Abstract: A damper for protecting a gauge sensor measuring the pressure of a dry etch chamber. The damper includes a vacuum tube for connecting the gauge with the chamber and at least one plate for blocking the plasma of the chamber from directly striking against the sensor. The at least one plate is disposed at the inner wall of the vacuum tube to effectively prevent the plasma from attaching onto the sensor so as to maintain the sensitivity of the sensor and prolong the lifetime of the gauge.

Abstract: An adjustable positioning device used to position a work piece on a work platform is provided. The adjustable positioning device includes a base which is coupled to the work platform and has multiple sockets, and a supporting frame which has multiple slots. The supporting frame further includes a supporting portion protruded from a lateral side of the supporting frame, a number of bars which are installed at the bottom of the supporting frame and are used to insert into selected sockets, a slide block with a sliding section and a pressing section wherein the sliding section is able to slide and can be selectively fixed in a slot while the pressing section and the supporting portion are opposed to each other. The work piece can be retained between the pressing section and the supporting portion.

Abstract: A damper for protecting a gauge sensor measuring the pressure of a dry etch chamber. The damper includes a vacuum tube for connecting the gauge with the chamber and at least one plate for blocking the plasma of the chamber from directly striking against the sensor. The at least one plate is disposed at the inner wall of the vacuum tube to effectively prevent the plasma from attaching onto the sensor so as to maintain the sensitivity of the sensor and prolong the lifetime of the gauge.

Abstract: An apparatus for preventing a substrate from being contaminated by condensed liquid is disclosed to be adapted to a substrate, comprising a reaction chamber having at least a doorway on one side for the substrate to enter or exit wherein the chamber receives the substrate and a process fluid to proceed with a processing step, a conveyor unit for delivering the substrate into or out of the reaction chamber via the doorway, a first jet device disposed on the delivery route of the conveyor unit external to the reaction chamber to eject a gas out in a direction toward the substrate on the conveyor unit, and a second jet device disposed on one side of the doorway external to the reaction chamber to eject a gas out in a direction toward the doorway. Also, a method for preventing a substrate from being contaminated by condensed liquid is provided.

Abstract: An adjustable positioning device used to position a work piece on a work platform is provided. The adjustable positioning device includes a base which is coupled to the work platform and has multiple sockets, and a supporting frame which has multiple slots. The supporting frame further includes a supporting portion protruded from a lateral side of the supporting frame, a number of bars which are installed at the bottom of the supporting frame and are used to insert into selected sockets, a slide block with a sliding section and a pressing section wherein the sliding section is able to slide and can be selectively fixed in a slot while the pressing section and the supporting portion are opposed to each other. The work piece can be retained between the pressing section and the supporting portion.