Abstract: An automatic contaminants detection apparatus comprises a polarized laser beam source, a polarized laser beam irradiation optical system having irradiation angle switching means for switching an irradiation angle depending on the presence or absence of a pattern on a sample surface to irradiate the polarized laser beam emitted by the polarized laser beam source to the sample surface with an angle of grazing, a detector for detecting condensed scattered or reflected lights of the laser beam from the sample surface with or without interleave of an analyzer, and analyzer switching means for inserting or removing the analyzer into or from a detection light path of the detector depending on the presence or absence of the pattern on the sample surface. The apparatus can detect contaminants on the patterned or non-patterned sample surface with a high sensitivity.

Abstract: An apparatus for detecting contaminants depositing on the reticle of a reduction projection mask aligner comprises a laser spot projector which conducts a laser beam to the light path upstream of the condenser lens of the aligner such that the laser beam is in the same direction as of the exposure light beam. The laser spot projector projects the laser beam from above the reticle through the condenser lens so as to form a laser spot on the upper surface of the reticle. A laser spot scanner which scans the entire area of the reticle by the laser spot projected on to the reticle by the laser spot projector, and a photoelectric detector which receives the scattered light emitted aslant on the reticle surface, whereby a contaminant on the reticle is detected in accordance with the signal produced by the detector.

Abstract: A wafer transforming device defines an airtight space by means of a base, a hollow case, and a diaphragm type chuck which is fixed to the upper end of the case by suction. In this space, a large number of vertically moving elements are arranged at predetermined intervals. In the state in which a wafer is held by suction by means of the chuck and in which the chuck is held in contact with the upper ends of the vertically moving elements by supplying a vacuum pressure into the space, the vertically moving elements located within a required range are selectively actuated. Thus, the chuck is pushed up, and the wafer held on the chuck by the suction is transformed into a desired state.

Abstract: An X ray exposure process and system for transferring a mask pattern onto a wafer with use of X rays, wherein heights on the mask at many points are measured on a light interference band basis by a mask-height measuring device of non-contact measurement type at an X ray exposure position, the mask being mounted on a chamber which is filled with a He gas and or the like to prevent attenuation of an X ray source, heights on the wafer at many points are measured at a wafer-height measuring position different from said exposure position, and according to the measured results, the wafer is finely moved upwardly or downwardly (that is, deformed) individually independently by means of a chuck which sucks and holds the wafer at many points thereon so that, a gap between the mask and wafer is adjusted to a desired level.

Abstract: A test apparatus for detecting defects on a plate is disclosed. An illumination light is focused to one surface of the plate and another illumination light is focused to the other surface of the plate, and scattered light from the defects on the surfaces are detected to separately detect the defects on the front and rear surfaces of the plate.

Abstract: A focusing position detecting device in which a laser beam is directed through an objective lens toward the surface of an object to form a minute spot on the surface of the object, and the beam reflected from the surface of the object is led through the objective lens again toward a concentrating point, so as to detect the focusing position of the objective lens by measuring the position of the concentrating point. In the device, a photoelectric element is provided to detect the intensity of the reflected beam, and the intensity of the laser beam is so controlled that the output of the photoelectric element is maintained constant.

Abstract: A method and apparatus of inspecting a surface of a specimen for the presence of defects, foreign substance and the like are disclosed. The surface has a mark such as a cutting mark formed thereon and composed of fine grooves or recesses extending in a predetermined direction. The surface is scanned two-dimensionally with an irradiating laser beam impinging or illuminating on the specimen surface perpendicularly thereto. Those of the irregularly scattered laser light rays reflected from the specimen surface which are in a first direction perpendicular to the lengthwise direction of the mark are intercepted by a shielding member or caused to pass through regions other than a reflecting region of a reflecting mirror, while those scattered light rays which are in other directions than the first direction are directed to a photoelectric converter tube along a bypass path across the shielding member or through reflection of the mirror.