Abstract: An electroplating device includes a plating solution, at least one anode basket located in the plating solution, and a workpiece to be plated. An electroplating aid board is arranged between the anode basket and the workpiece to be plated. The electroplating aid board has at least one side that has a length exceeding the workpiece to be plated. The electroplating aid board is made of a plastic material that is not electrically conductive and includes a plurality of holes formed therein. In an electroplating operation, the holes provide an effect of tunnel that guides positive ions (such as copper ions) of the plating solution to flow from the anode basket (namely anode) straightforward to the nearest surface portion of the workpiece to be plated.

Abstract: A transistor circuit layout structure includes a transistor disposed on a substrate and including a source terminal, a drain terminal and a split gate including an independent first block and an independent second block, a bit line disposed on the source terminal and on the drain terminal or embedded in the substrate, a word line disposed on the first block, and a back line disposed on the second block. The horizontal level of the back line is different from that of the bit line and the word line.

Abstract: A DRAM memory structure at least includes a strip semiconductive material disposed on a substrate and extending along a first direction, a split gate disposed on the substrate and extending along a second direction, a dielectric layer at least sandwiched between the split gate and the substrate, a gate dielectric layer at least sandwiched between the split gate and the strip semiconductive material, and a capacitor unit. The split gate independently includes a first block and a second block to divide the strip semiconductive material into a source terminal, a drain terminal and a channel. The capacitor unit is electrically connected to the source terminal.

Abstract: Disclosed is a transmission mechanism of vertical circuit board etching device. The transmission mechanism includes a driving shaft unit that has power output terminals respectively coupled to power input terminals of driven shaft units that are of the same number as pairs of clamping/rolling/feeding roller shafts to drive the driven shaft units to rotate. Power output terminals of the driven shaft units are coupled to the pairs of clamping/rolling/feeding roller shafts. Transmission rollers that are contained in the driving shaft unit and the driven shaft units for coupling to each other for changing direction of power transmission and changing speeds of rotation are all rollers that include a plurality of circumferentially-distributed peg-like teeth extending from a roller surface thereof.

Abstract: A dynamic memory structure includes a strip semiconductor material disposed on a substrate, a gate standing astride the strip semiconductor material and dividing the strip semiconductor material into a source terminal, a drain terminal and a channel region wherein a source width of the source terminal is larger than or equal to a channel width, a dielectric layer sandwiched between the gate and the strip semiconductor material, and a capacitor unit disposed on the substrate and including the source terminal serving as a lower electrode.

Abstract: Activate one active word line of two active word lines formed between two isolation word lines to a logic-high voltage, and float another active word line of the two active word lines. Then activate a plurality of first memory cells corresponding to the active word line having the logic-high voltage to a logic “1” voltage, and write a logic “0” voltage to a plurality of second memory cells corresponding to the floating active word line. Then write the logic “1” voltage to a plurality of bit lines. Then, suspend for charge sharing for a third predetermined time. Finally, read a voltage of the floating active word line to check if any leakage path exists between the floating active word line and the active word line having the logic-high voltage.

Abstract: A connector applied to a portable device includes a wireless module, a connection module, at least one connection socket, a controller, and a memory. The wireless module is used for establishing a wireless connection between the portable device and the connector. The connection module is used for communicating with an external device. The at least one connection socket is used for connecting the connection module with the external device. The controller is coupled between the wireless module and the connection module for transmitting data between the wireless module and the connection module and executing commands to control the wireless module and the connection module. The memory is used for storing the commands required for the controller and is used as a data register to boost a data transmission rate between the portable device and the external device.

Abstract: Activate one active word line of two active word lines formed between two isolation word lines to a logic-high voltage, and float another active word line of the two active word lines. Then activate a plurality of first memory cells corresponding to the active word line having the logic-high voltage to a logic “1” voltage, and write a logic “0” voltage to a plurality of second memory cells corresponding to the floating active word line. Then write the logic “1” voltage to a plurality of bit lines. Then, suspend for charge sharing for a third predetermined time. Finally, read a voltage of the floating active word line to check if any leakage path exists between the floating active word line and the active word line having the logic-high voltage.

