Abstract: Provided is a method for etching an etching target layer of a workpiece. The workpiece has a mask on the etching target layer. The etching target layer and the mask are formed from respective materials for which etching efficiency by a plasma of a rare gas having an atomic number greater than an atomic number of argon is higher than etching efficiency for the materials by a plasma of argon gas. The mask is formed from a material having a melting point higher than that of the etching target layer. The method includes (a) exposing the workpiece to a plasma of a first process gas containing a first rare gas having an atomic number greater than the atomic number of argon, and (b) exposing the workpiece to a plasma of a second process gas containing a second rare gas having an atomic number less than the atomic number of argon.

Abstract: A crosslinkable halogen-free resin composition includes a polymer blend, and a metal hydroxide mixed in an amount of 120 to 200 parts by mass per 100 parts by mass of the polymer blend. The polymer blend includes a maleic anhydride-modified high-density polyethylene, 30 to 50 parts by mass of an ethylene-acrylic ester-maleic anhydride terpolymer, 5 to 20 parts by mass of a maleic anhydride modified ethylene-?-olefin copolymer and 10 to 30 parts by mass of an ethylene-acrylic ester copolymer.

Abstract: A crosslinkable halogen-free resin composition includes a polymer blend, and a metal hydroxide mixed in an amount of 120 to 200 parts by mass per 100 parts by mass of the polymer blend. The polymer blend includes a high-density polyethylene, 30 to 50 parts by mass of an ethylene-acrylic ester-maleic anhydride terpolymer, 5 to 20 parts by mass of a maleic anhydride modified ethylene-?-olefin copolymer and 10 to 30 parts by mass of an ethylene-vinyl acetate copolymer.

Abstract: A cable includes a conductor, an insulation coating layer on the conductor, and an outer coating layer on the insulation coating layer. The insulation coating layer is made of a composition containing 100 parts by mass of a base polymer (A) and 100 to 250 parts by mass of a non-halogen flame retardant. The polymer (A) contains 70% to 99% by mass of an ethylene-vinyl acetate copolymer (a1) containing an ethylene-vinyl acetate copolymer having a melting point of 70° C. or higher, and 1% to 30% by mass of an acid-modified polyolefin resin (a2) having a glass transition point of ?55° C. or lower. The polymer (A) contains 25% to 50% by mass of a vinyl acetate component derived from the copolymer (a1). The outer coating layer is made of a composition containing 100 parts by mass of a base polymer (B) and 150 to 220 parts by mass of a non-halogen flame retardant.

Abstract: A halogen-free crosslinkable resin composition includes a base polymer including a high density polyethylene, 30 to 50 parts by mass of an ethylene-acrylic ester-maleic anhydride terpolymer, 5 to 20 parts by mass of an ethylene-?-olefin copolymer modified with maleic anhydride, and 10 to 30 parts by mass of an ethylene-acrylic ester copolymer, and a metal hydroxide of which content is 120 to 200 parts by mass based on 100 parts by mass of the base polymer.

Abstract: An insulated wire includes a conductor, and an insulating cover layer including an inner layer on an outer periphery of the conductor and an outer layer on an outer periphery of the inner layer. The inner layer includes a halogen-free resin composition including base polymer (A), which includes a first ethylene-?-olefin copolymer (a1) and a second ethylene-?-olefin copolymer (a2) at a ratio of 50:50 to 90:10, the first ethylene-?-olefin copolymer (a1) having a density of not less than 0.864 g/cm3 and not more than 0.890 g/cm3, a melting point of not more than 90° C. and a melt flow rate of not less than 1 g/10 min and not more than 5 g/10 min, and the second ethylene-?-olefin copolymer (a2) having a melting point of not less than 55° C. and not more than 80° C. and a melt flow rate of not less than 30 g/10 min.

Abstract: There is provided a cleaning method for removing a first deposit, formed on an upper electrode through an etching of a metal layer containing a metal, by using a plasma generated between a lower electrode of a lower structure and the upper electrode in a processing chamber of a plasma processing apparatus. The method includes a step of colliding ions with the first deposit formed on the upper electrode and a step of removing a second deposit, which is generated by said colliding and formed on the lower structure. Further, a cycle including the step of colliding and the step of removing is repeated multiple times.

