Abstract: An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.

Abstract: A lithographic apparatus comprises a patterning device, a projection system, and a controller. The patterning device is configured to pattern a beam of radiation. The radiation beam comprises a plurality of pulses of radiation. The projection system is configured to project the patterned beam of radiation onto a substrate coated with a layer of radiation sensitive material. The controller is arranged to control a total energy of a respective pulse of the plurality of pulses of the radiation beam. The controller is configured to take into account information indicative of properties of the layer of radiation sensitive material on a part of the substrate onto which the radiation beam is to be projected.

Abstract: A device manufacturing method comprising applying patterns to a plurality of arrays of individually controllable elements, such that they modulate a beam of radiation, and projecting the modulated beam of radiation onto a substrate. The patterns applied to the arrays of individually controllable elements are arranged such that pre-determined amounts of background radiation are included in the modulated beam of radiation. The pre-determined amounts of background radiation being different for different locations on the arrays.

Abstract: A lithographic system is provided in which an extent of overlap between pattern sections is adjusted in order to match a size of a pattern section to a size of a repeating portion of the pattern to be formed.

Abstract: A control system configured to control a position of a fluid supply system, the fluid supply system constructed and arranged to supply a fluid between a substrate and a projection system, the substrate positioned with a substrate stage, the control system including a controller configured to determine a desired position of the fluid supply system based on a position signal to be provided to the substrate stage and a position offset, the position offset added to the position signal to be provided to the substrate stage.

Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.

Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.

Abstract: A lithographic apparatus comprises a substrate table to hold a substrate and a projection system to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system to supply a fluid between the substrate and a final lens element of the projection system as well as a position controller to control a position of the fluid supply system. The position controller is configured to, being provided with a position quantity of the substrate, determine a desired position of the liquid supply system by adding a position offset to the position quantity of the substrate, and position the liquid supply system according to the desired position. The position quantity may comprise a position and/or rotational position of the substrate table and/or a height function of a substrate height.

Abstract: A lithographic apparatus comprises a substrate table to hold a substrate and a projection system to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system to supply a fluid between the substrate and a final lens element of the projection system as well as a position controller to control a position of the fluid supply system. The position controller is configured to, being provided with a position quantity of the substrate, determine a desired position of the liquid supply system by adding a position offset to the position quantity of the substrate, and position the liquid supply system according to the desired position. The position quantity may comprise a position and/or rotational position of the substrate table and/or a height function of a substrate height.

Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.

Abstract: An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.

Abstract: An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.