Patents by Inventor Min Young Lim

Min Young Lim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11150555
    Abstract: A non-ionic photoacid generator and a chemically amplified positive-type photoresist composition for a thick film including the non-ionic photoacid generator. The non-ionic photoacid generator may not only exhibit high solubility in a solvent of the photoresist composition, but may also exhibit chemical and thermal stability and high sensitivity. In particular, the non-ionic photoacid generator is decomposed by light to generate an acid, and at the same time, can exhibit a corrosion preventing effect on a metal substrate.
    Type: Grant
    Filed: April 3, 2018
    Date of Patent: October 19, 2021
    Assignee: LG CHEM, LTD.
    Inventors: Min Young Lim, Tae Seob Lee, Ji Hye Kim
  • Patent number: 11042089
    Abstract: The present invention relates to a chemically amplified photoresist composition including an alkali-soluble resin and a polymeric photo-acid generator having a predetermined structure, a photoresist pattern produced from the chemically amplified photoresist composition, and a method for preparing the chemically amplified photoresist pattern.
    Type: Grant
    Filed: September 14, 2018
    Date of Patent: June 22, 2021
    Assignee: LG CHEM, LTD.
    Inventors: Min Young Lim, Ji Hye Kim, Yongmi Kim
  • Patent number: 11003077
    Abstract: The present invention relates to a positive photoresist composition including an acrylic resin including a repeat unit of a specific structure, and a photosensitive acid-generating compound, a photoresist pattern using the same, and a method for manufacturing a pattern.
    Type: Grant
    Filed: March 16, 2018
    Date of Patent: May 11, 2021
    Assignee: LG CHEM, LTD.
    Inventors: Min Young Lim, Tae Seob Lee, Ji Hye Kim
  • Patent number: 10990007
    Abstract: The present invention relates to a photoacid generator, and a chemically amplified photoresist composition for a thick film including the same, wherein the photoacid generator has excellent solubility and sensitivity, and also has an anti-corrosion effect, in addition to the effect as a photoacid generator. Thus, a chemically amplified photoresist composition for a thick film including the photoacid generator reduces scum and/or footing at the exposed part after development. The photoacid generator represented by the following Chemical Formula 1: In Chemical Formula 1, the definition of each substituents is the same as the detail description of the specification.
    Type: Grant
    Filed: August 24, 2018
    Date of Patent: April 27, 2021
    Assignee: LG CHEM, LTD.
    Inventors: Min Young Lim, Tae Seob Lee, Hyun Min Park
  • Publication number: 20210011379
    Abstract: The present invention provides a positive photoresist composition having excellent storage stability, sensitivity, developing properties, plating resistance, and heat resistance. More specifically, a specific dissolution inhibitor in the form of an oligomer having the same repeating unit structure as the resin contained in the photoresist composition is applied to said composition.
    Type: Application
    Filed: July 25, 2018
    Publication date: January 14, 2021
    Applicant: LG CHEM, LTD.
    Inventors: Min Young LIM, Tae Seob LEE, Ji Hye KIM
  • Publication number: 20200233302
    Abstract: The present invention relates to a chemically amplified photoresist composition including an alkali-soluble resin and a polymeric photo-acid generator having a predetermined structure, a photoresist pattern produced from the chemically amplified photoresist composition, and a method for preparing the chemically amplified photoresist pattern.
    Type: Application
    Filed: September 14, 2018
    Publication date: July 23, 2020
    Applicant: LG CHEM, LTD.
    Inventors: Min Young LIM, Ji Hye KIM, Yongmi KIM
  • Publication number: 20200209740
    Abstract: The present invention relates to a photoresist composition capable of realizing excellent pattern performance during formation of fine patterns, and of preparing a photoresist film that is excellent in chemical stability of a plating solution, and a photoresist film using the same.
    Type: Application
    Filed: November 5, 2018
    Publication date: July 2, 2020
    Applicant: LG CHEM, LTD.
