Abstract: Disclosed is a transition metal compound that exhibits high activity and high comonomer incorporation in olefin polymerization and can be used for preparing a polyolefin having a BOCD structure, a method for preparing the same, and a catalyst composition including the same.

Abstract: An end cap holder may include a base block and a holding block. The base block may be configured to provide an end cap, which may be at a nozzle of the gas cylinder, with a torque for combining/separating the end cap with/from the nozzle. An angle correction groove may be formed at a first surface of the base block oriented toward the end cap. The holding block may be rotatably receivable in the angle correction groove to hold the end cap. The holding block may selectively make point contact with the base block to transmit the torque of the base block to the end cap. Thus, the holding block may accurately hold the end cap tilted to a vertical axis or a horizontal axis.

Abstract: Disclosed is a novel transition metal compound that exhibits excellent catalytic activity in polyethylene polymerization and is useful for preparing polyethylene having a high intramolecular short-chain branch content without deteriorating physical properties such as molecular weight, melting point, and density; a catalyst composition comprising the same; and a method for preparing polyethylene using the same.

Abstract: A method of forming a semiconductor device includes pretreating a semiconductor substrate including at least one buried power rail for power transmission, based on chemical reaction by supplying a pretreatment gas for surface treatment onto a backside of the semiconductor substrate, forming at least one metal catalyst layer on the backside of the semiconductor substrate so as to be at least partially aligned with the at least one buried power rail, and forming at least one backside via hole by supplying an etchant to the semiconductor substrate to anisotropically etch the semiconductor substrate between the at least one metal catalyst layer and the at least one buried power rail while the at least one metal catalyst layer is descending into the semiconductor substrate by using metal assisted chemical etching (MACE).

Abstract: The disclosure relates to a fifth generation (5G) or sixth generation (6G) communication system for supporting a higher data transmission rate. An encoding apparatus may obtain state-indicator information indicating a state of each of bits included in the polar code based on an index set of the bits, identify a weak-bit or a second weak-bit corresponding to a parity bit candidate position preset according to an interconnection within a parity-check (PC)-chain of the polar code and between PC-chains of the polar code as a parity bit, based on a number of weak-bits determined according to the state-indicator information and a number of bits to be used as parity bits, and obtain a polar code including the identified parity bit.

Abstract: A semiconductor photoresist composition and a method of forming patterns utilizing the semiconductor photoresist composition are disclosed. The semiconductor photoresist composition may include a first organometallic compound represented by Chemical Formula 1, a second organometallic compound represented by Chemical Formula 2, and a solvent, where the first organometallic compound is different from the second organometallic compound, at least one selected from among R1 and L1 may include a tertiary carbon, and at least one selected from among R2 and L2 may include at least one selected from among a primary carbon and a secondary carbon.

Abstract: A semiconductor device may include a bit line structure, a first spacer, and a second spacer on a substrate. The bit line structure may include a conductive structure and an insulation structure stacked in a vertical direction substantially perpendicular to an upper surface of the substrate. The first spacer and the second spacer may be stacked in a horizontal direction on a sidewall of the bit line structure. The horizontal direction may be substantially parallel to the upper surface of the substrate. The conductive structure may include a nitrogen-containing conductive portion at a lateral portion thereof. The first spacer may contact the nitrogen-containing conductive portion.

Abstract: A semiconductor photoresist composition includes a first organometallic compound, a second organometallic compound, and a solvent. A method of forming patterns utilizing the same is provided.

Abstract: The present invention relates to a novel compound having inhibitory activity against O-GlcNAcase and a use thereof.

Abstract: A position sensor includes a substrate having a first surface and a second surface opposite to the first surface; an initial shaft passing through the first and the second surfaces of the substrate in a direction perpendicular to the substrate; a first initial gear mounted to the initial shaft and positioned above the first surface of the substrate; a second initial gear mounted to the initial shaft and position below the second surface of the substrate; a first sub-shaft positioned above the first surface of the substrate, and disposed perpendicular to the substrate and parallel to the initial shaft; a first sub-gear mounted to the first sub-shaft and positioned above the first surface of the substrate and rotatably engaged with the first initial gear; a first sub-rotor mounted to the first sub-shaft and positioned above the first surface of the substrate; a first sensing coil disposed on a first surface of the substrate; a second sub-shaft separated from the first sub-shaft, positioned below the second surf

