Patents by Inventor Moon Suh
Moon Suh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20210033499Abstract: Disclosed herein is a method comprising directing, from a distribution unit, a stream comprising at least one of solid CO2 particles or CO2 droplets toward an article, wherein the article comprises a plurality of surface particles, and wherein the stream comprising at least one of solid CO2 particles or CO2 droplets causes at least a portion of the plurality of surface particles on the article to dislodge from the surface of the article; collecting, on a surface of a substrate having a pre-determined initial state comprising initial surface particles on the surface of the substrate or a real-time aerosol sampling unit, at least some of the portion of the plurality of surface particles dislodged from the surface of the article; analyzing the surface of the substrate after performing the collecting; and determining at least one of a size, a morphology, a chemical composition, a particle number concentration, or a particle size distribution of the portion of the plurality of surface particles that were dislodgedType: ApplicationFiled: August 1, 2019Publication date: February 4, 2021Inventors: ChangGong Wang, Zhili Zuo, Chang Ke, Song-Moon Suh
-
Patent number: 10755903Abstract: A method of cleaning a remote plasma source includes supplying a first cycle of one or more first cleaning gases to a remote plasma source. The method includes supplying a second cycle of one or more second cleaning gases to the remote plasma source. The method includes supplying one or more cooling fluids to one or more cooling conduits coupled with the remote plasma source.Type: GrantFiled: January 4, 2017Date of Patent: August 25, 2020Assignee: Applied Materials, Inc.Inventors: Sidharth Bhatia, Zhili Zuo, Hidehiro Kojiri, Anjana M. Patel, Song-Moon Suh, Ganesh Balasubramanian
-
Publication number: 20200255938Abstract: Physical vapor deposition methods for reducing the particulates deposited on the substrate are disclosed. The pressure during sputtering can be increased to cause agglomeration of the particulates formed in the plasma. The agglomerated particulates can be moved to an outer portion of the process chamber prior to extinguishing the plasma so that the agglomerates fall harmlessly outside of the diameter of the substrate.Type: ApplicationFiled: February 11, 2020Publication date: August 13, 2020Applicant: Applied Materials, Inc.Inventors: Halbert Chong, Lei Zhou, Adolph Miller Allen, Vaibhav Soni, Kishor Kalathiparambil, Vanessa Faune, Song-Moon Suh
-
Publication number: 20200230782Abstract: Embodiments of methods and apparatus for cleaning contaminants from a substrate are disclosed herein. In some embodiments, a substrate cleaning apparatus includes: a substrate support to support a substrate along an edge of the substrate, wherein the substrate further includes a first side and an opposing second side having contaminants disposed on the second side; a showerhead disposed a first distance of about 1.5 mm to about 4.4 mm opposite the substrate support and facing the first side of the substrate; and one or more nozzles disposed a second distance of about 1 inch to about 2 inches beneath the substrate support to discharge a mixture of solid and gaseous carbon dioxide toward the contaminants on the second side of the substrate, and wherein the one or more nozzles have an angle of about 20 to about 40 degrees.Type: ApplicationFiled: April 2, 2020Publication date: July 23, 2020Inventors: Pulkit AGARWAL, Bonnie T. CHIA, Song-Moon SUH, Cheng-Hsiung TSAI, Dhritiman Subha KASHYAP, Xiaoxiong YUAN, Eric RIESKE
-
Publication number: 20200105626Abstract: Methods and apparatus for simulating arcing that can occur during substrate fabrication is provided. In some embodiments, the method includes: loading a bare silicon substrate that has been pretreated with at least one of polybutylene terephthalate (PBT) or a film into a testing environment, performing a physical vapor deposition (PVD) process on the bare silicon substrate, and determining arcing occurrences on the bare silicon substrate caused during the PVD process.Type: ApplicationFiled: February 5, 2019Publication date: April 2, 2020Inventors: MINGDONG LI, LEI ZHOU, CHAO DU, YONG CAO, CHEN GONG, BO XIE, YONGMEI CHEN, SONG-MOON SUH, RONGJUN WANG, XIANMIN TANG
-
