Abstract: A photopolymerization initiator composition containing a thiol compound having a mercapto group-containing group that has at least one substituent on the carbon atoms on carbon atom(s) at the ?- and/or ?-position with respect to the mercapto group and a photopolymerization initiator; a photosensitive composition containing the composition; and a novel thiol compound for use in these compositions. The photosensitive composition containing the photopolymerizazion initiator composition of the present invention has high sensitivity and excellent storage stability and enables reduction in cost due by increasing productivity.

Abstract: There are provided a novel curable polymer compound of the present invention comprises having a structure represented by the following Formula (I): CH2?C(R1)COO(R2O)nCH2CH(OH)CH2OOC— ??Formula (I) wherein R1 represents a hydrogen atom or a methyl group, R2 independently has one or more organic residues selected from the group consisting of an alkylene group, a branched alkylene group, an alkenylene group, a branched alkenylene group, a cycloalkylene group, a cycloalkenylene group and an arylene group, and n represents an integer of 0 to 1, a method of preparing the polymer compound, a radical polymerizable and curable composition using the polymer compound, and a cured product obtained by photo-curing the radical polymerizable and curable composition.

Abstract: The present invention provides a novel hexaarylbiimidazole compound of the following formula (1): wherein each R1 represents a halogen, and each R2 represents an optionally substituted C1-4 alkyl group. The hexaarylbiimidazole compound of the present invention is useful as photoradical generators in photopolymerizable compositions used as resists and is characterized by low sublimating thermal decomposition products. The photopolymerizable compositions may be suitably used as resists or as color filters for color liquid crystal display elements, cameras and the like.

Abstract: The present invention provides a carbon black dispersion composition for a color filter black matrix resist composition, containing (A) a carbon black having specified physical properties (average primary particle diameter, concentration of surface carboxyl groups), (B) a copolymer having an amino group and/or its quaternary ammonium salt, and (C) an organic solvent, and a color filter black matrix resist composition that contains the above-mentioned dispersion composition, (D) a binder resin having a carboxyl group, (E) an ethylenically unsaturated monomer, (F) a photopolymerization initiator, and (G) specified multifunctional thiol compound and can easily form a thin film or pattern having high light-shielding property by photolithographic method pattern, has excellent storage stability, and exhibits sufficient sensitivity and resolution.

Abstract: The present invention relates to (1) a photosensitive composition for color filter black matrix resists, containing (A) a binder resin having a carboxyl group, (B) a compound having an ethylenically unsaturated bond, (C) a photopolymerizing initiator, (D) a thiol compound having two or more mercapto-group-containing groups in which carbon atoms at the a-position and/or n-position with respect to the mercapto group have a substituent, and (E) an organic solvent, and having high sensitivity and excellent storage stability; and (2) color filterblack blackmatrix resist containing (1) the photosensitive composition for color filter black matrix resists and a black pigment (F).

Abstract: The present invention relates to a black resist composition for color filter which contains titanium black (A) with an average primary particle size of 100 nm, carbon black (B) with an average primary particle size of 60 nm or less, an acrylic copolymer dispersant (C) with an amino group and/or a quaternary ammonium salt, an organic solvent (D) and a binder resin (E) with a carboxyl group and an ethylenic unsaturated group, where the ratio in mass between the titanium black (A) and the titanium black (B) is 100:5 to 1000. According to the black resist composition for color filter of the present invention, patterns can readily be formed by photolithography, and the composition has high light resistance and high insulation property, and can be made into a thin film to attain sufficient sensitivity and resolution property.

Abstract: A photopolymerization initiator composition containing a thiol compound having a mercapto group-containing group that has at least one substituent on the carbon atoms on carbon atom(s) at the ?- and/or ?-position with respect to the mercapto group and a photopolymerization initiator; a photosensitive composition containing the composition; and a novel thiol compound for use in these compositions. The photosensitive composition containing the photopolymerizazion initiator composition of the present invention has high sensitivity and excellent storage stability and enables reduction in cost due by increasing productivity.

Abstract: A photosensitive coloring composition for color filters using coloring compositons containd (A) a binder resin having an amido group and a carboxyl group and (B) a coloring material has excellent photosensitivity and has improved dispersibility upon producing in particular a coloring composition containing a black pigment such as a carbon black. Use of (A) an epoxy(meth)acrylate resin can further improve the photosensitivity and from a black matrix having sufficient film strenght and low reflectivity. Furhter, use of a modified carbon black treated with a compound having a isocyanate group and an ethylenically unsaturaged bond in a molecule as the coloring material can give rise to a photosensitive resin composition excellent in optically opaque property, photosensitivity and dispersion stability.