Patents by Inventor Mitsuyoshi Koizumi

Mitsuyoshi Koizumi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100167431
    Abstract: A laser processing apparatus which achieves both shorter TAT and reduction in processing defects. In the apparatus, a laser radiation section, an undulation measurement section for measuring undulation of a substrate or a film thickness measuring section for measuring the thickness of a thin film formed on the substrate, and an optical inspection section for optically inspecting grooves formed by laser-processing the thin film on the substrate are fixed so that their positional relationship is kept constant.
    Type: Application
    Filed: October 1, 2009
    Publication date: July 1, 2010
    Inventors: Hironaru YAMAGUCHI, Mikio Hongo, Mitsuyoshi Koizumi, Masaki Araki
  • Publication number: 20100103397
    Abstract: A position of a chuck 10 is detected. The movements of the stages 5 and 7 are controlled according to a result of detecting the position of the chuck 10, so as to position the chuck 10. Further, a light receiving means 51 is disposed on the chuck 10 for receiving a light beam irradiated from a head 20a of a light beam irradiation device 20. The misalignment of the head 20a of the light beam irradiation device 20 is detected based on the received light beam. According to a result of detecting the misalignment, a coordinate of drawing data supplied to a DMD driving circuit 27 of each light beam irradiation device 20 is modified. Moreover, the drawing data with the modified coordinate is supplied to the DMD driving circuit 27 of each light beam irradiation device 20.
    Type: Application
    Filed: August 13, 2009
    Publication date: April 29, 2010
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Ryouji Nemoto, Tomoaki Hayashi, Satoshi Uehara, Mitsuyoshi Koizumi
  • Publication number: 20100060878
    Abstract: A chuck 10 which supports a substrate 1 is moved by using an X-direction stage 5, and a position of the chuck 10 is detected at the same time. A traveling error of the X-direction stage 5 is detected according to a detecting result of position of the chuck 10. Then, a coordinate of drawing data supplied to a driving circuit 27 of a light beam irradiation device 20 is modified according to a detecting result of the traveling error of the X-direction stage 5, and the patterned data having the modified coordinate is supplied to the driving circuit 27 of the light beam irradiation device 20. Even if the traveling error such as shifting or yawing occurs in the X-direction stage 5, patterns can still be precisely drawn.
    Type: Application
    Filed: August 11, 2009
    Publication date: March 11, 2010
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: RYOUJI NEMOTO, TOMOAKI HAYASHI, SATOSHI UEHARA, MITSUYOSHI KOIZUMI, HIDETSUGU YUKI
  • Publication number: 20100040964
    Abstract: A range of a coordinate of drawing data supplied to a digital micromirror device (DMD) driving circuit 27 of a light beam irradiation device 20 is determined to configure a bandwidth of a light beam irradiated from an irradiation optical system of the light beam irradiation device 20. The drawing data having the determined range of the coordinate is supplied to the DMD driving circuit 27 of the light beam irradiation device 20. Movement of a stage 7 is controlled to move a chuck 10 for only a distance less than the bandwidth of the light beam irradiated from the irradiation optical system of the light beam irradiation device 20 towards a direction perpendicular to a scanning direction of the substrate by the light beam of the light beam irradiation device 20, at each scanning, and a same region of the substrate is scanned multiple times.
    Type: Application
    Filed: August 13, 2009
    Publication date: February 18, 2010
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: RYOUJI NEMOTO, Tomoaki Hayashi, Satoshi Uehara, Mitsuyoshi Koizumi
  • Patent number: 6284119
    Abstract: A DNA base sequencer including a gel electrophoretic means having tracks for electrophoresing fluorophore-labelled DNA fragments, a laser diode as a light source for illuminating said tracks with exciting laser light and a CCD sensor for detecting the fluorescence emitted from the illuminated DNA fragments, the laser diode has a control unit including a Peltier device for controlling the temperature of the laser diode, a Peltier device temperature setting generating means having a processor and a memory, and a temperature control circuit that generates a drive current to the Peltier device for controlling its temperature. The CCD sensor receives part of the exciting light from the laser diode as stray light and detects its wavelength.
    Type: Grant
    Filed: August 30, 1999
    Date of Patent: September 4, 2001
    Assignee: Hitachi Electronics Engineering Co., Ltd.
