Patents by Inventor Mitsuhiro Fujita

Mitsuhiro Fujita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120273924
    Abstract: Provided are an actinic-ray- or radiation-sensitive resin composition that excels in the sensitivity, roughness characteristics and exposure latitude, and a method of forming a pattern using the same. The composition includes (A) a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and (B) a compound that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid, the compound being any of compounds of general formula (1-1) below.
    Type: Application
    Filed: December 22, 2011
    Publication date: November 1, 2012
    Applicant: FUJIFILM Corporation
    Inventors: Tomoki Matsuda, Akinori Shibuya, Yoko Tokugawa, Shuhei Yamaguchi, Mitsuhiro Fujita
  • Publication number: 20120164574
    Abstract: Provided is an actinic-ray-sensitive or radiation-sensitive resin composition that is excellent in depth of focus and density distribution dependency, and an actinic-ray-sensitive or radiation-sensitive film and a pattern forming method using the same. An actinic-ray-sensitive or radiation-sensitive resin composition according to the present invention includes (A) a first resin which decomposes by an action of an acid to increase a solubility of the first resin in an alkaline developer, (B) a second resin which includes at least one of a fluorine atom and a silicon atom and is different from the first resin, and (C) an onium salt which includes a nitrogen atom in a cation portion and generates an acid by being decomposed upon irradiation with actinic-ray or radiation.
    Type: Application
    Filed: December 13, 2011
    Publication date: June 28, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Yoko TOKUGAWA, Mitsuhiro FUJITA, Tomoki MATSUDA
  • Publication number: 20120126219
    Abstract: An organic electroluminescent element including: a first electrode; at least one organic deposition layer; and a second electrode, the first electrode, the organic deposition layer, and the second electrode being formed in this order, wherein the organic deposition layer satisfies the relationship 0.093<Ra/t<0.340 where Ra denotes a surface roughness of a surface of the organic deposition layer, the surface being at the side of the second electrode, and t denotes a thickness of the organic deposition layer.
    Type: Application
    Filed: July 12, 2010
    Publication date: May 24, 2012
    Inventors: Tasuku Sato, Kuniyuki Kaminaga, Masayuki Hayashi, Kiyohiko Tsutsumi, Mitsuhiro Fujita
  • Publication number: 20120045634
    Abstract: The present invention relates to a ceramics composite including an inorganic material which includes: a matrix phase including a translucent ceramics; and a phosphor phase including YAG containing Ce, in which a content of the phosphor phase is from 22% by volume to 55% by volume based on the whole phase including the matrix phase and the phosphor phase, a content of Ce in the YAG is 0.005 to 0.05 in terms of an atomic ratio of Ce to Y (Ce/Y), and the ceramics composite has a thickness in a light outgoing direction of 30 ?m to 200 ?m.
    Type: Application
    Filed: August 10, 2011
    Publication date: February 23, 2012
    Applicant: Covalent Materials Corporation
    Inventors: Masaki Irie, Mitsuhiro Fujita
  • Publication number: 20120015302
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, wherein (B) the compound capable of generating an acid upon irradiation with an actinic ray or radiation is contained in an amount of 10 to 30 mass % based on the entire solid content of the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method uses the composition.
    Type: Application
    Filed: March 26, 2010
    Publication date: January 19, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Naohiro Tango, Michihiro Shirakawa, Mitsuhiro Fujita, Shuhei Yamaguchi, Akinori Shibuya, Shohei Kataoka
  • Publication number: 20100255418
    Abstract: According to one embodiment, An actinic-ray- or radiation-sensitive resin composition comprises a basic compound (C) having n basic groups and m groups that when exposed to actinic rays or radiation, generate an acid, provided that n and m satisfy the relationships n?1, m?2 and n<m.
