Patents by Inventor Mitsuru Ishikawa
Mitsuru Ishikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7663752Abstract: A polarization modulation imaging ellipsometer capable of measuring ellipsometric parameters of the surface of a sample for each of the measured points with high precision and at high speed, which has a light source unit that emits light whose intensity periodically changes at a predetermined frequency; an incident-light optical unit having a collimator, a polarizer, and a photoelastic phase modulator which modulates light emitted from the light source unit an emitted-light optical unit having an analyzer which analyzes a polarization state of light that has been reflected from or transmitted through the sample and a two-dimensional detector which converts light received from the analyzer to an electrical signal and outputs the electrical signal; and a control/analysis unit which operates the light source unit and the photoelastic phase modulator at the same frequency, and calculates ellipsometric parameters of each of the measured points.Type: GrantFiled: April 16, 2007Date of Patent: February 16, 2010Assignee: National Institute of Advanced Industrial Science and TechnologyInventors: Soichi Otsuki, Mitsuru Ishikawa
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METHOD FOR SYNTHESIZING NUCLEIC ACID USING DNA POLYMERASE BETA AND SINGLE MOLECULE SEQUENCING METHOD
Publication number: 20090291440Abstract: The present invention provides a nucleic acid synthesis method capable of continuously carrying out an extension reaction and a single molecule sequencing method capable of obtaining base information accurately at high speed. A method for synthesizing a nucleic acid, including the steps of: forming a complex of a target nucleic acid hybridized to a primer oligonucleotide and a DNA polymerase ?; allowing the DNA polymerase ? to incorporate a fluorescently-labeled dNTP so that the fluorescently-labeled dNTP is bound to the 3? end of the primer oligonucleotide; and allowing the DNA polymerase ? to continuously incorporate fluorescently-labeled dNTP to extend a nucleic acid complementary to the target nucleic acid from the 3? end of the bound fluorescently-labeled dNTP.Type: ApplicationFiled: November 16, 2006Publication date: November 26, 2009Inventors: Ken Hirano, Yoshinobu Baba, Mitsuru Ishikawa, Yoshiyuki Mizushina, Takahiro Nishimoto -
Patent number: 7588641Abstract: A droplet formation method of a mixed liquid is a method that the droplets 71, 72 and 73 are each delivered from each capillary tip to form the droplet 74 of the mixed liquid consisting of a raw material liquid on a substrate by applying a pulse voltage between the raw material liquids stored for each of a plurality of capillaries 1, 2 and 3 and the substrate disposed opposite to each capillary tip. In addition, a droplet formation device of the mixed liquid is provided with a plurality of capillaries for realizing formation of the droplet 74 of the aforementioned mixed liquid, a substrate, a voltage applying device for applying a pulse voltage and a controller for controlling the voltage applying device.Type: GrantFiled: August 28, 2002Date of Patent: September 15, 2009Assignee: Hamamatsu Photonics K.K.Inventors: Osamu Yogi, Tomonori Kawakami, Mitsuru Ishikawa
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Patent number: 7582220Abstract: In an etching method for etching an etching target film formed on a substrate placed inside an airtight processing chamber 104 by inducing a processing gas into the processing chamber 104, the processing gas contains CF4, N2 and Ar and the etching target film is constituted of an upper organic polysiloxane film and a lower inorganic SiO2 film. The flow rate ratio of CF4 and N2 in the processing gas is essentially set within a range of 1?(N2 flow rate/CF4 flow rate)?4. If (N2 flow rate/CF4 flow rate) is less than 1, an etching stop occurs and, as a result, deep etching is not achieved. If, on the other hand, (N2 flow rate/CF4 flow rate) is larger than 4, bowing tends to occur and, thus, a good etching shape is not achieved. Accordingly, the flow rate ratio of CF4 and N2 in the processing gas should be set essentially within a range of 1?(N2 flow rate/CF4 flow rate)?4, to ensure that improvements in both the selection ratio and the etching shape are achieved.Type: GrantFiled: October 26, 2000Date of Patent: September 1, 2009Assignee: Tokyo Electron LimitedInventors: Mitsuru Ishikawa, Masaaki Hagihara, Koichiro Inazawa
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Publication number: 20080049224Abstract: The present invention aims to provide a polarization modulation imaging ellipsometer capable of measuring ellipsometric parameters of the surface of a sample for each of the measured points with high precision and at high speed.Type: ApplicationFiled: April 16, 2007Publication date: February 28, 2008Applicant: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGYInventors: Soichi Otsuki, Mitsuru Ishikawa
