Patents by Inventor Min-Hsuan Tsai

Min-Hsuan Tsai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100155895
    Abstract: A power semiconductor device includes a P type silicon substrate; a deep N well in the P type silicon substrate; a P grade region in the deep N well; a P+ drain region in the P grade region; a first STI region in the P grade region; a second STI region in the P grade region, wherein the first and second STI region isolate the P+ drain region; a third STI region in the deep N well; a gate electrode overlying an area between the second and third STI regions and covering a portion of the second STI region; a gate dielectric layer between the gate electrode and the P type silicon substrate; a P well formed at one side of the third STI region; and a P+ source region in the P well.
    Type: Application
    Filed: December 19, 2008
    Publication date: June 24, 2010
    Inventor: Min-Hsuan Tsai
  • Patent number: 7728388
    Abstract: A power semiconductor device includes a P type silicon substrate; a deep N well in the P type silicon substrate; a P grade region in the deep N well; a P+ drain region in the P grade region; a first STI region in the P grade region; a second STI region in the P grade region, wherein the first and second STI region isolate the P+ drain region; a third STI region in the deep N well; a gate electrode overlying an area between the second and third STI regions and covering a portion of the second STI region; a gate dielectric layer between the gate electrode and the P type silicon substrate; a P well formed at one side of the third STI region; and a P+ source region in the P well.
    Type: Grant
    Filed: December 19, 2008
    Date of Patent: June 1, 2010
    Assignee: United Microelectronics Corp.
    Inventor: Min-Hsuan Tsai
  • Publication number: 20090277792
    Abstract: The present invention discloses a method for concentrating charged particles and an apparatus thereof. The method comprises: providing a substrate comprising a reservoir; disposing a conducting granule in the reservoir, the conducting granule being negatively charged or positively charged and comprising nano-pores or nano-channels capable of permitting ion permeation; disposing a buffer solution in the reservoir, the buffer solution comprising counter-ions having an opposite electric property to the conducting granule; adding the charged particles into the buffer solution, the charged particles being co-ions having an identical electric property as the conducting granule; and applying an external electric field on the conducting granule.
    Type: Application
    Filed: March 30, 2009
    Publication date: November 12, 2009
    Applicant: NATIONAL CHUNG CHENG UNIVERSITY
    Inventors: Shau-Chun Wang, Hsueh-Chia Chang, Hsiao-Ping Chen, Hsien-Hung Wei, Chun-Ching Yu, Min-Hsuan Tsai