    Type: Application
    Filed: April 5, 2010
    Publication date: October 7, 2010
    Applicant: FUJIFILM Corporation
    Inventors: Shuhei Yamaguchi, Hisamitsu Tomeba, Mitsuhiro Fujita
  • Patent number: 7608553
    Abstract: The invention intends to obtain a transparent yttrium oxide sintered body of which in-line transmittance in a visible wavelength region of 400 to 800 nm at a thickness of 1 mm is 60% or more, without using aluminum that readily segregates in grain boundaries of yttrium oxide, without using special raw materials in which a silicon content is particularly reduced and without finely pulverizing raw materials. A transparent yttrium oxide sintered body that contains, with yttrium oxide as a main component, at least either one of tantalum or niobium or both thereof and has the in-line transmittance of 60% or more at a thickness of 1 mm in a visible wavelength region in the range of 400 to 800 nm.
    Type: Grant
    Filed: October 31, 2006
    Date of Patent: October 27, 2009
    Assignee: Covalent Materials Corporation
    Inventors: Mitsuhiro Fujita, Masaki Irie
  • Patent number: 7240518
    Abstract: The apparatus for producing glass beads of the present invention comprises a melting pot 2 for heating and melting glass, a nozzle 2A for dripping molten glass 4 in the melting pot 2, which is disposed at the bottom of the melting pot 2, and a liquid glass droplet receiver 11 filled with cooling solution 150 for cooling the liquid glass droplet 10 dripped from the nozzle 2A, which is disposed under the nozzle 2A, wherein the cooling solution 150 is made from a material that forms a bubble layer around the liquid glass droplet 10 as the cooling solution 150 is vaporized due to the heat of the liquid glass droplet 10 during a period when the liquid glass droplet 10 is cooled down to a temperature lower than the glass transfer temperature in the cooling solution 150.
    Type: Grant
    Filed: December 25, 2002
    Date of Patent: July 10, 2007
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Masahiro Hiraka, Shigeo Furukawa, Mitsuhiro Fujita
  • Publication number: 20070105708
    Abstract: The invention intends to obtain a transparent yttrium oxide sintered body of which in-line transmittance in a visible wavelength region of 400 to 800 nm at a thickness of 1 mm is 60% or more, without using aluminum that readily segregates in grain boundaries of yttrium oxide, without using special raw materials in which a silicon content is particularly reduced and without finely pulverizing raw materials. A transparent yttrium oxide sintered body that contains, with yttrium oxide as a main component, at least either one of tantalum or niobium or both thereof and has the in-line transmittance of 60% or more at a thickness of 1 mm in a visible wavelength region in the range of 400 to 800 nm.
    Type: Application
    Filed: October 31, 2006
    Publication date: May 10, 2007
    Inventors: Mitsuhiro Fujita, Masaki Irie
  • Publication number: 20050238859
    Abstract: A metal member-buried ceramics article which can uniformalize adsorption force or adsorption force and distribution of temperature in plane, decrease pollution of a semiconductor wafer, and suppress warping of the whole body is provided. This article has a three layer structure comprising, between an upper layer 2 and a lower layer 3 composed of an AlN sintered body in the form of plate, an intermediate connecting layer 4 having a thickness of 0.5 to 10 mm composed of a sintered body of defatted AlN powder and a metal electrode 5 in contact with the inner surface of the upper layer or lower layer or a metal electrode in contact with the inner surface of the upper layer and a metal electric resistor in contact with the inner surface of the lower layer sandwiched between them, and has means for suppressing a stress remaining in sintering the defatted AlN powder.
    Type: Application
    Filed: March 10, 2005
    Publication date: October 27, 2005
    Inventors: Tomonori Uchimaru, Atsushi Arai, Shigeko Muramatsu, Shinichiro Aomura, Mitsuhiro Fujita, Susumu Kimijima, Keisuke Watanabe
  • Patent number: 6838405
    Abstract: A plasma-resistant member for a semiconductor manufacturing apparatus, which can reduce the contamination level on a semiconductor wafer. The contents of Fe, Ni, Cr and Cu are made lower than 1.0 ppm respectively within a depth of at least 10 ?m from surface in a plasma-resistant member.
