Abstract: An organic compound adsorbent and a gas blowing apparatus comprising same, wherein the organic compound adsorbent has a BET specific surface area of 500 m2/g or more, and the relationship between an average diameter of unit pore inlets and an average diameter inside unit pores of the metal organic framework satisfies Equation 1: 0.4 ? x ? ( nm ) / y ? ( nm ) ? 1. [ Equation ? 1 ] wherein: x is an average diameter of a unit pore inlet of the metal organic framework; and y is an average diameter inside a unit pore of the metal organic framework, and thus even in a dynamic gas flow having a flow rate of 1 cm/sec or more, the adsorption amount and the adsorption rate of volatile organic compounds can be improved, and therefore volatile organic compounds can be efficiently adsorbed in environments having a gas flow, such as an air purifier and an air conditioner.

Abstract: Disclosed are a pressure sensor for sensing pressure in a vertical direction, a strain sensor for sensing tension in a horizontal direction, and a method for manufacturing the sensors. The disclosed pressure sensor includes a plurality of pressure sensor units stacked in multiple layers, and at least one of a pressure elastic modulus and an amount of conductive particles per unit area of each of the plurality of pressure sensor units is different from each other.

Abstract: A pressure sensor having unevenness and a manufacturing method therefor are disclosed. The disclosed pressure sensor senses pressure in a vertical direction and includes a first pressure sensor unit and a second pressure sensor unit, wherein the first pressure sensor unit and the second pressure sensor unit are stacked, and unevenness is formed on the upper surface of the first pressure sensor unit and on the lower surface of the second pressure sensor unit.

Abstract: A blankmask includes a hard film and a light-shielding film formed on a transparent substrate. The hard film is made of a silicon compound that contains at least one of oxygen, nitrogen and carbon in addition to silicon. There are provided a blankmask and a photomask improved in resolution, desired critical dimension (CD), and process window margin. Thus, it is possible to manufacture a blankmask and a photomask of good quality when a pattern of 32 nm or below, in particular, 14 nm or below is formed.

Abstract: An electronic device according to various examples of the present invention comprises: a display; a touch sensor for sensing a touch on at least one point of the display device; and a processor, wherein the processor can be configured to: display an always on display picture on a first region of the display; control the remaining region of the display, except for the first region, in an off-state; control the entire region of the display, in the on-state, when the touch on the first region is sensed; and display, on at least a partial region of the display, the picture related to an object corresponding to the location of the touch.

Abstract: A 4D printing device is disclosed. The disclosed 4D printing device comprises: a first nozzle for outputting a first material on the basis of a 3D printing type A; and a second nozzle for outputting a second material on the basis of a 3D printing type B.

Abstract: A blankmask according to the present disclosure includes a light-shielding film provided on a transparent substrate; and a hard mask film provided on the light-shielding film and comprising molybdenum chromium (MoCr). Thus, the hard mask film has not only an enhanced etching speed but also sufficient etching resistance to fluorine (F)-based dry etching, so that an etching load against a resist film can be decreased and a hard mask film pattern and a light-shielding film pattern can be improved in a line edge roughness (LER), thereby forming a photomask for high-precision pattern printing.

Abstract: A blankmask includes a transparent substrate, a phase-shift film, and a light-shielding film. The phase-shift film for example has a transmissivity of 30˜100%, and in this case the light-shielding film has a thickness of 40˜70 nm and a composition ratio of 30˜80 at % chromium, 10˜50 at % nitrogen, 0˜35% oxygen, and 0˜25% carbon. A structure where the light-shielding film and the phase-shift film are stacked has an optical density of 2.5˜3.5. Thus, CD deviation is minimized when the light-shielding film is etched in a manufacturing process for a photomask.

Abstract: An electronic device according to various examples of the present invention comprises: a display; a touch sensor for sensing a touch on at least one point of the display device; and a processor, wherein the processor can be configured to: display an always on display picture on a first region of the display; control the remaining region of the display, except for the first region, in an off-state; control the entire region of the display, in the on-state, when the touch on the first region is sensed; and display, on at least a partial region of the display, the picture related to an object corresponding to the location of the touch.

Abstract: Disclosed are a pressure sensor for sensing pressure in a vertical direction, a strain sensor for sensing tension in a horizontal direction, and a method for manufacturing the sensors. The disclosed pressure sensor includes a plurality of pressure sensor units stacked in multiple layers, and at least one of a pressure elastic modulus and an amount of conductive particles per unit area of each of the plurality of pressure sensor units is different from each other.

Abstract: A pressure sensor having unevenness and a manufacturing method therefor are disclosed. The disclosed pressure sensor senses pressure in a vertical direction and includes a first pressure sensor unit and a second pressure sensor unit, wherein the first pressure sensor unit and the second pressure sensor unit are stacked, and unevenness is formed on the upper surface of the first pressure sensor unit and on the lower surface of the second pressure sensor unit.