    Inventors: Hiroaki Machida, Yusuke Miyazaki, Mitsuyoshi Koizumi
  • Patent number: 6172709
    Abstract: A video camera system comprises a lens block and a camera block which are attachable and detachable through a block coupling mechanism to and from each other. The detachable lens block incorporates a focus lens drive mechanism for driving a focus lens and an autofocus control section for executing autofocus control. The autofocus control section receives a composite video signal obtained by processing a video signal from an image pickup device in a signal processing section of the camera block. The autofocus control section produces a focus control signal on the basis of the composite video signal to control the focus lens drive mechanism for the execution of the autofocus control. In addition, the detachable lens block is composed of an iris drive mechanism for optically adjusting an aperture of a lens and an autoiris control section for automatically controlling the iris drive mechanism, so that automatic iris control is executed on the basis of the composite video signal outputted from the camera block.
    Type: Grant
    Filed: December 12, 1997
    Date of Patent: January 9, 2001
    Assignees: Yamamo Optical, Ltd., Hitachi Video and Information System, Inc.
    Inventors: Shiro Yamano, Mitsuyoshi Koizumi, Makoto Amano, Akira Tamura
  • Patent number: 5245403
    Abstract: An apparatus for detecting extraneous substances on a glass plate includes a first light projecting system arranged above a plane under examination on a glass plate, the surface of which is irradiated with an S-polarized laser beam at a first elevation angle, a second light projecting system arranged above the surface thereof which is irradiated with a P-polarized laser beam at a second elevation angle greater than the first elevation angle, and a light receiving system for receiving scattered light from the surface irradiated with the laser beams respectively emitted from the first and the second light projecting system at an elevation angle smaller than the first elevation angle. The light receiving system is arranged on a side opposite to the direction of irradiation with the normal line set up at the laser beam irradiation point therebetween and the output level of the P-polarized laser beam is set in specific relation to the S-polarized laser beam.
    Type: Grant
    Filed: December 27, 1991
    Date of Patent: September 14, 1993
    Assignee: Hitachi Electronics Engineering Co., Ltd.
    Inventors: Noboru Kato, Izuo Horai, Toshihiro Kimura, Mitsuyoshi Koizumi
  • Patent number: 5225886
    Abstract: Disclosed herein are method of and apparatus for detecting a foreign substance on an object by illuminating said object, detecting via an optical system light reflected from said object and detecting said foreign substance in distinction from a background. The object is exposed to first illumination such that light reflected from said background is suppressed but light reflected from said foreign substance is highlighted relative to the light reflected from said background. The light reflected from said object as a result of said first illumination is detected, thereby obtaining a first detection signal. The object is exposed to second illumination such that light reflected from said background is free from suppression relative to the light reflected from said substance as a result of said second illumination. The light reflected from said object as a result of said second illumination is detected, thereby obtaining a second detection signal.
    Type: Grant
    Filed: September 18, 1990
    Date of Patent: July 6, 1993
    Assignee: Hitachi, Ltd.
    Inventors: Mitsuyoshi Koizumi, Yoshimasa Ohshima
  • Patent number: 5146509
    Abstract: A circuit pattern to be inspected is imaged so that an image signal representing the circuit pattern to be inspected is produced. The image signal of the circuit pattern is compared with a reference circuit pattern image signal, wherein a part of the image signal discerned to be different from the latter is detected as a candidate defect, at a rate synchronized with the rate of imaging. A local image signal corresponding to each local image covering a region including every one of detected candidate defects is extracted and stored in a memory device. Thereafter, on the basis of the local image signal read out from the memory device, whether or not the candidate defect concerned is fatally harmful with regard to electrical conductivity is examined at a rate asynchronous with the imaging rate.
    Type: Grant
    Filed: August 28, 1990
    Date of Patent: September 8, 1992
    Assignees: Hitachi, Ltd., Hitachi Video Engineering, Inc.
    Inventors: Yasuhiko Hara, Mitsuyoshi Koizumi, Shigeki Kitamura
  • Patent number: 5098191
    Abstract: Method of inspecting reticles and an apparatus therefor, where means for holding and transferring an inspected reticle and a standard reticle respectively, means for illuminating light with spatial coherency adjusted onto both reticles respectively, and an objective lens for collecting transmitted light or reflected light from the illuminated body produced by the illuminating, are installed on respective Fourier transformation surfaces of both reticle surfaces, and a light blocking plate for blocking light corresponding to the adjusted spatial coherency is installed, and electric signals obtained are compared thereby a defect or a foreign substance existing on the inspected reticle can be detected.
