Abstract: A resin composition which includes (a) a solvent, (b) silica particles, (c) a polysiloxane, and (d) a secondary or tertiary amine compound, wherein the solvent (a) includes an organic acid. From the resin composition, an even film is easily formed even on bases having protrusions and recesses, such as lens shapes. The resin composition has satisfactory storage stability.

Abstract: Provided is a resin composition which contains a UV absorbent having high solubility in solvents, and imparts superior UV-cut performance and transparency, and good weather resistance, even when being formed as a thin film. The resin composition contains a UV absorbent (a) and a resin (b), wherein the UV absorbent (a) contains at least two compounds, i.e., a compound (a-1) having a global absorption maximum at less than 340 nm, and a compound (a-2) having a global absorption maximum at 340-380 nm, and the total content of (a-1) and (a-2) is 10-30 mass % of the total solid content.

Abstract: A resin composition including a polysiloxane (A) and a solvent (B), wherein the polysiloxane (A) contains at least one partial structure represented by any of the general formulae (1) to (3), and the relationship between the film thickness X and the film thickness Y, which respectively represent the thickness of a film produced by application of the resin composition and subsequent drying at 100° C. for 3 minutes and the thickness of the film after subsequent heating at 230° C. for 5 minutes, satisfies the following inequation: (X?Y)/x?0.05. The resin composition exhibits excellent coating properties on rugged surface and has excellent planarization properties even if the resin composition is in a form of thin film. (R1 represents a single bond or a C1-4 alkyl group; R2 represents a C1-4 alkyl group; and R3 represents an organic group.

Abstract: An object of the present invention is to provide a transparent photosensitive material that is usable as an interlayer insulating film for metal wires, is excellent in migration resistance and substrate adhesiveness under high temperature and high humidity conditions, and is satisfactory in patternability. The photosensitive resin composition of the present invention contains an acrylic polymer (A1) having, in a side chain thereof, a polymerizable group, a cardo based resin (A2) having a polymerizable group and an alkali-soluble group, and a photopolymerization initiator (B), and contents of the acrylic polymer (A1) and the cardo based resin (A2) satisfy a weight ratio of 1:10 to 10:1.

Abstract: Disclosed is a polymetalloxane including a constituent unit represented by the following general formula (1), which stably exists in a transparent and uniform state in a solution and can form a homogeneous cured film: wherein R1 is an organic group and at least one of R1 is an (R33SiO—) group, R3 is optionally selected from specific groups, R2 is optionally selected from specific groups, when plural R1, R2, and R3 exist, they may be the same or different, M represents a specific metal atom, m is an integer indicating a valence of a metal atom M, and a is an integer of 1 to (m?2).

Abstract: The present invention is aimed at providing a laminated base material capable of conveniently attaining the enhancement in lightness of a decorating layer without requiring a thickened film thickness and an increased number of complicated steps. The present invention provides a laminated base material including a substrate (A), and a layer (B) and a layer (C) sequentially laminated on a surface of the substrate (A), wherein a refractive index nA of the substrate (A) and a refractive index nB of the layer (B) satisfy the relationship of 0.6?nA?nB?0.1, and the layer (C) contains a pigment.

Abstract: A photosensitive resin composition can achieve both resolution of a fine pattern and conductivity after a heat treatment. The photosensitive resin composition includes: (A) conductive fine particles whose surfaces are coated with an elemental carbon and/or a carbon compound, and (B) an alkali-soluble resin having an acid dissociating group.

Abstract: A positive photosensitive resin composition including: a polysiloxane synthesized by hydrolyzing and partially condensing a specific organosilane and an organosilane that has a carboxyl group and/or a dicarboxylic acid anhydride structure; particles of one or more metal compounds selected from an aluminum compound, a tin compound, a titanium compound, and a zirconium compound, or composite particles of a silicon compound and one or more metal compounds selected from an aluminum compound, a tin compound, a titanium compound, and a zirconium compound; a naphthoquinone diazide compound; and a solvent.

Abstract: The present invention provides a negative photosensitive resin composition including the following (a) to (d): (a) metallic compound particles, (b) a polysiloxane compound, (c) a compound having at least 1 group containing an ?,?-unsaturated carboxylate ester structure, and (d) a photopolymerization initiator, the composition also including (e) a compound containing maleimide group.

Abstract: A resin composition which includes (a) a solvent, (b) silica particles, (c) a polysiloxane, and (d) a secondary or tertiary amine compound, wherein the solvent (a) includes an organic acid. From the resin composition, an even film is easily formed even on bases having protrusions and recesses, such as lens shapes. The resin composition has satisfactory storage stability.