Abstract: A crosslinkable halogen-free resin composition includes a base polymer including at least one type of ethylene-vinyl acetate copolymer (EVA) and an acid-modified polyolefin resin having a glass-transition temperature (Tg) as measured by DSC of not more than ?55° C. at a mass ratio of 70:30 to 99:1, and a metal hydroxide included in an amount of 100 to 250 parts by mass per 100 parts by mass of the base polymer. The at least one type of EVA has a melting temperature (Tm) as measured by DSC of not less than 70° C. The base polymer includes 25 to 50 mass % of a vinyl acetate (VA).

Abstract: A video display apparatus is provided wherein even for ones, such as 32 pull-down and 22 pull-down, in which since the motion range of an original material is wide, there is a high probability of degradation of the precision of detected vectors, the processing time is effectively used to enhance the precision of detected vectors, thereby generating interpolated pictures having higher qualities. The apparatus recalculates, based on motion vectors (Va) used in generating the first interpolated picture, motion vectors for use in the next interpolated picture generation, thereby detecting recalculated motion vectors having higher precision and less errors than the original motion vectors. A repeated-picture determining part utilizes an interval, during which identical pictures requiring no vector detections consecutively appear, to further improve the precision of motion vectors.

Abstract: A non-halogen flame retardant electric wire cable includes a conductor, at least one insulating layer formed on an outer periphery of the conductor by coating the conductor with a non-halogen flame retardant resin composition, and a sheath formed on an outer periphery of the outermost insulating layer by coating the outermost insulating layer with the non-halogen flame retardant resin composition. The non-halogen flame retardant resin composition includes a base polymer including any one of ethylene-vinyl acetate copolymer having a vinyl acetate content of 25% by mass or more and polyethylene having a melting peak temperature of 115° C. to 140° C. as measured by DSC and a metal hydroxide. Ratios of the changes in the mass of the sheath and the outermost insulating layer which occur when the sheath and the outermost insulating layer are immersed in xylene heated at 110° C. for 24 hours are 420% or less.

Abstract: A halogen-free flame-retardant wire includes a conductor, and a single insulation layer or a plurality of insulation layers formed by covering an outer periphery of the conductor with a halogen-free flame-retardant resin composition. The single insulation layer or an outermost insulation layer of the plurality of insulation layers includes a halogen-free flame-retardant resin composition including a base polymer including an ethylene-vinyl acetate copolymer (EVA) of not less than 25 mass % in a vinyl acetate content (VA content) or a polyethylene (PE) with a melting peak at 115 to 140° C. measured by a differential scanning calorimetry (DSC), and a metal hydroxide mixed in an amount of 150 to 300 parts by mass per 100 parts by mass of the base polymer. A mass change rate of the single insulation layer or the outermost insulation layer after 24-hour immersion in xylene at 110° C. is not more than 420%.

Abstract: A substrate processing method which is capable of enhancing productivity in manufacturing product substrates. In process chambers of an etching apparatus, etching is carried out on a substrate as an object to be processed, and dummy processing is carried out on at least one non-product substrate before execution of the etching. A host computer determines whether or not the dummy processing is to be executed. The host computer determines whether or not the interior of each of the process chambers and is in a stable state, and omits the execution of the dummy processing when it is determined that it is in the stable state.

Abstract: A non-halogen multilayer insulated wire includes a conductor, an inner layer covering the conductor, and an outer layer formed on the external surface of the inner layer. The inner layer includes a polyolefin resin composition including 60 to 95 parts by mass of a high density polyethylene, 5 to 40 parts by mass of an ethylene copolymer, and 0.1 to 1 part by mass of a metal damage inhibitor. The outer layer includes a polyester resin composition that includes a base polymer mainly including a polyester resin, and further includes, relative to 100 parts by mass of the base polymer, 50 to 150 parts by mass of a polyester block copolymer, 0.5 to 5 parts by mass of a hydrolysis inhibitor, 0.5 to 5 parts by mass of an inorganic porous filler, and 10 to 30 parts by mass of magnesium hydroxide.