    Type: Grant
    Filed: October 19, 1989
    Date of Patent: March 24, 1992
    Assignee: Hitachi, Ltd.
    Inventors: Minori Noguchi, Hiroaki Shishido, Mitsuyoshi Koizumi, Nobuyuki Akiyama, Toshihilo Nakata
  • Patent number: 5046847
    Abstract: A method and apparatus for detecting foreign matter on a sample by illuminating a stripe-shaped region with linearly polarized light. Some of the light reflected by the sample is intercepted by a light intercepting stage, and the rest of the light reflected by the sample, which passes through the light intercepting stage is directed to a detecting optical system, to be detected by a photo-detector. The sample is illuminated obliquely at a predetermined angle with respect to a group of straight lines constituting a primary pattern on the sample. The angle is selected so that the diffraction light reflected by the group of straight lines does not enter the detecting optical system. A polarizing spatial filter using a liquid crystal element may be disposed in a predetermined restricted region in a spacial frequency region, or Fourier transformation plane, within the detecting optical system.
    Type: Grant
    Filed: October 25, 1988
    Date of Patent: September 10, 1991
    Assignee: Hitachi Ltd.
    Inventors: Toshihiko Nakata, Nobuyuki Akiyama, Yoshihiko Yamuchi, Mitsuyoshi Koizumi, Yoshimasa Oshima
  • Patent number: 4952058
    Abstract: A system for detecting abnormal patterns in a surface pattern on the surface of a sample wherein, when the abnormal pattern has a portion smaller than the surface pattern, the light for illuminating the sample is stopped down to an opening so that the abnormal pattern can be distinguished over the surface pattern, the surface pattern is limited to a predetermined opening by the illumination light to form an image on a detector, and the surface pattern detected by the detector is processed to detect the abnormal pattern in the surface pattern. Further, the plurality of light rays having good directivity are illuminated onto a point on the surface of the sample from dissimilar directions maintaining a predetermined angle of incidence, the detect signals are separated to be corresponded to said light rays, and the above processing is carried out to enhance the precision of detection.
    Type: Grant
    Filed: April 22, 1988
    Date of Patent: August 28, 1990
    Assignee: Hitach, Ltd.
    Inventors: Minori Noguchi, Hiroaki Shishido, Mitsuyoshi Koizumi
  • Patent number: 4933565
    Abstract: The present invention relates to a method and apparatus for correcting defects of an X-ray mask which includes a focused ion beam used to irradiate at least a region having a defective portion of an X-ray mask having a protective film and eliminating the protective film; exposing a circuit pattern having a defective portion located under the region or setting this circuit pattern to the state near the exposure; detecting one of the secondary electrons, secondary ions, reflected electrons, or absorbing current generated from that region and detecting a true defective position. Then positioning the focused ion beam to the true defective position and irradiating the focused ion beam to the defective portion thereby correcting the defect.
    Type: Grant
    Filed: July 8, 1988
    Date of Patent: June 12, 1990
    Assignee: Hitachi, Ltd.
    Inventors: Hiroshi Yamaguchi, Keiya Saito, Mitsuyoshi Koizumi, Akira Shimase, Satoshi Haraichi, Tateoki Miyauchi, Shinji Kuniyoshi, Susumu Aiuchi
  • Patent number: 4922308
    Abstract: A method of and an apparatus for detecting a fine foreign substance in which the surface of a specimen is illuminated with linearly-polarized laser beam to detect light scattered from the surface and having passed through a polarization filter, the back side of the specimen is illuminated with light from a light source such as a mercury lamp to obtain the light and darkness information or phase information on the specimen surface by transmitted light from the specimen, and fine massive and filmy foreign substances on the specimen surface are detected on the basis of information given by the scattered light and transmitted light.
    Type: Grant
    Filed: June 29, 1987
    Date of Patent: May 1, 1990
    Assignee: Hitachi, Ltd.
