Patents by Inventor Ming Lun Yu

Ming Lun Yu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pyrometer
    Publication number: 20110046916
    Abstract: A position sensitive pyrometer includes a sensor.
    Type: Application
    Filed: August 20, 2010
    Publication date: February 24, 2011
    Applicant: First Solar, Inc.
    Inventors: Ming Lun Yu, Markus E. Beck
  • Etch selectivity enhancement in electron beam activated chemical etch
    Patent number: 7879730
    Abstract: Etch selectivity enhancement during electron beam activated chemical etch (EBACE) is disclosed. A target or portion thereof may be exposed to a gas composition of a type that etches the target when the gas composition and/or target are exposed to an electron beam. By directing an electron beam toward the target in the vicinity of the gas composition, an interaction between the electron beam and the gas composition etches a portion of the target exposed to both the gas composition and the electron beam. Selectivity of etching of the target due to interaction between the electron beam and gas composition may be enhanced in a number of ways.
    Type: Grant
    Filed: January 12, 2007
    Date of Patent: February 1, 2011
    Assignee: KLA-Tencor Technologies Corporation
    Inventors: Mehran Naser-Ghodsi, Garrett Pickard, Rudy F. Garcia, Tzu-Chin Chuang, Ming Lun Yu, Kenneth Krzeczowski, Matthew Lent, Sergey Lopatin, Chris Huang, Niles K. MacDonald
  • Method and instrument for chemical defect characterization in high vacuum
    Patent number: 7635842
    Abstract: A method and the instrument for characterization of the defects on a surface with Auger electron spectroscopy in a high vacuum environment are disclosed. Defects on the surface of a sample may be characterized with Auger electron spectroscopy in a high vacuum environment.
    Type: Grant
    Filed: February 15, 2008
    Date of Patent: December 22, 2009
    Assignee: KLA-Tencor Corporation
    Inventors: Mehran Nasser-Ghodsi, Ming Lun Yu, Stuart Friedman, Gabor Toth
  • Beam exposure correction system and method
    Patent number: 7417233
    Abstract: A system and method of determining shape and position corrections of a beam such as a particle or other beam used in a system such as a particle beam lithography. The method of providing corrected deflector voltages may include determining a voltage step value by subtracting a previous deflector voltage value with a current deflector voltage value; determining a plurality of correction values using the voltage step value and an exposure time for the current deflector voltage value; selecting a current voltage correction value from the plurality of correction values using the current deflector voltage value; and calculating a corrected deflector voltage value by adding the current voltage correction value to the current deflector voltage value.
    Type: Grant
    Filed: September 28, 2005
    Date of Patent: August 26, 2008
    Assignee: Applied Materials, Inc.
    Inventors: Scott C. Stovall, Benyamin Buller, Jimmy Iskandar, Ming Lun Yu
  • METHOD AND INSTRUMENT FOR CHEMICAL DEFECT CHARACTERIZATION IN HIGH VACUUM
    Publication number: 20080197277
    Abstract: A method and the instrument for characterization of the defects on a surface with Auger electron spectroscopy in a high vacuum environment are disclosed. Defects on the surface of a sample may be characterized with Auger electron spectroscopy in a high vacuum environment at a pressure of about 10?7 Torr to 10?6 Torr.
    Type: Application
    Filed: February 15, 2008
    Publication date: August 21, 2008
    Applicant: KLA-Tencor Corporation
    Inventors: Mehran Nasser-Ghodsi, Ming Lun Yu, Stuart Friedman, Gabor Toth