    Inventors: Eun Seok PARK, Min Young LIM, Ji Hye KIM
  • Publication number: 20200033724
    Abstract: A non-ionic photoacid generator and a chemically amplified positive-type photoresist composition for a thick film including the non-ionic photoacid generator. The non-ionic photoacid generator may not only exhibit high solubility in a solvent of the photoresist composition, but may also exhibit chemical and thermal stability and high sensitivity. In particular, the non-ionic photoacid generator is decomposed by light to generate an acid, and at the same time, can exhibit a corrosion preventing effect on a metal substrate.
    Type: Application
    Filed: April 3, 2018
    Publication date: January 30, 2020
    Applicant: LG CHEM, LTD.
    Inventors: Min Young LIM, Tae Seob LEE, Ji Hye KIM
  • Publication number: 20200033727
    Abstract: A photoresist composition capable of forming a pattern in which a footing phenomenon is suppressed while being highly sensitive during formation of a fine pattern on a metal surface substrate, and capable of producing a photoresist film that is excellent in chemical stability, and a photoresist film using the photoresist composition.
    Type: Application
    Filed: November 22, 2018
    Publication date: January 30, 2020
    Applicant: LG CHEM, LTD.
    Inventors: Yongsik AHN, Yongmi KIM, Min Young LIM
  • Publication number: 20200033725
    Abstract: The present invention relates to a photoacid generator, and a chemically amplified photoresist composition for a thick film including the same, wherein the photoacid generator has excellent solubility and sensitivity, and also has an anti-corrosion effect, in addition to the effect as a photoacid generator. Thus, a chemically amplified photoresist composition for a thick film including the photoacid generator reduces scum and/or footing at the exposed part after development. The photoacid generator represented by the following Chemical Formula 1: In Chemical Formula 1, the definition of each substituents is the same as the detail description of the specification.
    Type: Application
    Filed: August 24, 2018
    Publication date: January 30, 2020
    Applicant: LG CHEM, LTD.
    Inventors: Min Young LIM, Tae Seob LEE, Hyun Min PARK
  • Publication number: 20190384176
    Abstract: A chemically amplified photoresist composition comprising a triazole-based plasticizer and an alkali developable resin, which is capable of minimizing cracking of a photoresist obtained from the composition and improving adhesion to a substrate and sensitivity, and a photoresist film comprising a cured product of the chemically amplified photoresists composition.
    Type: Application
    Filed: October 25, 2018
    Publication date: December 19, 2019
    Applicant: LG CHEM, LTD.
    Inventors: Min Young LIM, Yongmi KIM, Ji Hye KIM
  • Publication number: 20190146338
    Abstract: The present invention relates to a positive photoresist composition including an acrylic resin including a repeat unit of a specific structure, and a photosensitive acid-generating compound, a photoresist pattern using the same, and a method for manufacturing a pattern.
    Type: Application
    Filed: March 16, 2018
    Publication date: May 16, 2019
    Applicant: LG CHEM, LTD.
    Inventors: Min Young LIM, Tae Seob LEE, Ji Hye KIM
  • Patent number: 9790369
    Abstract: Provided is a complex material that includes a first metal deposition layer, a first thermosetting resin layer positioned on one side of the first metal deposition layer, and a second thermosetting resin layer positioned on the other side of the first metal deposition layer.
    Type: Grant
    Filed: May 2, 2013
    Date of Patent: October 17, 2017
    Assignee: Lotte Advanced Materials Co., Ltd.
    Inventors: Young-Sin Kim, Kang-Yeol Park, Young-Chul Kwon, Seon-Ae Lee, Min-Young Lim
  • Patent number: 9637630
    Abstract: A resin composition includes (A) a thermoplastic resin, (B) a first metal layer-resin composite particle including a first metal layer and first thermosetting resin coating layers positioned on the first metal layer and (C) a second metal layer-resin composite particle including a second metal layer and second thermosetting resin coating layers positioned on the second metal layer, and a molded article using the same.