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Patent number: 6881587Abstract: A liquid-contained substance analysis device according to this invention comprises: a substrate 14, which is coated on the surface with PVA and which is mirror finished; a first light source 18 for illuminating light onto substrate 14; and light detector 30, which detects the scattered light due to a liquid or a trace of a liquid that exists on substrate 14, and the position of liquid L or trace of liquid L is detected based on the scattered light detected by light detector 30. By then illuminating excitation light from a second light source 20 onto the detected position, the substances contained in liquid L are analyzed.Type: GrantFiled: August 10, 2001Date of Patent: April 19, 2005Assignee: Hamamatsu Photonics K.K.Inventors: Osamu Yogi, Tomonori Kawakami, Mitsuru Ishikawa
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Patent number: 6811090Abstract: A minute droplet forming apparatus comprises a nozzle 1 for storing therewithin a liquid 2 for forming a droplet 3; a substrate 5, disposed so as to face the tip of the nozzle 1, for mounting the droplet 3 dropped from the tip of the nozzle 1; and a pulse power supply 10 for applying a pulse voltage between an electrode 12 arranged in the liquid 2 within the nozzle 1 and the substrate 5. After a liquid column 2a is formed by projecting the liquid from the nozzle tip by applying the pulse voltage between substrate 5 and the electrode 12, a nickel piece 7 disposed within the nozzle 1 is moved to the tip part of the nozzle 1 by an XYZ stage 9 by way of a magnet 8, so as to enhance the fluid resistance in the nozzle tip part, thereby causing a setback force for returning the liquid 2 into the nozzle 1, by which the droplet 3 is isolated from the liquid column 2a.Type: GrantFiled: January 29, 2002Date of Patent: November 2, 2004Assignee: Hamamatsu Photonics K.K.Inventors: Osamu Yogi, Mitsuru Ishikawa, Tomonori Kawakami
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Publication number: 20040182948Abstract: A droplet formation method of a mixed liquid is a method that the droplets 71, 72 and 73 are each delivered from each capillary tip to form the droplet 74 of the mixed liquid consisting of a raw material liquid on a substrate by applying a pulse voltage between the raw material liquids stored for each of a plurality of capillaries 1, 2 and 3 and the substrate disposed opposite to each capillary tip. In addition, a droplet formation device of the mixed liquid is provided with a plurality of capillaries for realizing formation of the droplet 74 of the aforementioned mixed liquid, a substrate, a voltage applying device for applying a pulse voltage and a controller for controlling the voltage applying device.Type: ApplicationFiled: January 21, 2004Publication date: September 23, 2004Inventors: Osamu Yogi, Tomonori Kawakami, Mitsuru Ishikawa
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Publication number: 20030170732Abstract: A liquid-contained substance analysis device according to this invention comprises: a substrate 14, which is coated on the surface with PVA and which is mirror finished; a first light source 18 for illuminating light onto substrate 14; and light detector 30, which detects the scattered light due to a liquid or a trace of a liquid that exists on substrate 14, and the position of liquid L or trace of liquid L is detected based on the scattered light detected by light detector 30. By then illuminating excitation light from a second light source 20 onto the detected position, the substances contained in liquid L are analyzed.Type: ApplicationFiled: February 10, 2003Publication date: September 11, 2003Inventors: Osamu Yogi, Tomonori Kawakami, Mitsuru Ishikawa
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Patent number: 6422033Abstract: An absorption type refrigerating apparatus is provided which is capable of not discharging to the outside but, instead, oxidizes hydrogen gas generated therein to water through reaction with metal oxide to inhibit a reduction of the operational efficiency. The hydrogen gas saved in the condenser 9 is brought in direct contact with a metal oxide of the hydrogen gas removing module 93 provided in the condenser 9. This causes the reducing reaction of the metal oxide to transform the hydrogen gas to water. The module 93 of a reduction unit is accommodated in the condenser 9 thus eliminating the need of a conventional sealing structure where the reduction unit is provided outside and connected by a conduit to the condenser 9. The reducing reaction can favorably be promoted by the heat of a refrigerant vapor introduced into the condenser 9 through its inlet 94.Type: GrantFiled: January 11, 2001Date of Patent: July 23, 2002Assignee: Honda Giken Kogyo Kabushiki KaishaInventors: Mitsuru Ishikawa, Nobuyuki Yuri, Hidetaka Kayanuma