Publication number: 20190326152Abstract: Methods and apparatus for supporting a substrate are provided herein. In some embodiments, a substrate support to support a substrate having a given diameter includes: a base ring having an inner diameter less than the given diameter, the base ring having a support surface configured to contact a first surface of the substrate and to form a seal between the support surface and the first surface of the substrate, when disposed atop the base ring; and a clamp ring having an inner diameter less than the given diameter, wherein the clamp ring includes a contact surface proximate the inner diameter configured to contact an upper surface of the substrate, when present, and wherein the clamp ring and the base ring are further configured to provide a bias force toward each other to clamp the substrate in the substrate support.Type: ApplicationFiled: April 18, 2019Publication date: October 24, 2019Inventors: CHANG KE, BONNIE CHIA, SONG-MOON SUH, CHENG-HSIUNG TSAI, YUANHONG GUO, LEI ZHOU, DAVID LANGTRY
-
Patent number: 10431489Abstract: Embodiments of apparatus for supporting a substrate are disclosed herein. In some embodiments, an apparatus for supporting a substrate includes: a support surface; and a plurality of substrate contact elements protruding from the support surface, wherein the plurality of substrate contact elements are formed of a material having a hardness less than or equal to a hardness of silicon, having a low adhesion, having a coefficient of static friction large enough to prevent sliding, having a surface roughness less than or equal to 10 Ra, and that is electrically conductive.Type: GrantFiled: November 26, 2014Date of Patent: October 1, 2019Assignee: APPLIED MATERIALS, INC.Inventors: Pulkit Agarwal, Song-Moon Suh, Glen Mori, Steven V. Sansoni
-
Publication number: 20190210061Abstract: Methods and apparatus for removing deposits in self-assembled monolayer (SAM) based selective deposition process schemes using cryogenic gas streams are described. Some methods include removing deposits in self-assembled monolayer (SAM) based selective depositions by exposing the substrate to cryogenic aerosols to remove undesired deposition on SAM protected surfaces. Processing chambers for cryogenic gas assisted selective deposition are also described.Type: ApplicationFiled: January 8, 2019Publication date: July 11, 2019Inventors: Chang Ke, Song-Moon Suh, Liqi Wu, Michael S. Jackson, Lei Zhou, Biao Liu, Cheng Pan, Paul F. Ma, Mei Chang
-
Patent number: 10217650Abstract: A substrate cleaning apparatus may include a substrate support having a support surface to support a substrate to be cleaned, wherein the substrate support is rotatable about a central axis normal to the support surface; a first nozzle to provide a first cleaning gas to a region of the inner volume corresponding to the position of an edge of the substrate when the substrate is supported by the support surface of the substrate support; a first annular body disposed opposite and spaced apart from the support surface of the substrate support by a gap, the first annular body having a central opening defined by an inner wall shaped to provide a reducing size of the gap between the first annular body and the support surface in a radially outward direction; and a first gas inlet to provide a first gas to the central opening of the first annular body.Type: GrantFiled: September 13, 2016Date of Patent: February 26, 2019Assignee: APPLIED MATERIALS, INC.Inventors: James Matthew Holden, Song-Moon Suh, Todd Egan, Kalyanjit Ghosh, Leon Volfovski, Michael R. Rice, Richard Giljum
-
Patent number: 9925639Abstract: Disclosed herein are systems and methods for cleaning a ceramic article using a stream of solid carbon dioxide (CO2) particles. A method includes flowing liquid CO2 into a spray nozzle, and directing a first stream of solid CO2 particles from the spray nozzle toward a ceramic article for a first time duration to clean the ceramic article. The liquid CO2 is converted into the first stream of solid CO2 particles upon exiting the spray nozzle. The first stream of solid CO2 particles causes a layer of solid CO2 to be formed on the ceramic article. After the layer of solid CO2 has sublimated, a second stream of solid CO2 particles is directed from the spray nozzle toward the ceramic article for at least one of the first time duration or a second time duration to further clean the ceramic article.Type: GrantFiled: July 18, 2014Date of Patent: March 27, 2018Assignee: APPLIED MATERIALS, INC.Inventors: Song-Moon Suh, Yuanhong Guo, Guangchi Xuan, Pulkit Agarwal
-
