Patents by Inventor Min-Chung Cheng

Min-Chung Cheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220293608
    Abstract: The present disclosure provides a method of forming a semiconductor structure. The method comprises providing a substrate comprising an isolation region, an active region adjacent to the isolation region, and a first top surface, wherein the isolation region includes an isolation trench filled with a dielectric material, and the active region includes a gate trench filled with a gate electrode material; forming a hard mask on the substrate; and performing an etching process to partially remove portions of the dielectric material and gate electrode material exposed by the hard mask to form a second top surface of the dielectric material and a third top surface of the gate electrode material, wherein the second top surface and the third top surface are substantially at the same level and are substantially lower than the first top surface.
    Type: Application
    Filed: March 15, 2021
    Publication date: September 15, 2022
    Inventor: MIN-CHUNG CHENG
  • Publication number: 20220285359
    Abstract: A semiconductor device includes a substrate, an oxide layer and a word line. The substrate has a plurality of protruding portions. Adjacent two of the protruding portions define a dense zone, and another adjacent two of the protruding portions define a loose zone. The oxide layer is disposed on the substrate. The word line is disposed on the substrate. A bottom surface of a portion of the word line in the dense zone and a bottom surface of a portion of the word line in the loose zone are substantially at the same height.
    Type: Application
    Filed: March 2, 2021
    Publication date: September 8, 2022
    Inventors: Min-Chung CHENG, Chen-Tsung LIAO, Cheng-Wei CHIU
  • Publication number: 20220115381
    Abstract: The present disclosure provides a semiconductor structure having a fin structure and a method of manufacturing the semiconductor structure. The semiconductor includes a substrate defined with an active region. A first gate structure is disposed in the active region and includes a dielectric material. A second gate structure is disposed in the active region and includes the dielectric material. A fin structure having a first top surface is arranged to alternate with the first gate structure and the second gate structure. The first gate structure has a second top surface and the second gate structure has a third top surface. The second top surface and the third top surface are lower than the first top surface.
    Type: Application
    Filed: October 9, 2020
    Publication date: April 14, 2022
    Inventor: MIN-CHUNG CHENG
  • Publication number: 20180329431
    Abstract: A thermal image positioning system and a positioning method thereof are provided. The thermal image positioning method includes: configuring a plurality of thermal image generators in a space, where the thermal image generators respectively generate a plurality of thermal images; making a carrier to move according to the thermal images, providing a thermal image receiver to respectively receive the thermal images, and respectively generating a plurality of distance information according to the thermal images; and generating coordinate information of the space according to the distance information.
    Type: Application
    Filed: July 18, 2017
    Publication date: November 15, 2018
    Applicant: Chunghwa Picture Tubes, LTD.
    Inventors: Min-Chung Cheng, Chun-Wei Wang, Ru-Yi Hsieh
  • Patent number: 9832941
    Abstract: A hydroponic cultivation apparatus with detachable cultivation tray is provided in that each cultivation tray is magnetically mounted to an expansion socket of a main aqueduct so that a replaceable cultivation room may be independently provided. Each cultivation tray is equipped with a light source plate at the bottom. The light source plate is provided with power via a wireless receiver connected with a wireless transmitter at the socket. Multiple drain slots are aligning along a direction perpendicular to a horizontal level on each cultivation tray with some of them plugged with insulation pieces so that each cultivation tray may have the water level controlled independently.
    Type: Grant
    Filed: January 4, 2016
    Date of Patent: December 5, 2017
    Assignee: Chunghwa Picture Tubes, Ltd.
    Inventors: Min-Chung Cheng, Mu-Hua Lin
  • Patent number: 9685316
    Abstract: A semiconductor process includes the following steps. A wafer on a pedestal is provided. The pedestal is lifted to approach a heating source and an etching process is performed on the wafer. An annealing process is performed on the wafer by the heating source. In another way, a wafer on a pedestal, and a heating source on a same side of the wafer as the pedestal are provided. An etching process is performed on the wafer by setting the temperature difference between the heating source and the pedestal larger than 180° C.
