 16, 2022
    Publication date: February 8, 2024
    Inventors: Byeong Gil LYU, Mi Kyung KIM, Eun Kyo KIM, Hye Bin KIM
  • Publication number: 20240025834
    Abstract: Provided is a method for preparing an acrylic acid, in which a lactic acid aqueous solution is dehydrated to prepare a reaction product stream, from which by-products are removed using an extraction column, an extractant recovery column, a first separation column, a second separation column, and a refining column to prepare a high-purity acrylic acid.
    Type: Application
    Filed: August 1, 2022
    Publication date: January 25, 2024
    Inventors: Byeong Gil LYU, Mi Kyung KIM, Eun Kyo KIM, Hye Bin KIM
  • Publication number: 20240025833
    Abstract: Provided is a method for preparing an acrylic acid including: supplying a lactic acid aqueous solution to a reactor and performing a dehydration reaction to prepare a reaction product including an acrylic acid; supplying a reactor discharge stream including the reaction product to a first cooling tower and supplying an upper discharge stream from the first cooling tower to a second cooling tower; supplying a first acrylic acid aqueous solution stream discharged from a lower portion of the second cooling tower to an extraction column; supplying an upper discharge stream from the extraction column and a second acrylic acid aqueous solution stream discharged from a lower portion of the first cooling tower to a distillation column; and separating the acrylic acid from a lower discharge stream from the distillation column.
    Type: Application
    Filed: June 16, 2022
    Publication date: January 25, 2024
    Inventors: Byeong Gil LYU, Mi Kyung KIM, Eun Kyo KIM, Hye Bin KIM
  • Patent number: 11877508
    Abstract: Provided are a fluorinated compound for patterning a metal or an electrode (cathode), an organic electronic element using the same, and an electronic device thereof, wherein a fine pattern of the electrode is formed by using the fluorinated compound as a material for patterning a metal or an electrode (cathode), without using a shadow mask, and it is possible to more easily apply UDC since it is easy to manufacture a transparent display having high light transmittance.
    Type: Grant
    Filed: February 15, 2023
    Date of Patent: January 16, 2024
    Assignees: DUK SAN NEOLUX CO., LTD., SAMSUNG DISPLAY CO., LTD.
    Inventors: Ki Won Kim, Kyung Hwan Oh, Bu Yong Yun, Hyung Dong Lee, Jin Woo Shin, Soung Yun Mun, Jae Duk Yoo, Jung Geun Lee, Joon Gu Lee, Yeon Hwa Lee, Mi Kyung Kim, Ji Hyun Seo, Kwan Hee Lee
  • Patent number: 11859049
    Abstract: The present disclosure relates to a method for preparing a polyalkylene carbonate. More specifically, provided is a method for preparing a polyalkylene carbonate in which after polymerization of polyalkylene carbonate, a mixture from which unreacted carbon dioxide and residual catalyst have been removed is charged into a stripper to remove the unreacted epoxide compound, and then heat-exchanged before removing the solvent to increase the temperature of the mixture stream to the maximum level, which is subjected to a heating step, following by a solvent removal step, whereby the amount of steam required in the heating step is reduced, side reactions due to unreacted epoxide compounds are prevented, and steam energy can be reduced in the solvent removal step.
    Type: Grant
    Filed: July 7, 2020
    Date of Patent: January 2, 2024
    Assignee: LG Chem, Ltd.
    Inventors: Woosung Hwang, Dongmin Kim, Seung Young Park, Mi Kyung Kim, Joon Ho Shin, Wonseok Kim
  • Patent number: 11856841
    Abstract: Provided are a fluorinated compound for patterning a metal or an electrode (cathode), an organic electronic element using the same, and an electronic device thereof, wherein a fine pattern of the electrode is formed by using the fluorinated compound as a material for patterning a metal or an electrode (cathode), without using a shadow mask, and it is possible to more easily apply UDC since it is easy to manufacture a transparent display having high light transmittance.
    Type: Grant
    Filed: February 15, 2023
    Date of Patent: December 26, 2023
    Assignees: DUK SAN NEOLUX CO., LTD., SAMSUNG DISPLAY CO., LTD.
    Inventors: Ki Won Kim, Kyung Hwan Oh, Bu Yong Yun, Hyung Dong Lee, Jin Woo Shin, Soung Yun Mun, Jae Duk Yoo, Jung Geun Lee, Joon Gu Lee, Yeon Hwa Lee, Mi Kyung Kim, Ji Hyun Seo, Kwan Hee Lee
  • Publication number: 20230303753
    Abstract: The present invention relates to a method for preparing a polyolefin-polystyrene-based multiblock copolymer having a uniform structure and showing excellent physical properties through continuous type coordination polymerization and batch type anionic polymerization.
    Type: Application
    Filed: August 25, 2021
    Publication date: September 28, 2023
    Applicant: LG Chem, Ltd.
    Inventors: Yun Kon Kim, Seul Ki Im, Hyun Mo Lee, Ji Hyun Park, Dong Min Kim, Mi Kyung Kim, Ki Soo Lee, Eun Ji Shin, Seok Pil Sa, Seung Jung Yu
  • Publication number: 20230271914
    Abstract: The present application relates to a process for producing acrylic acid.