Publication number: 20170207069Abstract: A method of cleaning a remote plasma source includes supplying a first cycle of one or more first cleaning gases to a remote plasma source. The method includes supplying a second cycle of one or more second cleaning gases to the remote plasma source. The method includes supplying one or more cooling fluids to one or more cooling conduits coupled with the remote plasma source.Type: ApplicationFiled: January 4, 2017Publication date: July 20, 2017Inventors: Sidharth BHATIA, Zhili ZUO, Hidehiro KOJIRI, Anjana M. PATEL, Song-Moon SUH, Ganesh BALASUBRAMANIAN
-
Publication number: 20170018441Abstract: A substrate cleaning apparatus may include a substrate support having a support surface to support a substrate to be cleaned, wherein the substrate support is rotatable about a central axis normal to the support surface; a first nozzle to provide a first cleaning gas to a region of the inner volume corresponding to the position of an edge of the substrate when the substrate is supported by the support surface of the substrate support; a first annular body disposed opposite and spaced apart from the support surface of the substrate support by a gap, the first annular body having a central opening defined by an inner wall shaped to provide a reducing size of the gap between the first annular body and the support surface in a radially outward direction; and a first gas inlet to provide a first gas to the central opening of the first annular body.Type: ApplicationFiled: September 13, 2016Publication date: January 19, 2017Inventors: JAMES MATTHEW HOLDEN, SONG-MOON SUH, TODD EGAN, KALYANJIT GHOSH, LEON VOLFOVSKI, MICHAEL R. RICE, RICHARD GILJUM
-
Publication number: 20160322239Abstract: Embodiments of methods and apparatus for cleaning contaminants from a substrate are disclosed herein. In some embodiments, a substrate cleaning apparatus includes: a substrate support to support a substrate along an edge of the substrate, wherein the substrate further includes a first side and an opposing second side having contaminants disposed on the second side; a showerhead disposed a first distance of about 1.5 mm to about 4.4 mm opposite the substrate support and facing the first side of the substrate; and one or more nozzles disposed a second distance of about 1 inch to about 2 inches beneath the substrate support to discharge a mixture of solid and gaseous carbon dioxide toward the contaminants on the second side of the substrate, and wherein the one or more nozzles have an angle of about 20 to about 40 degrees.Type: ApplicationFiled: June 24, 2015Publication date: November 3, 2016Inventors: Pulkit AGARWAL, Bonnie T. CHIA, Song-Moon SUH, Cheng-Hsiung TSAI, Dhritiman Subha KASHYAP, Xiaoxiong YUAN, Eric RIESKE
-
Patent number: 9443714Abstract: A substrate cleaning apparatus may include a substrate support having a support surface to support a substrate to be cleaned, wherein the substrate support is rotatable about a central axis normal to the support surface; a first nozzle to provide a first cleaning gas to a region of the inner volume corresponding to the position of an edge of the substrate when the substrate is supported by the support surface of the substrate support; a first annular body disposed opposite and spaced apart from the support surface of the substrate support by a gap, the first annular body having a central opening defined by an inner wall shaped to provide a reducing size of the gap between the first annular body and the support surface in a radially outward direction; and a first gas inlet to provide a first gas to the central opening of the first annular body.Type: GrantFiled: March 5, 2013Date of Patent: September 13, 2016Assignee: APPLIED MATERIALS, INC.Inventors: James Matthew Holden, Song-Moon Suh, Todd Egan, Kalyanjit Ghosh, Leon Volfovski, Michael R. Rice, Richard Giljum
-
Patent number: 9425076Abstract: Embodiments of apparatus for supporting a substrate are disclosed herein. In some embodiments, an apparatus for supporting a substrate includes a support member; and a plurality of substrate contact elements protruding from the support member, wherein each of the plurality of substrate contact elements includes: a first contact surface to support a substrate when placed thereon; and a second contact surface extending from the first contact surface, wherein the second contact surface is adjacent a periphery of the substrate to prevent radial movement of the substrate, wherein the first contact surface is at a first angle with respect to the support member and the second contact surface is at a second angle with respect to the support member, and wherein the first angle is between about 3 degrees and 5 degrees.Type: GrantFiled: September 3, 2014Date of Patent: August 23, 2016Assignee: APPLIED MATERIALS, INC.Inventors: Pulkit Agarwal, Daniel Greenberg, Song-Moon Suh, Jeffrey Brodine, Steven V. Sansoni, Glen Mori