Abstract: The present invention aims to provide a substrate having an ITO with a low ITO pattern visibility, which substrate is formed by a method utilizing a simple technique such as coating, printing or the like, and which method is less burdensome from the viewpoints of cost and process; and to provide a touch panel member using the substrate. The present invention provides a substrate including a region where thin layers are laminated on a transparent ground substrate, which thin layers are, in the order mentioned from the upper surface of the substrate: an ITO (Indium Tin Oxide) thin layer (I); an organic thin layer (II) having a film thickness of from 0.01 to 0.4 ?m and a refractive index of from 1.58 to 1.85; and a transparent adhesive thin layer (III) having a refractive index of from 1.46 to 1.52.

Abstract: Disclosed is a photosensitive resin composition which exhibits positive or negative photosensitivity and is used as a mask in an ion implantation step, the photosensitive resin composition including, as a resin, (A) a polysiloxane. The photosensitive resin composition of the present invention has high heat resistance and is capable of controlling a pattern shape, and also has excellent ion implantation mask performance, thus enabling application to a low-cost high-temperature ion implantation process.

Abstract: An impurity-diffusing composition including (A) a polysiloxane represented by Formula (1) and (B) an impurity diffusion component. In the formula, R1 represents an aryl group having 6 to 15 carbon atoms, and a plurality of R1 may be the same or different. R2 represents any of a hydroxyl group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an acyl group having 2 to 6 carbon atoms, and an aryl group having 6 to 15 carbon atoms, and a plurality of R2 may be the same or different. R3 and R4 each represent any of a hydroxyl group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, and an acyl group having 2 to 6 carbon atoms, and a plurality of R3 and a plurality of R4 each may be the same or different. The ratio of n:m is 95:5 to 25:75.

Abstract: The present invention provides a negative-type photosensitive white composition for a touch panel, the composition including: (A) a white pigment; (B) an alkali-soluble resin; (C) a polyfunctional monomer; and (D) a photopolymerization initiator.

Abstract: The purpose of the present invention is to provide a negative-type photosensitive coloring composition ideal for forming a white, light-blocking pattern and which not only has excellent chemical resistance, but also has extremely excellent heat resistance and does not yellow or crack even when undergoing high-temperature processing. This negative-type photosensitive coloring composition contains (A) a white pigment, (B) a polysiloxane obtained by co-hydrolyzate condensation of an alkoxysilane compound containing a compound of a specific structure, (C) polyfunctional acrylic monomers, (D) a photoradical polymerization initiator and (E) an organic solvent.

Abstract: A photosensitive resin composition can achieve both resolution of a fine pattern and conductivity after a heat treatment. The photosensitive resin composition includes: (A) conductive fine particles whose surfaces are coated with an elemental carbon and/or a carbon compound, and (B) an alkali-soluble resin having an acid dissociating group.

Abstract: The present invention provides a negative photosensitive resin composition including the following (a) to (d): (a) metallic compound particles, (b) a polysiloxane compound, (c) a compound having at least 1 group containing an ?,?-unsaturated carboxylate ester structure, and (d) a photopolymerization initiator, the composition also including (e) a compound containing maleimide group.

Abstract: A positive photosensitive resin composition including: a polysiloxane synthesised by hydrolysing and partially condensing a specific organosilane and an organosilane that has a carboxyl group and/or a dicarboxylic acid anhydride structure; particles of one or more metal compounds selected from an aluminium compound, a tin compound, a titanium compound, and a zirconium compound, or composite particles of a silicon compound and one or more metal compounds selected from an aluminium compound, a tin compound, a titanium compound, and a zirconium compound; a naphthoquinone diazide compound; and a solvent.

Abstract: An impurity-diffusing composition including (A) a polysiloxane represented by Formula (1) and (B) an impurity diffusion component. In the formula, R1 represents an aryl group having 6 to 15 carbon atoms, and a plurality of R1 may be the same or different. R2 represents any of a hydroxyl group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an acyl group having 2 to 6 carbon atoms, and an aryl group having 6 to 15 carbon atoms, and a plurality of R2 may be the same or different. R3 and R4 each represent any of a hydroxyl group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, and an acyl group having 2 to 6 carbon atoms, and a plurality of R3 and a plurality of R4 each may be the same or different. The ratio of n:m is 95:5 to 25:75.

Abstract: The present invention aims to provide a substrate having an ITO with a low ITO pattern visibility, which substrate is formed by a method utilizing a simple technique such as coating, printing or the like, and which method is less burdensome from the viewpoints of cost and process; and to provide a touch panel member using the substrate. The present invention provides a substrate including a region where thin layers are laminated on a transparent ground substrate, which thin layers are, in the order mentioned from the upper surface of the substrate: an ITO (Indium Tin Oxide) thin layer (I); an organic thin layer (II) having a film thickness of from 0.01 to 0.4 ?m and a refractive index of from 1.58 to 1.85; and a transparent adhesive thin layer (III) having a refractive index of from 1.46 to 1.52.