Abstract: A re-routing method and the circuit thereof, used to rearrange the external circuit coupled with the integrated circuit (IC), comprises the steps of providing a plurality of first conductive plate on the substrate of the IC to form an isolation layer; providing a plurality of second conductive plates on the isolation layer, wherein each of the second conductive plates is moved in isovector with each of the corresponding first conductive plates as the center, each of the second conductive plates electrically connected with each of the first conductive plates. Therefore, according to move the second conductive plates in isovector, the probe card may be reused for circuit testing to save the cost and reduce the material management.

Abstract: A re-routing method and the circuit thereof, used to rearrange the external circuit coupled with the integrated circuit (IC), comprises the steps of providing a plurality of first conductive plate on the substrate of the IC to form an isolation layer; providing a plurality of second conductive plates on the isolation layer, wherein each of the second conductive plates is moved in isovector with each of the corresponding first conductive plates as the center, each of the second conductive plates electrically connected with each of the first conductive plates. Therefore, according to move the second conductive plates in isovector, the probe card may be reused for circuit testing to save the cost and reduce the material management.

Abstract: A method for forming planarized isolation using a nitride hard mask and two CMP steps is described. A first nitride layer is deposited over a pad oxide layer on the surface of a semiconductor substrate. The first nitride and pad oxide layers are etched through where they are not covered by a mask to provide at least one wide opening and at least one narrow opening where the surface of the substrate is exposed. Trenches are etched into the substrate where it is exposed. An oxide layer is deposited overlying the first nitride layer and within the trenches completely filling the narrow trench wherein a trough is formed over the wide trench. A second nitride layer is deposited over the oxide layer. The second nitride layer is polished away with a polish stop at the oxide layer whereby the second nitride layer is removed except: where it lies within the trough.

Abstract: A process for fabricating a DRAM capacitor structure, in which the capacitor upper plate structure is defined during the formation of bit line contact hole opening, and substrate contact hole opening procedure, eliminating the need for a specific upper plate, photolithographic masking procedure, has been developed. The process features isolating a polysilicon upper plate structure, during an isotropic RIE cycle, also creating an undercut polysilicon region, in the contact holes, which are opened simultaneously during the upper plate definition. Subsequent silicon nitride spacers, on the sides of the contact holes, provides insulation between the polysilicon upper plate structure, and bit line, and substrate contact plug structures, now located in the contact holes. The undercut polysilicon regions, allow the formation of thicker silicon nitride spacers, to be formed in this undercut region.

Abstract: A method for implementing shallow trench isolation by using a non-critical chemical mechanical polishing method in an integrated circuit. After STI regions are etched and insulator oxide layer is deposited and etched back, a planarized insulator oxide layer is formed. The corners of silicon nitride layer over active area are exposed after the etch back step. Then, a silicon nitride cap layer is deposited. A non-critical photoresist patterning is used to expose the bigger active regions. Afterward, the cap layer on the bigger active regions is removed. Thereafter, a non-critical CMP process is used to polish the cap layer on the smaller active regions, then the insulator oxide layer under cap layer is removed by wet etch. Subsequently, a wet etch is used to remove the cap layer and silicon nitride layer. Finally, the shallow trench isolation process is completed after the pad oxide is removed.

Abstract: A process for fabricating a DRAM cell has been developed, in which two interlaced patterns, each comprised of capacitor node contact holes and bit line contact holes, are independently created, each using a specific photolithographic mask, and a specific photolithographic procedure. The two interlaced patterns allow the creation of the capacitor node contact images, and the bit line contact holes images, to be formed in a thin polysilicon layer, with minimum spacing between contact images. Capacitor node contact holes, as well as bit line contact holes, are than formed in an insulator layer, via a dry etching procedure, using the patterned thin polysilicon layer as a mask. The use of specific masks, or of the interlaced pattern, allows the minimum spacing, between a capacitor node contact hole, and a bit line contact hole, to be limited only by the overlay between photolithographic masks.