-
Patent number: 9269562Abstract: Embodiments of the present invention generally relate to a method for cleaning a processing chamber during substrate processing. During a first substrate processing step, a plasma is formed from a gas mixture of argon, helium, and hydrogen in the processing chamber. In a second substrate processing step, an argon plasma is formed in the processing chamber.Type: GrantFiled: January 17, 2013Date of Patent: February 23, 2016Assignee: APPLIED MATERIALS, INC.Inventors: Robert Dinsmore, John C. Forster, Song-Moon Suh, Cheng-Hsiung Tsai, Glen T. Mori
-
Patent number: 9252002Abstract: Shutter disk assemblies for use in process chambers to protect a substrate support disposed below the shutter disk assembly from undesired material deposition are provided herein. In some embodiments, a shutter disk assembly for use in a process chamber to protect a substrate support disposed below the shutter disk assembly may include an upper disk member having a top surface and a bottom surface; and a lower carrier member having at least a portion of the lower carrier member disposed below a portion of the upper disk member to support the upper disk member and to create a protective overlap region that prevents exposure of the substrate support upon deformation of the upper disk member.Type: GrantFiled: July 17, 2012Date of Patent: February 2, 2016Assignee: APPLIED MATERIALS, INC.Inventors: Cheng-Hsiung Matthew Tsai, Ananthkrishna Jupudi, Robert Dinsmore, Song-Moon Suh
-
Publication number: 20160016286Abstract: Disclosed herein are systems and methods for cleaning a ceramic article using a stream of solid carbon dioxide (CO2) particles. A method includes flowing liquid CO2 into a spray nozzle, and directing a first stream of solid CO2 particles from the spray nozzle toward a ceramic article for a first time duration to clean the ceramic article. The liquid CO2 is converted into the first stream of solid CO2 particles upon exiting the spray nozzle. The first stream of solid CO2 particles causes a layer of solid CO2 to be formed on the ceramic article. After the layer of solid CO2 has sublimated, a second stream of solid CO2 particles is directed from the spray nozzle toward the ceramic article for at least one of the first time duration or a second time duration to further clean the ceramic article.Type: ApplicationFiled: July 18, 2014Publication date: January 21, 2016Inventors: Song-Moon Suh, Yuanhong Guo, Guangchi Xuan, Pulkit Agarwal
-
Publication number: 20160005638Abstract: Embodiments of apparatus for supporting a substrate are disclosed herein. In some embodiments, an apparatus for supporting a substrate includes a support member; and a plurality of substrate contact elements protruding from the support member, wherein each of the plurality of substrate contact elements includes: a first contact surface to support a substrate when placed thereon; and a second contact surface extending from the first contact surface, wherein the second contact surface is adjacent a periphery of the substrate to prevent radial movement of the substrate, wherein the first contact surface is at a first angle with respect to the support member and the second contact surface is at a second angle with respect to the support member, and wherein the first angle is between about 3 degrees and 5 degrees.Type: ApplicationFiled: September 3, 2014Publication date: January 7, 2016Inventors: PULKIT AGARWAL, DANIEL GREENBERG, SONG-MOON SUH, JEFFREY BRODINE, STEVEN V. SANSONI, GLEN MORI
-
Patent number: 9177782Abstract: A substrate cleaning apparatus may include a substrate support member to support a substrate having a first side and a contaminated second side; a liquid carbon dioxide source; a gaseous carbon dioxide source; and one or more nozzles coupled to the liquid carbon dioxide source and to the gaseous carbon dioxide source, wherein the one or more nozzles are configured to receive liquid carbon dioxide and to discharge a first mixture of solid and gaseous carbon dioxide from the liquid carbon dioxide source to the second side of the substrate and to receive gaseous carbon dioxide and to discharge a second mixture of solid and gaseous carbon dioxide from the gaseous carbon dioxide source to the second side of the substrate. Methods of cleaning a substrate may be performed in the substrate cleaning apparatus.Type: GrantFiled: March 5, 2013Date of Patent: November 3, 2015Assignee: APPLIED MATERIALS, INC.Inventors: James Matthew Holden, Song-Moon Suh, Shalina D. Sudheeran, Glen T. Mori