Patents by Inventor Ming Lun Yu

Ming Lun Yu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170288073
    Abstract: Methods and devices are described for a photovoltaic device. The photovoltaic device includes a glass substrate, a semiconductor absorber layer formed over the glass substrate, a metal back contact layer formed over the semiconductor absorber layer, and a p-type back contact buffer layer formed from one of MnTe, Cd1-xMnxTe, and SnTe, the buffer layer disposed between the semiconductor absorber layer and the metal back contact layer.
    Type: Application
    Filed: June 12, 2017
    Publication date: October 5, 2017
    Applicant: First Solar, Inc.
    Inventors: Benyamin Buller, Markus Gloeckler, Akhlesh Gupta, Rick Powell, Rui Shao, Gang Xiong, Ming Lun Yu, Zhibo Zhao
  • Patent number: 9406829
    Abstract: A method to improve operation of a CdTe-based photovoltaic device is disclosed, the method comprising the steps of depositing a semiconductor absorber layer adjacent to a substrate, depositing a semiconductor buffer layer adjacent to the semiconductor layer, and annealing at least one of the semiconductor absorber layer and the semiconductor buffer layer with one of a laser and a flash lamp.
    Type: Grant
    Filed: June 27, 2014
    Date of Patent: August 2, 2016
    Assignee: First Solar, Inc.
    Inventors: Pratima Addepalli, Benyamin Buller, Markus Gloeckler, Akhlesh Gupta, David Hwang, Andrei Los, Rick Powell, Rui Shao, Gang Xiong, Ming Lun Yu, San Yu, Zhibo Zhao
  • Patent number: 9383316
    Abstract: A method of measuring vapor flux density including directing a light beam through a vapor flux to a pixel array sensor and using the pixel array sensor to measure attenuation of the light beam.
    Type: Grant
    Filed: December 26, 2013
    Date of Patent: July 5, 2016
    Assignee: First Solar, Inc.
    Inventors: Markus E. Beck, Ulrich A. Bonne, Raffi Garabedian, Erel Milshtein, Ming Lun Yu
  • Publication number: 20150000733
    Abstract: Methods and devices are described for a photovoltaic device. The photovoltaic device includes a glass substrate, a semiconductor absorber layer formed over the glass substrate, a metal back contact layer formed over the semiconductor absorber layer, and a p-type back contact buffer layer formed from one of MnTe, Cd1-xMnxTe, and SnTe, the buffer layer disposed between the semiconductor absorber layer and the metal back contact layer.
    Type: Application
    Filed: June 27, 2014
    Publication date: January 1, 2015
    Inventors: Benyamin Buller, Markus Gloeckler, Akhlesh Gupta, Rick Powell, Rui Shao, Gang Xiong, Ming Lun Yu, Zhibo Zhao
  • Publication number: 20150004743
    Abstract: A method to improve operation of a CdTe-based photovoltaic device is disclosed, the method comprising the steps of depositing a semiconductor absorber layer adjacent to a substrate, depositing a semiconductor buffer layer adjacent to the semiconductor layer, and annealing at least one of the semiconductor absorber layer and the semiconductor buffer layer with one of a laser and a flash lamp.
    Type: Application
    Filed: June 27, 2014
    Publication date: January 1, 2015
    Inventors: Pratima Addepalli, Benyamin Buller, Markus Gloeckler, Akhlesh Gupta, David Hwang, Andrei Los, Rick Powell, Rui Shao, Gang Xiong, Ming Lun Yu, San Yu, Zhibo Zhao
  • Patent number: 8734536
    Abstract: A temperature-adjusted spectrometer can include a light source and a temperature sensor.
    Type: Grant
    Filed: July 21, 2011
    Date of Patent: May 27, 2014
    Assignee: First Solar, Inc
    Inventors: Markus E. Beck, Ming Lun Yu
  • Publication number: 20140104616
    Abstract: A flux monitor system includes a light source and a sensor.
    Type: Application
    Filed: December 26, 2013
    Publication date: April 17, 2014
    Applicant: FIRST SOLAR, INC.
    Inventors: MARKUS E. BECK, ULRICH A. BONNE, RAFFI GARABEDIAN, EREL MILSHTEIN, MING LUN YU
  • Patent number: 8646408
    Abstract: A flux monitor system includes a light source and a sensor.
    Type: Grant
    Filed: December 30, 2010
    Date of Patent: February 11, 2014
    Assignee: First Solar, Inc.
    Inventors: Markus E. Beck, Ulrich Alexander Bonne, Raffi Garabedian, Erel Milshtein, Ming Lun Yu
  • Patent number: 8472021
    Abstract: A particle detector for evaporation flux is disclosed. The particle detector includes a light source and at least one reflective surface.
    Type: Grant
    Filed: April 8, 2011
    Date of Patent: June 25, 2013
    Assignee: First Solar, Inc.
    Inventors: Markus E. Beck, Robert Green, Raffi Garabedian, Erel Milshtein, Ming Lun Yu
  • Patent number: 8237120
    Abstract: A defect may be characterized using primary radiation directed from a primary electron source to a measurement location on the sample. An electron energy analyzer may capture secondary electrons emitted from the measurement location in a focusing direction by an electron energy analyzer. A transverse focusing device may focus electrons emitted from the measurement location in a transverse direction that is perpendicular to the focusing direction.
    Type: Grant
    Filed: September 17, 2009
    Date of Patent: August 7, 2012
    Assignee: KLA-Tencor Corporation
    Inventors: Gabor Toth, Rudy Garcia, Mehran Nasser-Ghodsi, Khashayar Shadman, Ming Lun Yu, Stuart Friedman
  • Publication number: 20120018829
    Abstract: A temperature-adjusted spectrometer can include a light source and a temperature sensor.
