Abstract: The present disclosure provides methods and apparatuses for biomaterial detection sensors. In some embodiments, a biomaterial detection sensor includes a membrane including a plurality of wells. Each of the plurality of wells is configured to encapsulate a biomaterial contained in a sample solution. A surface of the membrane is selectively modified into at least one of a hydrophilic surface and a hydrophobic surface. In some embodiments, a method of manufacturing a biomaterial detection sensor includes depositing a first membrane and a second membrane on respective surfaces of a wafer, forming a window by etching the first membrane and the first surface of the wafer, forming a plurality of wells on the second membrane, modifying a surface of the second membrane into at least one of a hydrophilic surface and a hydrophobic surface; and transferring a two-dimensional graphene oxide material onto a bottom of each of the plurality of wells.

Abstract: A method performed by a near-real time (RT) radio access network intelligent controller (RIC), may comprise: receiving, from an E2 node, an indication message including information on a slice associated with a cell; identifying a size of a resource allocated for the slice based on the information on the slice; and transmitting, to the E2 node, a control message including information on the size of the resource, wherein the information on the slice may comprise collection duration, a sum of data volume during the collection duration, and information on a terminal associated with the slice.

Abstract: A semiconductor photoresist composition includes an organotin compound represented by Chemical Formula 1 and a solvent. A method for forming patterns uses the semiconductor photoresist composition.

Abstract: A semiconductor photoresist composition including an organometallic compound, an additive represented by Chemical Formula 1, and a solvent, and a method of forming uses the semiconductor photoresist composition. Details of Chemical Formula 1 are as defined in the specification.

Abstract: A semiconductor photoresist composition and a method of forming patterns utilizing the semiconductor photoresist composition are disclosed. The semiconductor photoresist composition may include a first organometallic compound represented by Chemical Formula 1, a second organometallic compound represented by Chemical Formula 2, and a solvent, where the first organometallic compound is different from the second organometallic compound, at least one selected from among R1 and L1 may include a tertiary carbon, and at least one selected from among R2 and L2 may include at least one selected from among a primary carbon and a secondary carbon.

Abstract: A semiconductor device may include a bit line structure, a first spacer, and a second spacer on a substrate. The bit line structure may include a conductive structure and an insulation structure stacked in a vertical direction substantially perpendicular to an upper surface of the substrate. The first spacer and the second spacer may be stacked in a horizontal direction on a sidewall of the bit line structure. The horizontal direction may be substantially parallel to the upper surface of the substrate. The conductive structure may include a nitrogen-containing conductive portion at a lateral portion thereof. The first spacer may contact the nitrogen-containing conductive portion.

Abstract: A semiconductor photoresist composition includes a first organometallic compound, a second organometallic compound, and a solvent. A method of forming patterns utilizing the same is provided.

Abstract: The present invention relates to a novel compound having inhibitory activity against O-GlcNAcase and a use thereof.

Abstract: A position sensor includes a substrate having a first surface and a second surface opposite to the first surface; an initial shaft passing through the first and the second surfaces of the substrate in a direction perpendicular to the substrate; an initial gear mounted to the initial shaft and positioned above the first surface of the substrate; a first sub-shaft positioned above the first surface of the substrate, and disposed perpendicular to the substrate and parallel to the initial shaft; a first sub-gear mounted to the first sub-shaft and positioned above the first surface of the substrate and rotatably engaged with the initial gear; a first sub-rotor mounted to the first sub-shaft and positioned above the first surface of the substrate; a first sensing coil disposed on the first surface of the substrate; a second sub-shaft positioned above the first surface of the substrate, and disposed perpendicular to the substrate and parallel to the initial shaft and the first sub-shaft; a second sub-gear mounted to

Abstract: A position sensor includes a substrate; a first initial shaft positioned in a first side space defined by a first surface of the substrate; a first initial gear and a first initial rotor mounted to the first initial shaft in the first side space; a sub-shaft passing through the substrate; a first sub-gear mounted to the sub-shaft in the first side space, and engaged with the first initial gear; a second sub-gear mounted to the sub-shaft in a second side space defined by a second surface of the substrate; a second initial shaft positioned in the second side space; a second initial gear and a second initial rotor mounted to the second initial shaft in the second side space, the second initial gear engaged with the second sub-gear; and first and second sensing coils disposed on the first and second surfaces of the substrate, respectively.