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Publication number: 20020063083Abstract: A minute droplet forming apparatus comprises a nozzle 1 for storing therewithin a liquid 2 for forming a droplet 3; a substrate 5, disposed so as to face the tip of the nozzle 1, for mounting the droplet 3 dropped from the tip of the nozzle 1; and a pulse power supply 10 for applying a pulse voltage between an electrode 12 arranged in the liquid 2 within the nozzle 1 and the substrate 5. After a liquid column 2a is formed by projecting the liquid from the nozzle tip by applying the pulse voltage between substrate 5 and the electrode 12, a nickel piece 7 disposed within the nozzle 1 is moved to the tip part of the nozzle 1 by an XYZ stage 9 by way of a magnet 8, so as to enhance the fluid resistance in the nozzle tip part, thereby causing a setback force for returning the liquid 2 into the nozzle 1, by which the droplet 3 is isolated from the liquid column 2a.Type: ApplicationFiled: January 29, 2002Publication date: May 30, 2002Applicant: HAMAMATSU PHOTONICS K.K.Inventors: Osamu Yogi, Mitsuru Ishikawa, Tomonori Kawakami
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Publication number: 20020057034Abstract: A surface elastic wave device is provided in which an influence of the stress based on a difference of the coefficients of thermal expansion between the surface elastic wave chip and a wiring substrate is reduced and a connection defective due to heat is prevented. When quartz is used for a surface elastic wave substrate (K1) and aluminum is used for the wiring substrate (52), the surface elastic wave device is characterized in that bumps are arranged within a definite area (B1) in aluminum pads (input electrode pad (4), output electrode pad (5), and ground electrode pads (G1 to G8)) placed on a functional surface of the surface elastic wave chip (1). According to the present invention, an area in which the bumps are formed, a film thickness of an aluminum pad (Al film thickness), the chip size of the surface elastic wave chip (1), and the number of the bumps are defined to a surface elastic wave substrate of quartz or LiTaO3.Type: ApplicationFiled: September 29, 1999Publication date: May 16, 2002Inventors: MITSURU ISHIKAWA, YOSHINORI MIZUNO, MICHINOBU TANIOKA, KENICHI OOTAKE
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Publication number: 20010009101Abstract: An absorption type refrigerating apparatus is provided capable of not discharging to the outside but oxidizing hydrogen gas generated therein to water through reaction with metal oxide to inhibit declination of the operational efficiency. The hydrogen gas saved in the condenser 9 is brought in direct contact with a metal oxide of the hydrogen gas removing module 93 provided in the condenser 9. This causes the reducing reaction of the metal oxide to turn the hydrogen gas to water. The module 93 or a reduction unit is accommodated in the condenser 9 thus eliminating the need of a conventional sealing structure where the reduction unit is provided outside and connected by a conduit to the condenser 9. The reducing reaction can favorably be promoted by the heat of a refrigerant vapor introduced into the condenser 9 through its inlet 94.Type: ApplicationFiled: January 11, 2001Publication date: July 26, 2001Applicant: Honda Giken Kogyo Kabushiki KaishaInventors: Mitsuru Ishikawa, Nobuyuki Yuri, Hidetaka Kayanuma
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Patent number: 6247330Abstract: For minimizing declination of the operational efficiency, hydrogen gas generated in an absorption type refrigerator is eliminated by reduction without exhausting to the outside. The hydrogen gas H2 remains close to the level surface 93 of a refrigerant in a condenser 9 is transferred together with a refrigerant vapor via an extraction pipe 92 to a condenser tank 91. The condenser tank 91 is equipped with a heated metal oxide which is allowed to come into direct contact with the hydrogen gas for carrying out its reduction. Accordingly, the hydrogen gas is eliminated and a trace of water is generated. The water is then returned back via the extraction pipe 92 to the condenser 9. As a result, the elimination of the hydrogen gas is successfully carried out while the water generated stays in the system, whereby the content of water in the refrigerant can be maintained to a desired level.Type: GrantFiled: September 30, 1999Date of Patent: June 19, 2001Assignee: Honda Giken Kogyo Kabushiki KaishaInventors: Mitsuru Ishikawa, Nobuyuki Yuri, Hidetaka Kayanuma, Kohichi Miyashita
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Patent number: 6176096Abstract: The purity of a refrigerant liquid can be maintained to an appropriate level without being varied corresponding to a change in the atmospheric condition and the loading state. A portion of the refrigerant liquid in an evaporator is conveyed from the evaporator to the upper end of a rectifier where it is used as a vapor/liquid contact fluid. A temperature sensor T6 is provided at the upper end of the rectifier for detecting the temperature at the top of the rectifier or the temperature of the refrigerant vapor. The temperature and the purity of the refrigerant vapor are closely related to each other. The higher the temperature, the lower the purity is deteriorated. When the temperature T detected by the temperature sensor T6 is higher than a reference temperature level Tref, a flow control valve V5 is actuated to increase the flow of the refrigerant liquid to the rectifier. This recovers the purity of the refrigerant vapor, thus preventing declination of the purity of the refrigerant vapor in the evaporator.Type: GrantFiled: July 29, 1999Date of Patent: January 23, 2001Assignee: Honda Giken Kogyo Kabashika KaishaInventors: Nobuyuki Yuri, Hidetaka Kayanuma, Mitsuru Ishikawa, Toshimitsu Takaishi