    Type: Grant
    Filed: August 1, 2002
    Date of Patent: January 4, 2005
    Assignee: Toshiba Ceramics Co., Ltd.
    Inventors: Mitsuhiro Fujita, Keiji Morita
  • Publication number: 20040168473
    Abstract: The apparatus for producing glass beads of the present invention comprises a melting pot 2 for heating and melting glass, a nozzle 2A for dripping molten glass 4 in the melting pot 2, which is disposed at the bottom of the melting pot 2, and a liquid glass droplet receiver 11 filled with cooling solution 150 for cooling the liquid glass droplet 10 dripped from the nozzle 2A, which is disposed under the nozzle 2A, wherein the cooling solution 150 is made from a material that forms a bubble layer around the liquid glass droplet 10 as the cooling solution 150 is vaporized due to the heat of the liquid glass droplet 10 during a period when the liquid glass droplet 10 is cooled down to a temperature lower than the glass transfer temperature in the cooling solution 150.
    Type: Application
    Filed: November 7, 2003
    Publication date: September 2, 2004
    Inventors: Masahiro Hiraka, Shigeo Furukawa, Mitsuhiro Fujita
  • Publication number: 20030034130
    Abstract: A plasma-resistant member for a semiconductor manufacturing apparatus, which can reduce the contamination level on a semiconductor wafer. The contents of Fe, Ni, Cr and Cu are made lower than 1.0 ppm respectively within a depth of at least 10 &mgr;m from surface in a plasma-resistant member.
    Type: Application
    Filed: August 1, 2002
    Publication date: February 20, 2003
    Applicant: TOSHIBA CERAMICS CO., LTD.
    Inventors: Mitsuhiro Fujita, Keiji Morita
  • Patent number: 6492042
    Abstract: The invention is a method of producing a ceramics material comprising the steps of: preparing a raw powder in which alumina particles having an average particle diameter of 0.1-1.0 &mgr;are doped with at least magnesia of 0.01-1 weight % and a solution containing yttrium of 0.1-15 weight % in yttria; molding said raw powder and calcining a molding thus created; and heating the calcined molding in an atmosphere containing a hydrogen gas to create YAG which is leached to the surface to deposit YAG on the surface and sintering the molding.
    Type: Grant
    Filed: July 10, 2001
    Date of Patent: December 10, 2002
    Assignee: Toshiba Ceramics Co., Ltd.
    Inventors: Keiji Morita, Mitsuhiro Fujita, Haruo Murayama
  • Patent number: 6474562
    Abstract: There is provided a nozzle section having a nozzle for injecting gas and a spherical portion composed of a nozzle nut part and a spherical base end portion, respectively on its front end portion and base end portion. There is provided a nozzle case for supporting the spherical portion so as to make an outward gas injection direction of the nozzle adjustable. The spherical base end portion and the nozzle nut part are provided so that they are separated from one another by the rotation of one of the nozzle and nozzle nut part about the axis of the longitudinal direction. The nozzle section which has been adjusted to have a gas injection direction is fixed from the side of the nozzle, thereby simplifying adjustment of a gas injection direction at the nozzle section by eliminating conventionally required additional operations.
    Type: Grant
    Filed: January 3, 2001
    Date of Patent: November 5, 2002
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Yasuo Imanaka, Hiromitsu Harada, Mitsuhiro Fujita, Yukio Miyaki
  • Publication number: 20020012791
    Abstract: The invention of a producing method is a method of producing a ceramics material comprising the steps of: preparing a raw powder in which alumina particles having an average particle diameter of 0.1-1.0 &mgr;are doped with at least magnesia of 0.01-1 weight % and a solution containing yttrium of 0.1-15 weight % in yttria; molding said raw powder and calcining a molding thus created; and heating the calcined molding in an atmosphere containing a hydrogen gas to create YAG which is leached to the surface to deposit YAG on the surface and sintering the molding.
