Patents by Inventor Minne Cuperus
Minne Cuperus has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10345711Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.Type: GrantFiled: August 21, 2017Date of Patent: July 9, 2019Assignee: ASML Netherlands B.V.Inventors: Christiaan Alexander Hoogendam, Gerrit Johannes Nijmeijer, Minne Cuperus, Petrus Anton Willem Cornelia Maria Van Eijck
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Publication number: 20180067401Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.Type: ApplicationFiled: August 21, 2017Publication date: March 8, 2018Inventors: Christiaan Alexander HOOGENDAM, Gerrit Johannes Nijmeijer, Minne Cuperus, Petrus Anton Willem Cornelia Maria Van Eijck
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Patent number: 9740106Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.Type: GrantFiled: November 3, 2015Date of Patent: August 22, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Christiaan Alexander Hoogendam, Gerrit Johannes Nijmeijer, Minne Cuperus, Petrus Anton Willem Cornelia Maria Van Eijck
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Publication number: 20170052456Abstract: A lithographic system including a lithographic apparatus with an anamorphic projection system, and a radiation source configured to generate an EUV radiation emitting plasma at a plasma formation location, the EUV radiation emitting plasma having an elongate form in a plane substantially perpendicular to an optical axis of the radiation source.Type: ApplicationFiled: January 23, 2015Publication date: February 23, 2017Applicant: ASML Netherlands B.V.Inventors: Jan Bernard Plechelmus VAN SCHOOT, Minne CUPERUS, Andrei Mikhailovich YAKUNIN
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Publication number: 20160054665Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.Type: ApplicationFiled: November 3, 2015Publication date: February 25, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Christiaan Alexander HOOGENDAM, Gerrit Johannes NIJMEIJER, Minne CUPERUS, Petrus Anton Willem Cornelia Maria VAN EIJCK
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Patent number: 9182222Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.Type: GrantFiled: November 8, 2012Date of Patent: November 10, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Christiaan Alexander Hoogendam, Gerrit Johannes Nijmeijer, Minne Cuperus, Petrus Anton Willem Cornelia Maria Van Eijck
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Patent number: 8749754Abstract: An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.Type: GrantFiled: December 28, 2009Date of Patent: June 10, 2014Assignee: ASML Netherlands B.V.Inventors: Bob Streefkerk, Henrikus Herman Marie Cox, Christiaan Alexander Hoogendam, Jeroen Johannes Sophia Maria Mertens, Koen Jacobus Johannes Maria Zaal, Minne Cuperus
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Patent number: 8553201Abstract: An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.Type: GrantFiled: October 1, 2008Date of Patent: October 8, 2013Assignee: ASML Netherlands B.V.Inventors: Bob Streefkerk, Henrikus Herman Marie Cox, Christiaan Alexander Hoogendam, Jeroen Johannes Sophia Maria Mertens, Koen Jacobus Johannes Maria Zaal, Minne Cuperus
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Publication number: 20130182231Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.Type: ApplicationFiled: November 8, 2012Publication date: July 18, 2013Applicant: ASML Netherlands B.V.Inventors: Christiaan Alexander Hoogendam, Gerrit Johannes Nijmeijer, Minne Cuperus, Petrus Anton Willem Cornelia Maria Van Eijck
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Patent number: 8441617Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.Type: GrantFiled: November 3, 2011Date of Patent: May 14, 2013Assignee: ASML Netherlands B.V.Inventors: Christiaan Alexander Hoogendam, Gerrit Johannes Nijmeijer, Minne Cuperus, Petrus Anton Willem Cornelia Maria Van Eijck
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Publication number: 20120050740Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.Type: ApplicationFiled: November 3, 2011Publication date: March 1, 2012Applicant: ASML Netherlands B.V.Inventors: CHRISTIAAN ALEXANDER HOOGENDAM, Gerrit Johannes Nijmeijer, Minne Cuperus, Petrus Anton Willem Cornelia Maria Van Eijck
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Patent number: 8077291Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.Type: GrantFiled: October 9, 2007Date of Patent: December 13, 2011Assignee: ASML Netherlands B.V.Inventors: Christiaan Alexander Hoogendam, Gerrit Johannes Nijmeijer, Minne Cuperus, Petrus Anton Willern Cornelia Maria Van Eijck