Abstract: A clothing-type wearable device for measuring muscle activation and a manufacturing method therefor are disclosed. The disclosed manufacturing method for the clothing-type wearable device comprises the steps of: (a) forming a clothing pattern on a fabric part; (b) attaching at least one strain sensor generated by means of a conductive solution to at least one location inside the clothing pattern; and (c) sewing the fabric to which the at least one strain sensor has been attached.

Abstract: A blankmask according to the present disclosure includes a light-shielding film provided on a transparent substrate; and a hard mask film provided on the light-shielding film and comprising molybdenum chromium (MoCr). Thus, the hard mask film has not only an enhanced etching speed but also sufficient etching resistance to fluorine (F)-based dry etching, so that an etching load against a resist film can be decreased and a hard mask film pattern and a light-shielding film pattern can be improved in a line edge roughness (LER), thereby forming a photomask for high-precision pattern printing.

Abstract: A continuous electric/electronic device and a method of manufacturing the same are disclosed. The method of manufacturing a continuous electric/electronic device having a serial connection structure comprises (a) disposing a first electrode current collection unit, (b) disposing first organic?inorganic material in regard to the first electrode current collection unit, (c) laminating a first area of a second electrode current collection unit on the disposed first organic?inorganic material, (d) disposing second organic?inorganic material in regard to a second area of the second electrode current collection unit and (e) laminating a third electrode current collection unit on the disposed second organic?inorganic material. Here, the first area and the second area of the second electrode current collection unit operate as current collection units having different polarity in regard to adjoining first organic?inorganic material and second organic?inorganic material.

Abstract: A touch control system for a vehicle may include a detector portion disposed on a head lining of a vehicle, and a communication module configured to receive a signal from the detector portion and transmit the signal to a device to be controlled by the signal.

Abstract: Disclosed are a blankmask and a photomask, in which compositions of metal and light elements of a light-shielding film are controlled so that the light-shielding film can guarantee a light-shielding efficiency, increase an etching speed, become thinner, and have a minimum sheet-resistance. To this end, the blankmask according to the present invention includes at least a light-shielding film on a transparent substrate, and the light-shielding film includes a first light-shielding layer adjacent to the transparent substrate and a second light-shielding layer formed on the first light-shielding layer, in which the first and the second light-shielding film contains chrome (Cr) and molybdenum (Mo).

Abstract: Disclosed is a phase-shift blankmask for manufacturing a photomask, which can achieve a fine pattern of not greater than 32 nm, preferably not greater than 14 nm, and more preferably not greater than 10 nm. To this end, a phase-shift film, a light-shielding film, an etch-stopping film and a hard film are provided on a transparent substrate, in which the light-shielding film has a multi-layered structure of two or more layers different in composition, one of which essentially contains oxygen (O), a light-shielding layer essentially having oxygen (O) occupies 50%˜100% of the whole thickness of the light-shielding film, and the phase-shift film has a transmissivity of 10%˜50%.

Abstract: Disclosed is a phase-shift blankmask, in which a light-shielding film includes a metal compound and having a structure of a multi-layer film or a continuous film, which includes a first light-shielding layer and a second light-shielding layer. The second light-shielding layer has higher optical density at an exposure wavelength per unit thickness (?) than the first light-shielding layer. The first light-shielding layer occupies 70% to 90% of the whole thickness of the light-shielding film. With this, the blankmask secures a light-shielding effect, has an improved etching speed, and makes a resist film thinner, thereby achieving a fine pattern.

Abstract: A continuous electric/electronic device and a method of manufacturing the same are disclosed. The method of manufacturing a continuous electric/electronic device having a serial connection structure comprises (a) disposing a first electrode current collection unit, (b) disposing first organic•inorganic material in regard to the first electrode current collection unit, (c) laminating a first area of a second electrode current collection unit on the disposed first organic•inorganic material, (d) disposing second organic•inorganic material in regard to a second area of the second electrode current collection unit and (e) laminating a third electrode current collection unit on the disposed second organic•inorganic material. Here, the first area and the second area of the second electrode current collection unit operate as current collection units having different polarity in regard to adjoining first organic•inorganic material and second organic•inorganic material.

Abstract: Disclosed are a blankmask and a photomask, in which compositions of metal and light elements of a light-shielding film are controlled so that the light-shielding film can guarantee a light-shielding efficiency, increase an etching speed, become thinner, and have a minimum sheet-resistance. To this end, the blankmask according to the present invention includes at least a light-shielding film on a transparent substrate, and the light-shielding film includes a first light-shielding layer adjacent to the transparent substrate and a second light-shielding layer formed on the first light-shielding layer, in which the first and the second light-shielding film contains chrome (Cr) and molybdenum (Mo).