    Type: Application
    Filed: July 21, 2011
    Publication date: January 26, 2012
    Inventors: Markus E. Beck, Ming Lun Yu
  • Publication number: 20120021556
    Abstract: A selenium deposition system can improve the selenium vapor distribution.
    Type: Application
    Filed: July 22, 2011
    Publication date: January 26, 2012
    Inventors: Markus E. Beck, Ashish Bodke, Ulrich Alexander Bonne, Benyamin Buller, Raffi Garabedian, Erel Milshtein, Ming Lun Yu
  • Patent number: 8052885
    Abstract: Structural modification using electron beam activated chemical etch (EBACE) is disclosed. A target or portion thereof may be exposed to a gas composition of a type that etches the target when the gas composition and/or target are exposed to an electron beam. By directing an electron beam toward the target in the vicinity of the gas composition, an interaction between the electron beam and the gas composition etches a portion of the target exposed to both the gas composition and the electron beam. Structural modifications of the target may be conducted by means of etching due to interaction between the electron beam and gas composition.
    Type: Grant
    Filed: January 12, 2007
    Date of Patent: November 8, 2011
    Assignee: KLA-Tencor Corporation
    Inventors: Mehran Naser-Ghodsi, Garrett Pickard, Rudy F. Garcia, Ming Lun Yu, Kenneth Krzeczowski, Matthew Lent, Sergey Lopatin, Chris Huang, Niles K. MacDonald
  • Publication number: 20110249263
    Abstract: A particle detector for evaporation flux is disclosed. The particle detector includes a light source and at least one reflective surface.
    Type: Application
    Filed: April 8, 2011
    Publication date: October 13, 2011
    Inventors: Markus E. Beck, Robert Green, Raffi Garabedian, Erel Milshtein, Ming Lun Yu
  • Patent number: 8008207
    Abstract: A method for controlling chemical dry etching to improve smoothness of an etched surface is disclosed. Ions are implanted into a surface to form a volatilizable compound at a temperature low enough to avoid, reduce, or eliminate formation of three-dimensional structures of the volatilizable compound that might create the roughness at an etched surface of the volatilizable compound. The ions are applied in a sufficient energy to penetrate to a predetermined depth of material that is to be removed from the surface in an etching cycle, and in a sufficient dosage to achieve full formation of the volatilizable compound. The surface of the volatilizable compound is exposed to a gas composition for a time duration sufficient to completely etch the volatilizable compound.
    Type: Grant
    Filed: May 23, 2007
    Date of Patent: August 30, 2011
    Assignee: KLA-Tencor Technologies Corporation
    Inventors: Ming Lun Yu, Mehran Nasser-Ghodsi
  • Publication number: 20110165315
    Abstract: A flux monitor system includes a light source and a sensor.
    Type: Application
    Filed: December 30, 2010
    Publication date: July 7, 2011
    Applicant: First Solar, Inc.
    Inventors: Markus E. Beck, Ulrich Alexander Bonne, Raffi Garabedian, Erel Milshtein, Ming Lun Yu
  • Publication number: 20110046916
    Abstract: A position sensitive pyrometer includes a sensor.
    Type: Application
    Filed: August 20, 2010
    Publication date: February 24, 2011
    Applicant: First Solar, Inc.
    Inventors: Ming Lun Yu, Markus E. Beck
  • Patent number: 7879730
    Abstract: Etch selectivity enhancement during electron beam activated chemical etch (EBACE) is disclosed. A target or portion thereof may be exposed to a gas composition of a type that etches the target when the gas composition and/or target are exposed to an electron beam. By directing an electron beam toward the target in the vicinity of the gas composition, an interaction between the electron beam and the gas composition etches a portion of the target exposed to both the gas composition and the electron beam. Selectivity of etching of the target due to interaction between the electron beam and gas composition may be enhanced in a number of ways.
    Type: Grant
    Filed: January 12, 2007
    Date of Patent: February 1, 2011
    Assignee: KLA-Tencor Technologies Corporation
    Inventors: Mehran Naser-Ghodsi, Garrett Pickard, Rudy F. Garcia, Tzu-Chin Chuang, Ming Lun Yu, Kenneth Krzeczowski, Matthew Lent, Sergey Lopatin, Chris Huang, Niles K. MacDonald
  • Patent number: 7635842
    Abstract: A method and the instrument for characterization of the defects on a surface with Auger electron spectroscopy in a high vacuum environment are disclosed. Defects on the surface of a sample may be characterized with Auger electron spectroscopy in a high vacuum environment.
    Type: Grant
    Filed: February 15, 2008
    Date of Patent: December 22, 2009
    Assignee: KLA-Tencor Corporation
    Inventors: Mehran Nasser-Ghodsi, Ming Lun Yu, Stuart Friedman, Gabor Toth
  • Patent number: 7417233
    Abstract: A system and method of determining shape and position corrections of a beam such as a particle or other beam used in a system such as a particle beam lithography. The method of providing corrected deflector voltages may include determining a voltage step value by subtracting a previous deflector voltage value with a current deflector voltage value; determining a plurality of correction values using the voltage step value and an exposure time for the current deflector voltage value; selecting a current voltage correction value from the plurality of correction values using the current deflector voltage value; and calculating a corrected deflector voltage value by adding the current voltage correction value to the current deflector voltage value.
    Type: Grant
    Filed: September 28, 2005
    Date of Patent: August 26, 2008
    Assignee: Applied Materials, Inc.
    Inventors: Scott C. Stovall, Benyamin Buller, Jimmy Iskandar, Ming Lun Yu