Abstract: A method of patterning a substrate is described. The method includes establishing a reference etch process condition for a plasma processing system. The method further includes transferring a mask pattern formed in a mask layer to one or more layers on a substrate using at least one plasma etching process in the plasma processing system to form a feature pattern in the one or more layers and, following the transferring, performing a multi-step dry cleaning process to substantially recover the reference etch condition. Furthermore, the multi-step dry cleaning process includes performing a first dry cleaning process step using plasma formed from a first dry clean process composition containing an oxygen-containing gas, and performing a second dry cleaning process step using plasma formed from a second dry clean process composition containing a halogen-containing gas.

Abstract: An oxygen electrode used in the fuel cell and includes a plurality of carbon particles, a carbon thin-film, and surface nanostructure. The carbon particles are bonded to one another with the carbon thin-film, and the surface nanostructure is formed on the surface of the carbon thin-film. The surface nanostructure comprises catalyst nanoparticles made of platinum (Pt) and carbon nanoparticles. According to this combination of these elements, the catalyst nanoparticles are confined within three-dimensional structure to be formed by the carbon nanoparticles and are immobilized without losing space which allows any reactant to be accessed to the surface of the catalyst nanoparticles.

Abstract: A substrate processing method which is capable of enhancing productivity in manufacturing product substrates. In process chambers of an etching apparatus, etching is carried out on a substrate as an object to be processed, and dummy processing is carried out on at least one non-product substrate before execution of the etching. A host computer determines whether or not the dummy processing is to be executed. The host computer determines whether or not the interior of each of the process chambers and is in a stable state, and omits the execution of the dummy processing when it is determined that it is in the stable state.

Abstract: A ring mechanism, comprising a focus ring and divided cover rings surrounding a wafer W placed on a loading table (lower electrode) mounted in a processing chamber, wherein a ring-shaped clearance ?1 is provided between the divided rings to spread plasma to the radial outside of the focus ring to allow plasma to get therein, whereby a potential difference between the wafer W and the focus ring can be eliminated to prevent arc discharge by plasma from occurring between the wafer W and the focus ring.

Abstract: A video display apparatus is provided wherein even for ones, such as 32 pulldown and 22 pulldown, in which since the motion range of an original material is wide, there is a high probability of degradation of the precision of detected vectors, the processing time is effectively used to enhance the precision of detected vectors, thereby generating interpolated pictures having higher qualities. A liquid crystal display apparatus has a means (14) for converting the frame rate by interpolating a picture, which has been corrected based on an interframe motion vector, between frames of input video signals. When interpolating signals representative of two or three consecutive identical pictures generated in telecine or the like, the liquid crystal display apparatus recalculates, based on motion vectors (Va) used in generating the first interpolated picture, motion vectors for use in the next interpolated picture generation, thereby detecting motion vectors having higher precision and less errors.

Abstract: An oxygen electrode used in the fuel cell and includes a plurality of carbon particles, a carbon thin-film, and surface nanostructure. The carbon particles are bonded to one another with the carbon thin-film, and the surface nanostructure is formed on the surface of the carbon thin-film. The surface nanostructure comprises catalyst nanoparticles made of platinum (Pt) and carbon nanoparticles. According to this combination of these elements, the catalyst nanoparticles are confined within three-dimensional structure to be formed by the carbon nanoparticles and are immobilized without losing space which allows any reactant to be accessed to the surface of the catalyst nanoparticles.

Abstract: The present invention is aimed to realize, in a fuel cell with an oxygen electrode (a catalytic electrode), both catalytic function and immobilization of the catalyst nanoparticles when the catalyst nanoparticles are very small nanoparticles in the size of 1-3 nm. Oxygen electrode used in the fuel cell according to the present invention is an oxygen electrode comprising a plurality of carbon particles, a carbon thin-film, and surface nanostructure, wherein the carbon particles are bonded to one another with the carbon thin-film 2, the surface nanostructure is formed on the surface of the carbon thin-film, the surface nanostructure comprises catalyst nanoparticles made of platinum (Pt) and carbon nanoparticles, diameter of each of the carbon particles is 30 nm or more and 100 nm or less, diameter of the catalyst nanoparticle is 1.7 nm or more and 3.1 nm or less, and diameter of the carbon nanoparticle is 1.0 nm or more and 11.2 nm or less.