Abstract: A method for forming planarized isolation by combining LOCOS and STI isolation processes is described. A first nitride layer is deposited over a pad oxide layer on the surface of a semiconductor substrate. The first nitride layer and pad oxide layer are etched through where they are not covered by a mask to provide openings where the surface of the semiconductor substrate is exposed wherein there is at least one wide opening and one narrow opening. A second nitride layer is deposited over the substrate and etched back to leave spacers on the sidewalls of the openings wherein the narrow opening is filled by the spacers. The exposed semiconductor substrate within the wide opening is oxidized wherein a field oxide region is formed within the wide opening. A portion of the first nitride layer and spacers is etched away whereby the semiconductor substrate within the narrow opening is exposed. A trench is etched into the semiconductor substrate where it is exposed within the narrow opening.

Abstract: A silicon dioxide layer and a silicon nitride layer are formed on the wafer. Subsequently, a plurality of shallow trenches are generated in the wafer. A HDP-CVD oxide having protruding portions is refilled into the trenches and formed on the silicon nitride layer for isolation. A wet etch is performed to etch the HDP-CVD oxide layer such that the corners of the silicon nitride layer formed on the active area will be exposed. A cap silicon nitride layer is then conformally formed on the surface of the oxide layer. Then, a chemical mechanical polishing (CMP) process is used to remove the top of the cap silicon nitride layer, thereby exposing the residual protruding portions of the oxide layer. The residual protruding portions of the oxide layer are next removed. Then, the silicon nitride layer and the cap silicon nitride layer are both removed by conventional methods. Finally, the pad oxide is removed.

Abstract: A process for forming a damascene landing pad structure, used to connect a bit line structure, of a semiconductor memory device, to an underlying source and drain region, of a transfer gate transistor, has been developed. The process features the formation of a dual shaped, landing pad opening in an insulator layer, comprised of a first shaped opening, exposing an underlying source and drain region, and an enlarged, second shape opening, exposing non-active device regions. Polysilicon deposition and patterning result in the formation of the damascene landing pad structure, in the dual shaped, landing pad opening. Insulator deposition is followed by the opening of a bit line via hole, exposing the top surface of the damascene landing pad structure, in a region in which the damascene landing pad structure overlays a non-active device region. This is followed by the formation of the bit line structure, contacting the top surface of the damascene landing pad structure, exposed in the bit line via hole.

Abstract: A process for fabricating a DRAM cell has been developed, in which two interlaced patterns, each comprised of capacitor node contact holes and bit line contact holes, are independently created, each using a specific photolithographic mask, and a specific photolithographic procedure. The two interlaced patterns allow the creation of the capacitor node contact images, and the bit line contact holes images, to be formed in a thin polysilicon layer, with minimum spacing between contact images. Capacitor node contact holes, as well as bit line contact holes, are than formed in an insulator layer, via a dry etching procedure, using the patterned thin polysilicon layer as a mask. The use of specific masks, or of the interlaced pattern, allows the minimum spacing, between a capacitor node contact hole, and a bit line contact hole, to be limited only by the overlay between photolithographic masks.

Abstract: An improved local oxidation of silicon (LOCOS) method with recessed silicon substrate and double polysilicon/silicon nitride spacer is disclosed. The present invention includes forming a pad oxide layer on a semiconductor substrate and then forming a first silicon nitride layer on the pad oxide layer. An active region is defined by patterning and etching the pad oxide layer and the first silicon nitride layer using a photoresist mask. Thereafter, a silicon oxide layer and a second silicon nitride layer is formed. Next, a polysilicon layer is deposited over the second silicon nitride layer. The polysilicon layer, the second silicon nitride layer, and the silicon oxide layer are etched back to form a double polysilicon/silicon nitride spacer. Finally, an isolation region in the substrate is formed.

Abstract: The invention provides a method of forming field oxide regions between active regions in a semiconductor substrate. The invention forms nitride feet on the sidewalls of a nitride oxidation mask to prevent formation of the bird's beak on the field oxide and reduce stress in the active areas. The invention begins by forming a first oxide layer and a masking block, over the active regions. A second nitride layer is deposited over the masking block and the substrate surface. The second nitride layer is anisotropically etched with a customized etch forming nitride spacers on the sidewalls of the masking block, and nitride spacer feet on the surface of the first oxide layer. The customized etch of the invention optimizes the microloading effects to properly form the nitride feet. The substrate is oxidized, using the masking block nitride spacers and the nitride spacer feet as an oxidation mask to form field oxide regions. The nitride feet eliminate bird's beak problem.