    Type: Grant
    Filed: February 25, 2013
    Date of Patent: June 20, 2017
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Chia Chang Hsu, Kuo-Chih Lai, Chun-Ling Lin, Bor-Shyang Liao, Pin-Hong Chen, Shu Min Huang, Min-Chung Cheng, Chi-Mao Hsu
  • Publication number: 20170079223
    Abstract: A hydroponic cultivation apparatus with detachable cultivation tray is provided in that each cultivation tray is magnetically mounted to an expansion socket of a main aqueduct so that a replaceable cultivation room may be independently provided. Each cultivation tray is equipped with a light source plate at the bottom. The light source plate is provided with power via a wireless receiver connected with a wireless transmitter at the socket. Multiple drain slots are aligning along a direction perpendicular to a horizontal level on each cultivation tray with some of them plugged with insulation pieces so that each cultivation tray may have the water level controlled independently.
    Type: Application
    Filed: January 4, 2016
    Publication date: March 23, 2017
    Inventors: Min-Chung Cheng, Mu-Hua Lin
  • Patent number: 9318338
    Abstract: A method for fabricating a semiconductor device is provided. The method includes the following steps. Firstly, a substrate having a nitride layer and a platinum (Pt)-containing nickel (Ni)-semiconductor compound layer is provided. Then the nitride layer and the Pt are removed in situ with a chemical solution including a sulfuric acid component and a phosphoric acid component.
    Type: Grant
    Filed: August 19, 2013
    Date of Patent: April 19, 2016
    Assignee: UNITED MICROELECTRONICS CORPORATION
    Inventors: Bor-Shyang Liao, Tsung-Hsun Tsai, Kuo-Chih Lai, Pin-Hong Chen, Chia-Chang Hsu, Shu-Min Huang, Min-Chung Cheng, Chun-Ling Lin
  • Patent number: 9265205
    Abstract: A multifunctional planting system includes a supporter and a spraying device. The supporter includes a base and a plurality of lateral walls. The lateral walls are bent from the base to form a sunken structure for storing nutrient solution. The spraying device is disposed on the supporter. The spraying device includes an accommodating structure, a buckling component and a piezoelectric component. The nutrient solution is accommodated inside the accommodating structure. The buckling component passes through the accommodating structure. The piezoelectric component is disposed on a hollow portion of the buckling component. A plurality of tiny apertures are formed on the piezoelectric component. The piezoelectric component receives an electronic signal to generate oscillation. The oscillation transforms the liquid nutrient solution inside the accommodating structure into the gaseous nutrient solution.
    Type: Grant
    Filed: December 24, 2013
    Date of Patent: February 23, 2016
    Assignee: Chunghwa Picture Tubes, Ltd.
    Inventors: Min-Chung Cheng, Min-Lun Wu, Tso-Hsuan Yeh, Che-Wei Chang
  • Patent number: 9125351
    Abstract: A plant cultivation device includes: a planting container having an accommodation space; a planting pan disposed in the accommodation space of the planting container for dividing the accommodation space into a leaf region and a root region; an atomizing sheet disposed in a bottom plate of the planting container, used for performing spraying to the root region of the planting container; and a control circuit board, electrically connected to the atomizing sheet, used for controlling whether the atomizing sheet performs spraying, a nutrient solution tank, used for accommodating a nutrient solution; and a water absorbing material, wherein an end of the water absorbing material is disposed in the nutrient solution tank for taking the nutrient solution of the nutrient solution tank, and the other end of the water absorbing material is in contact with the atomizing sheet.
    Type: Grant
    Filed: December 23, 2013
    Date of Patent: September 8, 2015
    Assignee: CHUNGHWA PICTURE TUBES, LTD.