    Type: Grant
    Filed: September 2, 2013
    Date of Patent: May 2, 2017
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Seon-Ae Lee, Young-Sin Kim, Min-Young Lim, Kang-Yeol Park
  • Patent number: 9353253
    Abstract: A low gloss thermoplastic resin composition can have improved scratch resistance, and includes a silicon compound-grafted aromatic vinyl-vinyl cyanide-based copolymer to improve mechanical physical properties such as scratch resistance, and the like, and to implement low gloss property. The low gloss composition can be used in a vehicle interior material.
    Type: Grant
    Filed: December 11, 2014
    Date of Patent: May 31, 2016
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Gyeong Ha Chae, Min Young Lim, Young Chul Kwon, Kang Yeol Park, Bo Eun Kim, Joo Hyun Jang, Jae Won Heo
  • Publication number: 20150376396
    Abstract: A resin composition includes (A) a thermoplastic resin, (B) a first metal layer-resin composite particle including a first metal layer and first thermosetting resin coating layers positioned on the first metal layer and (C) a second metal layer-resin composite particle including a second metal layer and second thermosetting resin coating layers positioned on the second metal layer, and a molded article using the same.
    Type: Application
    Filed: September 2, 2013
    Publication date: December 31, 2015
    Applicant: Cheil Industries Inc.
    Inventors: Seon-Ae LEE, Young-Sin KIM, Min-Young LIM, Kang-Yeol PARK
  • Publication number: 20150353736
    Abstract: Provided is a complex material that includes a first metal deposition layer, a first thermosetting resin layer positioned on one side of the first metal deposition layer, and a second thermosetting resin layer positioned on the other side of the first metal deposition layer.
    Type: Application
    Filed: May 2, 2013
    Publication date: December 10, 2015
    Applicant: Cheil Industries Inc.
    Inventors: Young-Sin KIM, Kang-Yeol PARK, Young-Chul KWON, Seon-Ae LEE, Min-Young LIM
  • Publication number: 20150183974
    Abstract: A low gloss thermoplastic resin composition can have improved scratch resistance, and includes a silicon compound-grafted aromatic vinyl-vinyl cyanide-based copolymer to improve mechanical physical properties such as scratch resistance, and the like, and to implement low glass property. The low gloss composition can be used in a vehicle interior material.
    Type: Application
    Filed: December 11, 2014
    Publication date: July 2, 2015
    Inventors: Gyeong Ha CHAE, Min Young LIM, Young Chul KWON, Kang Yeol PARK, Bo Eun KIM, Joo Hyun JANG, Jae Won HEO
  • Patent number: 8951713
    Abstract: An alkali-soluble resin is provided. The alkali-soluble resin is prepared using a polyfunctional thiol compound as a chain transfer agent. The alkali-soluble resin has a lower viscosity than a resin having the same molecular weight. Further provided is a negative-type photosensitive resin composition comprising the alkali-soluble resin as a binder resin. The use of the alkali-soluble resin lowers the overall viscosity of the photosensitive resin composition to effectively reduce the height of a stepped portion of a photoresist pattern using a small amount of the photosensitive resin composition.
    Type: Grant
    Filed: January 15, 2013
    Date of Patent: February 10, 2015
    Assignee: LG Chem, Ltd.
    Inventors: Han Soo Kim, Sung Hyun Kim, Kwang Han Park, Min Young Lim, Yoon Hee Heo, Ji Heum Yoo, Sun Hwa Kim
  • Patent number: RE45219
    Abstract: Provided are a photoreactive polymer that includes a multi-cyclicmulticyclic compound at as its main chain and a method of preparing the same. The photoreactive polymer exhibits excellent thermal stability since it includes a multi-cyclicmulticyclic compound having a high glass transition temperature at as its main chain. In addition, the photoreactive polymer has a relatively large vacancy so that a photoreactive group can move relatively freely in the main chain therein. As a result, a slow photoreaction rate, which is a disadvantage of a conventional polymer material used to form an alignment layer for a liquid crystal display device, can be overcome.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: October 28, 2014
    Assignee: LG Chem, Ltd.
    Inventors: Heon Kim, Sung Ho Chun, Keon Woo Lee, Sung Joon Oh, Kyungjun Kim, Jungho Jo, Byung Hyun Lee, Min Young Lim, Hye Won Jeong