Abstract: A position sensor includes a substrate having a first surface and a second surface opposite to the first surface; an initial shaft passing through the first and the second surfaces of the substrate in a direction perpendicular to the substrate; an initial gear mounted to the initial shaft and positioned above the first surface of the substrate; a first sub-shaft positioned above the first surface of the substrate, and disposed perpendicular to the substrate and parallel to the initial shaft; a first sub-gear mounted to the first sub-shaft and positioned above the first surface of the substrate and rotatably engaged with the initial gear; a first sub-rotor mounted to the first sub-shaft and positioned above the first surface of the substrate; a first sensing coil disposed on the first surface of the substrate; a second sub-shaft positioned above the first surface of the substrate, and disposed perpendicular to the substrate and parallel to the initial shaft and the first sub-shaft; a second sub-gear mounted to

Abstract: A position sensor includes a substrate; a first initial shaft positioned in a first side space defined by a first surface of the substrate; a first initial gear and a first initial rotor mounted to the first initial shaft in the first side space; a sub-shaft passing through the substrate; a first sub-gear mounted to the sub-shaft in the first side space, and engaged with the first initial gear; a second sub-gear mounted to the sub-shaft in a second side space defined by a second surface of the substrate; a second initial shaft positioned in the second side space; a second initial gear and a second initial rotor mounted to the second initial shaft in the second side space, the second initial gear engaged with the second sub-gear; and first and second sensing coils disposed on the first and second surfaces of the substrate, respectively.

Abstract: Disclosed herein is a sensor assembly capable of detecting moisture introduced into a rack housing. The sensor assembly includes a housing, an angle sensor provided in the housing, and a moisture sensor provided in the housing. The moisture sensor includes a ground electrode, a first input electrode, a second input electrode, and a control unit electrically connected to the ground electrode, the first input electrode, and the second input electrode to detect moisture. The ground electrode, the first input electrode, and the second input electrode extend downward from the housing. A lower end of the ground electrode, a lower end of the first input electrode, and a lower end of the second input electrode are exposed to the outside of the housing. Further, the first input electrode extends downward to a different level compared to the second input electrode.

Abstract: A semiconductor photoresist composition including an organometallic compound represented by Chemical Formula 1 and a solvent and a method of forming patterns using the same are disclosed.

Abstract: An electronic apparatus according to various embodiments disclosed in the disclosure may comprise: a first housing rotatable about a first axis; a projector module coupled to a portion of the first housing and rotatable about a second axis perpendicular to the first axis; a vision sensor module rotatable about the first axis; a second housing; a first driving device disposed inside the first housing and capable of transmitting power to each of the projector module and the first housing; and a second driving device disposed inside the second housing and capable of transmitting power to the vision sensor module. According to the various embodiments, the projector module can rotate independently of the first housing in the direction of the second axis, and the vision sensor module can rotate independently of the first housing in the direction of the first axis.

Abstract: Provided is a genome editing composition for prime editing including a prime editor protein and a prime editing guide RNA, for editing a Z-type mutation of alpha-1 antitrypsin deficiency. The composition according to an aspect includes both a pegRNA sequence capable of effectively editing the SERPINA1 gene and prime editor 2 (PE 2), and thus, may effectively deliver the prime editor to a cell, and act specifically for a target sequence of the SERPINA1 gene, enabling genome editing with high accuracy, and therefore, may be useful as a SERPINA1 gene editing platform. In addition, the composition is capable of correcting the Z-type mutation of the SERPINA1 gene, and may be used for treatment or prevention of alpha-1 antitrypsin deficiency.

Abstract: A method of forming patterns includes coating a metal-containing resist composition on a substrate, sequentially coating two types of compositions for removing edge beads along an edge of the substrate, performing a heat-treatment including drying and heating to form a metal-containing resist film on the substrate, and exposing and developing the metal-containing resist film to form a resist pattern; or coating a metal-containing resist composition on a substrate, coating a composition for removing edge beads along an edge of the substrate, performing a heat-treatment including drying and heating to form a metal-containing resist film on the substrate, exposing the metal-containing resist film, and developing with a developing solution composition to form a resist pattern, wherein details of the two types of compositions for removing edge beads and the developing solution composition are as described in the specification.