    Inventors: Min-Lun Wu, Min-Chung Cheng, Guan-Liang Lee, Che-Wei Chang, Wen-Li Tsai
  • Publication number: 20150128495
    Abstract: A multifunctional planting system includes a supporter and a spraying device. The supporter includes a base and a plurality of lateral walls. The lateral walls are bent from the base to form a sunken structure for storing nutrient solution. The spraying device is disposed on the supporter. The spraying device includes an accommodating structure, a buckling component and a piezoelectric component. The nutrient solution is accommodated inside the accommodating structure. The buckling component passes through the accommodating structure. The piezoelectric component is disposed on a hollow portion of the buckling component. A plurality of tiny apertures are formed on the piezoelectric component. The piezoelectric component receives an electronic signal to generate oscillation. The oscillation transforms the liquid nutrient solution inside the accommodating structure into the gaseous nutrient solution.
    Type: Application
    Filed: December 24, 2013
    Publication date: May 14, 2015
    Applicant: Chunghwa Picture Tubes, Ltd.
    Inventors: Min-Chung Cheng, Min-Lun Wu, Tso-Hsuan Yeh, Che-Wei Chang
  • Patent number: 8993390
    Abstract: A manufacturing method of a semiconductor device comprises the following steps. First, a substrate is provided, at least one fin structure is formed on the substrate, and a metal layer is then deposited on the fin structure to form a salicide layer. After depositing the metal layer, the metal layer is removed but no RTP is performed before the metal layer is removed. Then a RTP is performed after the metal layer is removed.
    Type: Grant
    Filed: May 15, 2014
    Date of Patent: March 31, 2015
    Assignee: United Microelectronics Corp.
    Inventors: Kuo-Chih Lai, Chia Chang Hsu, Nien-Ting Ho, Bor-Shyang Liao, Shu Min Huang, Min-Chung Cheng, Yu-Ru Yang
  • Publication number: 20150082699
    Abstract: A plant cultivation device includes: a planting container having an accommodation space; a planting pan disposed in the accommodation space of the planting container for dividing the accommodation space into a leaf region and a root region; an atomizing sheet disposed in a bottom plate of the planting container, used for performing spraying to the root region of the planting container; and a control circuit board, electrically connected to the atomizing sheet, used for controlling whether the atomizing sheet performs spraying, a nutrient solution tank, used for accommodating a nutrient solution; and a water absorbing material, wherein an end of the water absorbing material is disposed in the nutrient solution tank for taking the nutrient solution of the nutrient solution tank, and the other end of the water absorbing material is in contact with the atomizing sheet.
    Type: Application
    Filed: December 23, 2013
    Publication date: March 26, 2015
    Applicant: CHUNGHWA PICTURE TUBES, LTD.
    Inventors: MIN-LUN WU, MIN-CHUNG CHENG, GUAN-LIANG LEE, CHE-WEI CHANG, WEN-LI TSAI
  • Publication number: 20150050799
    Abstract: A method for fabricating a semiconductor device is provided. The method includes the following steps. Firstly, a substrate having a nitride layer and a platinum (PO-containing nickel (Ni)-semiconductor compound layer is provided. Then the nitride layer and the Pt are removed in situ with a chemical solution including a sulfuric acid component and a phosphoric acid component.
    Type: Application
    Filed: August 19, 2013
    Publication date: February 19, 2015
    Applicant: UNITED MICROELECTRONICS CORPORATION
    Inventors: Bor-Shyang Liao, Tsung-Hsun Tsai, Kuo-Chih Lai, Pin-Hong Chen, Chia-Chang Hsu, Shu-Min Huang, Min-Chung Cheng, Chun-Ling Lin
  • Patent number: 8845149
    Abstract: A plant illumination apparatus including a driving unit having a central axis, a first slide base, a second slide base, a light source, and a retractable arm having a retraction-control terminal and light-disposing terminal is provided. The first and second slide bases are disposed on the driving unit. The drive unit simultaneously drives the first and second slide bases to move along the central axis in opposite directions. The retraction-control terminal has a first end and a second end respectively connected to the first and second slide bases and moving therewith. When the first and second ends approach each other, the retractable arm extends so the light-disposing terminal moves away from the retraction-control terminal. When the first and second ends leave each other, the retractable arm retracts so the light-disposing terminal moves toward the retraction-control terminal. The light source is disposed on the light-disposing terminal to illuminate a plant.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: September 30, 2014
    Assignee: Chunghwa Picture Tubes, Ltd.
