Abstract: A method for determining mediators on the association between adverse childhood experiences and suicidal ideation of older adults according to an embodiment of the present disclosure, which is a method for determining mediators on the association between adverse childhood experiences of older adults, as an independent variable, and suicidal ideation, as a dependent variable, may include a data measurement step of measuring data for adverse childhood experiences, suicidal ideation, mental health mediators, physical health mediators, social relationship mediators, and covariates; and a statistical analysis step of estimating adjusted effects and crude effects of the mental health mediators, physical health mediators, and social relationship mediators on the suicidal ideation using a logistic-regression analysis and analyzing three path models respectively using mental health mediators, physical health mediators, and social relationship mediators, which are sets of multiple mediators.

Abstract: An ankle joint motion assist device may include a foot accommodating portion on which a user's foot may be accommodated; a driver connected to the foot accommodating portion and providing driving force for rotation of the foot accommodating portion; and a connector rotatably connecting the foot accommodating portion and the driver, wherein the connector may include a first connector to which the foot accommodating portion is coupled, and a second connector to which the driver is coupled, the first connector may be rotatably connected to the second connector about a first rotation axis and a second rotation axis, perpendicular to each other, the driver may include a pair of linear motor modules respectively connected to the first connector through a pair of linkers, and both end portions of the pair of linkers may be rotatably connected to the pair of linear motor modules and the first connector.

Abstract: Disclosed are oxadiazole compounds and pharmaceutically acceptable salts thereof. The compounds and pharmaceutically acceptable salts thereof are specifically suitable for the treatment of neurological diseases such as epilepsy.

Abstract: A camera calibration method comprises receiving an image captured by a camera of a vehicle, detecting a vehicle body area of the vehicle from the image, and estimating a posture of the camera based on the vehicle body area.

Abstract: A muscular strength assisting apparatus includes a muscular strength assisting portion that assists a user's muscular strength and a first connecting link including one side connected to one side of the muscular strength assisting portion and an opposite side rotatable relative to a shoulder of the user about a first rotation axis. The muscular strength assisting portion includes an upper arm module that assists muscular strength of an upper arm of the user and a link assembly including one side connected to one side of the upper arm module to be rotatable about a second rotation axis non-parallel to the first rotation axis and an opposite side disposed adjacent to a portion of a body of the user to be supported on the user.

Abstract: The present invention relates to a photoresist composition capable of realizing excellent pattern performance during formation of fine patterns, and of preparing a photoresist film that is excellent in chemical stability of a plating solution, and a photoresist film using the same.

Abstract: The present invention provides a positive photoresist composition having excellent storage stability, sensitivity, developing properties, plating resistance, and heat resistance. More specifically, a specific dissolution inhibitor in the form of an oligomer having the same repeating unit structure as the resin contained in the photoresist composition is applied to said composition.

Abstract: A chemically amplified photoresist composition comprising a triazole-based plasticizer and an alkali developable resin, which is capable of minimizing cracking of a photoresist obtained from the composition and improving adhesion to a substrate and sensitivity, and a photoresist film comprising a cured product of the chemically amplified photoresists composition.

Abstract: A non-ionic photoacid generator and a chemically amplified positive-type photoresist composition for a thick film including the non-ionic photoacid generator. The non-ionic photoacid generator may not only exhibit high solubility in a solvent of the photoresist composition, but may also exhibit chemical and thermal stability and high sensitivity. In particular, the non-ionic photoacid generator is decomposed by light to generate an acid, and at the same time, can exhibit a corrosion preventing effect on a metal substrate.

Abstract: The present invention relates to a chemically amplified photoresist composition including an alkali-soluble resin and a polymeric photo-acid generator having a predetermined structure, a photoresist pattern produced from the chemically amplified photoresist composition, and a method for preparing the chemically amplified photoresist pattern.

Abstract: The present invention relates to a positive photoresist composition including an acrylic resin including a repeat unit of a specific structure, and a photosensitive acid-generating compound, a photoresist pattern using the same, and a method for manufacturing a pattern.

Abstract: The present invention relates to a photoacid generator, and a chemically amplified photoresist composition for a thick film including the same, wherein the photoacid generator has excellent solubility and sensitivity, and also has an anti-corrosion effect, in addition to the effect as a photoacid generator. Thus, a chemically amplified photoresist composition for a thick film including the photoacid generator reduces scum and/or footing at the exposed part after development. The photoacid generator represented by the following Chemical Formula 1: In Chemical Formula 1, the definition of each substituents is the same as the detail description of the specification.

Abstract: The present invention provides a positive photoresist composition having excellent storage stability, sensitivity, developing properties, plating resistance, and heat resistance. More specifically, a specific dissolution inhibitor in the form of an oligomer having the same repeating unit structure as the resin contained in the photoresist composition is applied to said composition.

Abstract: The present invention relates to a chemically amplified photoresist composition including an alkali-soluble resin and a polymeric photo-acid generator having a predetermined structure, a photoresist pattern produced from the chemically amplified photoresist composition, and a method for preparing the chemically amplified photoresist pattern.

Abstract: The present invention relates to a photoresist composition capable of realizing excellent pattern performance during formation of fine patterns, and of preparing a photoresist film that is excellent in chemical stability of a plating solution, and a photoresist film using the same.

Abstract: A non-ionic photoacid generator and a chemically amplified positive-type photoresist composition for a thick film including the non-ionic photoacid generator. The non-ionic photoacid generator may not only exhibit high solubility in a solvent of the photoresist composition, but may also exhibit chemical and thermal stability and high sensitivity. In particular, the non-ionic photoacid generator is decomposed by light to generate an acid, and at the same time, can exhibit a corrosion preventing effect on a metal substrate.

Abstract: A photoresist composition capable of forming a pattern in which a footing phenomenon is suppressed while being highly sensitive during formation of a fine pattern on a metal surface substrate, and capable of producing a photoresist film that is excellent in chemical stability, and a photoresist film using the photoresist composition.

Abstract: The present invention relates to a photoacid generator, and a chemically amplified photoresist composition for a thick film including the same, wherein the photoacid generator has excellent solubility and sensitivity, and also has an anti-corrosion effect, in addition to the effect as a photoacid generator. Thus, a chemically amplified photoresist composition for a thick film including the photoacid generator reduces scum and/or footing at the exposed part after development. The photoacid generator represented by the following Chemical Formula 1: In Chemical Formula 1, the definition of each substituents is the same as the detail description of the specification.

Abstract: A chemically amplified photoresist composition comprising a triazole-based plasticizer and an alkali developable resin, which is capable of minimizing cracking of a photoresist obtained from the composition and improving adhesion to a substrate and sensitivity, and a photoresist film comprising a cured product of the chemically amplified photoresists composition.

Abstract: The present invention relates to a positive photoresist composition including an acrylic resin including a repeat unit of a specific structure, and a photosensitive acid-generating compound, a photoresist pattern using the same, and a method for manufacturing a pattern.