Abstract: A position sensor includes a substrate having a first surface and a second surface opposite to the first surface; an initial shaft passing through the first and the second surfaces of the substrate in a direction perpendicular to the substrate; a first initial gear mounted to the initial shaft and positioned above the first surface of the substrate; a second initial gear mounted to the initial shaft and position below the second surface of the substrate; a first sub-shaft positioned above the first surface of the substrate, and disposed perpendicular to the substrate and parallel to the initial shaft; a first sub-gear mounted to the first sub-shaft and positioned above the first surface of the substrate and rotatably engaged with the first initial gear; a first sub-rotor mounted to the first sub-shaft and positioned above the first surface of the substrate; a first sensing coil disposed on a first surface of the substrate; a second sub-shaft separated from the first sub-shaft, positioned below the second surf

Abstract: Disclosed herein is a sensor assembly capable of detecting moisture introduced into a rack housing. The sensor assembly includes a housing, an angle sensor provided in the housing, and a moisture sensor provided in the housing. The moisture sensor includes a ground electrode, a first input electrode, a second input electrode, and a control unit electrically connected to the ground electrode, the first input electrode, and the second input electrode to detect moisture. The ground electrode, the first input electrode, and the second input electrode extend downward from the housing. A lower end of the ground electrode, a lower end of the first input electrode, and a lower end of the second input electrode are exposed to the outside of the housing. Further, the first input electrode extends downward to a different level compared to the second input electrode.

Abstract: A semiconductor photoresist composition including an organometallic compound represented by Chemical Formula 1 and a solvent and a method of forming patterns using the same are disclosed.

Abstract: An electronic apparatus according to various embodiments disclosed in the disclosure may comprise: a first housing rotatable about a first axis; a projector module coupled to a portion of the first housing and rotatable about a second axis perpendicular to the first axis; a vision sensor module rotatable about the first axis; a second housing; a first driving device disposed inside the first housing and capable of transmitting power to each of the projector module and the first housing; and a second driving device disposed inside the second housing and capable of transmitting power to the vision sensor module. According to the various embodiments, the projector module can rotate independently of the first housing in the direction of the second axis, and the vision sensor module can rotate independently of the first housing in the direction of the first axis.

Abstract: Provided is a genome editing composition for prime editing including a prime editor protein and a prime editing guide RNA, for editing a Z-type mutation of alpha-1 antitrypsin deficiency. The composition according to an aspect includes both a pegRNA sequence capable of effectively editing the SERPINA1 gene and prime editor 2 (PE 2), and thus, may effectively deliver the prime editor to a cell, and act specifically for a target sequence of the SERPINA1 gene, enabling genome editing with high accuracy, and therefore, may be useful as a SERPINA1 gene editing platform. In addition, the composition is capable of correcting the Z-type mutation of the SERPINA1 gene, and may be used for treatment or prevention of alpha-1 antitrypsin deficiency.

Abstract: A method of forming patterns includes coating a metal-containing resist composition on a substrate, sequentially coating two types of compositions for removing edge beads along an edge of the substrate, performing a heat-treatment including drying and heating to form a metal-containing resist film on the substrate, and exposing and developing the metal-containing resist film to form a resist pattern; or coating a metal-containing resist composition on a substrate, coating a composition for removing edge beads along an edge of the substrate, performing a heat-treatment including drying and heating to form a metal-containing resist film on the substrate, exposing the metal-containing resist film, and developing with a developing solution composition to form a resist pattern, wherein details of the two types of compositions for removing edge beads and the developing solution composition are as described in the specification.

Abstract: A manipulator and a method for controlling the manipulator are disclosed.

Abstract: An apparatus is for unsupervised domain adaptation for allowing a deep learning model with supervised learning on a source domain completed to be subjected to unsupervised domain adaptation to a target domain. The apparatus includes a first learning unit to perform a forward pass by inputting a pair (xsi, ysi) of first data xsi of the source domain and a label ysi for each of the first data and second data xTj belonging to the target domain, and insert a dropout following a Bernoulli distribution into the deep learning model in performing the forward pass, and a second learning unit to perform a back propagation to minimize uncertainty about the learning parameter of the deep learning model by using a predicted value for each class output through the forward pass and the label ysi, and an uncertainty vector for the second data xTj output through the forward pass as inputs.