    Inventors: Min-Chung Cheng, Min-Lun Wu, Che-Wei Chang
  • Publication number: 20140248762
    Abstract: A manufacturing method of a semiconductor device comprises the following steps. First, a substrate is provided, at least one fin structure is formed on the substrate, and a metal layer is then deposited on the fin structure to form a salicide layer. After depositing the metal layer, the metal layer is removed but no RTP is performed before the metal layer is removed. Then a RTP is performed after the metal layer is removed.
    Type: Application
    Filed: May 15, 2014
    Publication date: September 4, 2014
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Kuo-Chih Lai, Chia Chang Hsu, Nien-Ting Ho, Bor-Shyang Liao, Shu Min Huang, Min-Chung Cheng, Yu-Ru Yang
  • Publication number: 20140242802
    Abstract: A semiconductor process includes the following steps. A wafer on a pedestal is provided. The pedestal is lifted to approach a heating source and an etching process is performed on the wafer. An annealing process is performed on the wafer by the heating source. In another way, a wafer on a pedestal, and a heating source on a same side of the wafer as the pedestal are provided. An etching process is performed on the wafer by setting the temperature difference between the heating source and the pedestal larger than 180° C.
    Type: Application
    Filed: February 25, 2013
    Publication date: August 28, 2014
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Chia Chang Hsu, Kuo-Chih Lai, Chun-Ling Lin, Bor-Shyang Liao, Pin-Hong Chen, Shu Min Huang, Min-Chung Cheng, Chi-Mao Hsu
  • Patent number: 8815738
    Abstract: A salicide process is described. A substrate having thereon an insulating layer and a silicon-based region is provided. A nickel-containing metal layer is formed on the substrate. A first anneal process is performed to form a nickel-rich silicide layer on the silicon-based region. The remaining nickel-containing metal layer is stripped. A thermal recovery process is performed at a temperature of 150-250° C. for a period longer than 5 minutes. A second anneal process is performed to change the phase of the nickel-rich silicide layer and form a low-resistivity mononickel silicide layer.
    Type: Grant
    Filed: July 10, 2012
    Date of Patent: August 26, 2014
    Assignee: United Microelectronics Corp.
    Inventors: Chia-Chang Hsu, Bor-Shyang Liao, Kuo-Chih Lai, Nien-Ting Ho, Chi-Mao Hsu, Shu-Min Huang, Min-Chung Cheng
  • Publication number: 20140215920
    Abstract: A hydroponic apparatus and a collecting device are provided. The collecting device includes at least two hollow containers, a connection part and two handles. Each of the hollow containers has an interior adapted to be stuffed with a porous adsorption material. The connection part is adapted to physically connecting one of the hollow containers to next one of the hollow containers in order. The two handles are disposed on the outermost two of the hollow containers.
    Type: Application
    Filed: June 11, 2013
    Publication date: August 7, 2014
    Inventors: Chou-Chiang KUO, Min-Chung CHENG, Che-Wei CHANG
  • Publication number: 20140204567
    Abstract: A plant illumination apparatus including a driving unit having a central axis, a first slide base, a second slide base, a light source, and a retractable arm having a retraction-control terminal and light-disposing terminal is provided. The first and second slide bases are disposed on the driving unit. The drive unit simultaneously drives the first and second slide bases to move along the central axis in opposite directions. The retraction-control terminal has a first end and a second end respectively connected to the first and second slide bases and moving therewith. When the first and second ends approach each other, the retractable arm extends so the light-disposing terminal moves away from the retraction-control terminal. When the first and second ends leave each other, the retractable arm retracts so the light-disposing terminal moves toward the retraction-control terminal. The light source is disposed on the light-disposing terminal to illuminate a plant.
    Type: Application
    Filed: March 15, 2013
    Publication date: July 24, 2014
    Applicant: CHUNGHWA PICTURE TUBES, LTD.
    Inventors: Min-Chung Cheng, Min-Lun Wu, Che-Wei Chang