    Inventors: Minori Noguchi, Mitsuyoshi Koizumi, Hiroaki Shishido, Sachio Uto, Yoshimasa Ohshima
  • Patent number: 4814596
    Abstract: Disclosed is an apparatus for detecting particles comprising semiconductor laser drive means for performing feedback control of semiconductor lasers, each thereof incorporating a sensor therewith for monitoring laser-output thereof, by using the output of the sensor, means for holding the feedback voltage, illuminating means including a plurality of optical means disposed to oppose each other so that the laser-outputs from the semiconductor lasers are obliquely applied onto a specimen, and detection means for detecting the light scattered from the particles present on the specimen.
    Type: Grant
    Filed: July 17, 1987
    Date of Patent: March 21, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Mitsuyoshi Koizumi, Yoshimasa Ohshima
  • Patent number: 4740079
    Abstract: The present invention provides a method for detecting foreign substances which detects a foreign substance with a first photoelectric conversion element by emphasizing the foreign substance and detects a background on the object with a second photoelectric conversion element by emphasizing the background and detects a foreign substance detection signal obtained from the first photoelectric conversion element by emphasizing the signal with a detection signal obtained from the second photoelectric conversion element.
    Type: Grant
    Filed: October 28, 1985
    Date of Patent: April 26, 1988
    Assignee: Hitachi, Ltd.
    Inventors: Mitsuyoshi Koizumi, Yoshimasa Ohshima, Minoru Tanaka
  • Patent number: 4674875
    Abstract: Method and apparatus for inspecting surface defects of a sample in which oblique illumination is applied onto a surface of the sample and in which illuminance of reflected beams generated from the surface is measured. Shading plate having double pinholes or double slits is used as means for shading a scattered beam from aventurine prominences of the sample surface to fully shade the scattered beam so that the inspection is accurately executed.
    Type: Grant
    Filed: December 7, 1984
    Date of Patent: June 23, 1987
    Assignee: Hitachi, Ltd.
    Inventor: Mitsuyoshi Koizumi
  • Patent number: 4669875
    Abstract: The foreign particle detecting method and apparatus are disclosed wherein a polarized laser beam emitted by a laser beam irradiating system from a direction inclined with respect to the direction perpendicular to the surface of a substrate is used by a scanning means to linearly scan the substrate surface from a direction approximately 90.degree. with respect to the laser light irradiating direction; and the laser light reflected from a foreign particle on the substrate surface is detected by a polarized light analyzer and a photoelectric conversion device from a direction set approximately equal to said scanning direction and inclined with respect to the direction perpendicular to the substrate surface.
    Type: Grant
    Filed: November 3, 1983
    Date of Patent: June 2, 1987
    Assignee: Hitachi, Ltd.
    Inventors: Masataka Shiba, Sachio Uto, Mitsuyoshi Koizumi
  • Patent number: 4668089
    Abstract: An exposure apparatus comprises a light source, a mask plate having an exposure pattern area section and an alignment/reflection area section, a projection lens, a movable stage for holding a workpiece having a workpiece alignment mark, an alignment control and a driver for the movable stage. Before the exposure pattern area section is illuminated by the light source to be projected through the projection lens onto the workpiece, the workpiece is properly aligned with the mask. Alignment between the mask plate and the workpiece is performed by the effective use of the alignment/reflection area section specifically arranged and having a specific structure.
    Type: Grant
    Filed: December 20, 1984
    Date of Patent: May 26, 1987
    Assignee: Hitachi, Ltd.
    Inventors: Yoshitada Oshida, Masataka Shiba, Toshihiko Nakata, Mitsuyoshi Koizumi, Naoto Nakashima
  • Patent number: RE33991
    Abstract: The foreign particle detecting method and apparatus are disclosed wherein a polarized laser beam emitted by a laser beam irradiating system from a direction inclined with respect to the direction perpendicular to the surface of a substrate is used by a scanning means to linearly scan the substrate surface from a direction approximately 90.degree. with respect to the laser light irradiating direction; and the laser light reflected from a foreign particle on the substrate surface is detected by a polarized light analyzer and a photoelectric conversion device from a direction set approximately equal to said scanning direction and inclined with respect to the direction perpendicular to the substrate surface.
    Type: Grant
    Filed: June 2, 1989
    Date of Patent: July 14, 1992
    Assignee: Hitachi, Ltd.
    Inventors: Masataka Shiba, Sachio Uto, Mitsuyoshi Koizumi