    Type: Application
    Filed: July 10, 2001
    Publication date: January 31, 2002
    Applicant: TOSHIBA CERAMICS CO., LTD.
    Inventors: Keiji Morita, Mitsuhiro Fujita, Haruo Murayama
  • Publication number: 20010020651
    Abstract: There is provided a nozzle section having a nozzle for injecting gas and a spherical portion composed of a nozzle nut part and a spherical base end portion, respectively on its front end portion and base end portion. There is provided a nozzle case for supporting the spherical portion so as to make an outward gas injection direction of the nozzle adjustable. The spherical base end portion and the nozzle nut part are provided so that they are separated from one another by the rotation of one of the nozzle and nozzle nut part about the axis of the longitudinal direction. The nozzle section which has been adjusted to have a gas injection direction is fixed from the side of the nozzle, thereby simplifying adjustment of a gas injection direction at the nozzle section by eliminating conventionally required additional operations.
    Type: Application
    Filed: January 3, 2001
    Publication date: September 13, 2001
    Inventors: Yasuo Imanaka, Hiromitsu Harada, Mitsuhiro Fujita, Yukio Miyaki
  • Patent number: 6225249
    Abstract: The aluminum nitride sintered body of the invention has a thermal conductivity equivalent to that of a high purity aluminum nitride sintered body and a volume resistivity of 1014 &OHgr;·cm or less, and is composed of aluminum nitride phase and yttrium aluminum oxide phase formed at grain boundaries of aluminum nitride phase, where the yttrium aluminum oxide phase is 0.5 to 10 wt % in extremes for aluminum nitride phase, and contains at least one kind of lanthanide element 0.1 to 20 atom % in extremes for yttrium element.
    Type: Grant
    Filed: July 8, 1999
    Date of Patent: May 1, 2001
    Assignee: Toshiba Ceramics Co., Ltd.
    Inventors: Mitsuhiro Fujita, Shinichiro Aonuma, Kouji Sano, Shigeko Muramatsu
  • Patent number: 6151744
    Abstract: A method of and apparatus for cleaning a substrate which require shorter processing time with high processing efficiency are disclosed. A cleaning brush pivots about a pivot axis between two positions. An ultrasonic cleaning nozzle pivots about a pivot axis between two positions. To perform a cleaning process, the cleaning brush and the ultrasonic cleaning nozzle are driven in accordance with a processing pattern previously produced by an operator. The processing pattern is produced so that the movement of the cleaning brush between two positions and the movement of the ultrasonic cleaning nozzle between two positions are not caused simultaneously. Any processing pattern desired by the operator may be produced if this requirement is satisfied. Execution of the cleaning process in accordance with the processing pattern allows cleaning of a substrate using the cleaning brush and the ultrasonic cleaning nozzle at the same time.
    Type: Grant
    Filed: April 14, 1997
    Date of Patent: November 28, 2000
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Masami Ohtani, Masahide Ikeda, Mitsuhiro Fujita, Joichi Nishimura
  • Patent number: 5846327
    Abstract: A substrate spin treating apparatus includes a spin chuck for supporting a substrate in a horizontal posture and spinning the substrate about a vertical axis. A nozzle is provided for supplying a treating solution to the substrate supported by the spin chuck, and a scatter preventive cup in disposed to surround the substrate on the spin chuck and has an inclined surface extending around an entire inner circumference of the cup for downwardly guiding sprays of the treating solution and the like formed by a spinning of the substrate. The scatter preventive cup includes an inner skirt extending around an entire circumference adjacent an upper end of the inclined surface The inner skirt has a surface opposed to the inclined surface and bent away from a spin center of the substrate. This construction suppresses the treating solution from adhering to and accumulating on portions, adjacent the upper end of the inclined surface, of the surface of the inner skirt opposed to the inclined surface.
    Type: Grant
    Filed: March 13, 1997
    Date of Patent: December 8, 1998
    Assignee: Dainippon Screen Mfg. Co. Ltd.
    Inventors: Takanori Kawamoto, Mitsuhiro Fujita