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Patent number: 6009721Abstract: An absorption refrigerator is minimized in the size and the weight. A sensible heat exchanger 14 and a cooling fan 19 for cooling the sensible heat exchanger 14 are mounted front and rear opposite to each other to form a cooling unit. At one side of the fan 19, a regenerator 3 and a rectifier 6 are aligned vertically one over the other. At the other side of the fan 19, an evaporator 1 and an absorber 2 of a rectangular configuration are provided side by side. A condenser 9 is laid above the cooling unit. The cooling unit, the evaporator 1, the absorber 2, the condenser 9, the regenerator 3, the rectifier 6, and a set of pumps P1 to P4 all are installed in a main housing 20 of substantially a rectangular parallelopiped shape having a depth reduced axially of the cooling fan 19.Type: GrantFiled: August 24, 1998Date of Patent: January 4, 2000Assignee: Honda Giken Kogyo Kabushiki KaishaInventors: Toru Fukuda, Toshimitsu Takaishi, Mitsuru Ishikawa
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Patent number: 5970739Abstract: In a rectifying apparatus of vapor/liquid contact type, the rectifier 5 is disposed above a regenerator 4 and has two stages, a lower recovery stage and an upper condensation stage. The two stages are filled with filler elements 7a, 7b and 7c, 7d, respectively. Each filler elements 7a and 7c has a conical bottom for biasing the falling liquid towards its center and the rising refrigerant vapor towards its outer edge. The rising speed of the refrigerant vapor is made more uniform and the falling liquid has less tendency to drip down along the side wall. As the contact between the vapor and the liquid is increased, the efficiency of rectification is enhanced.Type: GrantFiled: July 28, 1998Date of Patent: October 26, 1999Assignee: Honda Giken Kogyo Kabushiki KaishaInventors: Nobuyuki Yuri, Manabu Kagawa, Mitsuru Ishikawa
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Patent number: 5965446Abstract: A method for placing fluorescent single molecules on a surface of a substrate includes dropping a sample solution in which fluorescent molecules are dissolved in a predetermined concentration in a volatile, organic solvent, onto a slip of paper placed on the substrate and pulling the slip of paper so as to make the dropped sample solution traverse the surface of the substrate before the organic solvent evaporates. Since a single molecular layer of fluorescent molecules with high uniformity can be placed readily on the surface of the substrate, measurement of fluorescence and measurement of scattered light can be carried out accurately and structural defects of the surface of substrate can be visualized from luminous spots of fluorescence and from luminous spots of scattered light.Type: GrantFiled: October 24, 1997Date of Patent: October 12, 1999Assignee: Hamamatsu Photonics K.K.Inventor: Mitsuru Ishikawa
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Patent number: 5901567Abstract: An absorption refrigerating/heating apparatus in which a refrigerant vapor generated in the evaporator (1) is absorbed to produce absorption heat by the absorbent in an absorber (2). There are first tube for chilled water in the evaporator, a second tube for cooling water in the absorber, a third tube in an indoor unit (15), and a forth tube in a sensible heat exchanger. The first tube and the second tube are respectively connected to the third tube and the fourth tube in a cooling operation, while to the fourth tube and the third tube respectively in a heating operation.Type: GrantFiled: November 25, 1997Date of Patent: May 11, 1999Assignee: Honda Giken Kogyo Kabushiki KaishaInventors: Akira Suzuki, Manabu Kagawa, Tooru Fukuda, Toshimitsu Takaishi, Mitsuru Ishikawa, Hidetaka Kayanuma
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Patent number: 5802869Abstract: Pipings for joining pumps for delivering absorbent solution and refrigerant with an absorber and an evaporator are eliminated for minimizing the dimensions of the absorber or the evaporator, preventing leakage under pressure, and reducing heat loss and cavitation. Two pumps P2 and P3 for circulating and delivering the absorbent solution in a lower tank 21 are mounted in side-by-side relationship in a recess of a base 23 of the lower tank 21. The base 23 has a space therein for accommodating an impeller 36. The space forms a part of pump chamber communicated to a flow passage 37.Type: GrantFiled: April 3, 1997Date of Patent: September 8, 1998Assignee: Honda Giken Kogyo Kabushiki KaishaInventors: Manabu Kagawa, Mitsuru Ishikawa