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Patent number: 8059266Abstract: Systems and methods for measuring stray light in a lithographic apparatus are described using Radiometric Kirk Test (also known as Scanning SAMOS Test). The Radiometric Kirk Test of the present invention involves a test pattern having an isolated dark area within a much larger bright field. The radiometric Kirk test includes at least two continuous or stepped scans of an aperture of a detector in an image plane of a lithographic system. During a dark area measurement, the aperture of the detector is positioned such that at least at one point the aperture of the detector is centered within an image of the dark area. During a bright area measurement, the aperture of the detector is positioned within the image of the bright field. The integrated detector signal is correspondingly computed for the dark area measurement and the bright area measurement.Type: GrantFiled: September 23, 2008Date of Patent: November 15, 2011Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: David A. Hult, Heine Melle Mulder, Minne Cuperus
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Patent number: 8009270Abstract: A device manufacturing method comprising applying patterns to a plurality of arrays of individually controllable elements, such that they modulate a beam of radiation, and projecting the modulated beam of radiation onto a substrate. The patterns applied to the arrays of individually controllable elements are arranged such that pre-determined amounts of background radiation are included in the modulated beam of radiation. The pre-determined amounts of background radiation being different for different locations on the arrays.Type: GrantFiled: March 22, 2007Date of Patent: August 30, 2011Assignee: ASML Netherlands B.V.Inventors: Paul Antoon Cyriel Desmedt, Patricius Aloysius Jacobus Tinnemans, Minne Cuperus
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Patent number: 8009269Abstract: A lithographic system is provided in which an extent of overlap between pattern sections is adjusted in order to match a size of a pattern section to a size of a repeating portion of the pattern to be formed.Type: GrantFiled: March 14, 2007Date of Patent: August 30, 2011Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Kars Zeger Troost, Jason Douglas Hintersteiner, Minne Cuperus, Kamen Hristov Chilov, Richard Carl Zimmerman, Ronnie Florentius Van T Westeinde
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Patent number: 7859644Abstract: A control system configured to control a position of a fluid supply system, the fluid supply system constructed and arranged to supply a fluid between a substrate and a projection system, the substrate positioned with a substrate stage, the control system including a controller configured to determine a desired position of the fluid supply system based on a position signal to be provided to the substrate stage and a position offset, the position offset added to the position signal to be provided to the substrate stage.Type: GrantFiled: December 17, 2007Date of Patent: December 28, 2010Assignee: ASML Netherlands B.V.Inventors: Jan-Gerard Cornelis Van Der Toorn, Hans Butler, Henrikus Herman Marie Cox, Evert Hendrik Jan Draaijer, Nicolaas Ten Kate, Frits Van Der Meulen, Mark Johannes Hermanus Frencken, Martijn Houkes, Antonius Henricus Arends, Minne Cuperus
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Publication number: 20100091255Abstract: An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.Type: ApplicationFiled: December 28, 2009Publication date: April 15, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Bob STREEFKERK, Henrikus Herman Cox, Christiaan Alexander Hoogendam, Jeroen Johannes Sophia Maria Mertens, Koen Jacobus Johannes M. Zaal, Minne Cuperus
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Patent number: 7671963Abstract: An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.Type: GrantFiled: May 19, 2005Date of Patent: March 2, 2010Assignee: ASML Netherlands B.V.Inventors: Bob Streefkerk, Henrikus Herman Cox, Christiaan Alexander Hoogendam, Jeroen Johannes Sophia Maria Mertens, Koen Jacobus Johannes M Zaal, Minne Cuperus
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Publication number: 20090086179Abstract: Systems and methods for measuring stray light in a lithographic apparatus are described using Radiometric Kirk Test (also known as Scanning SAMOS Test). The Radiometric Kirk Test of the present invention involves a test pattern having an isolated dark area within a much larger bright field. The radiometric Kirk test includes at least two continuous or stepped scans of an aperture of a detector in an image plane of a lithographic system. During a dark area measurement, the aperture of the detector is positioned such that at least at one point the aperture of the detector is centered within an image of the dark area. During a bright area measurement, the aperture of the detector is positioned within the image of the bright field. The integrated detector signal is correspondingly computed for the dark area measurement and the bright area measurement.Type: ApplicationFiled: September 23, 2008Publication date: April 2, 2009Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: David A. Hult, Heine Melle Mulder, Minne Cuperus
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Publication number: 20090033905Abstract: An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.Type: ApplicationFiled: October 1, 2008Publication date: February 5, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Bob STREEFKERK, Henrikus Herman Marie Cox, Christiaan Alexander Hoogendam, Jeroen Johannes Sophia Mertens, Koen Jacobus Johannes Zaal, Minne Cuperus