    Type: Application
    Filed: October 27, 2021
    Publication date: August 31, 2023
    Inventors: Hyebin KIM, Mi Kyung KIM, Eunkyo KIM, Joon Ho SHIN
  • Publication number: 20230200214
    Abstract: Provided are a fluorinated compound for patterning a metal or an electrode (cathode), an organic electronic element using the same, and an electronic device thereof, wherein a fine pattern of the electrode is formed by using the fluorinated compound as a material for patterning a metal or an electrode (cathode), without using a shadow mask, and it is possible to more easily apply UDC since it is easy to manufacture a transparent display having high light transmittance.
    Type: Application
    Filed: February 15, 2023
    Publication date: June 22, 2023
    Applicants: DUK SAN NEOLUX CO., LTD., SAMSUNG DISPLAY CO., LTD.
    Inventors: Ki Won KIM, Kyung Hwan OH, Bu Yong YUN, Hyung Dong LEE, Jin Woo SHIN, Soung Yun MUN, Jae Duk YOO, Jung Geun LEE, Joon Gu LEE, Yeon Hwa LEE, Mi Kyung KIM, Ji Hyun SEO, Kwan Hee LEE
  • Publication number: 20230189636
    Abstract: Provided are a fluorinated compound for patterning a metal or an electrode (cathode), an organic electronic element using the same, and an electronic device thereof, wherein a fine pattern of the electrode is formed by using the fluorinated compound as a material for patterning a metal or an electrode (cathode), without using a shadow mask, and it is possible to more easily apply UDC since it is easy to manufacture a transparent display having high light transmittance.
    Type: Application
    Filed: February 15, 2023
    Publication date: June 15, 2023
    Applicants: DUK SAN NEOLUX CO., LTD., SAMSUNG DISPLAY CO., LTD.
    Inventors: Ki Won KIM, Kyung Hwan OH, Bu Yong YUN, Hyung Dong LEE, Jin Woo SHIN, Soung Yun MUN, Jae Duk YOO, Jung Geun LEE, Joon Gu LEE, Yeon Hwa LEE, Mi Kyung KIM, Ji Hyun SEO, Kwan Hee LEE
  • Publication number: 20230174453
    Abstract: Provided is a process for producing acrylic acid, wherein the process comprises a first step and a second step in which a first absorbent is added to a reaction product of a bio-material and cooled to separate a first low-boiling-point material including acetaldehyde (ACHO) and a first high-boiling-point material including acrylic acid (AA). The process is capable of producing high-purity acrylic acid at high yield, and acetaldehyde is produced as by-product along with the reaction product of the bio-material. The process includes separating the acetaldehyde produced as by-product into a high-purity product at high yield.
    Type: Application
    Filed: October 27, 2021
    Publication date: June 8, 2023
    Inventors: Hyebin KIM, Mi Kyung KIM, Eunkyo KIM, Joon Ho SHIN
  • Publication number: 20230174451
    Abstract: Provided is a process for producing acrylic acid, comprising (step 1) separating a first low-boiling-point material including acetaldehyde (ACHO) and a first high-boiling-point material including acrylic acid (AA) by adding a first absorbent to a reaction product of a bio-raw material and cooling the result; (step 2) separating a first incompressible material and a second low-boiling-point material including acetaldehyde (ACHO) by adding a second absorbent to the first low-boiling-point material including acetaldehyde (ACHO) and cooling the result; (step 3) heating the second low-boiling-point material including acetaldehyde (ACHO); (step 4) separating the heated second low-boiling-point material including acetaldehyde (ACHO) to acetaldehyde (ACHO) and the second absorbent and (step 5) producing acrylic acid by purifying the first high-boiling-point material including acrylic acid (AA).
    Type: Application
    Filed: October 27, 2021
    Publication date: June 8, 2023
    Inventors: Hyebin KIM, Mi Kyung KIM, Eunkyo KIM, Joon Ho SHIN
  • Publication number: 20230167184
    Abstract: An embodiment relates to an anti-BCMA-binding protein and, more specifically, provides an isolated BCMA-binding protein comprising an antigen-binding domain that binds specifically to BCMA, wherein the antigen-binding domain comprises: i) heavy chain variable domain complementarity determining region 1 (VH-CDR1) comprising the amino acid sequence of SEQ ID NO: 1 or an amino acid sequence having at least 80% homology to SEQ ID NO: 1; ii) VH-CDR2 comprising the amino acid sequence of SEQ ID NO: 2 or an amino acid sequence having at least 80% homology to SEQ ID NO: 2; and iii) VH-CDR3 comprising the amino acid sequence of SEQ ID NO: 3 or an amino acid sequence having at least 80% homology to SEQ ID NO: 3.
    Type: Application
    Filed: March 15, 2021
    Publication date: June 1, 2023
    Inventors: Hyunbo SHIM, Hyung Cheol KIM, Mi Kyung KIM
  • Publication number: 20230167044
    Abstract: Provided is a process for producing acrylic acid, the process comprising: (step 1) preparing a first aqueous lactic acid solution by diluting a lactic acid raw material with water; (step 2) heat exchanging the first aqueous lactic acid solution to form a vaporized second lactic acid vapor and an unvaporized third aqueous lactic acid solution; (step 3) including the unvaporized third aqueous lactic acid solution in the aqueous solution of the step 1; and (step 4) supplying and absorbing an absorption liquid to the vaporized second lactic acid vapor to form an absorbed fourth aqueous lactic acid solution and an unabsorbed fifth lactic acid vapor, wherein the absorption liquid is water or an aqueous lactic acid solution.
    Type: Application
    Filed: October 27, 2021
    Publication date: June 1, 2023
    Inventors: Eunkyo KIM, Mi Kyung KIM, Joon Ho SHIN, Hyebin KIM